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ES286983A1 - Improvements introduced in the manufacture of photosensible leaves (Machine-translation by Google Translate, not legally binding) - Google Patents

Improvements introduced in the manufacture of photosensible leaves (Machine-translation by Google Translate, not legally binding)

Info

Publication number
ES286983A1
ES286983A1 ES286983A ES286983A ES286983A1 ES 286983 A1 ES286983 A1 ES 286983A1 ES 286983 A ES286983 A ES 286983A ES 286983 A ES286983 A ES 286983A ES 286983 A1 ES286983 A1 ES 286983A1
Authority
ES
Spain
Prior art keywords
translation
manufacture
machine
legally binding
google translate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES286983A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of ES286983A1 publication Critical patent/ES286983A1/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

Improvements introduced in the manufacture of improved photosensitive sheets able to immediately give a visible image of exposure to actinic light without further treatment, characterized in that said sheets comprise a base sheet or support with a layer of a photosensitive preparation by at least one of its surfaces, said photosensitive preparation comprising a diazo material and an acid-base indicator. (Machine-translation by Google Translate, not legally binding)
ES286983A 1962-04-27 1963-04-11 Improvements introduced in the manufacture of photosensible leaves (Machine-translation by Google Translate, not legally binding) Expired ES286983A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US19078962A 1962-04-27 1962-04-27

Publications (1)

Publication Number Publication Date
ES286983A1 true ES286983A1 (en) 1963-12-01

Family

ID=22702786

Family Applications (1)

Application Number Title Priority Date Filing Date
ES286983A Expired ES286983A1 (en) 1962-04-27 1963-04-11 Improvements introduced in the manufacture of photosensible leaves (Machine-translation by Google Translate, not legally binding)

Country Status (7)

Country Link
CH (1) CH439959A (en)
DE (1) DE1447022B2 (en)
DK (1) DK106257C (en)
ES (1) ES286983A1 (en)
GB (1) GB1041463A (en)
NL (1) NL292007A (en)
SE (1) SE306233B (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2331377C2 (en) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Photosensitive copying material
US4486529A (en) * 1976-06-10 1984-12-04 American Hoechst Corporation Dialo printing plate made from laser
GB1604652A (en) * 1977-04-12 1981-12-16 Vickers Ltd Radiation sensitive materials
EP0041984B1 (en) * 1979-12-07 1984-09-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
ZA821588B (en) * 1981-03-24 1983-02-23 Sensitisers Ltd Photosensitive relief image-forming materials
AU557375B2 (en) * 1981-06-19 1986-12-18 Sericol Group Ltd. Photo sensitive compositions and their use
DE3144499A1 (en) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
DE3144480A1 (en) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS61107352A (en) * 1984-10-31 1986-05-26 Konishiroku Photo Ind Co Ltd Positive plating material for lithographic printing
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US5334481A (en) * 1985-05-02 1994-08-02 Ciba-Geigy Corporation Positive diazo quinone photoresist compositions containing antihalation compound
US4777111A (en) * 1985-06-03 1988-10-11 Fairmount Chemical Company, Inc. Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
JPH0642071B2 (en) * 1985-11-09 1994-06-01 コニカ株式会社 Photosensitive composition and photosensitive lithographic printing plate
JP2944296B2 (en) 1992-04-06 1999-08-30 富士写真フイルム株式会社 Manufacturing method of photosensitive lithographic printing plate
CN101813888B (en) * 2010-04-14 2012-02-01 东莞长联新材料科技有限公司 Method for regulating and controlling heat stability and photochemical activity of diazonium photoresists

Also Published As

Publication number Publication date
DE1447022A1 (en) 1968-11-28
SE306233B (en) 1968-11-18
NL292007A (en)
DE1447022B2 (en) 1971-11-25
GB1041463A (en) 1966-09-07
DK106257C (en) 1967-01-09
CH439959A (en) 1967-07-15

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