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FR2408972A1 - High flux plasma source and accelerator - use VHF magnetic field injected into slot structure via tapered waveguide and sealing window - Google Patents

High flux plasma source and accelerator - use VHF magnetic field injected into slot structure via tapered waveguide and sealing window

Info

Publication number
FR2408972A1
FR2408972A1 FR7734239A FR7734239A FR2408972A1 FR 2408972 A1 FR2408972 A1 FR 2408972A1 FR 7734239 A FR7734239 A FR 7734239A FR 7734239 A FR7734239 A FR 7734239A FR 2408972 A1 FR2408972 A1 FR 2408972A1
Authority
FR
France
Prior art keywords
magnetic field
slot
high flux
tapered waveguide
plasma source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7734239A
Other languages
French (fr)
Other versions
FR2408972B1 (en
Inventor
Georges Mourier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7734239A priority Critical patent/FR2408972A1/en
Publication of FR2408972A1 publication Critical patent/FR2408972A1/en
Application granted granted Critical
Publication of FR2408972B1 publication Critical patent/FR2408972B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

A plasma source is used which provides a high flux output. It is based on a gaseous discharge in a UHF magnetic field. The particle velocity is relatively low to allow interactions within a reduced length. The plasma (4) generated is accelerated as a 'sheet' by the magnetic field established by a propagating series of slot electrodes (31). The slot spacing is slightly less than the critical value required to prevent the plasma from entering the structure. The field is injected into the slot structure (31) at one side via a tapered waveguide (2) and sealing window (20). The source gas enters from a central channel (5) opening into the slot volume.
FR7734239A 1977-11-15 1977-11-15 High flux plasma source and accelerator - use VHF magnetic field injected into slot structure via tapered waveguide and sealing window Granted FR2408972A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7734239A FR2408972A1 (en) 1977-11-15 1977-11-15 High flux plasma source and accelerator - use VHF magnetic field injected into slot structure via tapered waveguide and sealing window

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7734239A FR2408972A1 (en) 1977-11-15 1977-11-15 High flux plasma source and accelerator - use VHF magnetic field injected into slot structure via tapered waveguide and sealing window

Publications (2)

Publication Number Publication Date
FR2408972A1 true FR2408972A1 (en) 1979-06-08
FR2408972B1 FR2408972B1 (en) 1980-04-25

Family

ID=9197596

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7734239A Granted FR2408972A1 (en) 1977-11-15 1977-11-15 High flux plasma source and accelerator - use VHF magnetic field injected into slot structure via tapered waveguide and sealing window

Country Status (1)

Country Link
FR (1) FR2408972A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0100611A1 (en) * 1982-07-30 1984-02-15 Energy Conversion Devices, Inc. Reduced capacitance electrode assembly
EP0420117A3 (en) * 1989-09-26 1991-10-09 Idemitsu Petrochemical Co. Ltd. Microwave plasma generating apparatus and process for the preparation of diamond thin film utilizing same
EP0420101A3 (en) * 1989-09-25 1991-10-16 Ryohei Itatani Microwave plasma generating apparatus
US5270616A (en) * 1989-09-25 1993-12-14 Ryohei Itatani Microwave plasma generating apparatus
US20160217979A1 (en) * 2013-08-30 2016-07-28 National Institute Of Advanced Industrial Science And Technology Microwave plasma processing device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1367094A (en) * 1971-02-13 1974-09-18 Weissfloch C F Wertheimer M R Plasma-generating apparatus and process

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1367094A (en) * 1971-02-13 1974-09-18 Weissfloch C F Wertheimer M R Plasma-generating apparatus and process

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NV8072/77 *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0100611A1 (en) * 1982-07-30 1984-02-15 Energy Conversion Devices, Inc. Reduced capacitance electrode assembly
EP0420101A3 (en) * 1989-09-25 1991-10-16 Ryohei Itatani Microwave plasma generating apparatus
US5270616A (en) * 1989-09-25 1993-12-14 Ryohei Itatani Microwave plasma generating apparatus
EP0420117A3 (en) * 1989-09-26 1991-10-09 Idemitsu Petrochemical Co. Ltd. Microwave plasma generating apparatus and process for the preparation of diamond thin film utilizing same
US5188862A (en) * 1989-09-26 1993-02-23 Idemitsu Petrochemical Company Limited Microwave plasma generating apparatus and process for the preparation of diamond thin film utilizing same
US20160217979A1 (en) * 2013-08-30 2016-07-28 National Institute Of Advanced Industrial Science And Technology Microwave plasma processing device

Also Published As

Publication number Publication date
FR2408972B1 (en) 1980-04-25

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