[go: up one dir, main page]

EP3389055B1 - X-ray device for generating high-energy x-ray radiation - Google Patents

X-ray device for generating high-energy x-ray radiation

Info

Publication number
EP3389055B1
EP3389055B1 EP17165888.3A EP17165888A EP3389055B1 EP 3389055 B1 EP3389055 B1 EP 3389055B1 EP 17165888 A EP17165888 A EP 17165888A EP 3389055 B1 EP3389055 B1 EP 3389055B1
Authority
EP
European Patent Office
Prior art keywords
ray
target
electron beam
linear accelerator
electrons
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP17165888.3A
Other languages
German (de)
French (fr)
Other versions
EP3389055A1 (en
Inventor
Marvin Möller
Sven Müller
Martin Koschmieder
Stefan Willing
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Healthineers AG
Original Assignee
Siemens Healthineers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Healthineers AG filed Critical Siemens Healthineers AG
Priority to EP17165888.3A priority Critical patent/EP3389055B1/en
Priority to US15/947,934 priority patent/US10825639B2/en
Priority to CN201810316877.XA priority patent/CN108696977B/en
Publication of EP3389055A1 publication Critical patent/EP3389055A1/en
Application granted granted Critical
Publication of EP3389055B1 publication Critical patent/EP3389055B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G1/00X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/08Electrical details
    • H05G1/26Measuring, controlling or protecting
    • H05G1/30Controlling
    • H05G1/52Target size or shape; Direction of electron beam, e.g. in tubes with one anode and more than one cathode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/16Vessels; Containers; Shields associated therewith
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H6/00Targets for producing nuclear reactions
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/10Scattering devices; Absorbing devices; Ionising radiation filters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00X-ray tubes
    • H01J2235/08Targets (anodes) and X-ray converters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00X-ray tubes
    • H01J2235/12Cooling
    • H01J2235/1225Cooling characterised by method
    • H01J2235/1262Circulating fluids
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H9/00Linear accelerators
    • H05H9/04Standing-wave linear accelerators
    • H05H9/048Lepton LINACS

Definitions

  • the invention relates to an X-ray device for generating high-energy X-rays, comprising a linear accelerator and a target.
  • the linear accelerator is designed to generate X-rays and to generate an electron beam directed at the target, the kinetic energy of which per electron is at least 1 MeV.
  • X-ray systems typically have an electron beam source that delivers an accelerated electron beam to a target (also known as the target material). When the electrons strike the target, X-rays are generated in the area of the so-called focal spot.
  • the electron beam source is usually formed by a cathode, with the emerging electrodes being accelerated by an applied acceleration field toward an anode, which in such designs forms the target.
  • a linear accelerator as the electron beam source, which delivers an electron beam directed at the target.
  • An X-ray tube for medical imaging such as computed tomography. It consists of a cathode and an anode.
  • the electron beam is directed onto a target to generate X-rays.
  • the electron beam passes through a diaphragm channel that borders the target and is incorporated into a diaphragm body.
  • the area around the diaphragm channel must be as solid as possible; water cooling may be required.
  • GB 645 509 A discloses an electromagnetic modular waveguide of any length while maintaining a vacuum.
  • GB 665 998 A describes the use of such a modular waveguide to accelerate charged particles.
  • the object of the present invention is to provide an X-ray device for generating high-energy X-rays in which the extent of the focal spot on the target can be minimized.
  • An X-ray device for generating high-energy X-rays comprises a linear accelerator and a target.
  • the target typically consists of a target material which is used to generate X-rays by deceleration. of the accelerated electrons.
  • the area of the target in which this conversion takes place is referred to as the focal spot.
  • the linear accelerator is further designed and aligned to generate an electron beam directed at the target, the kinetic energy per electron of which is at least 1 MeV.
  • an aperture is arranged in the beam path of the electron beam between the linear accelerator and the target, said aperture having an edge region surrounding an aperture opening, the material thickness of which, in the propagation direction of the electron beam, is less than 10% of the average range of electrons of the generated kinetic energy in the material of the edge region.
  • the invention takes the approach of providing an aperture that is not designed to absorb the electrons of the generated energy range to any noticeable extent; rather, it is envisaged that the interaction should be essentially limited to inelastic or elastic scattering processes.
  • the aperture at least in the edge region delimiting the aperture opening, has a material thickness that is only a fraction of the average range of electrons of the generated kinetic energy in the material of the edge region.
  • the resulting divergently propagating electrons subsequently generally no longer impact the target material.
  • the area of the electron beam that creates the focal spot is thus essentially limited to the area of the aperture.
  • the energy transfer to the aperture is minimal, as this is essentially based only on inelastic scattering effects. This results, among other things, in less heat input to the aperture, which therefore does not necessarily require additional cooling.
  • the edge area of the aperture forms a scattering body (also known as a diffuser) for the electrons passing through it, within the energy range specified by the applied accelerating voltage.
  • the randomly deflected electrons can be absorbed in other areas of the X-ray system and are thus no longer visible in the effective beam field of the generated X-ray radiation.
  • Limiting the size of the focal spot on the target results, among other things, in improved image quality in imaging techniques.
  • the acquired images exhibit less blurring and smaller penumbras because the size of the focal spot approximates that of an ideal point source.
  • Possible fields of application include, for example, radiography, particularly the non-destructive testing of workpieces, components, or other objects; the inspection of transported goods, particularly in the context of freight inspection, where, for example, trucks or freight containers for trains or container ships are x-rayed to make their contents visible; and applications in the field of medicine, particularly in the field of radiation therapy.
  • the limitation of the focal spot provided by the invention allows for more precise dose distribution in radiotherapy, particularly in intensity-modulated radiotherapy, since the penumbra of the collimator limiting the photon beam field is smaller.
  • the X-ray devices can be optimized in terms of weight, since downstream collimators for collimating the generated X-rays can be eliminated or at least limited.
  • the aperture consists of a thin sheet, particularly made of steel or another transition metal or alloy.
  • Another particularly preferred non-metallic material for the aperture is, for example, graphite.
  • the material and thickness of the aperture are matched to the kinetic energy of the electrons generated during the intended use of the X-ray device.
  • the material thickness is typically in the range of one or more millimeters if it is made of a lightweight material such as graphite.
  • Apertures made of a heavier material, particularly metal have thinner material thicknesses, for example, in the submillimeter range, particularly in the range of approximately 1/10 mm.
  • At least the edge region of the aperture that scatters the electrons is formed by one or more foils.
  • Such designs can be viewed as cost-effective implementations of a scattering body of sufficiently small thickness, ensuring that the interaction of the generated kinetic energy with the electrons is essentially limited to scattering processes. If the region of the aperture that is responsible for the scattering of the electrons is formed by such a foil material, the heat input is minimal. Therefore, apertures designed in this way do not necessarily need to be actively cooled during operation of the X-ray device.
  • the foil is preferably made of a metal.
  • the aperture or at least the scattering edge area of the aperture is made of titanium.
  • the aperture or at least the edge area surrounding the aperture is made of stainless steel, tungsten, or copper. or from another transition metal or transition metal alloy.
  • the aperture in particular the aperture described above consisting of at least one metallic foil, can be cooled by a cooling device, in particular a water cooling device, in one possible embodiment. This ensures that even the relatively low heat transfer caused by inelastic scattering processes can be reliably dissipated.
  • a collimator is arranged in the beam path of the X-rays generated by the target. This serves to limit the effective beam field of the generated X-rays. If the location of X-ray generation (focal spot) is small, the penumbra at the edges of the effective beam field will also be small.
  • a vacuum housing surrounding at least the linear accelerator, the aperture, and the target, or a vacuum envelope surrounding these components is provided at least in some regions with a shield suitable for absorbing X-ray radiation caused by scattered electrons that strike the vacuum housing and are thereby slowed down.
  • the resulting X-ray radiation can be spectrally influenced by the choice of wall material and is preferably shielded locally by a shield arranged outside the vacuum housing.
  • the shield is provided inside the vacuum housing. Since the vacuum housing of the X-ray device is evacuated, the shield provided inside the vacuum housing preferably consists of a material with high vapor pressure; particularly preferably, the shield comprises elements with a low atomic number.
  • Materials with a low vapor pressure can also be used for shielding on the outside of the vacuum housing.
  • This shield consists, for example, of Made entirely or partially of lead. Since the scattered electrons are not absorbed by the aperture material, they propagate divergently to the direction of propagation of the electron beam and hit the vacuum enclosure, which is covered with shielding materials, where they are absorbed. Since the absorption of the electrons scattered by the aperture does not occur in a highly localized area, but rather in large areas of the vacuum enclosure, external cooling is generally not necessary here either.
  • the vacuum housing of the X-ray device can be cooled by means of a fluid cooling system.
  • the areas provided with the shielding exhibit increased absorption for electrons of the generated kinetic energy compared to areas of the vacuum housing without shielding.
  • it is intended to provide shielding only for those areas that are relevant for the absorption of scattered electrons. This contributes, among other things, to weight reduction.
  • the shielded regions preferably lie exclusively within a solid angle range emanating from the aperture and extending in the propagation direction of the electron beam.
  • the solid angle range is preferably formed by a plurality of superimposed scattering cones, the cone apices of which lie within the edge region surrounding the aperture.
  • the shield is arranged where the electrons scattered in the edge region of the aperture are at least highly likely to strike.
  • the solid angle range to be shielded corresponds to a medium scattering angle range of the electrons scattered in the edge region of the aperture.
  • the deflection of the scattered electrons with respect to the propagation direction of the unscattered electrons is smaller at higher energies than for electrons with lower kinetic energy.
  • the shielding in X-ray systems designed to provide higher-energy X-rays can be limited to a smaller solid angle range concentrated around the propagation direction of the unscattered electron beam.
  • the mean scattering angle range is assumed to be a scattering cone centered around the mean scattering angle, whose aperture angle corresponds to a mean deviation characteristic of the scattering process, in particular a standard deviation.
  • the mean scattering angle refers to the mean value of the angles of the scattered electrons to the acceleration axis, which corresponds to the propagation direction of the unscattered electrons.
  • the linear accelerator of the X-ray device is preferably designed to generate an electron beam whose kinetic energy per electron is less than 20 MeV.
  • the X-ray device is therefore preferably suitable for the already described applications in the field of radioscopy or radiology.
  • the invention further relates to a method for producing an X-ray device for generating high-energy X-rays, in particular a method for producing one of the X-ray devices described above.
  • the X-ray device comprises a linear accelerator and a target, wherein the linear accelerator is designed to generate X-rays by generating an electron beam directed at the target, the kinetic energy per electron being at least 1 MeV.
  • a component is arranged in the beam path of the electron beam between the linear accelerator and the target, the material thickness of which, in the propagation direction of the electron beam, is less than 10% of the average range of electrons of the generated kinetic energy in the material of the component.
  • a diaphragm opening is introduced into the component by exposing the component to an electron beam generated by the linear accelerator. In this sense, after the diaphragm opening has been introduced, the component forms the previously described diaphragm.
  • the invention utilizes this property to introduce the above-described aperture into the component.
  • the current intensity of the accelerated electron beam provided by the linear accelerator is increased, if necessary, compared to the current intensity generated during normal operation in order to burn a hole into the component inserted in the beam path – which, for example, is formed by one or more of the above-described foils.
  • the dimensioning of the aperture thus created corresponds to the central region of the electron beam. and thus automatically an aperture with the scattering characteristics described above for the electrons propagating away from the central region. Complex adjustment of an aperture already equipped with an aperture can be avoided, thus saving assembly and adjustment costs.
  • Figure 1 shows an X-ray device 1 according to a first embodiment of the invention in a schematic sectional view.
  • the X-ray device 1 comprises a linear accelerator 2, shown only schematically, which is designed to generate an electron beam E with a kinetic energy of at least 1 MeV per electron.
  • the electron beam E is directed at a target 3.
  • the target 3 emits X-ray radiation R in the region of a focal spot.
  • a diaphragm 4 is arranged, which diffuses a peripheral part of the incident primary electron beam E, so that the extent of the focal spot on the target 3 is reduced
  • at least one edge region B of the aperture 4 surrounding an aperture 5 is made of a material suitable for scattering electrons of the generated kinetic energy.
  • the edge region B of the aperture 4 has a material thickness in the propagation direction P of the electron beam E that is small compared to the range of the electrons of the generated kinetic energy in the material of the edge region B.
  • the material thickness of the edge region B according to the invention is less than 10% of the average range of electrons with the kinetic energy of at least 1 MeV in the material of the edge region B.
  • the electrons propagating away from the center of the electron beam E are diffusely scattered by the edge region B and thus distributed over a large area of the inner surface of a vacuum housing 6 of the X-ray device 1. Accordingly, the heat input caused by the absorption of these electrons is also distributed over large areas of the vacuum housing 6, so that external cooling of the vacuum housing 6 is unnecessary.
  • a shield 7 is arranged, which in the exemplary embodiment consists of lead and extends - with the exception of the area of the target 3 - over the entire outer surface of the vacuum housing 6.
  • radioscopy is a suitable field of application for the X-ray device 1; other fields of application include, for example, medical radiotherapy.
  • the aperture 4 is formed from a simple sheet or foil made of metal. Since the interaction of the electrons with the material of aperture 4 is essentially limited to inelastic and elastic scattering events, the heat input is also minimal. Cooling of aperture 4 is therefore not absolutely necessary.
  • a cooling device 8 for fluid cooling of the aperture 4 is provided, which is shown schematically in Figure 1 is shown.
  • the aperture 4 is designed such that a cooling fluid, for example water, can be passed through at least a portion of the aperture.
  • the aperture 4 is formed by two plane-parallel foils, between which a gap is formed into which the cooling fluid can be introduced.
  • the proportion of X-ray radiation R caused by scattered electrons can be further reduced if the X-ray radiation R emitted from the target 3 is collimated.
  • a collimator 9 for example a multi-leaf collimator, is optionally arranged in the region of the emitted X-ray radiation R close to the target.
  • Figure 2 shows an X-ray device 1 according to a second embodiment.
  • the second embodiment differs from the one shown in Figure 1 illustrated embodiment only with regard to the extent of the shield 7, so that reference is first made to the relevant description in order to avoid repetition.
  • the shielding 7 is limited to a partial area of the vacuum housing 6.
  • the design of the shielding 7 is such that at least the predominant portion of the electrons scattered in the edge area B are absorbed by the shielding 7.
  • a solid angle range ⁇ (indicated by dashed lines in the figure) emanating from the scattering edge area B must be shielded, into which on average at least the predominant A majority of electrons are scattered.
  • the extent of the shield 7 is therefore to be designed as a function of the kinetic energy of the electrons in accordance with the mean scattering angle ⁇ and the mean deviation from this mean scattering angle ⁇ .
  • the information relevant for the design of shield 7 is in Figure 3 for a selected scattering material and for specific energy ranges between 2 MeV and 18 MeV. Shown are the mean scattering angle ⁇ , which is relevant for electron scattering at the respective energy, and the mean deviation ⁇ from it, which is represented as bars centered around the mean scattering angle ⁇ .
  • the mean deviation ⁇ corresponds to the standard deviation, so that in the example illustrated here, assuming normally distributed scattering events, it can be assumed that approximately 68% of the scattering angles are scattered within the mean scattering angle range defined by the mean scattering angle ⁇ and the mean deviation ⁇ .
  • the solid angle range ⁇ covered by the shield 7 corresponds to the sum of the mean scattering angle ranges whose scattering centers lie in the edge region B of the aperture 4, which is crucial for electron scattering.
  • the dimensions of the shield 7 can be significantly reduced by this design.
  • a preferred method for producing the above-described X-ray device 1 comprises a method step in which a component, which in the final assembled state forms the aperture 4, is introduced into the beam path of the electron beam E provided by the linear accelerator 2.
  • the aperture 5 is burned into the component by means of the electron beam E.
  • an electron beam current provided by the linear accelerator 2 can be increased compared to the current generated during regular operation. Since the number of electrons is greatly increased in a central region of the electron beam E due to the focusing properties of the linear accelerator 2 and greatly decreases towards the edges, such a procedure leaves an edge region B surrounding the aperture 5 with the scattering properties described above. Edge beam regions of the electron beam E, in which the number of electrons is greatly reduced compared to the central region of the electron beam E, are thus scattered away from the target 3 during regular operation of the X-ray device 1, thus minimizing the extent of the focal spot on the target 3.

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Radiation-Therapy Devices (AREA)
  • X-Ray Techniques (AREA)
  • Particle Accelerators (AREA)

Description

Die Erfindung betrifft eine Röntgeneinrichtung zur Erzeugung von hochenergetischer Röntgenstrahlung, umfassend einen Linearbeschleuniger und ein Target. Der Linearbeschleuniger ist zur Erzeugung von Röntgenstrahlung sowie dazu ausgebildet, einen auf das Target gerichteten Elektronenstrahl zu erzeugen, dessen kinetische Energie pro Elektron zumindest 1 MeV beträgt.The invention relates to an X-ray device for generating high-energy X-rays, comprising a linear accelerator and a target. The linear accelerator is designed to generate X-rays and to generate an electron beam directed at the target, the kinetic energy of which per electron is at least 1 MeV.

Röntgeneinrichtungen weisen typischerweise eine Elektronenstrahlquelle auf, die einen beschleunigten Elektronenstrahl zur Beaufschlagung eines Targets (auch: Zielmaterial) bereitstellen. Beim Auftreffen der Elektronen auf das Target entsteht im Bereich des sogenannten Brennflecks Röntgenstrahlung. Die Elektronenstrahlquelle wird für gewöhnlich von einer Kathode gebildet, wobei die austretenden Elektroden durch eine anliegenden Beschleunigungsfeldstärke in Richtung einer Anode, welche in derartigen Ausführungen das Target bildet, beschleunigt werden. Bei Hochenergieanwendungen ist es ferner bekannt, einen Linearbeschleuniger als Elektronenstrahlquelle einzusetzen, der einen auf das Target gerichteten Elektronenstrahl bereitstellt.X-ray systems typically have an electron beam source that delivers an accelerated electron beam to a target (also known as the target material). When the electrons strike the target, X-rays are generated in the area of the so-called focal spot. The electron beam source is usually formed by a cathode, with the emerging electrodes being accelerated by an applied acceleration field toward an anode, which in such designs forms the target. For high-energy applications, it is also known to use a linear accelerator as the electron beam source, which delivers an electron beam directed at the target.

In vielen Anwendungen der Radioskopie oder Radiologie besteht das Bedürfnis, einen möglichst kleinen Brennfleck zu erzeugen. Bei der Bildgebung kann dadurch beispielsweise eine hohe Ortsauflösung bei optischer Vergrößerung erreicht werden oder die von den das Röntgenstrahlenfeld begrenzenden Blenden verursachten Halbschatten verkleinert werden. Bei der Strahlentherapie, insbesondere bei der intensitätsmodulierten Strahlentherapie, kann so weiterhin eine präzisere Dosisverteilung der deponierten Röntgenstrahlung realisiert werden.In many applications in radioscopy or radiology, there is a need to create the smallest possible focal spot. In imaging, for example, this can achieve high spatial resolution at optical magnification or reduce the penumbra caused by the apertures that limit the X-ray field. In radiotherapy, especially intensity-modulated radiotherapy, this also allows for a more precise dose distribution of the deposited X-rays.

Aus DE 10 2012 103 974 A1 ist eine Röntgenröhre für die medizinische Bildgebung wie der Computertomographie bekannt, die eine Kathode und eine Anode umfasst. Der Elektronenstrahl ist auf ein Target zur Erzeugung von Röntgenstrahlung gerichtet. Zur Begrenzung der Brennfleckgröße auf dem Target durchläuft der Elektronenstrahl einen diesen seitlich begrenzenden Blendenkanal, der in einem Blendenkörper eingebracht ist. Um die bei der Absorption der Elektronen entstehende Wärme abführen zu können, muss der Bereich um den Blendenkanal möglichst massiv ausgeführt werden, gegebenenfalls ist zusätzlich eine Wasserkühlung vorgesehen.Out of DE 10 2012 103 974 A1 An X-ray tube is known for medical imaging such as computed tomography. It consists of a cathode and an anode. The electron beam is directed onto a target to generate X-rays. To limit the focal spot size on the target, the electron beam passes through a diaphragm channel that borders the target and is incorporated into a diaphragm body. To dissipate the heat generated by the absorption of the electrons, the area around the diaphragm channel must be as solid as possible; water cooling may be required.

GB 645 509 A offenbart einen elektromagnetischen modular aufgebauten Wellenleiter mit einer beliebigen Länge bei gleichzeitiger Aufrechterhaltung des Vakuums. GB 665 998 A beschreibt den Einsatz eines solchen modular aufgebauten Wellenleiters zur Beschleunigung von geladenen Teilchen. GB 645 509 A discloses an electromagnetic modular waveguide of any length while maintaining a vacuum. GB 665 998 A describes the use of such a modular waveguide to accelerate charged particles.

Ausgehend von diesem Stand der Technik ist Aufgabe der vorliegenden Erfindung, eine Röntgeneinrichtung zur Erzeugung von hochenergetischer Röntgenstrahlung anzugeben, bei der die Ausdehnung des Brennflecks auf dem Target minimiert werden kann.Based on this prior art, the object of the present invention is to provide an X-ray device for generating high-energy X-rays in which the extent of the focal spot on the target can be minimized.

Gemäß der Erfindung wird diese Aufgabe gelöst durch eine Röntgeneinrichtung zur Erzeugung von hochenergetischer Röntgenstrahlung der eingangs genannten Art mit den kennzeichnenden Merkmalen des Patenanspruchs 1 und des Patentanspruchs 13.According to the invention, this object is achieved by an X-ray device for generating high-energy X-ray radiation of the type mentioned at the outset with the characterizing features of patent claim 1 and patent claim 13.

Vorteilhafte Ausgestaltungen der Erfindung sind Gegenstand der abhängigen Ansprüche.Advantageous embodiments of the invention are the subject of the dependent claims.

Eine Röntgeneinrichtung zur Erzeugung von hochenergetischer Röntgenstrahlung umfasst einen Linearbeschleuniger und ein Target. Das Target besteht typischerweise aus einem Zielmaterial, welches zur Erzeugung von Röntgenstrahlung durch Abbremsung der beschleunigten Elektronen dient. Der Bereich des Targets, in dem diese Konvertierung stattfindet, wird als Brennfleck bezeichnet. Der Linearbeschleuniger ist weiterhin dazu ausgebildet und ausgerichtet, einen auf das Target gerichteten Elektronenstrahl zu erzeugen, dessen kinetische Energie pro Elektron zumindest 1 MeV beträgt. Gemäß der Erfindung ist im Strahlengang des Elektronenstrahls zwischen dem Linearbeschleuniger und dem Target eine Blende angeordnet, welche einen eine Blendenöffnung umgebenden Randbereich aufweist, dessen Materialstärke in Propagationsrichtung des Elektronenstrahls weniger als 10% der mittleren Reichweite von Elektronen der erzeugten kinetischen Energie im Material des Randbereichs beträgt.An X-ray device for generating high-energy X-rays comprises a linear accelerator and a target. The target typically consists of a target material which is used to generate X-rays by deceleration. of the accelerated electrons. The area of the target in which this conversion takes place is referred to as the focal spot. The linear accelerator is further designed and aligned to generate an electron beam directed at the target, the kinetic energy per electron of which is at least 1 MeV. According to the invention, an aperture is arranged in the beam path of the electron beam between the linear accelerator and the target, said aperture having an edge region surrounding an aperture opening, the material thickness of which, in the propagation direction of the electron beam, is less than 10% of the average range of electrons of the generated kinetic energy in the material of the edge region.

In Linearbeschleunigern werden typischerweise hohe kinetische Energien erreicht, so dass die emittierten Elektronen eine im Vergleich zu den in herkömmlichen Röntgenröhren erzeugten Elektronen erhöhte mittlere Reichweite in Materialien haben. Die Erfindung wählt zur Begrenzung des Brennflecks in diesem energetischen Bereich den Ansatz, eine Blende vorzusehen, die nicht dazu ausgebildet ist, die Elektronen des erzeugten Energiebereichs in merklichem Ausmaß zu absorbieren, vielmehr ist vorgesehen, dass die Wechselwirkung im Wesentlichen auf inelastische oder elastische Streuvorgänge beschränkt werden soll. Hierzu weist die Blende zumindest in dem die Blendenöffnung begrenzenden Randbereich eine Materialstärke auf, die lediglich ein Bruchteil der mittleren Reichweite von Elektronen der erzeugten kinetischen Energie im Material der Randbereichs beträgt. Bei der Transmission des Elektronenstrahls durch den Randbereich der Blende erfahren die peripheren Elektronen, welche den Randbereich durchdringen, eine Auslenkung und werden gestreut. Die daraufhin divergent propagierenden Elektronen treffen anschießend im Allgemeinen nicht mehr auf das Zielmaterial auf, welches das Target bildet. Der den Brennfleck erzeugende Bereich des Elektronenstrahls ist somit im Wesentlichen auf den Bereich der Blendenöffnung begrenzt. Gleichzeitig ist der Energieübertrag auf die Blende minimal, da dieser im Wesentlichen nur auf inelastische Streueffekte beruht. Dies bedingt unter anderem einen geringeren Wärmeeintrag auf die Blende, die daher nicht notwendigerweise zusätzlich gekühlt werden muss.In linear accelerators, high kinetic energies are typically achieved, so that the emitted electrons have a longer average range in materials compared to the electrons generated in conventional X-ray tubes. To limit the focal spot in this energy range, the invention takes the approach of providing an aperture that is not designed to absorb the electrons of the generated energy range to any noticeable extent; rather, it is envisaged that the interaction should be essentially limited to inelastic or elastic scattering processes. For this purpose, the aperture, at least in the edge region delimiting the aperture opening, has a material thickness that is only a fraction of the average range of electrons of the generated kinetic energy in the material of the edge region. When the electron beam is transmitted through the edge region of the aperture, the peripheral electrons that penetrate the edge region are deflected and scattered. The resulting divergently propagating electrons subsequently generally no longer impact the target material. The area of the electron beam that creates the focal spot is thus essentially limited to the area of the aperture. At the same time, the energy transfer to the aperture is minimal, as this is essentially based only on inelastic scattering effects. This results, among other things, in less heat input to the aperture, which therefore does not necessarily require additional cooling.

Mit anderen Worten bildet der Randbereich der Blende einen Streukörper (auch: Diffusor) für die hindurchtretenden Elektronen des von der anliegenden Beschleunigungsspannung vorgegebenen Energiebereichs. Die dabei zufällig ausgelenkten Elektronen können in anderen Bereichen der Röntgeneinrichtung absorbiert werden und sind somit im Nutzstrahlenfeld der erzeugten Röntgenstrahlung nicht mehr sichtbar. Die Begrenzung der Ausdehnung des Brennflecks auf dem Target (auch: Zielmaterial) bedingt unter anderem eine verbesserte Bildqualität bei bildgebenden Verfahren. So weisen die erfassten Bilder eine geringere Unschärfe bzw. kleinere Halbschatten auf, da sich die Ausdehnung des Brennflecks einer idealen Punktquelle annähert. Mögliche Anwendungsfelder betreffen beispielsweise die Radioskopie, insbesondere die zerstörungsfreie Prüfung von Werkstücken, Bauteilen oder anderen Objekten, die Überprüfung von Transportgut, insbesondere im Rahmen einer Frachtgutkontrolle, bei der beispielsweise Lastkraftwägen oder Frachtcontainer für Züge oder Containerschiffe durchleuchtet werden, um deren Inhalt sichtbar zu machen oder Anwendungen im Bereich der Medizin, insbesondere im Bereich der Strahlentherapie. So kann beispielsweise durch die von der Erfindung bereitgestellte Begrenzung des Brennflecks eine präzisere Dosisverteilung bei der Strahlentherapie, insbesondere bei der intensitätsmodulierten Strahlentherapie realisiert werden, da die Halbschatten des das Photonennutzstrahlenfeld begrenzenden Kollimators kleiner sind. Zudem können die Röntgeneinrichtungen hinsichtlich ihres Gewichts optimiert werden, da nachgeschaltete Kollimatoren zur Kollimation der erzeugten Röntgenstrahlung wegfallen oder zumindest begrenzt können.In other words, the edge area of the aperture forms a scattering body (also known as a diffuser) for the electrons passing through it, within the energy range specified by the applied accelerating voltage. The randomly deflected electrons can be absorbed in other areas of the X-ray system and are thus no longer visible in the effective beam field of the generated X-ray radiation. Limiting the size of the focal spot on the target (also known as the target material) results, among other things, in improved image quality in imaging techniques. The acquired images exhibit less blurring and smaller penumbras because the size of the focal spot approximates that of an ideal point source. Possible fields of application include, for example, radiography, particularly the non-destructive testing of workpieces, components, or other objects; the inspection of transported goods, particularly in the context of freight inspection, where, for example, trucks or freight containers for trains or container ships are x-rayed to make their contents visible; and applications in the field of medicine, particularly in the field of radiation therapy. For example, the limitation of the focal spot provided by the invention allows for more precise dose distribution in radiotherapy, particularly in intensity-modulated radiotherapy, since the penumbra of the collimator limiting the photon beam field is smaller. Furthermore, the X-ray devices can be optimized in terms of weight, since downstream collimators for collimating the generated X-rays can be eliminated or at least limited.

Die Blende besteht in einem einfachen Ausführungsbeispiel aus einem dünnen Blech insbesondere aus Stahl oder einem anderen Übergangsmetall oder -legierung. Ein weiteres, besonders bevorzugtes nichtmetallisches Material für die Blende ist beispielsweise Graphit.In a simple embodiment, the aperture consists of a thin sheet, particularly made of steel or another transition metal or alloy. Another particularly preferred non-metallic material for the aperture is, for example, graphite.

Es versteht sich, dass das Material und die Materialstärke der Blende zumindest in dem die Blendenöffnung umgebenden Randbereich auf die kinetische Energie der beim bestimmungsgemäßen Gebrauch der Röntgeneinrichtung erzeugten Elektronen abgestimmt ist. Bei kinetischen Energien im MeV-Bereich liegt die Materialstärke typischerweise im Bereich von einem oder mehreren Millimetern, wenn diese aus einem leichten Material wie beispielsweise Graphit besteht. Blenden aus einem schwereren Material, insbesondere Metall weisen geringere Materialstärken beispielsweise im Submillimeterbereich, insbesondere im Bereich von etwa 1/10 mm, auf.It goes without saying that the material and thickness of the aperture, at least in the edge area surrounding the aperture opening, are matched to the kinetic energy of the electrons generated during the intended use of the X-ray device. For kinetic energies in the MeV range, the material thickness is typically in the range of one or more millimeters if it is made of a lightweight material such as graphite. Apertures made of a heavier material, particularly metal, have thinner material thicknesses, for example, in the submillimeter range, particularly in the range of approximately 1/10 mm.

In einem bevorzugten Ausführungsbeispiel der Erfindung ist zumindest der die Elektronen streuende Randbereich der Blende von einer Folie oder mehreren Folien gebildet. Derartige Ausführungen sind als kostengünstige Implementationen eines Streukörpers von hinreichend geringer Dicke zu sehen, bei denen sichergestellt ist, dass die Wechselwirkung mit den Elektronen der erzeugten kinetischen Energie im Wesentlichen auf Streuprozesse beschränkt ist. Ist der Bereich der Blende, der ursächlich für die Streuung der Elektronen ist, von einem derartigen Folienmaterial gebildet, so ist der Wärmeeintrag minimal. Die derartig ausgebildeten Blenden müssen daher während des Betriebs der Röntgeneinrichtung nicht notwendigerweise aktiv gekühlt werden.In a preferred embodiment of the invention, at least the edge region of the aperture that scatters the electrons is formed by one or more foils. Such designs can be viewed as cost-effective implementations of a scattering body of sufficiently small thickness, ensuring that the interaction of the generated kinetic energy with the electrons is essentially limited to scattering processes. If the region of the aperture that is responsible for the scattering of the electrons is formed by such a foil material, the heat input is minimal. Therefore, apertures designed in this way do not necessarily need to be actively cooled during operation of the X-ray device.

Die Folie besteht vorzugsweise aus einem Metall. Besonders bevorzugt besteht die Blende bzw. zumindest der streuende Randbereich der Blende aus Titan. In anderen Ausführungsbeispielen besteht die Blende oder zumindest der die Blendenöffnung umgebende Randbereich aus Edelstahl, Wolfram oder Kupfer oder aus einem anderen Übergangsmetall oder Übergangsmetalllegierung.The foil is preferably made of a metal. Particularly preferably, the aperture or at least the scattering edge area of the aperture is made of titanium. In other embodiments, the aperture or at least the edge area surrounding the aperture is made of stainless steel, tungsten, or copper. or from another transition metal or transition metal alloy.

Die Blende, insbesondere die vorstehend beschriebene Blende bestehend aus zumindest einer metallischen Folie, ist in einem möglichen Ausführungsbeispiel mittels einer Kühleinrichtung, insbesondere mittels einer Wasserkühleinrichtung kühlbar. Somit ist sichergestellt, dass auch der durch inelastische Streuprozesse übertragene, relativ geringe Wärmeübertrag zuverlässig abgeführt werden kann.The aperture, in particular the aperture described above consisting of at least one metallic foil, can be cooled by a cooling device, in particular a water cooling device, in one possible embodiment. This ensures that even the relatively low heat transfer caused by inelastic scattering processes can be reliably dissipated.

Vorzugsweise ist ein Kollimator im Strahlengang der durch Beaufschlagung des Targets erzeugten Röntgenstrahlen angeordnet. Dieser dient zur Begrenzung des Nutzstrahlenfelds der erzeugten Röntgenstrahlung. Ist der Ort der Röntgenstrahlentstehung (Brennfleck) klein, so sind auch die Halbschatten an den Grenzen des Nutzstrahlenfeldes klein.Preferably, a collimator is arranged in the beam path of the X-rays generated by the target. This serves to limit the effective beam field of the generated X-rays. If the location of X-ray generation (focal spot) is small, the penumbra at the edges of the effective beam field will also be small.

Besonders bevorzugt ist ein zumindest den Linearbeschleuniger, die Blende und das Target umgebendes Vakuumgehäuse oder eine diese Bauteile umgebende Vakuumhülle zumindest bereichsweise mit einer Abschirmung versehen, die dazu geeignet ist, Röntgenstrahlung zu absorbieren, die von gestreuten Elektronen hervorgerufen wird, welche auf das Vakuumgehäuse auftreffen und dadurch abgebremst werden. Die dabei entstehende Röntgenstrahlung kann durch die Wahl des Wandungsmaterials spektral beeinflusst werden und ist lokal bevorzugt durch eine außerhalb des Vakuumgehäuses angeordnete Abschirmung abzuschirmen. In anderen Ausführungsbeispielen ist die Abschirmung im Inneren des Vakuumgehäuses vorgesehen. Da das Vakuumgehäuse der Röntgeneinrichtung evakuiert ist, besteht die im Inneren des Vakuumgehäuses vorgesehene Abschirmung vorzugsweise aus einem Material mit hohem Dampfdruck, besonders bevorzugt umfasst die Abschirmung Elemente mit kleiner Kernladungszahl. Außenseitig am Vakuumgehäuse können zur Abschirmung auch Materialien zum Einsatz kommen, welche einen niedrigen Dampfdruck aufweisen. Diese Abschirmung besteht beispielsweise ganz oder zum Teil aus Blei. Da die gestreuten Elektronen vom Material der Blende nicht absorbiert werden, breiten diese sich divergent zur Propagationsrichtung des Elektronenstrahls aus und treffen auf das mit Abschirmmaterialien versehene Vakuumgehäuse auf, von welchem sie absorbiert werden. Da die Absorption der an der Blende gestreuten Elektronen in keinem stark lokalisierten Bereich, sondern in großflächigen Bereichen des Vakuumgehäuses erfolgt, kann auch hier im Allgemeinen auf eine externe Kühlung verzichtet werden.Particularly preferably, a vacuum housing surrounding at least the linear accelerator, the aperture, and the target, or a vacuum envelope surrounding these components, is provided at least in some regions with a shield suitable for absorbing X-ray radiation caused by scattered electrons that strike the vacuum housing and are thereby slowed down. The resulting X-ray radiation can be spectrally influenced by the choice of wall material and is preferably shielded locally by a shield arranged outside the vacuum housing. In other embodiments, the shield is provided inside the vacuum housing. Since the vacuum housing of the X-ray device is evacuated, the shield provided inside the vacuum housing preferably consists of a material with high vapor pressure; particularly preferably, the shield comprises elements with a low atomic number. Materials with a low vapor pressure can also be used for shielding on the outside of the vacuum housing. This shield consists, for example, of Made entirely or partially of lead. Since the scattered electrons are not absorbed by the aperture material, they propagate divergently to the direction of propagation of the electron beam and hit the vacuum enclosure, which is covered with shielding materials, where they are absorbed. Since the absorption of the electrons scattered by the aperture does not occur in a highly localized area, but rather in large areas of the vacuum enclosure, external cooling is generally not necessary here either.

In anderen möglichen Ausgestaltungen der Erfindung ist das Vakuumgehäuse der Röntgeneinrichtung, mittels einer Fluidkühlung kühlbar.In other possible embodiments of the invention, the vacuum housing of the X-ray device can be cooled by means of a fluid cooling system.

Besonders bevorzugt weisen die mit der Abschirmung versehenen Bereiche gegenüber Bereichen des Vakuumgehäuses ohne Abschirmung eine für Elektronen der erzeugten kinetischen Energie erhöhte Absorption auf. Mit anderen Worten ist vorgesehen, lediglich diejenigen Bereiche mit einer Abschirmung zu versehen, welche für die Absorption von gestreuten Elektronen relevant sind. Dies trägt unter anderem zur Gewichtsreduktion bei.Particularly preferably, the areas provided with the shielding exhibit increased absorption for electrons of the generated kinetic energy compared to areas of the vacuum housing without shielding. In other words, it is intended to provide shielding only for those areas that are relevant for the absorption of scattered electrons. This contributes, among other things, to weight reduction.

Die mit der Abschirmung versehenen Bereiche liegen vorzugsweise ausschließlich innerhalb eines von der Blende ausgehenden, sich in Propagationsrichtung des Elektronenstrahls erstreckenden Raumwinkelbereichs. Der Raumwinkelbereich wird bevorzugt von einer Vielzahl von überlagerten Streukegeln gebildet, deren Kegelspitzen innerhalb des die Blendenöffnung umgebenden Randbereichs liegen. Mit anderen Worten ist die Abschirmung dort angeordnet, wo die im Randbereich der Blende gestreuten Elektronen zumindest mit hoher Wahrscheinlichkeit auftreffen.The shielded regions preferably lie exclusively within a solid angle range emanating from the aperture and extending in the propagation direction of the electron beam. The solid angle range is preferably formed by a plurality of superimposed scattering cones, the cone apices of which lie within the edge region surrounding the aperture. In other words, the shield is arranged where the electrons scattered in the edge region of the aperture are at least highly likely to strike.

In Weiterbildung der Erfindung ist vorgesehen, dass der abzuschirmende Raumwinkelbereich einem mittleren Streuwinkelbereich der im Randbereich der Blende gestreuten Elektronen entspricht. Diese Weiterbildung macht sich die Beobachtung zunutze, dass der mittlere Streuwinkel sowohl von der kinetischen Energie der einfallenden Elektronen als auch vom Streukörper, welcher hier von dem die Blendenöffnung umgebenden Randbereich bereitgestellt wird, abhängt. In Abhängigkeit der bei Betrieb angelegten Beschleunigungsspannung und dem zur Begrenzung des Brennflecks eingesetzten Streumaterials ist somit ermöglicht, eine selektive Dimensionierung der Abschirmung vorzusehen. Dadurch ist insbesondere eine weitergehende Gewichtsreduktion ermöglicht, da nur diejenigen Bereiche des Vakuumgehäuses mit einer Abschirmung versehen werden, in denen der Großteil der gestreuten Elektronen absorbiert wird. So ist beispielsweise die Auslenkung der gestreuten Elektronen bezüglich der Propagationsrichtung der nicht gestreuten Elektronen bei höheren Energien kleiner als bei Elektronen geringerer kinetischer Energie. Im Ergebnis kann daher die Abschirmung bei Röntgeneinrichtungen, die zur Bereitstellung von höherenergetischer Röntgenstrahlung ausgebildet sind, auf einen kleineren, um die Propagationsrichtung des nicht gestreuten Elektronenstrahls konzentrierten Raumwinkelbereich begrenzt werden.In a further development of the invention, it is provided that the solid angle range to be shielded corresponds to a medium scattering angle range of the electrons scattered in the edge region of the aperture. This refinement takes advantage of the observation that the average scattering angle depends both on the kinetic energy of the incident electrons and on the scattering body, which in this case is provided by the edge region surrounding the aperture. Depending on the acceleration voltage applied during operation and the scattering material used to limit the focal spot, it is thus possible to provide selective dimensioning of the shielding. This enables, in particular, a further reduction in weight, since only those areas of the vacuum housing in which the majority of the scattered electrons are absorbed are provided with shielding. For example, the deflection of the scattered electrons with respect to the propagation direction of the unscattered electrons is smaller at higher energies than for electrons with lower kinetic energy. As a result, the shielding in X-ray systems designed to provide higher-energy X-rays can be limited to a smaller solid angle range concentrated around the propagation direction of the unscattered electron beam.

Als mittlerer Streuwinkelbereich im Sinne der vorliegenden Spezifikation wird ein um den mittleren Streuwinkel zentrierter Streukegel angenommen, dessen Öffnungswinkel einer für den Streuprozess charakteristischen mittleren Abweichung, insbesondere einer Standardabweichung entspricht. Der mittlere Streuwinkel bezeichnet den Mittelwert der Winkel der gestreuten Elektronen zur Beschleunigungsachse, welch mit der Propagationsrichtung der ungestreuten Elektronen übereinstimmt.The mean scattering angle range, as defined in this specification, is assumed to be a scattering cone centered around the mean scattering angle, whose aperture angle corresponds to a mean deviation characteristic of the scattering process, in particular a standard deviation. The mean scattering angle refers to the mean value of the angles of the scattered electrons to the acceleration axis, which corresponds to the propagation direction of the unscattered electrons.

Der Linearbeschleuniger der Röntgeneinrichtung ist bevorzugt dazu ausgebildet, einen Elektronenstrahl zu erzeugen, dessen kinetische Energie pro Elektron weniger als 20 MeV beträgt. Die Röntgeneinrichtung ist somit bevorzugt für die bereits beschriebenen Anwendungen im Bereich der Radioskopie oder Radiologie einsetzbar.The linear accelerator of the X-ray device is preferably designed to generate an electron beam whose kinetic energy per electron is less than 20 MeV. The X-ray device is therefore preferably suitable for the already described applications in the field of radioscopy or radiology.

Die Erfindung betrifft ferner ein Verfahren zur Herstellung einer Röntgeneinrichtung zur Erzeugung von hochenergetischer Röntgenstrahlung, insbesondere ein Verfahren zur Herstellung einer der vorstehend beschriebenen Röntgeneinrichtungen. Die Röntgeneinrichtung umfasst einen Linearbeschleuniger und ein Target, wobei der Linearbeschleuniger zur Erzeugung von Röntgenstrahlung dazu ausgebildet ist, einen auf das Target gerichteten Elektronenstrahl zu erzeugen, dessen kinetische Energie pro Elektron zumindest 1 MeV beträgt. Gemäß der Erfindung wird ein Bauteil im Strahlengang des Elektronenstrahls zwischen Linearbeschleuniger und Target angeordnet wird, dessen Materialstärke in Propagationsrichtung des Elektronenstrahls weniger als 10% der mittleren Reichweite von Elektronen der erzeugten kinetischen Energie im Material des Bauteils beträgt. In das Bauteil wird eine Blendenöffnung dadurch eingebracht, dass das Bauteil mit einem von dem Linearbeschleuniger erzeugten Elektronenstrahl beaufschlagt wird. In diesem Sinne bildet das Bauteil nach Einbringen der Blendenöffnung die bereits beschriebene Blende.The invention further relates to a method for producing an X-ray device for generating high-energy X-rays, in particular a method for producing one of the X-ray devices described above. The X-ray device comprises a linear accelerator and a target, wherein the linear accelerator is designed to generate X-rays by generating an electron beam directed at the target, the kinetic energy per electron being at least 1 MeV. According to the invention, a component is arranged in the beam path of the electron beam between the linear accelerator and the target, the material thickness of which, in the propagation direction of the electron beam, is less than 10% of the average range of electrons of the generated kinetic energy in the material of the component. A diaphragm opening is introduced into the component by exposing the component to an electron beam generated by the linear accelerator. In this sense, after the diaphragm opening has been introduced, the component forms the previously described diaphragm.

Es hat sich gezeigt, dass die mittels Linearbeschleunigern erzeugten Elektronenstrahlen auf Grund der anliegenden elektrischen Feder bereits stark fokussiert sind, so dass die Teilchendichte im Zentrum des Elektronenstrahls stark erhöht ist. Diese Eigenschaft macht sich die Erfindung zunutze, um die vorstehend beschriebene Blendenöffnung in das Bauteil einzubringen. Hierzu wird gegebenenfalls die vom Linearbeschleuniger bereitgestellte Stromstärke des beschleunigten Elektronenstrahls gegenüber der im normalen Betrieb generierten Stromstärke erhöht, um ein Loch in das im Strahlengang eingebrachte Bauteil - welches beispielsweise von einer oder mehrerer der vorstehend beschriebenen Folien gebildet ist - hinein zu brennen. Die Dimensionierung der so erzeugten Blendenöffnung entspricht dabei dem zentralen Bereich des Elektronenstrahls und damit automatisch einer Blendenöffnung mit den vorstehend beschriebenen Streucharakteristik für die abseits des zentralen Bereichs propagierenden Elektronen. Eine aufwendige Justage einer bereits eine Blendenöffnung aufweisende Blende kann vermieden werden und damit Montage- und Justierungskosten eingespart werden.It has been shown that the electron beams generated by linear accelerators are already highly focused due to the applied electric spring, so that the particle density in the center of the electron beam is greatly increased. The invention utilizes this property to introduce the above-described aperture into the component. For this purpose, the current intensity of the accelerated electron beam provided by the linear accelerator is increased, if necessary, compared to the current intensity generated during normal operation in order to burn a hole into the component inserted in the beam path – which, for example, is formed by one or more of the above-described foils. The dimensioning of the aperture thus created corresponds to the central region of the electron beam. and thus automatically an aperture with the scattering characteristics described above for the electrons propagating away from the central region. Complex adjustment of an aperture already equipped with an aperture can be avoided, thus saving assembly and adjustment costs.

Für eine weitere Beschreibung der Erfindung werden auf die in den Zeichnungsfiguren gezeigten Ausführungsbeispiele verwiesen. Es zeigen in einer schematischen Darstellung:

  • Fig. 1: eine Röntgeneinrichtung gemäß einem ersten Ausführungsbeispiel in einer schematischen Schnittdarstellung;
  • Fig. 2: eine Röntgeneinrichtung gemäß einem zweiten Ausführungsbeispiel in einer schematischen Schnittdarstellung;
  • Fig. 3: mittlere Streubereiche bei der Elektronenstreuung an einem ausgewählten Streukörper.
For a further description of the invention, reference is made to the exemplary embodiments shown in the drawing figures. They show, in a schematic representation:
  • Fig. 1 : an X-ray device according to a first embodiment in a schematic sectional view;
  • Fig. 2 : an X-ray device according to a second embodiment in a schematic sectional view;
  • Fig. 3 : mean scattering ranges in electron scattering from a selected scattering body.

Einander entsprechende Teile oder Bezugsgrößen sind in allen Figuren mit den gleichen Bezugszeichen versehen.Corresponding parts or reference sizes are provided with the same reference numerals in all figures.

Figur 1 zeigt eine Röntgeneinrichtung 1 gemäß einem ersten Ausführungsbeispiel der Erfindung in einer schematischen Schnittdarstellung. Die Röntgeneinrichtung 1 umfasst einen lediglich schematisch dargestellten Linearbeschleuniger 2, der dazu ausgelegt ist, einen Elektronenstrahl E der kinetischen Energie von zumindest 1 MeV pro Elektron zu erzeugen. Der Elektronenstrahl E ist auf ein Target 3 gerichtet. Das Target 3 emittiert im Bereich eines Brennflecks Röntgenstrahlung R. Figure 1 shows an X-ray device 1 according to a first embodiment of the invention in a schematic sectional view. The X-ray device 1 comprises a linear accelerator 2, shown only schematically, which is designed to generate an electron beam E with a kinetic energy of at least 1 MeV per electron. The electron beam E is directed at a target 3. The target 3 emits X-ray radiation R in the region of a focal spot.

Im Strahlengang zwischen Linearbeschleuniger 2 und Target 3 ist eine Blende 4 angeordnet, die einen peripheren Teil des einfallenden primären Elektronenstrahls E diffus streut, so dass die Ausdehnung des Brennflecks auf dem Target 3 reduziert wird. Hierzu besteht zumindest ein eine Blendenöffnung 5 umgebende Randbereich B der Blende 4 aus einem Material, welches dazu geeignet ist, Elektronen der erzeugten kinetischen Energie zu streuen. Der Randbereich B der Blende 4 weist in Propagationsrichtung P des Elektronenstrahls E eine Materialstärke auf, die im Vergleich der Reichweite der Elektronen der erzeugten kinetischen Energie im Material des Randbereichs B klein ist. Konkret beträgt die Materialstärke des Randbereichs B gemäß der Erfindung weniger als 10% der mittleren Reichweite von Elektronen mit der kinetischen Energie von zumindest 1 MeV im Material des Randbereichs B.In the beam path between the linear accelerator 2 and the target 3, a diaphragm 4 is arranged, which diffuses a peripheral part of the incident primary electron beam E, so that the extent of the focal spot on the target 3 is reduced For this purpose, at least one edge region B of the aperture 4 surrounding an aperture 5 is made of a material suitable for scattering electrons of the generated kinetic energy. The edge region B of the aperture 4 has a material thickness in the propagation direction P of the electron beam E that is small compared to the range of the electrons of the generated kinetic energy in the material of the edge region B. Specifically, the material thickness of the edge region B according to the invention is less than 10% of the average range of electrons with the kinetic energy of at least 1 MeV in the material of the edge region B.

Die abseits vom Zentrum des Elektronenstrahls E propagierenden Elektronen werden vom Randbereich B diffus gestreut und somit großflächig über die innere Oberfläche eines Vakuumgehäuses 6 der Röntgeneinrichtung 1 verteilt. Entsprechend verteilt sich auch der von der Absorption dieser Elektronen verursachte Wärmeeintrag über weite Bereiche des Vakuumgehäuses 6, so dass auf eine externe Kühlung des Vakuumgehäuses 6 verzichtet werden kann.The electrons propagating away from the center of the electron beam E are diffusely scattered by the edge region B and thus distributed over a large area of the inner surface of a vacuum housing 6 of the X-ray device 1. Accordingly, the heat input caused by the absorption of these electrons is also distributed over large areas of the vacuum housing 6, so that external cooling of the vacuum housing 6 is unnecessary.

Außenseitig am Vakuumgehäuse 6 ist eine Abschirmung 7 angeordnet, die in dem exemplarischen Ausführungsbeispiel aus Blei besteht und sich - mit Ausnahme des Bereichs des Targets 3 - über die gesamte äußere Oberfläche des Vakuumgehäuses 6 erstreckt.On the outside of the vacuum housing 6, a shield 7 is arranged, which in the exemplary embodiment consists of lead and extends - with the exception of the area of the target 3 - over the entire outer surface of the vacuum housing 6.

Dadurch, dass seitliche Randbereiche des Elektronenstrahls E vom Target 3 weggestreut werden, können Halbschatten in mittels der erzeugten Röntgenstrahlung R erfassten Bildern minimiert werden. Als Anwendungsfeld für die Röntgeneinrichtung 1 bietet sich somit die Radioskopie an, andere Anwendungsfelder betreffen beispielsweise die medizinische Strahlentherapie.By scattering the lateral edge regions of the electron beam E away from the target 3, penumbras in images captured by the generated X-ray radiation R can be minimized. Thus, radioscopy is a suitable field of application for the X-ray device 1; other fields of application include, for example, medical radiotherapy.

Die Blende 4 ist in dem gezeigten Ausführungsbeispiel aus einem einfachen Blech oder einer Folie aus Metall gebildet. Da die Wechselwirkung der Elektronen mit dem Material der Blende 4 im Wesentlichen auf inelastische und elastische Streuereignisse beschränkt ist, ist auch hier der Wärmeeintrag minimal. Eine Kühlung der Blende 4 ist somit nicht zwingend erforderlich.In the embodiment shown, the aperture 4 is formed from a simple sheet or foil made of metal. Since the interaction of the electrons with the material of aperture 4 is essentially limited to inelastic and elastic scattering events, the heat input is also minimal. Cooling of aperture 4 is therefore not absolutely necessary.

Optional ist eine Kühleinrichtung 8 zur Fluidkühlung der Blende 4 vorgesehen, die schematisch in Figur 1 dargestellt ist. In diesem Fall ist die Blende 4 derart ausgestaltet, dass ein Kühlfluid, beispielsweise Wasser, zumindest durch einen Abschnitt der Blende hindurch geleitet werden kann. In einem möglichen Ausführungsbeispiel ist die Blende 4 von zwei planparallelen Folien gebildet, zwischen denen ein Zwischenraum gebildet ist, in den das Kühlfluid einbringbar ist.Optionally, a cooling device 8 for fluid cooling of the aperture 4 is provided, which is shown schematically in Figure 1 is shown. In this case, the aperture 4 is designed such that a cooling fluid, for example water, can be passed through at least a portion of the aperture. In one possible embodiment, the aperture 4 is formed by two plane-parallel foils, between which a gap is formed into which the cooling fluid can be introduced.

Der Anteil der durch gestreute Elektronen verursachten Röntgenstrahlung R kann weiter reduziert werden, wenn eine Kollimation der vom Target 3 ausgehenden Röntgenstrahlung R erfolgt. Hierzu ist optional ein Kollimator 9, beispielsweise ein Lamellenkollimator, im targetnahen Bereich der austretenden Röntgenstrahlung R angeordnet.The proportion of X-ray radiation R caused by scattered electrons can be further reduced if the X-ray radiation R emitted from the target 3 is collimated. For this purpose, a collimator 9, for example a multi-leaf collimator, is optionally arranged in the region of the emitted X-ray radiation R close to the target.

Figur 2 zeigt eine Röntgeneinrichtung 1 gemäß einem zweiten Ausführungsbeispiel. Das zweite Ausführungsbeispiel unterscheidet sich von der in Figur 1 illustrierten Ausführung lediglich hinsichtlich der Ausdehnung der Abschirmung 7, so dass zunächst auf die diesbezügliche Beschreibung verwiesen wird, um Wiederholungen zu vermeiden. Figure 2 shows an X-ray device 1 according to a second embodiment. The second embodiment differs from the one shown in Figure 1 illustrated embodiment only with regard to the extent of the shield 7, so that reference is first made to the relevant description in order to avoid repetition.

Bei dem in Figur 2 dargestellten zweiten Ausführungsbeispiel ist die Abschirmung 7 auf einen Teilbereich des Vakuumgehäuses 6 beschränkt. Die Auslegung der Abschirmung 7 erfolgt derart, dass zumindest der überwiegende Anteil der im Randbereich B gestreuten Elektronen von der Abschirmung 7 absorbiert werden. Hierzu ist ein von dem streuenden Randbereich B ausgehender Raumwinkelbereich Ω (in Figur gestrichelt angedeutet) abzuschirmen, in den im Mittel zumindest die überwiegende Mehrzahl Elektronen gestreut werden. Die Ausdehnung der Abschirmung 7 ist somit in Abhängigkeit der kinetischen Energie der Elektronen nach Maßgabe des mittleren Streuwinkels ϕ und der mittleren Abweichung von diesem mittleren Streuwinkel ϕ auszulegen.In the Figure 2 In the second embodiment shown, the shielding 7 is limited to a partial area of the vacuum housing 6. The design of the shielding 7 is such that at least the predominant portion of the electrons scattered in the edge area B are absorbed by the shielding 7. For this purpose, a solid angle range Ω (indicated by dashed lines in the figure) emanating from the scattering edge area B must be shielded, into which on average at least the predominant A majority of electrons are scattered. The extent of the shield 7 is therefore to be designed as a function of the kinetic energy of the electrons in accordance with the mean scattering angle ϕ and the mean deviation from this mean scattering angle ϕ.

Die zur Auslegung der Abschirmung 7 relevante Information ist in Figur 3 für ein ausgewähltes Streumaterial und für bestimmte Energiebereiche zwischen 2 MeV und 18 MeV illustriert. Gezeigt sind jeweils der für Elektronenstreuung der jeweiligen Energie maßgebliche mittlere Streuwinkel ϕ und die mittlere Abweichung σ hiervon, die als um den mittleren Streuwinkel ϕ zentrierte Balken dargestellt ist. Die mittlere Abweichung σ entspricht hier der Standardabweichung, so dass in dem hier illustrierten Beispiel unter der Annahme von normalverteilten Streuereignissen davon auszugehen ist, dass etwa 68% der in den von dem mittleren Streuwinkel ϕ und der mittleren Abweichung σ festgelegten mittleren Streuwinkelbereich gestreut werden.The information relevant for the design of shield 7 is in Figure 3 for a selected scattering material and for specific energy ranges between 2 MeV and 18 MeV. Shown are the mean scattering angle ϕ, which is relevant for electron scattering at the respective energy, and the mean deviation σ from it, which is represented as bars centered around the mean scattering angle ϕ. The mean deviation σ corresponds to the standard deviation, so that in the example illustrated here, assuming normally distributed scattering events, it can be assumed that approximately 68% of the scattering angles are scattered within the mean scattering angle range defined by the mean scattering angle ϕ and the mean deviation σ.

Die Kenntnis der mittleren Streuwinkelbereiche in Abhängigkeit der kinetischen Energie der einfallenden Elektronen kann dazu genutzt werden, die Röntgeneinrichtung 1 gezielt geometrisch auszugestalten und abzuschirmen. Der Raumwinkelbereich Ω, den die Abschirmung 7 abdeckt, entspricht der Summe der mittleren Streuwinkelbereiche, deren Streuzentren in dem für die Elektronenstreuung maßgeblichen Randbereich B der Blende 4 liegen. Die Ausdehnung der Abschirmung 7 kann durch diese Konstruktionsweise deutlich reduziert werden.Knowledge of the mean scattering angle ranges as a function of the kinetic energy of the incident electrons can be used to specifically design and shield the X-ray device 1. The solid angle range Ω covered by the shield 7 corresponds to the sum of the mean scattering angle ranges whose scattering centers lie in the edge region B of the aperture 4, which is crucial for electron scattering. The dimensions of the shield 7 can be significantly reduced by this design.

Ein bevorzugtes Verfahren zur Herstellung der vorstehend beschriebenen Röntgeneinrichtung 1 umfasst einen Verfahrensschritt, in dem ein Bauteil, welches im endmontierten Zustand die Blende 4 bildet, in den Strahlengang des vom Linearbeschleuniger 2 bereitgestellten Elektronenstrahls E eingebracht wird. Die Blendenöffnung 5 wird in das Bauteil mittels des Elektronenstrahls E hinein gebrannt. Hierzu kann gegebenenfalls eine vom Linearbeschleuniger 2 bereitgestellte Stromstärke des Elektronenstrahls gegenüber der beim regulären Betrieb erzeugten Stromstärke erhöht werden. Da die Anzahl der Elektronen aufgrund der fokussierenden Eigenschaften des Linearbeschleunigers 2 in einem zentralen Bereich des Elektronenstrahls E stark erhöht ist und randseitig stark abnimmt, verbleibt bei einem derartigen Vorgehen ein die Blendenöffnung 5 umgebender Randbereich B mit den vorstehend beschriebenen streuenden Eigenschaften. Randseitige Strahlbereiche des Elektronenstrahls E, in denen die Elektronenanzahl im Vergleich zum zentralen Bereich des Elektronenstrahls E stark vermindert ist, werden somit im regulären Betrieb der Röntgeneinrichtung 1 vom Target 3 weggestreut und so die Ausdehnung des Brennflecks auf dem Target 3 minimiert.A preferred method for producing the above-described X-ray device 1 comprises a method step in which a component, which in the final assembled state forms the aperture 4, is introduced into the beam path of the electron beam E provided by the linear accelerator 2. The aperture 5 is burned into the component by means of the electron beam E. For this purpose, if necessary an electron beam current provided by the linear accelerator 2 can be increased compared to the current generated during regular operation. Since the number of electrons is greatly increased in a central region of the electron beam E due to the focusing properties of the linear accelerator 2 and greatly decreases towards the edges, such a procedure leaves an edge region B surrounding the aperture 5 with the scattering properties described above. Edge beam regions of the electron beam E, in which the number of electrons is greatly reduced compared to the central region of the electron beam E, are thus scattered away from the target 3 during regular operation of the X-ray device 1, thus minimizing the extent of the focal spot on the target 3.

Obwohl die Erfindung im Detail mit Bezug auf das bevorzugte Ausführungsbeispiel näher illustriert und beschrieben wurde, so ist die Erfindung nicht hierdurch eingeschränkt. Andere Variationen und Kombinationen können vom Fachmann hieraus abgeleitet werden, ohne von der Erfindung abzuweichen, wobei die Erfindung durch die Ansprüche definiert ist.Although the invention has been illustrated and described in detail with reference to the preferred embodiment, the invention is not limited thereby. Other variations and combinations may be derived by those skilled in the art without departing from the invention, which is defined by the claims.

Claims (13)

  1. X-ray device (1) for creation of high-energy x-ray radiation, comprising a linear accelerator (2) and a target (3), wherein the linear accelerator (2) for creation of x-ray radiation (R) is embodied to create an electron beam (E) directed onto the target (3), of which the kinetic energy per electron amounts to at least 1 MeV, characterised by a beam limiting device (4) arranged in the beam path of the electron beam (E) between linear accelerator (2) and target (3), which has an edge region (B) surrounding a beam limiting device opening (5), the material thickness of which in the propagation direction (P) of the electron beam (E), also referred to as primary electron beam in the following, amounts to less than 10% of the average reach of electrons of the created kinetic energy in the material of the edge region (B), wherein the edge region (B) of the beam limiting device (4) forms a scattering body for limiting the extent of the focal spot on the target (3) and wherein the beam limiting device (4) diffusely scatters a peripheral part of the incident primary electron beam (E).
  2. X-ray device (1) according to claim 1, characterised in that at least the edge region (B) of the beam limiting device (4) consist of graphite.
  3. X-ray device (1) according to claim 1 or 2, characterised in that at least the edge region (B) of the beam limiting device (4) is formed by at least one film.
  4. X-ray device (1) according to claim 3, characterised in that the film consists of a metal.
  5. X-ray device (1) according to claim 4, characterised in that the film consists at least partly of titanium, stainless steel or copper or is coated with titanium, stainless steel or copper.
  6. X-ray device (1) according to one of the preceding claims, characterised in that the beam limiting device (4) is able to be cooled by means of a cooling device, in particular by means of a water cooling device.
  7. X-ray device (1) according to one of the preceding claims, characterised in that a collimator (9) is arranged in the beam path of the x-rays (R) created by application of the beam to the target (3).
  8. X-ray device (1) according to one of the preceding claims, characterised by a vacuum housing (6) at least surrounding the linear accelerator (2), the beam limiting device (4) and the target (3), which at least in some regions is provided with screening (7), which is suitable for absorbing x-ray radiation caused by slowing down scattered electrons.
  9. X-ray device (1) according to claim 8, characterised in that the regions provided with the screening (7), compared to regions of the vacuum housing (6) without screening, exhibit an increased absorption for x-ray radiation.
  10. X-ray device (1) according to claim 8 or 9, characterised in that the regions provided with the screening (7) lie exclusively within a solid angle region (Ω) emanating from the beam limiting device (4) extending in the propagation direction (P) of the electron beam (E).
  11. X-ray device (1) according to claim 10, characterised in that the solid angle region (Ω) corresponds to an average solid angle region of the scattered electrons in the edge region (R) of the beam limiting device (4).
  12. X-ray device (1) according to one of the preceding claims, characterised in that the kinetic energy per electron in the created electron beam (E) amounts to less than 20 MeV.
  13. Method for manufacturing an x-ray device (1) for creation of high-energy x-ray radiation (R), comprising a linear accelerator (2) and a target (3), wherein the linear accelerator (2) for creation of x-ray radiation (R) is embodied so as to create an electron beam (E) directed onto the target (3), of which the kinetic energy per electron amounts to at least 1 MeV, characterised in that a component in the beam path of the electron beam (E) is arranged between linear accelerator (2) and target (3), of which the material thickness in the propagation direction (P) of the electron beam (E) amounts to less than 10% of the average reach of electrons of the created kinetic energy in the material of the component, wherein a beam limiting device opening (5) is inserted into the component by the component having an electron beam (E) created by the linear accelerator (2) applied to it.
EP17165888.3A 2017-04-11 2017-04-11 X-ray device for generating high-energy x-ray radiation Active EP3389055B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP17165888.3A EP3389055B1 (en) 2017-04-11 2017-04-11 X-ray device for generating high-energy x-ray radiation
US15/947,934 US10825639B2 (en) 2017-04-11 2018-04-09 X ray device for creation of high-energy x ray radiation
CN201810316877.XA CN108696977B (en) 2017-04-11 2018-04-10 X-ray equipment for generating high-energy X-ray radiation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP17165888.3A EP3389055B1 (en) 2017-04-11 2017-04-11 X-ray device for generating high-energy x-ray radiation

Publications (2)

Publication Number Publication Date
EP3389055A1 EP3389055A1 (en) 2018-10-17
EP3389055B1 true EP3389055B1 (en) 2025-09-24

Family

ID=58672310

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17165888.3A Active EP3389055B1 (en) 2017-04-11 2017-04-11 X-ray device for generating high-energy x-ray radiation

Country Status (3)

Country Link
US (1) US10825639B2 (en)
EP (1) EP3389055B1 (en)
CN (1) CN108696977B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119846689A (en) * 2025-01-07 2025-04-18 西北核技术研究所 Magnetic spectrometer for measuring gamma ray energy-time combined spectrum and implementation method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB645509A (en) * 1948-09-08 1950-11-01 Standard Telephones Cables Ltd Improvements in or relating to electromagnetic wave guides

Family Cites Families (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB665998A (en) * 1948-09-08 1952-02-06 Standard Telephones Cables Ltd Improvements in or relating to linear accelerators for charged particles
DE2425464C3 (en) * 1974-05-27 1978-11-02 Siemens Ag, 1000 Berlin Und 8000 Muenchen Process for the production of thin-film aperture diaphragms for particle beam devices
US3969629A (en) * 1975-03-14 1976-07-13 Varian Associates X-ray treatment machine having means for reducing secondary electron skin dose
US4140129A (en) * 1977-04-13 1979-02-20 Applied Radiation Corporation Beam defining system in an electron accelerator
US4121109A (en) * 1977-04-13 1978-10-17 Applied Radiation Corporation Electron accelerator with a target exposed to the electron beam
CA1099034A (en) * 1977-10-21 1981-04-07 Leonhard Taumann Electron accelerator comprising a target exposed to the electron beam
DE2926841A1 (en) * 1979-07-03 1981-01-22 Siemens Ag ELECTRONIC ACCELERATOR
US4359642A (en) * 1980-07-14 1982-11-16 Siemens Medical Laboratories, Inc. Collimator assembly for an electron accelerator
DE3138731A1 (en) * 1981-09-29 1983-04-07 Siemens AG, 1000 Berlin und 8000 München MONITORING ARRANGEMENT FOR THE ACCELERATION ENERGY OF AN ELECTRON ACCELERATOR
US4812653A (en) * 1987-12-01 1989-03-14 Honeywell Inc. Sharp edge for thick coatings
US5033075A (en) * 1988-05-18 1991-07-16 Rad/Red Laboratories Inc. Radiation reduction filter for use in medical diagnosis
DE3915613A1 (en) * 1989-05-12 1990-11-15 Berthold Lab Prof R COLLIMATOR FOR MEASURING RADIOACTIVE RADIATION
US4952814A (en) * 1989-06-14 1990-08-28 Varian Associates, Inc. Translating aperture electron beam current modulator
JPH07119837B2 (en) * 1990-05-30 1995-12-20 株式会社日立製作所 CT device, transmission device, and X-ray generator
JP3022014B2 (en) * 1992-01-17 2000-03-15 三菱電機株式会社 Light transmission type vacuum separation window and soft X-ray transmission window
US5619042A (en) * 1995-07-20 1997-04-08 Siemens Medical Systems, Inc. System and method for regulating delivered radiation in a radiation-emitting device
US6333966B1 (en) * 1998-08-18 2001-12-25 Neil Charles Schoen Laser accelerator femtosecond X-ray source
US6438207B1 (en) * 1999-09-14 2002-08-20 Varian Medical Systems, Inc. X-ray tube having improved focal spot control
JP3360725B2 (en) * 1999-10-19 2002-12-24 日本電気株式会社 Electron beam exposure method, mask and electron beam exposure apparatus used for the same
US6320936B1 (en) * 1999-11-26 2001-11-20 Parker Medical, Inc. X-ray tube assembly with beam limiting device for reducing off-focus radiation
US6493421B2 (en) * 2000-10-16 2002-12-10 Advanced X-Ray Technology, Inc. Apparatus and method for generating a high intensity X-ray beam with a selectable shape and wavelength
US6864633B2 (en) * 2003-04-03 2005-03-08 Varian Medical Systems, Inc. X-ray source employing a compact electron beam accelerator
JP2005276760A (en) * 2004-03-26 2005-10-06 Shimadzu Corp X-ray generator
US7091486B1 (en) * 2004-09-09 2006-08-15 Kla-Tencor Technologies Corporation Method and apparatus for beam current fluctuation correction
US7436932B2 (en) * 2005-06-24 2008-10-14 Varian Medical Systems Technologies, Inc. X-ray radiation sources with low neutron emissions for radiation scanning
CN1997256B (en) * 2005-12-31 2010-08-25 清华大学 A high and low power X ray output device
US7394082B2 (en) * 2006-05-01 2008-07-01 Hitachi, Ltd. Ion beam delivery equipment and an ion beam delivery method
GB2460089A (en) * 2008-05-16 2009-11-18 Elekta Ab Coincident treatment and imaging source
US8208601B2 (en) * 2008-08-13 2012-06-26 Oncology Tech Llc Integrated shaping and sculpting unit for use with intensity modulated radiation therapy (IMRT) treatment
DE102009007218A1 (en) * 2009-02-03 2010-09-16 Siemens Aktiengesellschaft Electron accelerator for generating a photon radiation with an energy of more than 0.5 MeV
US8269197B2 (en) * 2009-07-22 2012-09-18 Intraop Medical Corporation Method and system for electron beam applications
JP2011029072A (en) * 2009-07-28 2011-02-10 Canon Inc X-ray generator, and x-ray imaging device including the same
JP5670111B2 (en) 2009-09-04 2015-02-18 東京エレクトロン株式会社 X-ray generation target, X-ray generation apparatus, and method for manufacturing X-ray generation target
US8294125B2 (en) 2009-11-18 2012-10-23 Kla-Tencor Corporation High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture
EP2609612B1 (en) * 2010-08-27 2019-11-13 GE Sensing & Inspection Technologies GmbH Microfocus x-ray tube for a high-resolution x-ray apparatus
DE102011005450B4 (en) * 2011-03-11 2013-07-25 Friedrich-Alexander-Universität Erlangen-Nürnberg Aperture for an applicator and applicator to be used in electron beam radiation therapy
WO2013020130A1 (en) * 2011-08-04 2013-02-07 John Lewellen Bremstrahlung target for intensity modulated x-ray radiation therapy and stereotactic x-ray therapy
DE102012103974A1 (en) 2011-12-09 2013-06-13 Werth Messtechnik Gmbh Apparatus for generating X-rays emitting focal spot, has diaphragm portion comprising mechanical orifice passage that limits electron beam and/or X-rays, so that size of first effective focal spot is adjusted
US8853636B2 (en) * 2012-02-29 2014-10-07 Elekta Ab (Publ) Linear accelerators
JP6308714B2 (en) * 2012-08-28 2018-04-11 キヤノン株式会社 Radiation generating tube and radiation generating apparatus provided with the radiation generating tube
CN104754848B (en) * 2013-12-30 2017-12-08 同方威视技术股份有限公司 X-ray generator and the radioscopy imaging system with the device
CN103889135A (en) * 2014-02-18 2014-06-25 宫良平 Medical linear accelerator KV/MV coaxial X ray image system
JP6493420B2 (en) 2015-02-05 2019-04-03 株式会社島津製作所 X-ray generator
CN105140088B (en) 2015-07-24 2017-10-17 北京航空航天大学 The focusing arrangement and its application method of big beam deflection target practice X-ray source with microbeam
DE102016013747B4 (en) * 2016-11-18 2018-05-30 Yxlon International Gmbh Aperture for an X-ray tube and X-ray tube with such a diaphragm
GB2591630B (en) * 2018-07-26 2023-05-24 Sigray Inc High brightness x-ray reflection source

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB645509A (en) * 1948-09-08 1950-11-01 Standard Telephones Cables Ltd Improvements in or relating to electromagnetic wave guides

Also Published As

Publication number Publication date
CN108696977B (en) 2022-04-15
CN108696977A (en) 2018-10-23
US10825639B2 (en) 2020-11-03
EP3389055A1 (en) 2018-10-17
US20180294134A1 (en) 2018-10-11

Similar Documents

Publication Publication Date Title
DE69218808T2 (en) X-ray examination apparatus
EP0584871B1 (en) X-ray tube with anode in transmission mode
DE69814574T2 (en) Device for preventing the window of an X-ray tube from overheating
DE19544203A1 (en) X-ray tube, in particular microfocus X-ray tube
DE7901623U1 (en) X-ray tube
DE102008046288B4 (en) Electron beam control of an X-ray source with two or more electron beams
DE102008050352B4 (en) Multi-beam X-ray device
DE102008038569A1 (en) X-ray tube
EP0021441B1 (en) Electron accelerator for x-ray therapy
DE2533348B2 (en) Target for converting an electron beam with high kinetic energy into X-ray bremsstrahlung
DE2727275C3 (en) Electron accelerator with a target exposed to the electron beam
DE102013209447A1 (en) X-ray source and method for generating X-ray radiation
DE102016013747B4 (en) Aperture for an X-ray tube and X-ray tube with such a diaphragm
EP3389055B1 (en) X-ray device for generating high-energy x-ray radiation
DE2719609A1 (en) X=Ray tube for medical diagnostics or fluorescence analysis - giving pure spectrum of few monochromatic lines
US4327293A (en) Electron accelerator and target with collimator
WO2019219909A1 (en) X-ray tube having collimator, collimator apparatus for closed x-ray tube and use of such a collimator apparatus
WO2009146827A1 (en) Radiation source and method for generating x-ray radiation
WO2013007484A1 (en) Monochromatic x-ray source
WO2014177308A1 (en) X-ray source and imaging system
EP3599619A1 (en) Target for producing x-ray radiation, x-ray emitter and method for producing x-ray radiation
DE102012221638B4 (en) X-ray
DE102010030713B4 (en) X-ray source for generating X-rays with a hollow body target and a method for generating X-radiation in a hollow body target
DE102008035210B4 (en) X-ray target, linear accelerator and method for generating X-rays
WO2017133876A1 (en) Tomography device

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

17P Request for examination filed

Effective date: 20190305

RBV Designated contracting states (corrected)

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: EXAMINATION IS IN PROGRESS

17Q First examination report despatched

Effective date: 20210413

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: SIEMENS HEALTHINEERS AG

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

RIC1 Information provided on ipc code assigned before grant

Ipc: G21K 1/10 20060101ALN20250506BHEP

Ipc: H05H 9/04 20060101ALI20250506BHEP

Ipc: H05H 6/00 20060101ALI20250506BHEP

Ipc: H01J 35/16 20060101ALI20250506BHEP

Ipc: H05H 7/00 20060101ALI20250506BHEP

Ipc: H01J 35/00 20060101ALI20250506BHEP

Ipc: G21K 1/02 20060101AFI20250506BHEP

INTG Intention to grant announced

Effective date: 20250530

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH