FI834528A0 - Ljuskaenslig blandning, daerav framstaellt ljuskaensligt kopieringsmaterial och foerfarande foer framstaellning av en tryckform av kopieringsmaterialet - Google Patents

Ljuskaenslig blandning, daerav framstaellt ljuskaensligt kopieringsmaterial och foerfarande foer framstaellning av en tryckform av kopieringsmaterialet

Info

Publication number: FI834528A0
Authority: FI; Finland
Prior art keywords: copying material; tryckform; framstering; foing; blacking
Prior art date: 1982-12-13

Application number

FI834528A

Other languages

English (en)

Other versions

FI834528A7 (fi

FI834528L (fi

Inventor

Paul Stahlhofen

Original Assignee

Hoechst Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1982-12-13

Filing date

1983-12-09

Publication date

1983-12-09

1983-12-09 Application filed by Hoechst Ag filed Critical Hoechst Ag

1983-12-09 Publication of FI834528A0 publication Critical patent/FI834528A0/fi

1984-06-14 Publication of FI834528A7 publication Critical patent/FI834528A7/fi

1984-06-14 Publication of FI834528L publication Critical patent/FI834528L/fi

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Printing Plates And Materials Therefor (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

FI834528A 1982-12-13 1983-12-09 Ljuskaenslig blandning, daerav framstaellt ljuskaensligt kopieringsmaterial och foerfarande foer framstaellning av en tryckform av kopieringsmaterialet. FI834528L (fi)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE19823246106 DE3246106A1 (de)	1982-12-13	1982-12-13	Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial

Publications (3)

Publication Number	Publication Date
FI834528A0 true FI834528A0 (fi)	1983-12-09
FI834528A7 FI834528A7 (fi)	1984-06-14
FI834528L FI834528L (fi)	1984-06-14

Family

ID=6180546

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
FI834528A FI834528L (fi)	1982-12-13	1983-12-09	Ljuskaenslig blandning, daerav framstaellt ljuskaensligt kopieringsmaterial och foerfarande foer framstaellning av en tryckform av kopieringsmaterialet.

Country Status (9)

Country	Link
EP (1)	EP0111274B1 (fi)
JP (1)	JPS59114535A (fi)
AU (1)	AU571190B2 (fi)
BR (1)	BR8306803A (fi)
CA (1)	CA1254787A (fi)
DE (2)	DE3246106A1 (fi)
ES (1)	ES8503863A1 (fi)
FI (1)	FI834528L (fi)
ZA (1)	ZA839215B (fi)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL8500320A (nl) *	1985-02-06	1986-09-01	Philips Nv	Werkwijze voor het vervaardigen van een inrichting en inrichting vervaardigd met de werkwijze.
DE3821585A1 (de) *	1987-09-13	1989-03-23	Hoechst Ag	Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial fuer hochenergetische strahlung
US4812522A (en) *	1987-12-04	1989-03-14	Shell Oil Company	Molecularly miscible blends of polyketone with polyvinyl phenol
US5100768A (en) *	1989-05-09	1992-03-31	Kabushiki Kaisha Toshiba	Photosensitive composition
DE4106356A1 (de) *	1991-02-28	1992-09-03	Hoechst Ag	Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial
AU2001288865A1 (en) *	2000-09-08	2002-03-22	Shipley Company, L.L.C.	Polymers and photoresist compositions comprising electronegative groups

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5730829A (en) *	1980-08-01	1982-02-19	Hitachi Ltd	Micropattern formation method
DE3100077A1 (de) *	1981-01-03	1982-08-05	Hoechst Ag, 6000 Frankfurt	Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
DE3127754A1 (de) *	1981-07-14	1983-02-03	Hoechst Ag, 6000 Frankfurt	Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DD206518A3 (de) *	1981-08-10	1984-01-25	Akad Wissenschaften Ddr	Verfahren zur herstellung von mikrostrukturen
DE3246037A1 (de) *	1982-12-09	1984-06-14	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial

1982
- 1982-12-13 DE DE19823246106 patent/DE3246106A1/de not_active Withdrawn
1983
- 1983-12-01 JP JP58225518A patent/JPS59114535A/ja active Pending
- 1983-12-02 DE DE8383112142T patent/DE3379079D1/de not_active Expired
- 1983-12-02 EP EP83112142A patent/EP0111274B1/de not_active Expired
- 1983-12-07 AU AU22169/83A patent/AU571190B2/en not_active Ceased
- 1983-12-09 FI FI834528A patent/FI834528L/fi not_active Application Discontinuation
- 1983-12-09 CA CA000442945A patent/CA1254787A/en not_active Expired
- 1983-12-12 BR BR8306803A patent/BR8306803A/pt not_active IP Right Cessation
- 1983-12-12 ES ES527970A patent/ES8503863A1/es not_active Expired
- 1983-12-12 ZA ZA839215A patent/ZA839215B/xx unknown

Also Published As

Publication number	Publication date
CA1254787A (en)	1989-05-30
DE3246106A1 (de)	1984-06-14
BR8306803A (pt)	1984-07-17
ES527970A0 (es)	1985-03-16
EP0111274B1 (de)	1989-01-25
ZA839215B (en)	1984-08-29
JPS59114535A (ja)	1984-07-02
AU571190B2 (en)	1988-04-14
AU2216983A (en)	1984-06-21
FI834528A7 (fi)	1984-06-14
ES8503863A1 (es)	1985-03-16
EP0111274A3 (en)	1986-01-15
DE3379079D1 (en)	1989-03-02
EP0111274A2 (de)	1984-06-20
FI834528L (fi)	1984-06-14

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Legal Events

Date	Code	Title	Description
2004-08-31	FD	Application lapsed	Owner name: HOECHST AKTIENGESELLSCHAFT