FI901178A7 - Positiivisesti toimiva säteilylle herkkä seos ja siitä valmistettu säteilylle herkkä tallennusmateriaali suurienergiselle säteilylle - Google Patents

Positiivisesti toimiva säteilylle herkkä seos ja siitä valmistettu säteilylle herkkä tallennusmateriaali suurienergiselle säteilylle Download PDF

Info

Publication number: FI901178A7
Authority: FI; Finland
Prior art keywords: radiation; sensitive; recording material; material prepared; prepared therefrom
Prior art date: 1989-03-11

Application number

FI901178A

Other languages

English (en)

Swedish (sv)

Other versions

FI901178A0 (fi

Inventor

Jürgen Theis

Georg Pawlowski

Ralf Dammel

Juergen Lingnau

Original Assignee

Hoechst Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-03-11

Filing date

1990-03-08

Publication date

1990-09-12

1990-03-08 Application filed by Hoechst Ag filed Critical Hoechst Ag

1990-03-08 Publication of FI901178A0 publication Critical patent/FI901178A0/fi

1990-09-12 Publication of FI901178A7 publication Critical patent/FI901178A7/fi

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Materials For Photolithography (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

FI901178A 1989-03-11 1990-03-08 Positiivisesti toimiva säteilylle herkkä seos ja siitä valmistettu säteilylle herkkä tallennusmateriaali suurienergiselle säteilylle FI901178A7 (fi)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE3907954A DE3907954A1 (de)	1989-03-11	1989-03-11	Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung

Publications (2)

Publication Number	Publication Date
FI901178A0 FI901178A0 (fi)	1990-03-08
FI901178A7 true FI901178A7 (fi)	1990-09-12

Family

ID=6376122

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
FI901178A FI901178A7 (fi)	1989-03-11	1990-03-08	Positiivisesti toimiva säteilylle herkkä seos ja siitä valmistettu säteilylle herkkä tallennusmateriaali suurienergiselle säteilylle

Country Status (11)

Country	Link
US (1)	US5217843A (fi)
EP (1)	EP0387623B1 (fi)
JP (1)	JP2974718B2 (fi)
KR (1)	KR900014936A (fi)
AU (1)	AU631610B2 (fi)
BR (1)	BR9001122A (fi)
CA (1)	CA2011728A1 (fi)
DE (2)	DE3907954A1 (fi)
FI (1)	FI901178A7 (fi)
HK (1)	HK1000194A1 (fi)
ZA (1)	ZA901797B (fi)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3907953A1 (de) *	1989-03-11	1990-09-13	Hoechst Ag	Strahlungshaertbares gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
EP0410606B1 (en) *	1989-07-12	1996-11-13	Fuji Photo Film Co., Ltd.	Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0422628A3 (en) *	1989-10-13	1992-02-26	E.I. Du Pont De Nemours And Company	Photosensitive element
EP0536690B1 (en) *	1991-10-07	1998-09-09	Fuji Photo Film Co., Ltd.	Light-sensitive composition
JPH05247386A (ja) *	1991-11-27	1993-09-24	Hitachi Chem Co Ltd	ポジ型感光性アニオン電着塗料樹脂組成物、ポジ型感光性アニオン電着塗料、電着塗装浴、電着塗装法及びプリント回路板の製造法
JPH0954437A (ja) *	1995-06-05	1997-02-25	Fuji Photo Film Co Ltd	化学増幅型ポジレジスト組成物
EP1209528B1 (en)	2000-11-28	2015-07-22	Eternal Technology Corporation	Photoresist composition
US20100025069A1 (en) *	2008-07-30	2010-02-04	Smith Iii Robert L	Cable and a method of assembling same

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3502476A (en) *	1965-10-20	1970-03-24	Konishiroku Photo Ind	Light-sensitive photographic materials
GB1248036A (en) *	1968-01-12	1971-09-29	Agfa Gevaert	Photopolymerisation of ethylenically unsaturated organic compounds
DE1949010C3 (de) *	1969-09-27	1979-11-29	Bayer Ag, 5090 Leverkusen	Verwendung von halogenmethylierten Benzophenonen als Photopolymerisationsinitiatoren
US3912606A (en) *	1974-11-21	1975-10-14	Eastman Kodak Co	Photosensitive compositions containing benzoxazole sensitizers
CH621416A5 (fi) *	1975-03-27	1981-01-30	Hoechst Ag
DE2541977B2 (de) *	1975-09-20	1978-07-06	Te Ka De Felten & Guilleaume Fernmeldeanlagen Gmbh, 8500 Nuernberg	Anordnung zum Entzerren von Restdämpfungskurven
DE2718254C3 (de) *	1977-04-25	1980-04-10	Hoechst Ag, 6000 Frankfurt	Strahlungsempfindliche Kopiermasse
US4289845A (en) *	1978-05-22	1981-09-15	Bell Telephone Laboratories, Inc.	Fabrication based on radiation sensitive resists and related products
DE2928636A1 (de) *	1979-07-16	1981-02-12	Hoechst Ag	Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefbildern
DE3144480A1 (de) *	1981-11-09	1983-05-19	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3144499A1 (de) *	1981-11-09	1983-05-19	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3151078A1 (de) *	1981-12-23	1983-07-28	Hoechst Ag, 6230 Frankfurt	Verfahren zur herstellung von reliefbildern
US4398001A (en) *	1982-03-22	1983-08-09	International Business Machines Corporation	Terpolymer resist compositions
DE3473359D1 (de) *	1983-06-29	1988-09-15	Fuji Photo Film Co Ltd	Photosolubilizable composition
DE3406927A1 (de) *	1984-02-25	1985-08-29	Hoechst Ag, 6230 Frankfurt	Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen
EP0164083B1 (de) *	1984-06-07	1991-05-02	Hoechst Aktiengesellschaft	Positiv arbeitende strahlungsempfindliche Beschichtungslösung
DE3442756A1 (de) *	1984-11-23	1986-05-28	Hoechst Ag, 6230 Frankfurt	Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen
JPH067263B2 (ja) *	1985-08-19	1994-01-26	富士写真フイルム株式会社	光可溶化組成物
CA1307695C (en) *	1986-01-13	1992-09-22	Wayne Edmund Feely	Photosensitive compounds and thermally stable and aqueous developablenegative images
DE3621376A1 (de) *	1986-06-26	1988-01-07	Hoechst Ag	Strahlungsempfindliches aufzeichnungsmaterial

1989
- 1989-03-11 DE DE3907954A patent/DE3907954A1/de not_active Withdrawn
1990
- 1990-03-01 EP EP90104009A patent/EP0387623B1/de not_active Expired - Lifetime
- 1990-03-01 DE DE59010703T patent/DE59010703D1/de not_active Expired - Fee Related
- 1990-03-08 ZA ZA901797A patent/ZA901797B/xx unknown
- 1990-03-08 FI FI901178A patent/FI901178A7/fi not_active Application Discontinuation
- 1990-03-08 CA CA002011728A patent/CA2011728A1/en not_active Abandoned
- 1990-03-09 KR KR1019900003093A patent/KR900014936A/ko not_active Withdrawn
- 1990-03-09 AU AU51228/90A patent/AU631610B2/en not_active Expired - Fee Related
- 1990-03-09 BR BR909001122A patent/BR9001122A/pt unknown
- 1990-03-12 JP JP2060899A patent/JP2974718B2/ja not_active Expired - Fee Related
- 1990-03-12 US US07/491,817 patent/US5217843A/en not_active Expired - Lifetime
1997
- 1997-09-04 HK HK97101715A patent/HK1000194A1/xx not_active IP Right Cessation

Also Published As

Publication number	Publication date
ZA901797B (en)	1990-11-28
JP2974718B2 (ja)	1999-11-10
DE3907954A1 (de)	1990-09-13
BR9001122A (pt)	1991-03-05
CA2011728A1 (en)	1990-09-11
FI901178A0 (fi)	1990-03-08
AU631610B2 (en)	1992-12-03
KR900014936A (ko)	1990-10-25
JPH02272554A (ja)	1990-11-07
US5217843A (en)	1993-06-08
EP0387623A2 (de)	1990-09-19
DE59010703D1 (de)	1997-05-28
EP0387623A3 (de)	1991-07-24
EP0387623B1 (de)	1997-04-23
HK1000194A1 (en)	1998-01-27
AU5122890A (en)	1990-09-13

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Legal Events

Date	Code	Title	Description
2004-08-31	FA	Application withdrawn [patent]	Owner name: HOECHST AKTIENGESELLSCHAFT