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FR2132745B1 - - Google Patents

Info

Publication number
FR2132745B1
FR2132745B1 FR7212244A FR7212244A FR2132745B1 FR 2132745 B1 FR2132745 B1 FR 2132745B1 FR 7212244 A FR7212244 A FR 7212244A FR 7212244 A FR7212244 A FR 7212244A FR 2132745 B1 FR2132745 B1 FR 2132745B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7212244A
Other versions
FR2132745A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2132745A1 publication Critical patent/FR2132745A1/fr
Application granted granted Critical
Publication of FR2132745B1 publication Critical patent/FR2132745B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H10W74/43—
    • H10P50/283—
    • H10P50/73—
    • H10P95/00—
    • H10W20/40—
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/08—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by electric discharge, e.g. by spark erosion
FR7212244A 1971-04-08 1972-04-07 Expired FR2132745B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2117199A DE2117199C3 (de) 1971-04-08 1971-04-08 Verfahren zur Herstellung geätzter Muster in dünnen Schichten mit definierten Kantenprofilen

Publications (2)

Publication Number Publication Date
FR2132745A1 FR2132745A1 (fr) 1972-11-24
FR2132745B1 true FR2132745B1 (fr) 1976-06-11

Family

ID=5804229

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7212244A Expired FR2132745B1 (fr) 1971-04-08 1972-04-07

Country Status (8)

Country Link
US (1) US3839177A (fr)
JP (1) JPS5123265B1 (fr)
CA (1) CA966085A (fr)
DE (1) DE2117199C3 (fr)
FR (1) FR2132745B1 (fr)
GB (1) GB1383848A (fr)
IT (1) IT960866B (fr)
NL (1) NL7204499A (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7213625A (fr) * 1972-10-07 1974-04-09
GB1485015A (en) * 1974-10-29 1977-09-08 Mullard Ltd Semi-conductor device manufacture
US4123663A (en) * 1975-01-22 1978-10-31 Tokyo Shibaura Electric Co., Ltd. Gas-etching device
NL7607298A (nl) * 1976-07-02 1978-01-04 Philips Nv Werkwijze voor het vervaardigen van een inrichting en inrichting vervaardigd volgens de werkwijze.
JPS5812234B2 (ja) * 1976-12-24 1983-03-07 一實 奥田 表示入りダイヤモンドの製造方法
NL8303316A (nl) * 1983-09-28 1985-04-16 Philips Nv Werkwijze voor het vervaardigen van een inrichting voor het uitzenden van licht.
US4543320A (en) * 1983-11-08 1985-09-24 Energy Conversion Devices, Inc. Method of making a high performance, small area thin film transistor
DE3569265D1 (en) * 1985-01-17 1989-05-11 Ibm Deutschland Process for the production of low-resistance contacts
DE10135872A1 (de) * 2001-07-24 2003-02-27 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung einer Linse

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3410774A (en) * 1965-10-23 1968-11-12 Ibm Method and apparatus for reverse sputtering selected electrically exposed areas of a cathodically biased workpiece
US3474021A (en) * 1966-01-12 1969-10-21 Ibm Method of forming openings using sequential sputtering and chemical etching
US3479269A (en) * 1967-01-04 1969-11-18 Bell Telephone Labor Inc Method for sputter etching using a high frequency negative pulse train
US3483108A (en) * 1967-05-29 1969-12-09 Gen Electric Method of chemically etching a non-conductive material using an electrolytically controlled mask
US3585121A (en) * 1967-11-17 1971-06-15 Nat Res Dev Diffraction gratings
US3676317A (en) * 1970-10-23 1972-07-11 Stromberg Datagraphix Inc Sputter etching process
US3733258A (en) * 1971-02-03 1973-05-15 Rca Corp Sputter-etching technique for recording holograms or other fine-detail relief patterns in hard durable materials

Also Published As

Publication number Publication date
JPS5123265B1 (fr) 1976-07-15
NL7204499A (fr) 1972-10-10
DE2117199B2 (de) 1974-01-24
CA966085A (en) 1975-04-15
DE2117199A1 (de) 1972-10-12
FR2132745A1 (fr) 1972-11-24
GB1383848A (en) 1974-02-12
DE2117199C3 (de) 1974-08-22
IT960866B (it) 1973-11-30
US3839177A (en) 1974-10-01

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Legal Events

Date Code Title Description
ST Notification of lapse