FR1603558A - Cleaning heating surfaces with complexing agent soln - Google Patents
Cleaning heating surfaces with complexing agent solnInfo
- Publication number
- FR1603558A FR1603558A FR1603558DA FR1603558A FR 1603558 A FR1603558 A FR 1603558A FR 1603558D A FR1603558D A FR 1603558DA FR 1603558 A FR1603558 A FR 1603558A
- Authority
- FR
- France
- Prior art keywords
- soln
- heating surfaces
- complexing agent
- cleaning heating
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000008139 complexing agent Substances 0.000 title abstract 2
- 238000010438 heat treatment Methods 0.000 title abstract 2
- 238000004140 cleaning Methods 0.000 title 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 abstract 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 abstract 2
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 abstract 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 abstract 2
- 238000005406 washing Methods 0.000 abstract 2
- HFVMEOPYDLEHBR-UHFFFAOYSA-N (2-fluorophenyl)-phenylmethanol Chemical compound C=1C=CC=C(F)C=1C(O)C1=CC=CC=C1 HFVMEOPYDLEHBR-UHFFFAOYSA-N 0.000 abstract 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 abstract 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical class OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 abstract 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 abstract 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 150000007513 acids Chemical class 0.000 abstract 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 abstract 1
- 239000012459 cleaning agent Substances 0.000 abstract 1
- 229960001484 edetic acid Drugs 0.000 abstract 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
Heating surfaces of thermo energetic equipment are cleaned by washing off adhering deposits part. of Fe oxides and Cu with An aqs. soln. of two complexing agents (a) Na and/or NH4 salts of ethylenediamine tetracetic acid and (b) maleic, adipic, oxalic, succinic or glutaric acid or mixtures, where (b) is 0.2-1% of soln. and wt. ratio of (b):(a) is 1:1-1:5. Hydroxylamine or hydrazine, 0.02-0.1 wt. % of soln. is added before washing in proportion to (a) of 0.1:1 to remove Fe oxide deposits. Known cleaning agents use (a) with citric acid which is expensive but this process substitutes cheaper acids.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR178914 | 1968-12-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR1603558A true FR1603558A (en) | 1971-05-03 |
Family
ID=8658552
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR1603558D Expired FR1603558A (en) | 1968-12-18 | 1968-12-18 | Cleaning heating surfaces with complexing agent soln |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR1603558A (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0101230A3 (en) * | 1982-08-05 | 1985-08-14 | Halliburton Company | Ferrous sulfide dissolution in acid with lowered gas formation |
| DE4114951A1 (en) * | 1991-05-08 | 1992-11-12 | Siemens Ag | METHOD FOR SOLVING IRON OXIDES AND SOLUTION SUBSTANCE FOR THIS |
| FR2708627A1 (en) * | 1993-08-06 | 1995-02-10 | Damery Bernard | Process and products for removing deposits of manganese and iron in water reservoirs and conduits |
| US6143705A (en) * | 1996-06-05 | 2000-11-07 | Wako Pure Chemical Industries, Ltd. | Cleaning agent |
| US6231677B1 (en) * | 1998-02-27 | 2001-05-15 | Kanto Kagaku Kabushiki Kaisha | Photoresist stripping liquid composition |
| US6410494B2 (en) | 1996-06-05 | 2002-06-25 | Wako Pure Chemical Industries, Ltd. | Cleaning agent |
| EP1318432A1 (en) * | 2001-12-04 | 2003-06-11 | Kanto Kagaku Kabushiki Kaisha | Photoresist residue removing liquid composition |
| WO2003006205A3 (en) * | 2001-07-13 | 2003-12-18 | Applied Materials Inc | Barrier removal at low polish pressure |
| US6858540B2 (en) | 2000-05-11 | 2005-02-22 | Applied Materials, Inc. | Selective removal of tantalum-containing barrier layer during metal CMP |
| US7008554B2 (en) | 2001-07-13 | 2006-03-07 | Applied Materials, Inc. | Dual reduced agents for barrier removal in chemical mechanical polishing |
| US7012025B2 (en) | 2001-01-05 | 2006-03-14 | Applied Materials Inc. | Tantalum removal during chemical mechanical polishing |
| US7037174B2 (en) | 2002-10-03 | 2006-05-02 | Applied Materials, Inc. | Methods for reducing delamination during chemical mechanical polishing |
| US7390744B2 (en) | 2004-01-29 | 2008-06-24 | Applied Materials, Inc. | Method and composition for polishing a substrate |
-
1968
- 1968-12-18 FR FR1603558D patent/FR1603558A/en not_active Expired
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0101230A3 (en) * | 1982-08-05 | 1985-08-14 | Halliburton Company | Ferrous sulfide dissolution in acid with lowered gas formation |
| DE4114951A1 (en) * | 1991-05-08 | 1992-11-12 | Siemens Ag | METHOD FOR SOLVING IRON OXIDES AND SOLUTION SUBSTANCE FOR THIS |
| FR2708627A1 (en) * | 1993-08-06 | 1995-02-10 | Damery Bernard | Process and products for removing deposits of manganese and iron in water reservoirs and conduits |
| US6143705A (en) * | 1996-06-05 | 2000-11-07 | Wako Pure Chemical Industries, Ltd. | Cleaning agent |
| US6410494B2 (en) | 1996-06-05 | 2002-06-25 | Wako Pure Chemical Industries, Ltd. | Cleaning agent |
| US6514921B1 (en) | 1996-06-05 | 2003-02-04 | Wako Pure Chemical Industries, Ltd. | Cleaning agent |
| US6231677B1 (en) * | 1998-02-27 | 2001-05-15 | Kanto Kagaku Kabushiki Kaisha | Photoresist stripping liquid composition |
| US6858540B2 (en) | 2000-05-11 | 2005-02-22 | Applied Materials, Inc. | Selective removal of tantalum-containing barrier layer during metal CMP |
| US7012025B2 (en) | 2001-01-05 | 2006-03-14 | Applied Materials Inc. | Tantalum removal during chemical mechanical polishing |
| WO2003006205A3 (en) * | 2001-07-13 | 2003-12-18 | Applied Materials Inc | Barrier removal at low polish pressure |
| US7008554B2 (en) | 2001-07-13 | 2006-03-07 | Applied Materials, Inc. | Dual reduced agents for barrier removal in chemical mechanical polishing |
| US7104869B2 (en) | 2001-07-13 | 2006-09-12 | Applied Materials, Inc. | Barrier removal at low polish pressure |
| US6864044B2 (en) | 2001-12-04 | 2005-03-08 | Kanto Kagaku Kabushiki Kaisha | Photoresist residue removing liquid composition |
| EP1318432A1 (en) * | 2001-12-04 | 2003-06-11 | Kanto Kagaku Kabushiki Kaisha | Photoresist residue removing liquid composition |
| US7037174B2 (en) | 2002-10-03 | 2006-05-02 | Applied Materials, Inc. | Methods for reducing delamination during chemical mechanical polishing |
| US7244168B2 (en) | 2002-10-03 | 2007-07-17 | Applied Materials, Inc. | Methods for reducing delamination during chemical mechanical polishing |
| US7390744B2 (en) | 2004-01-29 | 2008-06-24 | Applied Materials, Inc. | Method and composition for polishing a substrate |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |