ES433118A1 - Photosensitive materials - Google Patents
Photosensitive materialsInfo
- Publication number
- ES433118A1 ES433118A1 ES433118A ES433118A ES433118A1 ES 433118 A1 ES433118 A1 ES 433118A1 ES 433118 A ES433118 A ES 433118A ES 433118 A ES433118 A ES 433118A ES 433118 A1 ES433118 A1 ES 433118A1
- Authority
- ES
- Spain
- Prior art keywords
- epoxide
- reaction
- photosensitiser
- coatings
- added
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000002118 epoxides Chemical class 0.000 abstract 4
- 239000007795 chemical reaction product Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 238000007259 addition reaction Methods 0.000 abstract 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 abstract 1
- 150000004056 anthraquinones Chemical class 0.000 abstract 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 150000002896 organic halogen compounds Chemical class 0.000 abstract 1
- 150000003142 primary aromatic amines Chemical class 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
- C08F299/028—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/5033—Amines aromatic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
In order to produce photopolymerisable coatings, an epoxide prepolymer containing at least two epoxide groups per molecule is reacted with an alpha, beta-ethylenically unsaturated carboxylic acid, a photosensitiser is added to the reaction product, and the resultant composition is applied to a substrate. Simultaneously with or subsequently to the reaction of the epoxide, an addition reaction is carried out between the epoxide and a primary aromatic amine. A mixture of an optionally substituted anthraquinone and an organic halogen compound is added as photosensitiser to the reaction product. These coatings can be used in a photolytic process for the production of printed circuits.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US42687773A | 1973-12-20 | 1973-12-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES433118A1 true ES433118A1 (en) | 1976-11-16 |
Family
ID=23692577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES433118A Expired ES433118A1 (en) | 1973-12-20 | 1974-12-19 | Photosensitive materials |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS5234935B2 (en) |
| BR (1) | BR7410702D0 (en) |
| CA (1) | CA1048328A (en) |
| CH (1) | CH613287A5 (en) |
| ES (1) | ES433118A1 (en) |
| FR (1) | FR2255629B1 (en) |
| GB (1) | GB1448643A (en) |
| IT (1) | IT1030846B (en) |
| NL (1) | NL7415671A (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4169732A (en) * | 1978-01-09 | 1979-10-02 | International Business Machines Corporation | Photosensitive coating composition and use thereof |
| NO159729C (en) * | 1978-11-01 | 1989-02-01 | Coates Brothers & Co | PROCEDURE FOR MANUFACTURING A PATTERN METAL PATTERN ON A LAYER ELECTRIC CONDUCTIVE METAL BEARED BY A NON-CONDUCTIVE SUBSTRATE. |
| JPS5622364A (en) | 1979-08-01 | 1981-03-02 | Matsushita Electric Ind Co Ltd | Coating composition |
| US4390615A (en) | 1979-11-05 | 1983-06-28 | Courtney Robert W | Coating compositions |
| DE3374413D1 (en) * | 1982-06-24 | 1987-12-17 | Ciba Geigy Ag | Photopolymerisable coating, photopolymerisable material and its use |
| JPS61125019A (en) * | 1984-11-16 | 1986-06-12 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Manufacture of ic and photoconductive photoresist composite used therefor |
| GB8715436D0 (en) * | 1987-07-01 | 1987-08-05 | Ciba Geigy Ag | Substituted anthraquinones |
| US4933398A (en) * | 1987-07-01 | 1990-06-12 | Ciba-Geigy Corporation | Photosensitive epoxy resins and use thereof |
| JPH0491104A (en) * | 1990-08-06 | 1992-03-24 | Ootex Kk | Photopolymerization reaction initiator |
-
1974
- 1974-10-18 FR FR7439740A patent/FR2255629B1/fr not_active Expired
- 1974-11-20 GB GB5034474A patent/GB1448643A/en not_active Expired
- 1974-11-27 CA CA214897A patent/CA1048328A/en not_active Expired
- 1974-11-29 IT IT2998874A patent/IT1030846B/en active
- 1974-12-02 NL NL7415671A patent/NL7415671A/en not_active Application Discontinuation
- 1974-12-17 CH CH1680474A patent/CH613287A5/en not_active IP Right Cessation
- 1974-12-19 ES ES433118A patent/ES433118A1/en not_active Expired
- 1974-12-20 JP JP14582574A patent/JPS5234935B2/ja not_active Expired
- 1974-12-20 BR BR1070274A patent/BR7410702D0/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| IT1030846B (en) | 1979-04-10 |
| JPS5097324A (en) | 1975-08-02 |
| DE2459179B2 (en) | 1977-04-21 |
| GB1448643A (en) | 1976-09-08 |
| CA1048328A (en) | 1979-02-13 |
| JPS5234935B2 (en) | 1977-09-06 |
| CH613287A5 (en) | 1979-09-14 |
| BR7410702D0 (en) | 1975-09-02 |
| FR2255629B1 (en) | 1976-10-22 |
| FR2255629A1 (en) | 1975-07-18 |
| NL7415671A (en) | 1975-06-24 |
| DE2459179A1 (en) | 1975-06-26 |
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