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FR2228241B1 - - Google Patents

Info

Publication number
FR2228241B1
FR2228241B1 FR7415470A FR7415470A FR2228241B1 FR 2228241 B1 FR2228241 B1 FR 2228241B1 FR 7415470 A FR7415470 A FR 7415470A FR 7415470 A FR7415470 A FR 7415470A FR 2228241 B1 FR2228241 B1 FR 2228241B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7415470A
Other versions
FR2228241A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Publication of FR2228241A1 publication Critical patent/FR2228241A1/fr
Application granted granted Critical
Publication of FR2228241B1 publication Critical patent/FR2228241B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H10P95/00—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B17/00—Details of cameras or camera bodies; Accessories therefor
    • G03B17/24—Details of cameras or camera bodies; Accessories therefor with means for separately producing marks on the film, e.g. title, time of exposure
    • G03B17/245—Optical means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Holders For Sensitive Materials And Originals (AREA)
  • Projection-Type Copiers In General (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
FR7415470A 1973-05-03 1974-05-03 Expired FR2228241B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2107373A GB1473301A (en) 1973-05-03 1973-05-03 Manufacture of multi-layer structures

Publications (2)

Publication Number Publication Date
FR2228241A1 FR2228241A1 (fr) 1974-11-29
FR2228241B1 true FR2228241B1 (fr) 1978-08-04

Family

ID=10156749

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7415470A Expired FR2228241B1 (fr) 1973-05-03 1974-05-03

Country Status (6)

Country Link
US (1) US4007988A (fr)
JP (1) JPS5234907B2 (fr)
DE (1) DE2421509C3 (fr)
FR (1) FR2228241B1 (fr)
GB (1) GB1473301A (fr)
NL (1) NL7406011A (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2708682C3 (de) * 1977-02-28 1981-04-09 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Justieren einer Belichtungsmaske relativ zu einer Substratscheibe bei der Fotolithografie
US4232969A (en) * 1979-05-30 1980-11-11 International Business Machines Corporation Projection optical system for aligning an image on a surface
JPS58116541A (ja) * 1981-12-29 1983-07-11 Canon Inc 整合方法
US4479711A (en) * 1982-12-02 1984-10-30 Canon Kabushiki Kaisha Mask aligner
US4679942A (en) * 1984-02-24 1987-07-14 Nippon Kogaku K. K. Method of aligning a semiconductor substrate and a photomask
DE10102540B4 (de) * 2001-01-19 2013-03-21 Vistec Semiconductor Systems Jena Gmbh Anordnung und Verfahren zur Identifikation von Substraten

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3264106A (en) * 1961-11-13 1966-08-02 Harold H Alldis Pin registration board and method
US3299777A (en) * 1965-06-14 1967-01-24 Harris Intertype Corp Web register mechanism
FR1542515A (fr) * 1966-07-21 1968-09-09 Ibm Montage à réglage automatique servant à réaliser un cadrage optique
FR95303E (fr) * 1967-02-13 1970-08-21 Olivetti General Electric Spa Procédé de fabrication de dessins photographiques pour circuits imprimés.
US3490846A (en) * 1967-06-01 1970-01-20 Kasper Instruments Optical alignment and exposure apparatus
GB1312825A (en) * 1969-04-19 1973-04-11 Licentia Gmbh Method and apparatus for bringing a mask and a semiconductor body into register with one another
FR2046588A5 (fr) * 1970-04-30 1971-03-05 Bassereau Roger
US3742229A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask alignment system

Also Published As

Publication number Publication date
US4007988A (en) 1977-02-15
FR2228241A1 (fr) 1974-11-29
DE2421509A1 (de) 1974-11-21
JPS5019365A (fr) 1975-02-28
GB1473301A (en) 1977-05-11
DE2421509C3 (de) 1979-12-20
NL7406011A (fr) 1974-11-05
JPS5234907B2 (fr) 1977-09-06
DE2421509B2 (de) 1976-10-07

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Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse