FI873755L - Tvaoskiktssystem. - Google Patents

Tvaoskiktssystem. Download PDF

Info

Publication number: FI873755L
Authority: FI; Finland
Prior art keywords: tvoskiktssym
Prior art date: 1986-08-30

Application number

FI873755A

Other languages

English (en)

Other versions

FI873755A7 (fi

FI873755A0 (fi

Inventor

Manfred Koehler

Eike Poetsch

Joerg Ohngemach

Dieter Dorsch

Rudolf Eidenschink

Gerhard Greber

Original Assignee

Merck Patent Gmbh

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-08-30

Filing date

1987-08-28

Publication date

1988-03-01

1987-01-31 Priority claimed from DE19873702897 external-priority patent/DE3702897A1/de

1987-08-28 Application filed by Merck Patent Gmbh filed Critical Merck Patent Gmbh

1987-08-28 Publication of FI873755A0 publication Critical patent/FI873755A0/fi

1988-03-01 Publication of FI873755L publication Critical patent/FI873755L/fi

1988-03-01 Publication of FI873755A7 publication Critical patent/FI873755A7/fi

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S502/00—Catalyst, solid sorbent, or support therefor: product or process of making
- Y10S502/522—Radiant or wave energy activated
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Paints Or Removers (AREA)
Polymerisation Methods In General (AREA)
Optical Integrated Circuits (AREA)
Application Of Or Painting With Fluid Materials (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

FI873755A 1986-08-30 1987-08-28 Kaksikerrossysteemi. FI873755A7 (fi)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE3629543		1986-08-30
DE19873702897 DE3702897A1 (de)	1987-01-31	1987-01-31	Zweischichtensystem

Publications (3)

Publication Number	Publication Date
FI873755A0 FI873755A0 (fi)	1987-08-28
FI873755L true FI873755L (fi)	1988-03-01
FI873755A7 FI873755A7 (fi)	1988-03-01

Family

ID=25847043

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
FI873755A FI873755A7 (fi)	1986-08-30	1987-08-28	Kaksikerrossysteemi.

Country Status (8)

Country	Link
US (2)	US4914004A (fi)
EP (1)	EP0258719A3 (fi)
KR (1)	KR880003218A (fi)
AU (1)	AU600746B2 (fi)
BR (1)	BR8704460A (fi)
CS (1)	CS274662B2 (fi)
DK (1)	DK453587A (fi)
FI (1)	FI873755A7 (fi)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0258719A3 (de) *	1986-08-30	1989-07-05	Ciba-Geigy Ag	Zweischichtensystem
DE3844445A1 (de) *	1988-12-31	1990-07-19	Basf Ag	Uv-vernetzbare massen auf basis von (meth)-acrylesterpolymerisaten
DE3914375A1 (de) *	1989-04-29	1990-11-15	Basf Ag	Durch ultraviolette strahlung haertbares mittel
US5200238A (en) *	1990-06-22	1993-04-06	Loctite (Ireland) Limited	Liquid crystal display devices and method of manufacture
GB9110418D0 (en) *	1991-05-14	1991-07-03	Du Pont Howson Ltd	Radiation-sensitive material
US5484822A (en) *	1991-06-24	1996-01-16	Polaroid Corporation	Process and composition for cladding optic fibers
DE69205226T2 (de) *	1991-07-12	1996-05-15	Agfa Gevaert Nv	Verfahren zur Herstellung von Bildern mittels einer photopolymerisierbaren Zusammensetzung.
CA2122921A1 (en) *	1991-11-05	1993-05-13	Tjoan L. Ang	Uv-cured hot melt pressure-sensitive adhesives
US5635328A (en) *	1993-08-21	1997-06-03	Konica Corporation	Light-sensitive lithographic printing plate utilizing o-quinone diazide light-sensitive layer containing cyclic clathrate compound
JP3548933B2 (ja) *	1994-07-29	2004-08-04	ミネソタマイニングアンドマニュファクチャリングカンパニー	架橋結合された粘弾性高分子材料に硬化可能なアクリル系シロップ
WO1996035725A1 (en) *	1995-05-10	1996-11-14	Avery Dennison Corporation	Pigmented, uv-cured, acrylic-based, pressure sensitive adhesives, and method for making same
US5879863A (en) *	1997-01-22	1999-03-09	Kabushiki Kaisha Toshiba	Pattern forming method
EP1085971B1 (en) *	1999-03-09	2004-06-02	Lee Eisinger	Application of textured or patterned surfaces to a prototype
JP2001163932A (ja)	1999-10-27	2001-06-19	Novartis Ag	材料表面を改質する方法
JP2001158813A (ja)	1999-10-27	2001-06-12	Novartis Ag	材料表面を被覆する方法
EP1095966B1 (en) *	1999-10-27	2006-01-11	Novartis AG	Process for the modification of a material surface
EP1095711B1 (en) *	1999-10-27	2004-01-28	Novartis AG	Process for coating a material surface
BR0114342A (pt) *	2000-10-16	2003-12-09	Novartis Ag	Processo para revestimento de uma superfìcie de material
DE10158347A1 (de) *	2001-11-28	2003-06-12	Tesa Ag	Verfahren zur Erzeugung von nano- und mikrostrukturierten Polymerfolien
JP3866579B2 (ja) *	2002-01-25	2007-01-10	富士フイルムホールディングス株式会社	薄層金属膜
JP2005037881A (ja) *	2003-04-21	2005-02-10	Fuji Photo Film Co Ltd	パターン形成方法、画像形成方法、微粒子吸着パターン形成方法、導電性パターン形成方法、パターン形成材料、及び平版印刷版
EP1589376A1 (en)	2004-03-23	2005-10-26	Fuji Photo Film Co., Ltd.	Conductive pattern forming method, and conductive pattern material

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2964401A (en) *	1957-02-18	1960-12-13	Du Pont	Photopolymerizable elements and processes
GB841454A (en) *	1957-09-16	1960-07-13	Du Pont	Improvements in or relating to photopolymerisable elements
BE622882A (fi) *	1961-09-26
US3520683A (en) *	1967-05-19	1970-07-14	Bell Telephone Labor Inc	Photoresist method and products produced thereby
US3636026A (en) *	1968-11-06	1972-01-18	Bayer Ag	Benzoin-silyl-esters
US3776889A (en) *	1971-01-07	1973-12-04	Powers Chemco Inc	Allyl carbamate esters of hydroxy-containing polymers
JPS5934297B2 (ja) *	1977-03-07	1984-08-21	帝人株式会社	支持板
US4187111A (en) *	1977-05-31	1980-02-05	Bell Telephone Laboratories, Incorporated	Sensitized porous bodies useful for producing thick refractive index recordings
US4439514A (en) *	1979-06-25	1984-03-27	University Patents, Inc.	Photoresistive compositions
IT1176018B (it) *	1984-04-12	1987-08-12	Lamberti Flli Spa	Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
US4536265A (en) *	1984-04-19	1985-08-20	Loctite Corporation	Siloxane polyphotoinitiators of the substituted acetophenone type
US4551418A (en) *	1985-02-19	1985-11-05	International Business Machines Corporation	Process for preparing negative relief images with cationic photopolymerization
US4666953A (en) *	1985-03-28	1987-05-19	Loctite Corporation	Silicone polyphotoinitiators
US4677137A (en) *	1985-05-31	1987-06-30	Minnesota Mining And Manufacturing Company	Supported photoinitiator
EP0258719A3 (de) *	1986-08-30	1989-07-05	Ciba-Geigy Ag	Zweischichtensystem
US4921589A (en) *	1988-12-20	1990-05-01	Allied-Signal Inc.	Polysiloxane bound photosensitizer for producing singlet oxygen

1987
- 1987-08-17 EP EP87111854A patent/EP0258719A3/de not_active Withdrawn
- 1987-08-26 KR KR1019870009329A patent/KR880003218A/ko not_active Withdrawn
- 1987-08-26 CS CS623987A patent/CS274662B2/cs unknown
- 1987-08-27 AU AU77492/87A patent/AU600746B2/en not_active Ceased
- 1987-08-28 FI FI873755A patent/FI873755A7/fi not_active IP Right Cessation
- 1987-08-28 BR BR8704460A patent/BR8704460A/pt unknown
- 1987-08-28 US US07/090,283 patent/US4914004A/en not_active Expired - Fee Related
- 1987-08-28 DK DK453587A patent/DK453587A/da not_active Application Discontinuation
1989
- 1989-12-14 US US07/450,491 patent/US5071732A/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
FI873755A7 (fi)	1988-03-01
AU7749287A (en)	1988-03-03
FI873755A0 (fi)	1987-08-28
CS623987A2 (en)	1991-03-12
EP0258719A2 (de)	1988-03-09
US5071732A (en)	1991-12-10
DK453587D0 (da)	1987-08-28
AU600746B2 (en)	1990-08-23
US4914004A (en)	1990-04-03
EP0258719A3 (de)	1989-07-05
KR880003218A (ko)	1988-05-14
DK453587A (da)	1988-03-01
BR8704460A (pt)	1988-04-19
CS274662B2 (en)	1991-09-15

Publication	Publication Date	Title
DE3767169D1 (de)	1991-02-14	Sportschuh.
DE3774909D1 (de)	1992-01-16	Antitumormittel.
ATE57924T1 (de)	1990-11-15	3-aryloxy-3-substituierte-propanamine.
FI892943A0 (fi)	1989-06-15	Dambinda.
FI864178A0 (fi)	1986-10-16	Motionsdryckspulver.
FI875190A0 (fi)	1987-11-24	Osymmetrisk stresskoncentrerare foer en distributionsfoerpackning.
DE3764043D1 (de)	1990-09-06	Alkylendiamine.
FI870599A0 (fi)	1987-02-12	Steriliseringsanordning och -foerfarande foer foerpackningsbehaollare.
ATE63533T1 (de)	1991-06-15	Xylolisomerisierung.
FI880396L (fi)	1988-01-28	Anordning foer aemnes oeverfoering.
FI872871L (fi)	1988-01-02	Foerbaettringar betraeffande kalciumsalter.
FI873755L (fi)	1988-03-01	Tvaoskiktssystem.
DE3771918D1 (de)	1991-09-12	Chinolinamide.
FI872268A7 (fi)	1987-11-24	Riktad termoanemometeromvandlare.
FI882394A0 (fi)	1988-05-20	Foereningar.
FI871430L (fi)	1987-10-03	Borrningsbom.
FI890053A0 (fi)	1989-01-05	Slitagebestaendigt signalljus foer flygfaelt.
DE3773636D1 (de)	1991-11-14	Saeurebeschleunigte hydrocarboxilierung.
FI872933L (fi)	1988-01-06	Mikrolegerat staol.
DE3771271D1 (de)	1991-08-14	Fluorphthalimide.
FI873857A7 (fi)	1988-03-09	Nukleosidanaloger.
FI873861L (fi)	1988-03-09	Antennmatare foer minst tvao olika frekvensband.
FI872927A0 (fi)	1987-07-02	Kylvaetskesystem foer foerbraenningsmotor.
FI872581A0 (fi)	1987-06-09	Polymerbehandlade jonbyteshartser.
FI871924A0 (fi)	1987-04-30	Manoevreringsbord.

Legal Events

Date	Code	Title	Description
1994-03-07	FD	Application lapsed
2004-08-31	MM	Patent lapsed	Owner name: CIBA-GEIGY AG