[go: up one dir, main page]

FR1458263A - Method of doping determined areas of semiconductors with n-type impurities - Google Patents

Method of doping determined areas of semiconductors with n-type impurities

Info

Publication number
FR1458263A
FR1458263A FR25719A FR25719A FR1458263A FR 1458263 A FR1458263 A FR 1458263A FR 25719 A FR25719 A FR 25719A FR 25719 A FR25719 A FR 25719A FR 1458263 A FR1458263 A FR 1458263A
Authority
FR
France
Prior art keywords
semiconductors
type impurities
determined areas
doping
doping determined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR25719A
Other languages
French (fr)
Inventor
P Gansauge
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DEJ26309A external-priority patent/DE1261486B/en
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Priority to FR25719A priority Critical patent/FR1458263A/en
Application granted granted Critical
Publication of FR1458263A publication Critical patent/FR1458263A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/18—Controlling or regulating
    • C30B31/185—Pattern diffusion, e.g. by using masks
    • H10P14/6332—
    • H10P14/69215—
    • H10P95/00—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
FR25719A 1964-07-31 1965-07-23 Method of doping determined areas of semiconductors with n-type impurities Expired FR1458263A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR25719A FR1458263A (en) 1964-07-31 1965-07-23 Method of doping determined areas of semiconductors with n-type impurities

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEJ26309A DE1261486B (en) 1964-07-31 1964-07-31 Method for n-doping defined areas of semiconductor bodies
FR25719A FR1458263A (en) 1964-07-31 1965-07-23 Method of doping determined areas of semiconductors with n-type impurities

Publications (1)

Publication Number Publication Date
FR1458263A true FR1458263A (en) 1966-03-04

Family

ID=25982546

Family Applications (1)

Application Number Title Priority Date Filing Date
FR25719A Expired FR1458263A (en) 1964-07-31 1965-07-23 Method of doping determined areas of semiconductors with n-type impurities

Country Status (1)

Country Link
FR (1) FR1458263A (en)

Similar Documents

Publication Publication Date Title
FR1498752A (en) Manufacturing process of epitaxial deposits
FR1457032A (en) Method for forming semiconductors and structures produced by this method
FR1505766A (en) Manufacturing process of diodes
FR1455244A (en) Silicon Carbide Epitaxial Culture Method
FR1381844A (en) Fluorocarbon distillation process
FR1424254A (en) Semiconductor device manufacturing process
DK135154B (en) Process for the production of rod-shaped silicon crystals with homogeneous antimony doping.
FR1458263A (en) Method of doping determined areas of semiconductors with n-type impurities
FR1455657A (en) Method of doping semiconductor bodies
FR1501798A (en) Nitrile purification process
FR1405168A (en) Semiconductor manufacturing process
FR1362344A (en) Semiconductor crystal marking process
FR1460406A (en) Semiconductor device manufacturing process
CA778035A (en) Method of doping defined regions of semiconductors with n-type impurities
FR1395298A (en) Production of semiconductor elements by the diffusion process
FR1457006A (en) Semiconductor device manufacturing process
FR1502629A (en) Manufacturing process for dipyridylmethylamines
FR1475380A (en) Superconductor manufacturing process
FR1482952A (en) Manufacturing process, by epitaxy, of semiconductor devices, in particular thyristors
FR1356432A (en) Method for reducing the dimension tolerances of spring rings
FR1367012A (en) Metallization process
FR1438123A (en) Manufacturing process, purification and doping of semiconductor compounds
FR1437789A (en) Semiconductor crystal manufacturing process
FR1515769A (en) Process for the preparation of 1 - (-) - alpha-methyl-beta- (3, 4-dihydroxy-phenyl) -alanine
FR1441043A (en) Method of manufacturing ohmic contacts