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FR1461060A - Procédé pour la fabrication de films minces - Google Patents

Procédé pour la fabrication de films minces

Info

Publication number
FR1461060A
FR1461060A FR43135A FR43135A FR1461060A FR 1461060 A FR1461060 A FR 1461060A FR 43135 A FR43135 A FR 43135A FR 43135 A FR43135 A FR 43135A FR 1461060 A FR1461060 A FR 1461060A
Authority
FR
France
Prior art keywords
production
thin films
films
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR43135A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of FR1461060A publication Critical patent/FR1461060A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Chemically Coating (AREA)
FR43135A 1964-12-26 1965-12-21 Procédé pour la fabrication de films minces Expired FR1461060A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7327764 1964-12-26

Publications (1)

Publication Number Publication Date
FR1461060A true FR1461060A (fr) 1966-12-10

Family

ID=13513477

Family Applications (1)

Application Number Title Priority Date Filing Date
FR43135A Expired FR1461060A (fr) 1964-12-26 1965-12-21 Procédé pour la fabrication de films minces

Country Status (3)

Country Link
DE (1) DE1521243B1 (fr)
FR (1) FR1461060A (fr)
GB (1) GB1120650A (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2707671B1 (fr) * 1993-07-12 1995-09-15 Centre Nat Rech Scient Procédé et dispositif d'introduction de précurseurs dans une enceinte de dépôt chimique en phase vapeur.
JP3030309B2 (ja) * 1994-03-09 2000-04-10 工業技術院長 薄膜製造装置
US5531183A (en) * 1994-07-13 1996-07-02 Applied Materials, Inc. Vaporization sequence for multiple liquid precursors used in semiconductor thin film applications
US6955211B2 (en) 2002-07-17 2005-10-18 Applied Materials, Inc. Method and apparatus for gas temperature control in a semiconductor processing system
JP4352783B2 (ja) * 2002-08-23 2009-10-28 東京エレクトロン株式会社 ガス供給系及び処理システム

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2872342A (en) * 1952-12-09 1959-02-03 Ohio Commw Eng Co Catalytic nickel plating
US2833676A (en) * 1954-08-17 1958-05-06 Erie Resistor Corp Metal coated dielectrics and method for producing same
GB789539A (en) * 1954-08-25 1958-01-22 Ohio Commw Eng Co Method of gas plating
US2842468A (en) * 1955-07-20 1958-07-08 Gen Electric Vapor deposition of single crystals
US2867546A (en) * 1956-02-08 1959-01-06 Ohio Commw Eng Co Gas plating of aluminum using aluminum trilsobutyl
US2834319A (en) * 1956-09-11 1958-05-13 Carl P Goodman Brooders
DE1114068B (de) * 1956-12-17 1961-09-21 Union Carbide Corp Verfahren zum Metallisieren von Papier- oder papieraehnlichen Baendern durch Gasplattieren
US2898235A (en) * 1957-01-16 1959-08-04 Ohio Commw Eng Co Metal dienyl gas plating

Also Published As

Publication number Publication date
DE1521243B1 (de) 1970-07-02
GB1120650A (en) 1968-07-24

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