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FI901179A0 - Genom straolning haerdbar blandning och daerav framstaellt straolningskaensligt registreringsmaterial foer energirik straolning. - Google Patents

Genom straolning haerdbar blandning och daerav framstaellt straolningskaensligt registreringsmaterial foer energirik straolning.

Info

Publication number
FI901179A0
FI901179A0 FI901179A FI901179A FI901179A0 FI 901179 A0 FI901179 A0 FI 901179A0 FI 901179 A FI901179 A FI 901179A FI 901179 A FI901179 A FI 901179A FI 901179 A0 FI901179 A0 FI 901179A0
Authority
FI
Finland
Prior art keywords
straolning
straolningskaensligt
registreringsmaterial
haerdbar
energirik
Prior art date
Application number
FI901179A
Other languages
English (en)
Other versions
FI901179A7 (fi
Inventor
Ralph Dammel
Jurgen Lingnau
Georg Pawlowski
Jurgen Theis
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of FI901179A0 publication Critical patent/FI901179A0/fi
Publication of FI901179A7 publication Critical patent/FI901179A7/fi

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
FI901179A 1989-03-11 1990-03-08 Säteilyn avulla kovetettu seos ja siitä valmistettu säteilylle herkkä tallennusmateriaali suurienergiselle säteilylle FI901179A7 (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3907953A DE3907953A1 (de) 1989-03-11 1989-03-11 Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung

Publications (2)

Publication Number Publication Date
FI901179A0 true FI901179A0 (fi) 1990-03-08
FI901179A7 FI901179A7 (fi) 1990-09-12

Family

ID=6376121

Family Applications (1)

Application Number Title Priority Date Filing Date
FI901179A FI901179A7 (fi) 1989-03-11 1990-03-08 Säteilyn avulla kovetettu seos ja siitä valmistettu säteilylle herkkä tallennusmateriaali suurienergiselle säteilylle

Country Status (10)

Country Link
US (1) US5614351A (fi)
EP (1) EP0388677A3 (fi)
JP (1) JPH0333747A (fi)
KR (1) KR900014935A (fi)
AU (1) AU630675B2 (fi)
BR (1) BR9001121A (fi)
CA (1) CA2011726A1 (fi)
DE (1) DE3907953A1 (fi)
FI (1) FI901179A7 (fi)
ZA (1) ZA901796B (fi)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2722870B2 (ja) * 1991-06-14 1998-03-09 日本ゼオン株式会社 レジスト組成物
JP3010607B2 (ja) * 1992-02-25 2000-02-21 ジェイエスアール株式会社 感放射線性樹脂組成物
US6110639A (en) * 1994-12-28 2000-08-29 Hoechst Japan Limited Radiation-sensitive composition and recording medium using the same
US5852823A (en) * 1996-10-16 1998-12-22 Microsoft Image classification and retrieval system using a query-by-example paradigm
JP3732139B2 (ja) 2001-10-29 2006-01-05 三菱電機株式会社 メモリ制御回路及びメモリバスの調停方法

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3502476A (en) * 1965-10-20 1970-03-24 Konishiroku Photo Ind Light-sensitive photographic materials
GB1248036A (en) * 1968-01-12 1971-09-29 Agfa Gevaert Photopolymerisation of ethylenically unsaturated organic compounds
US3692560A (en) * 1969-09-18 1972-09-19 Bayer Ag Acid hardening resins which can be activated by ultraviolet light
NL7205384A (fi) * 1972-04-21 1973-10-23
US3912606A (en) * 1974-11-21 1975-10-14 Eastman Kodak Co Photosensitive compositions containing benzoxazole sensitizers
CH621416A5 (fi) * 1975-03-27 1981-01-30 Hoechst Ag
US4193799A (en) * 1976-07-09 1980-03-18 General Electric Company Method of making printing plates and printed circuit
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
DE2718254C3 (de) * 1977-04-25 1980-04-10 Hoechst Ag, 6000 Frankfurt Strahlungsempfindliche Kopiermasse
US4289845A (en) * 1978-05-22 1981-09-15 Bell Telephone Laboratories, Inc. Fabrication based on radiation sensitive resists and related products
DE2928636A1 (de) * 1979-07-16 1981-02-12 Hoechst Ag Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
US4398001A (en) * 1982-03-22 1983-08-09 International Business Machines Corporation Terpolymer resist compositions
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
DE3406927A1 (de) * 1984-02-25 1985-08-29 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen
NO173574C (no) * 1984-06-01 1993-12-29 Rohm & Haas Fremgangsmaate til fremstilling av et termisk stabilt, positivt eller negativt bilde paa en underlagsflate
DE3442756A1 (de) * 1984-11-23 1986-05-28 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen
CA1307695C (en) * 1986-01-13 1992-09-22 Wayne Edmund Feely Photosensitive compounds and thermally stable and aqueous developablenegative images
US4699289A (en) * 1986-03-31 1987-10-13 San Far You Structure of switch box
DE3730783A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3821585A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
DE3907954A1 (de) * 1989-03-11 1990-09-13 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung

Also Published As

Publication number Publication date
ZA901796B (en) 1990-11-28
BR9001121A (pt) 1991-03-05
DE3907953A1 (de) 1990-09-13
AU630675B2 (en) 1992-11-05
AU5123090A (en) 1990-09-13
EP0388677A2 (de) 1990-09-26
KR900014935A (ko) 1990-10-25
EP0388677A3 (de) 1991-07-31
JPH0333747A (ja) 1991-02-14
FI901179A7 (fi) 1990-09-12
CA2011726A1 (en) 1990-09-11
US5614351A (en) 1997-03-25

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Legal Events

Date Code Title Description
FA Application withdrawn [patent]

Owner name: HOECHST AKTIENGESELLSCHAFT