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ES8800512A1 - Procedimiento para hacer un dispositivo transistor mos. - Google Patents

Procedimiento para hacer un dispositivo transistor mos.

Info

Publication number
ES8800512A1
ES8800512A1 ES549295A ES549295A ES8800512A1 ES 8800512 A1 ES8800512 A1 ES 8800512A1 ES 549295 A ES549295 A ES 549295A ES 549295 A ES549295 A ES 549295A ES 8800512 A1 ES8800512 A1 ES 8800512A1
Authority
ES
Spain
Prior art keywords
door
groove
electrode
impurity
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES549295A
Other languages
English (en)
Other versions
ES549295A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
American Telephone and Telegraph Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone and Telegraph Co Inc filed Critical American Telephone and Telegraph Co Inc
Publication of ES549295A0 publication Critical patent/ES549295A0/es
Publication of ES8800512A1 publication Critical patent/ES8800512A1/es
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/149—Source or drain regions of field-effect devices
    • H10D62/151—Source or drain regions of field-effect devices of IGFETs 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/026—Manufacture or treatment of FETs having insulated gates [IGFET] having laterally-coplanar source and drain regions, a gate at the sides of the bulk channel, and both horizontal and vertical current flow
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/025—Manufacture or treatment forming recessed gates, e.g. by using local oxidation
    • H10D64/027—Manufacture or treatment forming recessed gates, e.g. by using local oxidation by etching at gate locations

Landscapes

  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)

Abstract

PROCEDIMIENTO PARA LA REALIZACION DE UN DISPOSITIVO TRANSISTOR MOS. COMPRENDE LAS ETAPAS DE FORMAR UN SURCO EN UNA SUPERFICIE DE SUSTRATO SEMICONDUCTOR, TENIENDO EL SURCO UN PAR DE PAREDES LATERALES OPUESTAS, UN PAR DE PAREDES EXTREMAS OPUESTAS Y UN FONDO; DE FORMAR UNA ESTRUCTURA DE PUERTA, EN EL SURCO, QUE SE EXTIENDE DESCENDIENDO DE UNA FORMA CONTINUA A LO LARGO DE UNA PARED LATERAL, A LO LARGO DEL FONDO Y ASCENDIENDO A LO LARGO DE LA OTRA PARED LATERAL, COMPRENDIENDO LA ESTRUCTURA DE LA PUERTA UNA CAPA DIELECTRICA Y UNA CAPA DE ELECTRODO SUPERPUESTA A LA CAPA DIELECTRICA; DE FORMAR UNA PRIMERA REGION DE IMPUREZA EN LAS REGIONES SUPERFICIALES DEL SURCO NO CUBIERTAS POR EL ELECTRODO PUERTA, PARA CREAR UN CONTACTO DE LA FUENTE CON LA REGION DE IMPUREZA, EN UN LADO DEL ELECTRODO PUERTA; Y DE FORMAR UN CONTACTO DEL DRENADOR CON LA REGION DE IMPUREZA EN EL OTRO LADO DEL ELECTRODO PUERTA.
ES549295A 1984-11-27 1985-11-26 Procedimiento para hacer un dispositivo transistor mos. Expired ES8800512A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US67530584A 1984-11-27 1984-11-27

Publications (2)

Publication Number Publication Date
ES549295A0 ES549295A0 (es) 1987-11-16
ES8800512A1 true ES8800512A1 (es) 1987-11-16

Family

ID=24709896

Family Applications (2)

Application Number Title Priority Date Filing Date
ES549295A Expired ES8800512A1 (es) 1984-11-27 1985-11-26 Procedimiento para hacer un dispositivo transistor mos.
ES557586A Expired ES8800789A1 (es) 1984-11-27 1987-06-11 Perfeccionamientos en un dispositivo transistor mos

Family Applications After (1)

Application Number Title Priority Date Filing Date
ES557586A Expired ES8800789A1 (es) 1984-11-27 1987-06-11 Perfeccionamientos en un dispositivo transistor mos

Country Status (8)

Country Link
EP (1) EP0203146B1 (es)
JP (1) JPH0626251B2 (es)
KR (1) KR940005451B1 (es)
CA (1) CA1236932A (es)
DE (1) DE3570557D1 (es)
ES (2) ES8800512A1 (es)
IE (1) IE56967B1 (es)
WO (1) WO1986003341A1 (es)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01151268A (ja) * 1987-12-08 1989-06-14 Mitsubishi Electric Corp 半導体装置の製造方法
WO1990013918A1 (en) * 1989-05-12 1990-11-15 Oki Electric Industry Co., Ltd. Field effect transistor
JP2661792B2 (ja) * 1989-05-12 1997-10-08 沖電気工業株式会社 電界効果トランジスタの製造方法
JP2994670B2 (ja) 1989-12-02 1999-12-27 忠弘 大見 半導体装置及びその製造方法
JP2790362B2 (ja) * 1990-06-04 1998-08-27 キヤノン株式会社 半導体装置
FR2720191B1 (fr) * 1994-05-18 1996-10-18 Michel Haond Transistor à effet de champ à grille isolée, et procédé de fabrication correspondant.
DE19743342C2 (de) * 1997-09-30 2002-02-28 Infineon Technologies Ag Feldeffekttransistor hoher Packungsdichte und Verfahren zu seiner Herstellung
FR2791810B1 (fr) * 1999-03-31 2001-06-22 France Telecom Procede de fabrication d'une heterostructure planaire
EP1091413A3 (en) * 1999-10-06 2005-01-12 Lsi Logic Corporation Fully-depleted, fully-inverted, short-length and vertical channel, dual-gate, cmos fet
US7282401B2 (en) 2005-07-08 2007-10-16 Micron Technology, Inc. Method and apparatus for a self-aligned recessed access device (RAD) transistor gate
US7867851B2 (en) * 2005-08-30 2011-01-11 Micron Technology, Inc. Methods of forming field effect transistors on substrates
US7700441B2 (en) * 2006-02-02 2010-04-20 Micron Technology, Inc. Methods of forming field effect transistors, methods of forming field effect transistor gates, methods of forming integrated circuitry comprising a transistor gate array and circuitry peripheral to the gate array, and methods of forming integrated circuitry comprising a transistor gate array including first gates and second grounded isolation gates
US7602001B2 (en) 2006-07-17 2009-10-13 Micron Technology, Inc. Capacitorless one transistor DRAM cell, integrated circuitry comprising an array of capacitorless one transistor DRAM cells, and method of forming lines of capacitorless one transistor DRAM cells
US7923373B2 (en) 2007-06-04 2011-04-12 Micron Technology, Inc. Pitch multiplication using self-assembling materials
JP5258230B2 (ja) * 2007-08-28 2013-08-07 セイコーインスツル株式会社 半導体装置の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS506287A (es) * 1973-05-18 1975-01-22
JPS5499574A (en) * 1978-01-24 1979-08-06 Pioneer Electronic Corp Method of fabricating field effect transistor
US4296429A (en) * 1978-08-09 1981-10-20 Harris Corporation VMOS Transistor and method of fabrication
US4407058A (en) * 1981-05-22 1983-10-04 International Business Machines Corporation Method of making dense vertical FET's
US4419811A (en) * 1982-04-26 1983-12-13 Acrian, Inc. Method of fabricating mesa MOSFET using overhang mask
US4503598A (en) * 1982-05-20 1985-03-12 Fairchild Camera & Instrument Corporation Method of fabricating power MOSFET structure utilizing self-aligned diffusion and etching techniques

Also Published As

Publication number Publication date
ES8800789A1 (es) 1987-12-01
CA1236932A (en) 1988-05-17
IE56967B1 (en) 1992-02-12
IE852964L (en) 1986-05-27
ES557586A0 (es) 1987-12-01
EP0203146B1 (en) 1989-05-24
ES549295A0 (es) 1987-11-16
KR940005451B1 (ko) 1994-06-18
WO1986003341A1 (en) 1986-06-05
KR880700473A (ko) 1988-03-15
DE3570557D1 (en) 1989-06-29
EP0203146A1 (en) 1986-12-03
JPH0626251B2 (ja) 1994-04-06
JPS62500831A (ja) 1987-04-02

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