FI118180B - Optisille pinnoille soveltuva kiillotusformulaatio - Google Patents
Optisille pinnoille soveltuva kiillotusformulaatio Download PDFInfo
- Publication number
- FI118180B FI118180B FI20001800A FI20001800A FI118180B FI 118180 B FI118180 B FI 118180B FI 20001800 A FI20001800 A FI 20001800A FI 20001800 A FI20001800 A FI 20001800A FI 118180 B FI118180 B FI 118180B
- Authority
- FI
- Finland
- Prior art keywords
- cerium oxide
- polishing
- particle size
- alumina
- optical surfaces
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims description 35
- 238000005498 polishing Methods 0.000 title claims description 33
- 238000009472 formulation Methods 0.000 title claims description 28
- 230000003287 optical effect Effects 0.000 title claims description 14
- 239000002245 particle Substances 0.000 claims description 40
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 38
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 38
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 21
- 239000002002 slurry Substances 0.000 claims description 20
- 239000007787 solid Substances 0.000 claims description 10
- 239000000843 powder Substances 0.000 claims description 2
- 239000011521 glass Substances 0.000 description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 239000004615 ingredient Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 4
- 229910052684 Cerium Inorganic materials 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000006061 abrasive grain Substances 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000000007 visual effect Effects 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 2
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 150000002910 rare earth metals Chemical class 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000004575 stone Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 241000234435 Lilium Species 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 230000002902 bimodal effect Effects 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 150000001785 cerium compounds Chemical class 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 239000012612 commercial material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000011363 dried mixture Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000006210 lotion Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 239000002609 medium Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- MMKQUGHLEMYQSG-UHFFFAOYSA-N oxygen(2-);praseodymium(3+) Chemical compound [O-2].[O-2].[O-2].[Pr+3].[Pr+3] MMKQUGHLEMYQSG-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 229920001495 poly(sodium acrylate) polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910003447 praseodymium oxide Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 229910001954 samarium oxide Inorganic materials 0.000 description 1
- 229940075630 samarium oxide Drugs 0.000 description 1
- FKTOIHSPIPYAPE-UHFFFAOYSA-N samarium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Sm+3].[Sm+3] FKTOIHSPIPYAPE-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/773—Nanoparticle, i.e. structure having three dimensions of 100 nm or less
- Y10S977/775—Nanosized powder or flake, e.g. nanosized catalyst
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/773—Nanoparticle, i.e. structure having three dimensions of 100 nm or less
- Y10S977/775—Nanosized powder or flake, e.g. nanosized catalyst
- Y10S977/776—Ceramic powder or flake
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/025,730 US5989301A (en) | 1998-02-18 | 1998-02-18 | Optical polishing formulation |
| US2573098 | 1998-02-18 | ||
| US9903143 | 1999-02-16 | ||
| PCT/US1999/003143 WO1999042537A1 (en) | 1998-02-18 | 1999-02-16 | Optical polishing formulation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FI20001800L FI20001800L (fi) | 2000-08-15 |
| FI118180B true FI118180B (fi) | 2007-08-15 |
Family
ID=21827759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FI20001800A FI118180B (fi) | 1998-02-18 | 2000-08-15 | Optisille pinnoille soveltuva kiillotusformulaatio |
Country Status (28)
| Country | Link |
|---|---|
| US (2) | US5989301A (zh) |
| EP (1) | EP1060221B1 (zh) |
| JP (1) | JP3605036B2 (zh) |
| KR (1) | KR100354202B1 (zh) |
| CN (1) | CN1187426C (zh) |
| AR (1) | AR014959A1 (zh) |
| AT (1) | ATE245180T1 (zh) |
| AU (1) | AU729245B2 (zh) |
| BR (1) | BR9908020B1 (zh) |
| CA (1) | CA2319107C (zh) |
| CO (1) | CO5060536A1 (zh) |
| CZ (1) | CZ294042B6 (zh) |
| DE (1) | DE69909597T2 (zh) |
| DK (1) | DK1060221T3 (zh) |
| ES (1) | ES2204107T3 (zh) |
| FI (1) | FI118180B (zh) |
| HU (1) | HUP0101154A3 (zh) |
| IL (1) | IL137804A0 (zh) |
| MY (1) | MY123257A (zh) |
| NO (1) | NO319039B1 (zh) |
| NZ (1) | NZ505901A (zh) |
| PL (1) | PL186840B1 (zh) |
| PT (1) | PT1060221E (zh) |
| RU (1) | RU2181132C1 (zh) |
| SK (1) | SK285219B6 (zh) |
| TW (1) | TWI239995B (zh) |
| WO (1) | WO1999042537A1 (zh) |
| ZA (1) | ZA991150B (zh) |
Families Citing this family (68)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6839362B2 (en) * | 2001-05-22 | 2005-01-04 | Saint-Gobain Ceramics & Plastics, Inc. | Cobalt-doped saturable absorber Q-switches and laser systems |
| US20030092271A1 (en) * | 2001-09-13 | 2003-05-15 | Nyacol Nano Technologies, Inc. | Shallow trench isolation polishing using mixed abrasive slurries |
| US6896591B2 (en) * | 2003-02-11 | 2005-05-24 | Cabot Microelectronics Corporation | Mixed-abrasive polishing composition and method for using the same |
| US7326477B2 (en) * | 2003-09-23 | 2008-02-05 | Saint-Gobain Ceramics & Plastics, Inc. | Spinel boules, wafers, and methods for fabricating same |
| US7045223B2 (en) * | 2003-09-23 | 2006-05-16 | Saint-Gobain Ceramics & Plastics, Inc. | Spinel articles and methods for forming same |
| US20050061230A1 (en) * | 2003-09-23 | 2005-03-24 | Saint-Gobain Ceramics & Plastics, Inc. | Spinel articles and methods for forming same |
| US7919815B1 (en) | 2005-02-24 | 2011-04-05 | Saint-Gobain Ceramics & Plastics, Inc. | Spinel wafers and methods of preparation |
| RU2275887C1 (ru) * | 2005-03-04 | 2006-05-10 | Уфимский научно-исследовательский институт глазных болезней | Способ полировки жестких газопроницаемых контактных линз |
| US7294044B2 (en) * | 2005-04-08 | 2007-11-13 | Ferro Corporation | Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
| UA92690C2 (ru) * | 2006-12-19 | 2010-11-25 | Сейнт-Гобейн Серамикс Энд Пластикс, Инк. | Высокотемпературный абразив со связкой (варианты) и способ его формирования |
| CN102119071B (zh) | 2008-06-23 | 2015-01-28 | 圣戈班磨料磨具有限公司 | 高孔隙率的玻璃化超级磨料产品以及制备方法 |
| CA2751158C (en) * | 2009-01-30 | 2016-06-21 | Lenzsavers, Llc | Compositions and methods for restoring plastic covers and lenses |
| USD603884S1 (en) * | 2009-03-20 | 2009-11-10 | Michalec Ralph J | Pad for grinding or polishing ophthalmic lenses |
| JP5681201B2 (ja) | 2009-10-27 | 2015-03-04 | サンーゴバン アブレイシブズ，インコーポレイティド | 樹脂ボンド砥粒 |
| CN102639297B (zh) | 2009-10-27 | 2015-11-25 | 圣戈班磨料磨具有限公司 | 玻璃质的粘结的磨料 |
| SG10201506215WA (en) * | 2010-09-08 | 2015-09-29 | Basf Se | Aqueous polishing compositions containing n-substituted diazenium dioxides and/or n'-hydroxy-diazenium oxide salts |
| CN103370174B (zh) | 2010-12-31 | 2017-03-29 | 圣戈本陶瓷及塑料股份有限公司 | 具有特定形状的研磨颗粒和此类颗粒的形成方法 |
| TWI605112B (zh) * | 2011-02-21 | 2017-11-11 | 福吉米股份有限公司 | 研磨用組成物 |
| WO2013003831A2 (en) | 2011-06-30 | 2013-01-03 | Saint-Gobain Ceramics & Plastics, Inc. | Liquid phase sintered silicon carbide abrasive particles |
| WO2013003830A2 (en) | 2011-06-30 | 2013-01-03 | Saint-Gobain Ceramics & Plastics, Inc. | Abrasive articles including abrasive particles of silicon nitride |
| JP5802336B2 (ja) | 2011-09-26 | 2015-10-28 | サン−ゴバン セラミックス アンド プラスティクス，インコーポレイティド | 研磨粒子材料を含む研磨製品、研磨粒子材料を使用する研磨布紙および形成方法 |
| CH707294B1 (it) | 2011-09-29 | 2014-10-15 | Saint Gobain Abrasives Inc | Prodotti abrasivi e metodo per la finitura di superfici dure. |
| EP2797715A4 (en) | 2011-12-30 | 2016-04-20 | Saint Gobain Ceramics | SHAPED ABRASIVE PARTICLE AND METHOD OF FORMING THE SAME |
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| US8968435B2 (en) | 2012-03-30 | 2015-03-03 | Saint-Gobain Abrasives, Inc. | Abrasive products and methods for fine polishing of ophthalmic lenses |
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| US11865663B2 (en) * | 2018-05-10 | 2024-01-09 | George Shuai | Optical surface polishing |
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| EP4081369A4 (en) | 2019-12-27 | 2024-04-10 | Saint-Gobain Ceramics & Plastics Inc. | Abrasive articles and methods of forming same |
| CN113881348A (zh) * | 2021-11-04 | 2022-01-04 | 青岛福禄泰科表面材料科技有限公司 | 一种复合氧化铝抛光液及其制备方法和应用 |
| CN114213977A (zh) * | 2021-12-23 | 2022-03-22 | 中天科技精密材料有限公司 | 抛光剂及其制备方法 |
| US12508688B2 (en) | 2021-12-30 | 2025-12-30 | Saint-Gobain Abrasives, Inc. | Abrasive articles and methods of forming same |
| CA3241421A1 (en) | 2021-12-30 | 2023-07-06 | Anthony MARTONE | Abrasive articles and methods of forming same |
| WO2023130051A1 (en) | 2021-12-30 | 2023-07-06 | Saint-Gobain Abrasives, Inc. | Abrasive articles and methods of forming same |
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| GB1501570A (en) * | 1975-11-11 | 1978-02-15 | Showa Denko Kk | Abrader for mirror polishing of glass and method for mirror polishing |
| US4161394A (en) * | 1978-06-19 | 1979-07-17 | Regan Glen B | Polishing slurry of xanthan gum and a dispersing agent |
| FR2549846B1 (fr) * | 1983-07-29 | 1986-12-26 | Rhone Poulenc Spec Chim | Nouvelle composition de polissage a base de cerium et son procede de fabrication |
| US4576612A (en) * | 1984-06-01 | 1986-03-18 | Ferro Corporation | Fixed ophthalmic lens polishing pad |
| SU1420933A1 (ru) * | 1986-03-10 | 1991-06-07 | Предприятие П/Я Х-5476 | Способ получени суспензии дл полировани стекл нных пластин |
| US5312789A (en) * | 1987-05-27 | 1994-05-17 | Minnesota Mining And Manufacturing Company | Abrasive grits formed of ceramic, impregnation method of making the same and products made therewith |
| SU1654320A1 (ru) * | 1989-02-08 | 1991-06-07 | Всесоюзный Научно-Исследовательский Институт Химических Реактивов И Особо Чистых Химических Веществ | Полировальна суспензи дл обработки жестких контактных линз из полиметилметакрилата |
| KR950703624A (ko) * | 1992-09-25 | 1995-09-20 | 워렌 리처드 보비 | 알루미나 및 세리아를 함유하는 연마 그레인의 제조 방법(method of making abrasive grain containing alumina and ceria) |
| CA2111010A1 (en) * | 1993-01-29 | 1994-07-30 | Robert James Hagerty | Method of finely polishing planar optical elements |
| US5549962A (en) * | 1993-06-30 | 1996-08-27 | Minnesota Mining And Manufacturing Company | Precisely shaped particles and method of making the same |
| US5465314A (en) * | 1993-09-09 | 1995-11-07 | The Furukawa Electronic Co., Ltd. | Method of manufacturing optical connector |
| US5632668A (en) * | 1993-10-29 | 1997-05-27 | Minnesota Mining And Manufacturing Company | Method for the polishing and finishing of optical lenses |
| KR960041316A (ko) * | 1995-05-22 | 1996-12-19 | 고사이 아키오 | 연마용 입상체, 이의 제조방법 및 이의 용도 |
| US5693239A (en) * | 1995-10-10 | 1997-12-02 | Rodel, Inc. | Polishing slurries comprising two abrasive components and methods for their use |
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| CN1092095C (zh) * | 1996-05-08 | 2002-10-09 | 明尼苏达矿业和制造公司 | 包括抗填充成分的磨料制品 |
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| KR19980019046A (ko) * | 1996-08-29 | 1998-06-05 | 고사이 아키오 | 연마용 조성물 및 이의 용도(Abrasive composition and use of the same) |
| JP3856513B2 (ja) * | 1996-12-26 | 2006-12-13 | 昭和電工株式会社 | ガラス研磨用研磨材組成物 |
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| US5876470A (en) * | 1997-08-01 | 1999-03-02 | Minnesota Mining And Manufacturing Company | Abrasive articles comprising a blend of abrasive particles |
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1998
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