[go: up one dir, main page]

FR3077925B1 - Circuit integre tridimensionnel face a face de structure simplifiee - Google Patents

Circuit integre tridimensionnel face a face de structure simplifiee Download PDF

Info

Publication number
FR3077925B1
FR3077925B1 FR1851255A FR1851255A FR3077925B1 FR 3077925 B1 FR3077925 B1 FR 3077925B1 FR 1851255 A FR1851255 A FR 1851255A FR 1851255 A FR1851255 A FR 1851255A FR 3077925 B1 FR3077925 B1 FR 3077925B1
Authority
FR
France
Prior art keywords
face
integrated circuit
chip
line
simplified structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR1851255A
Other languages
English (en)
Other versions
FR3077925A1 (fr
Inventor
Didier Lattard
Sebastien Thuries
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR1851255A priority Critical patent/FR3077925B1/fr
Priority to US16/268,764 priority patent/US10777537B2/en
Publication of FR3077925A1 publication Critical patent/FR3077925A1/fr
Application granted granted Critical
Publication of FR3077925B1 publication Critical patent/FR3077925B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H10W90/00
    • H10W20/427
    • H10W70/635
    • H10W72/90
    • H10W80/161
    • H10W80/301
    • H10W90/20
    • H10W90/288
    • H10W90/291
    • H10W90/297
    • H10W90/722
    • H10W90/724
    • H10W90/754

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Manufacturing & Machinery (AREA)
  • Geometry (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

L'invention concerne un circuit intégré (9) comprenant : -une première puce (1) comportant un empilement d'un substrat (100), d'une couche d'interconnexion de début de ligne (101) et de couches d'interconnexion de fin de ligne (111-117) ; -une deuxième puce (2) comportant un empilement d'un substrat (200), d'une couche d'interconnexion de début de ligne (201) et de couches d'interconnexion de fin de ligne (211-216) ; -un réseau d'interconnexion (3) des première et deuxième puces. -la couche d'interconnexion de fin de ligne (118) de niveau de métallisation le plus élevé de la première puce (1) inclut un réseau de distribution de puissance ; -la couche d'interconnexion de fin de ligne (216) de niveau de métallisation le plus élevé de la deuxième puce (2) est dépourvue de réseau de distribution de puissance.
FR1851255A 2018-02-14 2018-02-14 Circuit integre tridimensionnel face a face de structure simplifiee Active FR3077925B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR1851255A FR3077925B1 (fr) 2018-02-14 2018-02-14 Circuit integre tridimensionnel face a face de structure simplifiee
US16/268,764 US10777537B2 (en) 2018-02-14 2019-02-06 Face-to-face three-dimensional integrated circuit of simplified structure

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1851255 2018-02-14
FR1851255A FR3077925B1 (fr) 2018-02-14 2018-02-14 Circuit integre tridimensionnel face a face de structure simplifiee

Publications (2)

Publication Number Publication Date
FR3077925A1 FR3077925A1 (fr) 2019-08-16
FR3077925B1 true FR3077925B1 (fr) 2021-06-18

Family

ID=62455658

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1851255A Active FR3077925B1 (fr) 2018-02-14 2018-02-14 Circuit integre tridimensionnel face a face de structure simplifiee

Country Status (2)

Country Link
US (1) US10777537B2 (fr)
FR (1) FR3077925B1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7307355B2 (ja) 2018-09-28 2023-07-12 株式会社ソシオネクスト 半導体集積回路装置および半導体パッケージ構造
CN113470578B (zh) * 2020-03-31 2022-06-17 北京小米移动软件有限公司 显示驱动模组、显示面板和电子设备
DE102021104688A1 (de) * 2020-04-30 2021-11-04 Taiwan Semiconductor Manufacturing Co., Ltd. Stromverteilungsstruktur und verfahren
US12255148B2 (en) * 2020-04-30 2025-03-18 Taiwan Semiconductor Manufacturing Company, Ltd. Power distribution structure and method
KR20220057116A (ko) 2020-10-29 2022-05-09 삼성전자주식회사 반도체 패키지

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004158524A (ja) * 2002-11-05 2004-06-03 Sony Corp 半導体素子および素子配線方法
WO2005122257A1 (fr) * 2004-06-07 2005-12-22 Fujitsu Limited Composant à semiconducteur incorporant un condensateur et procédé de fabrication de celui-ci
JP2007134468A (ja) * 2005-11-10 2007-05-31 Kawasaki Microelectronics Kk 半導体集積回路
JP2007173760A (ja) * 2005-11-25 2007-07-05 Matsushita Electric Ind Co Ltd 半導体集積回路及びその設計方法
JP5084380B2 (ja) * 2007-07-17 2012-11-28 株式会社東芝 半導体設計装置および半導体回路
JP4967164B2 (ja) * 2008-03-19 2012-07-04 Necインフロンティア株式会社 多層プリント配線板及びそれを用いた電子機器
KR101024241B1 (ko) * 2008-12-26 2011-03-29 주식회사 하이닉스반도체 반도체 장치 및 그를 포함하는 반도체 패키지
US8344512B2 (en) * 2009-08-20 2013-01-01 International Business Machines Corporation Three-dimensional silicon interposer for low voltage low power systems
JP5420671B2 (ja) * 2009-09-14 2014-02-19 株式会社日立製作所 半導体装置
JP5364023B2 (ja) * 2010-03-29 2013-12-11 パナソニック株式会社 半導体装置
US8674510B2 (en) * 2010-07-29 2014-03-18 Taiwan Semiconductor Manufacturing Company, Ltd. Three-dimensional integrated circuit structure having improved power and thermal management
US8445918B2 (en) * 2010-08-13 2013-05-21 International Business Machines Corporation Thermal enhancement for multi-layer semiconductor stacks
US8576578B2 (en) * 2011-06-27 2013-11-05 International Business Machines Corporation Robust power plane configuration in printed circuit boards
WO2013168354A1 (fr) * 2012-05-10 2013-11-14 パナソニック株式会社 Circuit intégré tridimensionnel avec structure de stabilisation pour tension d'alimentation, et procédé pour sa fabrication
US9041206B2 (en) * 2013-03-12 2015-05-26 Taiwan Semiconductor Manufacturing Company, Ltd. Interconnect structure and method
US9625186B2 (en) * 2013-08-29 2017-04-18 Taiwan Semiconductor Manufacturing Co., Ltd. Cooling system for 3D IC
US9741691B2 (en) * 2015-04-29 2017-08-22 Qualcomm Incorporated Power delivery network (PDN) design for monolithic three-dimensional (3-D) integrated circuit (IC)
US11041211B2 (en) * 2018-02-22 2021-06-22 Xilinx, Inc. Power distribution for active-on-active die stack with reduced resistance

Also Published As

Publication number Publication date
US20190252353A1 (en) 2019-08-15
US10777537B2 (en) 2020-09-15
FR3077925A1 (fr) 2019-08-16

Similar Documents

Publication Publication Date Title
FR3077925B1 (fr) Circuit integre tridimensionnel face a face de structure simplifiee
Burns et al. Three-dimensional integrated circuits for low-power, high-bandwidth systems on a chip
US20240321833A1 (en) Fully Interconnected Heterogeneous Multi-layer Reconstructed Silicon Device
US10930619B2 (en) Multi-wafer bonding structure and bonding method
Pak et al. Electrical characterization of trough silicon via (TSV) depending on structural and material parameters based on 3D full wave simulation
US8796140B1 (en) Hybrid conductor through-silicon-via for power distribution and signal transmission
US20160095221A1 (en) Integration of electronic elements on the backside of a semiconductor die
US9515035B2 (en) Three-dimensional integrated circuit integration
US7700410B2 (en) Chip-in-slot interconnect for 3D chip stacks
US8516426B2 (en) Vertical power budgeting and shifting for three-dimensional integration
KR20160036666A (ko) 수동 부품용 중첩체 기판을 구비한 다이 패키지
CN102341907A (zh) 使用先介电键合后通孔形成的三维集成电路的集成
TWI843735B (zh) 半導體裝置及半導體裝置之製造方法
CN105321929B (zh) 一种三维光电集成结构及其制作方法
CN116457941B (zh) 多芯片封装结构、制造方法以及电子设备
Liu et al. Fan-out embedded bridge solution in HPC application
US20170345796A1 (en) Electronic device with stacked electronic chips
US20140073133A1 (en) Method to mitigate through-silicon via-induced substrate noise
TW202407945A (zh) 用於邏輯電路的佈線連接的系統以及積體電路及其製造方法
WO2022160102A1 (fr) Structure d'empilement de puces et son procédé de fabrication, boîtier d'empilement de puces et dispositif électronique
US10756061B2 (en) Multi-layer chip and fabrication method thereof
US20250220926A1 (en) High bandwidth memory cube
US20080237882A1 (en) Annular via drilling (AVD) technology
US20220208712A1 (en) Multi-level bridge interconnects
US20050109525A1 (en) Methods and apparatus for integrated circuit device power distribution via internal wire bonds

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 2

PLSC Publication of the preliminary search report

Effective date: 20190816

PLFP Fee payment

Year of fee payment: 3

PLFP Fee payment

Year of fee payment: 4

PLFP Fee payment

Year of fee payment: 5

PLFP Fee payment

Year of fee payment: 6

PLFP Fee payment

Year of fee payment: 7

PLFP Fee payment

Year of fee payment: 8