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EP3016751B1 - Séparation de lumière par chaleur pour source de rayonnement uv - Google Patents

Séparation de lumière par chaleur pour source de rayonnement uv Download PDF

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Publication number
EP3016751B1
EP3016751B1 EP14734004.6A EP14734004A EP3016751B1 EP 3016751 B1 EP3016751 B1 EP 3016751B1 EP 14734004 A EP14734004 A EP 14734004A EP 3016751 B1 EP3016751 B1 EP 3016751B1
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EP
European Patent Office
Prior art keywords
radiation
strips
mirror
application
area
Prior art date
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Active
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EP14734004.6A
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German (de)
English (en)
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EP3016751A1 (fr
Inventor
Othmar Züger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
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Oerlikon Surface Solutions AG Pfaeffikon
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Priority to PL14734004T priority Critical patent/PL3016751T3/pl
Publication of EP3016751A1 publication Critical patent/EP3016751A1/fr
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/062—Pretreatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B3/00—Drying solid materials or objects by processes involving the application of heat
    • F26B3/28—Drying solid materials or objects by processes involving the application of heat by radiation, e.g. from the sun

Definitions

  • UV-curing coatings are used in many different areas. Curing is essentially understood to mean the crosslinking of polymer chains. In UV-curing paints, this crosslinking is induced by UV radiation.
  • these paints when applied to a workpiece, contain solvents that must be expelled before curing. This expulsion can be accelerated by increasing the temperature beyond the ambient temperature. The higher the temperature, the faster the expulsion of the solvents. However, a certain paint-dependent temperature (glass transition temperature, chemical decomposition temperature) must not be exceeded. Likewise, the deformation temperature of the material of the workpiece must not be exceeded.
  • High intensity UV radiation sources are based on gas discharge lamps that emit strong visible light (VIS) and infrared radiation (IR) in addition to the desired UV radiation.
  • VIS and IR contribute to a significant additional increase in temperature when curing paints. However, it must be avoided that the temperature rises during the curing process on the glass transition temperature of the paint. It is desirable to suppress this VIS and IR contribution as possible, while losing as little UV radiation as possible.
  • Typical UV radiation sources consist of a gas discharge lamp and a reflector element which collects the UV radiation emitted in the direction away from the workpiece and reflects it in the direction of the area of application.
  • the propagating to the application UV radiation is thus composed of direct radiation and reflected radiation together.
  • the lamp In the case of a substantially linear source, the lamp is substantially tubular. she can but also exist as a series of individual, substantially point-shaped lamps which are arranged in a row.
  • the reflector element can be provided with a coating which reflects the VIS and IR radiation as little as possible. This can be done through an absorbing layer, but is preferably carried out as a dichroic thin film coating which on the one hand highly reflects the UV component and transmits VIS and IR, i. deflects away from the field of application.
  • a UV source reduces the VIS and IR radiation in the field of application by a factor in the range of 2-5, depending on the reflective element (typically cylindrical elliptic element).
  • This deflection mirror should reflect the UV radiation as well as possible, but should reflect the VIS & IR radiation as poorly as possible.
  • This deflection mirror is designed as a flat mirror. Usually, a glass plate with dichroic thin film filter coating, which is arranged at an angle of 45 ° to the main beam of the UV source, is used. The application area is then located downstream in the beam path of the UV radiation reflected by the deflection mirror.
  • the UV radiation is deflected by this deflection mirror in the 90 °, while the VIS & IR radiation is transmitted and thus not directed to the application area.
  • the use of the dichroic deflection mirror leads to an extension of the light path between the UV source and the application, typically by about 70% of the length of the deflection mirror.
  • FIG. 1 The corresponding situation is in the FIG. 1 with respect to the reflector radiation and in FIG. 2 with respect to direct radiation.
  • the UV radiation is shown as a dotted line, while the radiation of the VIS & IR is shown as a dashed line.
  • the total radiation is shown as a solid line.
  • the extension of the beam path therefore has the consequence, above all for direct radiation, that the intensity of the UV radiation per unit area (area intensity) is reduced, in particular also in the field of application, due to the opening angle into which the radiation is emitted.
  • area intensity intensity of the UV radiation per unit area
  • a certain dose is required, which is due to the product of radiation intensity and exposure time (more precisely, by the temporal integral of the intensity).
  • the lower areal intensity described above can only be made up by increasing the exposure time to achieve the required dose. This leads to a longer process time and thus to higher process costs.
  • the required exposure dose can at best be achieved if the resulting overexposure of the flat areas does not entail any disadvantages, and the minimum necessary intensity can still be achieved. If this is not so, there is still the possibility of rotation of the components during the relative movement of the components to the UV source, but this additional movement means a significant overhead in the mounting of the components and the means for movement, and the disadvantages in a lower arrangement density of the components in the curing plant and a substantial extension of the exposure times.
  • a deflection mirror having a substantially concave surface shape. Not only can the curved path compensate the extended beam path readily, but also a partial focusing of the reflected UV radiation, at least in one plane, can be achieved, which leads to an increase of the surface intensity.
  • the shape of the curved deflection mirror is dependent on the exact position and orientation of the application.
  • the substrate of the curved deflection mirror is preferably permeable to VIS & IR radiation.
  • substrate material therefore, for example, glass and plastic come into question, it should be noted that the substrate is exposed to high temperatures and a UV residual.
  • a material for the substrate which absorbs VIS & IR efficiently, but this would be strongly heated by the absorbed power and therefore would have to be cooled separately.
  • a concavely curved glass surface can be coated with an interference filter.
  • the interference filter is constructed, for example, as a thin-film alternating layer system, wherein the near-surface layers provide for the reflection of the UV radiation and the alternating layer system as a whole forms an antireflection layer for the VIS & IR radiation.
  • Another challenge is the angular dependence of the optical behavior of the interference filters.
  • this embodiment requires so-called gradient filters in order to position-dependent angles of incidence.
  • the available coating technology is able to at least partially overcome this problem, even if this involves a great deal of effort and thus, in turn, costs.
  • the problem with the curved mirror solution is that, in some applications, sometimes the distance from the radiation source to the area of application of the radiation changes. This is the case, for example, when large substrates provided with a lacquer layer have to be exposed to UV radiation which lie in one plane and UV radiation is to be applied to UV radiation with the same curing apparatus but also small substrates positioned on a spindle the spindle, the substrates and thus the application area are closer to the deflection mirror. In the worst case, it is then necessary to exchange the curved deflection mirror by a deflection mirror with a different curvature. For example, describes US 4644899 A the use of a double mirror configuration and DE 10352184 A1 a configuration with curved reflecting surfaces. There is therefore a need for an easy-to-implement but efficient irradiation device for UV radiation, with which it is achieved that an application area is exposed to UV radiation in sufficient surface intensity.
  • the object is achieved according to a preferred embodiment in that a deflecting mirror composed of planar mirror strips is used, wherein the plane mirror strips are inclined relative to one another such that they at least roughly recreate a desired curvature. At least two strips are used, but preferably more than two, and more preferably three strips are used.
  • the coating of the mirror strips can be done so that initially flat glass is coated. Such a coated glass plate is then cut into strips and these strips are fastened in a holder element.
  • This holder element is designed such that each of the mirror strips with an orientation at a predetermined angle to the main beam of the UV Source comes to rest. The individual angles are chosen so that as much UV radiation falls within the scope of application. Due to the fact that the mirror strips essentially transmit the VIS & IR radiation, this proportion in the field of application remains small in any case.
  • the spectral properties of the thin film mirror layer for each mirror strip can be further optimized. It can therefore be coated for each angle a separate glass plate with specifically optimized for this angle thin film interference filter.
  • the deflecting mirror according to the invention is then assembled from strips of differently coated glass plates.
  • the fastenings with which the mirror strips are fixed to the holder are designed so that they can rotate at least over a certain angular range about an axis parallel to the longer edge of the mirror strips.
  • This makes it possible to adjust the modeled curvature of the deflection mirror and thus to optimize the UV radiation power for different application levels.
  • adjustable angles of the mirror segments the illumination of the various surface elements of 3-dimensional components with indentations and side surfaces can be made much more uniform and thus improved by adjusting the segments so that the light in a focused form with beam proportions over a wide angular range in the Scope of application. Although this results in a slightly lower intensity for the flat areas, a more homogeneous exposure over the entire surface of the component is achieved.
  • This embodiment allows a simple and above all flexible adaptation of the angular distribution and the spatial distribution of the irradiation light.
  • the adjustment of the angle of these mirror segments can also be done via externally controllable drives, which opens up the possibility, process-controlled controlling the exposure of different shaped elements to optimize run.
  • the mirrors can also be moved through the field of application by means of drives designed in this way, synchronously with a movement of the workpieces. In this way, the illumination of the surface shape of the workpieces can be dynamically adjusted and optimized.
  • the substrates are often moved through the application area. For example, on a circular motion when it is mounted on a so-called spindle. As a result, a repetitive exposure of the paint is achieved. With this movement, the undesirable temperature increase is further reduced because the surface may cool during the angular range of rotation away from the field of application.
  • the result is a substantially higher UV dose of 79, (compared to 65 for the flat deflecting mirror).
  • the VIS & IR dose increases slightly to 28 (compared to 25 for the flat deflection mirror).
  • the UV dose in the scope can be further improved.
  • a UV dose of 83 is obtained, ie a 30% increase over the flat deflecting mirror, while the VIS and IR dose increases only to about 29.
  • an intensity threshold of UV radiation must be exceeded for a certain period of time. While in the case of the flat deflecting mirror for the example given an intensity maximum of approximately 45 units is achieved, a value of approximately 60 is achieved for the deflecting mirror, which consists of two mirror strips, and in the FIG. 3 In the case shown with three stiffeners, even a value of about 80 is achieved. Thus, by dividing the dichroic mirror into stripes, almost the same areal intensity as in the case of a structure without this mirror can be achieved.
  • a higher efficiency of the UV light guide in the field of application has the advantage that necessary cooling of the system and in particular the application area in which the substrates provided with temperature-sensitive paint are on the one hand smaller dimensions and less expensive to build, and on the other hand in the Application can be operated with less energy consumption.
  • the entire waste heat of the curing process must be dissipated with strong air cooling in order to keep the temperature increase in the application area low.
  • intensive filtering must prevent dust particles from entering the stream and thus the paint surfaces that are initially in a viscous state and sticking there. Any reduction of the necessary air flow by reducing the unwanted radiation or improving the efficiency in the UV light guide, as shown in the invention, leads to a possible reduction of these necessary air flows.
  • FIG. 4 a holder for the mirror strips shown.
  • the holder comprises fixing elements 3, 7, 9 and 11, which are arranged on the strip at the shorter edge, for example clamped.
  • the fixing element 3 of a strip is connected to the fixing element 7 of an adjacent strip via webs 13, 17 connected by means of a joint 15.
  • the fixing element 9 of the central strip is in this case connected to the fixing element 11 of the other adjacent strip via webs 19, 23 connected by means of a joint 21.
  • the outer strips of the deflecting mirror have additional fixing elements 25 and 29.
  • These fixing elements are fixed to circular arcs 27, 31. They can be moved to adjustment along these circular arcs and then fixed.
  • Circular arc 27 belongs to a theoretical circle whose center lies in the joint 15.
  • Circular arc 31 belongs to a theoretical circle whose center lies in the joint 21.
  • such a holder is provided on both sides of the mirror strip thus arranged.
  • FIG. 5 a corresponding plan view is shown. With this bracket, the inclination of the mirror strips can be easily adjusted and adjusted.
  • Another aspect of the present invention relates to facilities and process for controllable illumination of workpieces with UV light for curing UV-sensitive surface finishes
  • this aspect relates to UV exposure devices for curing UV-sensitive coating layers on surfaces, with a focus on homogeneous or a particular profile following illumination of the paint surfaces on a 3-dimensional workpiece
  • paints used are applied by spraying, dipping or painting as a film on the components to be coated and then brought with a curing process in the final state with the desired properties.
  • energy is added to the paint film to accelerate the curing process.
  • thermal energy is supplied in the form of infrared radiation or by means of a heated gas (air). With suitable ovens or infrared radiators, the lacquer layer can be cured relatively uniformly even on more complex surface geometries.
  • the component For more complex surface geometries, the component must also be rotated and / or tilted relative to the UV source, which is a particular challenge for the mechanics of mounting the component in the curing system, which naturally leads to limitations in the Uniformity and uniformity of the properties and quality characteristics of the cured films, or limits the processable surface shapes.
  • Essential film properties of the cured paint film require a minimum dose of UV light, the changes with over-exposure may be low for these properties. Thus, a lack of UV light at certain points on the surface of the component can be compensated by a longer exposure time, whereby other areas are overexposed. For properties that are more critically dose dependent, the result is a loss of homogeneity
  • a more homogeneous illumination can be achieved by repeatedly rotating holders for the components.
  • Such fixtures and equipment are costly to purchase, demanding to handle and usually inflexible to use.
  • the utilization of the maximum through the plant loading area with components is lower.
  • FIG. 6a shows schematically the arrangement in one Curing unit with UV light source.
  • the UV light of the UV lamp is collected via a reflector and guided into an application area in which the paint film is exposed on components and thus cured.
  • the components in the area of application heat up so that the entire light radiation of the UV source in this area of the room is largely absorbed.
  • the paint films are temperature sensitive and the temperature must not exceed a maximum value. This problem is mitigated by cyclically moving the components through the application area, thus allowing the components to cool off during the time they are not within the range of application. For components of limited size, this cyclic movement is preferably on a circular path by mounting the components on a drum and moving this drum about its axis.
  • FIG Fig. 6b An extended embodiment of a curing unit is shown in FIG Fig. 6b shown.
  • a dichroic mirror permeable to the UV light and the IR radiation of the UV lamp, the unwanted VIS and IR radiation is led away from the area of application, whereby the temperature rise during the curing process can be further limited.
  • the power of the UV source is changed synchronously with the movement of the component.
  • the power is set according to a certain temporal curve.
  • a sinusoidal waveform is chosen, whereby the phase is kept in a constant relationship to the rotational movement of the drum ( FIG. 9 ).
  • the frequency of this modulation of the UV light output is given by the arrangement of the components on the drum, it being assumed that the distance between the components on the circumference of the drum is kept small in the sense of a dense loading.
  • the modulation thus continues to run continuously with each of the components that run sequentially through the application area.
  • FIG. 10 is shown the result for the local distribution of the UV radiation dose on the surface of the assumed components, depending for the configuration of Fig. 6a and Fig. 6b .
  • the course of the dose from the center to the edge has now almost been eliminated.
  • This result is achieved in this case with a modulation amplitude of the UV light output of about 35% relative to the constant value.
  • the phase of the modulation waveform is chosen so that the modulation power is minimal at the time when the component is at a minimum distance from the UV light source, ie the normal parallel to the axis of the UV light distribution.
  • any periodic waveform can be used which is in a defined phase relationship to the substrate movement. Both amplitude and phase may themselves be modulated, assuming a frequency that matches or is a multiple of that frequency of the component movement over the range of application.
  • the waveform in this case contains higher harmonic components, each with a specific, fixed phase, so that the synchronization with the component movement is maintained.
  • the principle of synchronous UV light power modulation for influencing the UV dose on paint films on component surfaces disposed on a rotating drum can also be used to provide an inhomogeneous distribution equalize the dose over the circumference of the drum.
  • Such inhomogeneity may arise due to mechanical inaccuracies, alignment and alignment errors, ect.
  • a deviation from a concentricity d..h non-constant rotational angular velocity
  • the UV dose on the components outside the drum can be selectively controlled to provide a more uniform dose distribution across the width of the components.
  • the phase of the modulation must be determined from the actual values of a rotation angle sensor which is rigidly connected to the axis of the drum.
  • Controlling the UV dose across the width of the device using synchronous modulation of the UV light output is not limited to eliminating non-uniformity of the UV dose, but can also be used to force a desired dose distribution across the device to enhance or attenuate a desired property of the cured lacquer film which can be influenced by the UV dose or UV intensity on the surface of the component.
  • this can be adjusted via the modulation amplitude and the modulation phase, assuming that the fundamental frequency of the modulation is determined by the occupation of the drum with components and the rotational speed of the drum. Both the modulation amplitude and the modulation phase can themselves be synchronously modulated again, the fundamental frequency again having to correspond to the frequency of movement of the components through the field of application.
  • Another advantage of this synchronous modulation can be that much less different, adapted to the individual components mounts may be necessary in a manufacturing environment in which a variety of components must be exposed. By adapting the modulation curve shapes in the recipe process, dose profiles on different components fixed with the same holders can be compensated.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Microbiology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Coating Apparatus (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)

Claims (6)

  1. Dispositif pour exposer des substrats à un rayonnement UV dans un champ d'application, le dispositif comprenant :
    - une source de rayonnement qui émet à la fois un rayonnement UV, une lumière visible et un rayonnement infrarouge en formant un angle solide,
    - un miroir de déviation à rayonnement sélectif qui réfléchit en majeure partie le rayonnement UV et transmet en majeure partie la lumière visible et le rayonnement infrarouge,
    caractérisé en ce que le miroir de déviation comprend au moins deux bandes de miroir plates qui sont inclinées de telle façon l'une par rapport à l'autre qu'elles réfléchissent le rayonnement direct divergent qui provient de la source de rayonnement en direction du champ d'application et réduisent ainsi au moins la divergence et entraînent une augmentation de l'intensité de surface dans le champ d'application.
  2. Dispositif selon la revendication 1, caractérisé en ce que le miroir de déviation comprend trois bandes de miroir plates.
  3. Dispositif selon l'une des revendications précédentes, caractérisé en ce que le dispositif comprend des moyens pour régler l'orientation des bandes de miroir.
  4. Procédé pour fabriquer un dispositif selon la revendication 1 comprenant les étapes suivantes consistant à :
    - fournir une source de rayonnement capable d'émettre à la fois un rayonnement UV, une lumière visible et un rayonnement infrarouge en formant un angle solide,
    - fournir un miroir de déviation capable de réfléchir en majeure partie le rayonnement UV et de transmettre en majeure partie la lumière visible et le rayonnement UV, caractérisé en ce que
    - pour fournir le miroir de déviation au moins une plaque de verre plate est recouverte d'un filtre interférentiel basé sur des systèmes de couches de film minces, le filtre interférentiel réfléchissant essentiellement le rayonnement UV selon un angle d'incidence prédéterminé et transmettant essentiellement la lumière visible et le rayonnement infrarouge et en ce que, après le revêtement, la au moins une plaque de verre est divisée en bandes et au moins deux bandes sont montées sur un support inclinées l'une par rapport à l'autre de façon à réfléchir le rayonnement direct divergent provenant de la source de rayonnement en direction du champ d'application, et ainsi à réduire au moins la divergence et à entraîner une augmentation de l'intensité de surface dans le champ d'application.
  5. Procédé selon la revendication 4, caractérisé en ce que pour composer le miroir de déviation on utilise des bandes de plaques de verre recouvertes de différents filtres interférentiels.
  6. Procédé selon l'une des revendications précédentes, caractérisé en ce que le miroir de déviation comprend trois bandes, de préférence exactement trois bandes.
EP14734004.6A 2013-07-03 2014-06-30 Séparation de lumière par chaleur pour source de rayonnement uv Active EP3016751B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL14734004T PL3016751T3 (pl) 2013-07-03 2014-06-30 Oddzielanie ciepła i światła dla źródła promieniowania uv

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361842576P 2013-07-03 2013-07-03
DE102013011066.1A DE102013011066A1 (de) 2013-07-03 2013-07-03 Wärme-Lichttrennung für eine UV-Strahlungsquelle
PCT/EP2014/001779 WO2015000574A1 (fr) 2013-07-03 2014-06-30 Séparation de lumière par chaleur pour source de rayonnement uv

Publications (2)

Publication Number Publication Date
EP3016751A1 EP3016751A1 (fr) 2016-05-11
EP3016751B1 true EP3016751B1 (fr) 2019-07-03

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Country Link
US (1) US11052423B2 (fr)
EP (1) EP3016751B1 (fr)
JP (1) JP6768505B2 (fr)
KR (1) KR102328419B1 (fr)
CN (1) CN105722607B (fr)
BR (1) BR112015032873B1 (fr)
CA (1) CA2917069C (fr)
DE (1) DE102013011066A1 (fr)
ES (1) ES2749119T3 (fr)
HU (1) HUE047192T2 (fr)
MX (1) MX377563B (fr)
PL (1) PL3016751T3 (fr)
PT (1) PT3016751T (fr)
RU (1) RU2659261C2 (fr)
WO (1) WO2015000574A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015016730A1 (de) 2015-12-22 2017-06-22 Oerlikon Surface Solutions Ag, Pfäffikon UV-Aushärtevorrichtung mit geteilten UV-Umlenkspiegeln
TWI796931B (zh) * 2022-01-12 2023-03-21 威光自動化科技股份有限公司 物件邊框uv膠複層的自動塗膠裝置及自動塗膠方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009046407A1 (de) * 2009-11-04 2011-05-05 Dürr Systems GmbH Vorrichtung zur Strahlungsbehandlung einer Beschichtung

Family Cites Families (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2140069A (en) * 1936-02-05 1938-12-13 Cyrus R Bostwick Triplicate folding hand mirror
US3171403A (en) * 1962-05-17 1965-03-02 John C Drescher Solar heating systems
US3712980A (en) * 1971-01-25 1973-01-23 Kollmorgen Corp Reflector arrangement for attenuating selected components of spectral radiation
US4048490A (en) * 1976-06-11 1977-09-13 Union Carbide Corporation Apparatus for delivering relatively cold UV to a substrate
US4146308A (en) * 1978-01-18 1979-03-27 Trina, Inc. Foldable mirror construction
AT355200B (de) * 1978-01-23 1980-02-25 Espe Pharm Praep Bestrahlungsgeraet zum aushaerten von durch strahlung haertbaren massen
US4408595A (en) * 1978-09-05 1983-10-11 Broyles Howard F Turret mounted solar concentrator with boom mounted secondary mirror or collector
US4277141A (en) * 1979-03-28 1981-07-07 Tropel, Inc. Multifaceted mirror and assembly fixture and method of making such mirror
US4487479A (en) * 1983-03-10 1984-12-11 Tolomeo Sr Joseph F Hunter's rear viewing mirror device
JPH0646304B2 (ja) * 1984-07-31 1994-06-15 東芝ライテック株式会社 紫外線硬化用照射装置
CH660489A5 (de) * 1984-08-31 1987-04-30 Bernhard Glaus Verfahren und vorrichtung zum aushaerten polymerisierbarer beschichtungsmassen auf nicht textilen substraten.
US4602321A (en) * 1985-02-28 1986-07-22 Vari-Lite, Inc. Light source having automatically variable hue, saturation and beam divergence
US4643544A (en) * 1985-11-21 1987-02-17 Loughran William P Three view in one mirror
US4864145A (en) * 1986-10-31 1989-09-05 Burgio Joseph T Jr Apparatus and method for curing photosensitive coatings
US4775231A (en) * 1987-05-26 1988-10-04 Clarence E. Granzow Mirror structure with primary reflector mounted on stub bars and secondary side reflectors
FR2629187B1 (fr) * 1988-03-24 1991-07-19 France Etat Four a rayonnement ultraviolet pour la polymerisation de revetements photopolymerisables
JPH0637521Y2 (ja) * 1988-10-05 1994-09-28 高橋 柾弘 マイクロ波励起による紫外線発生装置
JP2668833B2 (ja) * 1989-03-29 1997-10-27 ウシオ電機株式会社 光照射器
US5016152A (en) * 1989-09-21 1991-05-14 Fiberstars, Inc. Focused light source and method
US4974136A (en) * 1989-10-31 1990-11-27 Artup Corporation Light fixture
JP3299780B2 (ja) * 1992-07-31 2002-07-08 オリンパス光学工業株式会社 カメラ用ストロボ機構
USD370129S (en) * 1993-12-01 1996-05-28 Freudenfeld Shirley A Design of a portable hair styling mirror
GB2284704B (en) * 1993-12-10 1998-07-08 Gen Electric Patterned optical interference coatings for electric lamps
US5808763A (en) * 1995-10-31 1998-09-15 Jds Fitel Inc. Optical demultiplexor
US5742066A (en) * 1996-02-08 1998-04-21 Bright Solutions, Inc. Light source for use in leak detection in heating, ventilating, and air conditioning systems that utilize environmentally-safe materials
DE69706964T2 (de) * 1996-03-07 2002-04-04 Accu-Sort Systems, Inc. Dynamisches fokussierungsgeraet fuer optische abbildungssysteme
JPH09260753A (ja) * 1996-03-25 1997-10-03 Ando Electric Co Ltd 外部共振器型波長可変光源
JP3094902B2 (ja) * 1996-03-27 2000-10-03 ウシオ電機株式会社 紫外線照射装置
DE19651977C2 (de) * 1996-12-13 2001-03-01 Michael Bisges UV-Bestrahlungsvorrichtung
JPH1144799A (ja) * 1997-05-27 1999-02-16 Ushio Inc 光路分割型紫外線照射装置
US6531230B1 (en) * 1998-01-13 2003-03-11 3M Innovative Properties Company Color shifting film
US5967648A (en) * 1998-02-09 1999-10-19 Lexalite International Corporation Lighting fixture including a neutral density polymeric material for controlled light distribution
DE19810455C2 (de) * 1998-03-11 2000-02-24 Michael Bisges Kaltlicht-UV-Bestrahlungsvorrichtung
US7361404B2 (en) * 2000-05-10 2008-04-22 Ppg Industries Ohio, Inc. Coated article with removable protective coating and related methods
US7255451B2 (en) * 2002-09-20 2007-08-14 Donnelly Corporation Electro-optic mirror cell
US6542306B2 (en) * 2001-03-16 2003-04-01 Optical Coating Laboratories, Inc. Compact multiple channel multiplexer/demultiplexer devices
JP4577602B2 (ja) * 2001-07-31 2010-11-10 岩崎電気株式会社 紫外線照射装置
DE20114380U1 (de) * 2001-08-31 2002-02-21 Dr. Hönle AG, 82152 Planegg UV-Bestrahlungsvorrichtung
US6962421B2 (en) * 2002-07-11 2005-11-08 Peter Yang Full-size folding mirror and carry case apparatus
TW568987B (en) * 2002-08-16 2004-01-01 Au Optronics Corp Direct-type backlight unit for flat panel liquid crystal display
US7128429B2 (en) * 2002-10-15 2006-10-31 Mark Andy, Inc. Light trap and heat transfer apparatus and method
CA2503686A1 (fr) * 2002-10-28 2004-05-13 University Of Washington Capteur de resonance plasmonique de surface accordable en longueur d'onde
US7147654B2 (en) * 2003-01-24 2006-12-12 Laserscope Treatment Site Cooling System of Skin Disorders
DE10352184A1 (de) 2003-11-05 2005-06-23 Arccure Technologies Gmbh Vorrichtung zum Härten und/oder Trocknen einer Beschichtung auf einem Substrat
US7338177B2 (en) * 2003-11-26 2008-03-04 Donnelly Corporation Mirror reflective element for a vehicle
US20080151364A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
JP4533235B2 (ja) * 2004-07-29 2010-09-01 株式会社リコー 原稿照明装置、画像読み取り装置、および画像形成装置
DE102004043176B4 (de) * 2004-09-03 2014-09-25 Osram Gmbh Infrarotscheinwerfer
US7525660B2 (en) * 2005-02-08 2009-04-28 Northrop Grumman Systems Corporation Systems and methods for use in detecting harmful aerosol particles
DE102005018115A1 (de) * 2005-04-19 2006-10-26 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Kompakte Reflektorlampe und Verfahren zu ihrer Herstellung
US7638780B2 (en) * 2005-06-28 2009-12-29 Eastman Kodak Company UV cure equipment with combined light path
US7593156B2 (en) * 2005-08-26 2009-09-22 Leica Microsystems (Schweiz) Ag Microscope with micro-mirrors for optional deflection and/or beam splitting
FR2892409B1 (fr) * 2005-10-25 2007-12-14 Saint Gobain Procede de traitement d'un substrat
JP2007201134A (ja) * 2006-01-26 2007-08-09 Seiko Epson Corp 露光装置用光源装置、露光装置及び露光装置の調整方法
US8274729B2 (en) * 2006-03-03 2012-09-25 Gentex Corporation Thin-film coatings, electro-optic elements and assemblies incorporating these elements
US7535563B1 (en) * 2006-08-15 2009-05-19 Kla-Tencor Technologies Corporation Systems configured to inspect a specimen
US8465991B2 (en) * 2006-10-30 2013-06-18 Novellus Systems, Inc. Carbon containing low-k dielectric constant recovery using UV treatment
US20080137172A1 (en) * 2006-12-06 2008-06-12 Glimmerglass Networks, Inc. Array of graduated pre-tilted mems mirrors
US7763869B2 (en) * 2007-03-23 2010-07-27 Asm Japan K.K. UV light irradiating apparatus with liquid filter
JP2008288542A (ja) * 2007-04-17 2008-11-27 Nec Corp 紫外線照射装置および紫外線照射方法
US8233218B1 (en) * 2007-07-18 2012-07-31 Lightsmyth Technologies Inc. Decorative, ornamental, or jewelry articles having diffraction gratings
US7589916B2 (en) * 2007-08-10 2009-09-15 Angstrom, Inc. Micromirror array with iris function
US8810908B2 (en) * 2008-03-18 2014-08-19 Stereo Display, Inc. Binoculars with micromirror array lenses
US8077377B2 (en) * 2008-04-24 2011-12-13 Micronic Mydata AB Spatial light modulator with structured mirror surfaces
US8498033B2 (en) * 2008-09-05 2013-07-30 Jds Uniphase Corporation Optical device exhibiting color shift upon rotation
US8490396B2 (en) * 2008-09-22 2013-07-23 e-Cube Energy Technologies, Ltd. Configuration and tracking of 2-D “modular heliostat”
US20100192941A1 (en) * 2009-01-30 2010-08-05 Stoia Michael F Solar Concentration System With Micro-Mirror Array
US8162495B2 (en) * 2009-02-03 2012-04-24 Steven Russell Green System and method of focusing electromagnetic radiation
WO2010099516A1 (fr) * 2009-02-28 2010-09-02 Richard Welle Concentrateur solaire de fresnel segmenté
US8467124B2 (en) * 2010-02-19 2013-06-18 Ppg Industries Ohio, Inc. Solar reflecting mirror and method of making same
US20100242953A1 (en) * 2009-03-27 2010-09-30 Ppg Industries Ohio, Inc. Solar reflecting mirror having a protective coating and method of making same
US9995507B2 (en) * 2009-04-15 2018-06-12 Richard Norman Systems for cost-effective concentration and utilization of solar energy
CN102449451A (zh) * 2009-06-02 2012-05-09 C8麦迪森瑟斯公司 用于注入激励光和从样本收集非弹性散射光的全反射设备
US8439520B2 (en) * 2010-10-21 2013-05-14 Rambus Delaware Llc Color-configurable lighting assembly

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009046407A1 (de) * 2009-11-04 2011-05-05 Dürr Systems GmbH Vorrichtung zur Strahlungsbehandlung einer Beschichtung

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JP6768505B2 (ja) 2020-10-14
BR112015032873B1 (pt) 2022-04-12
CA2917069C (fr) 2021-02-16
WO2015000574A1 (fr) 2015-01-08
KR20160029819A (ko) 2016-03-15
US11052423B2 (en) 2021-07-06
KR102328419B1 (ko) 2021-11-19
US20160368021A1 (en) 2016-12-22
CA2917069A1 (fr) 2015-01-08
MX377563B (es) 2025-03-10
PT3016751T (pt) 2019-11-11
DE102013011066A1 (de) 2015-01-08
CN105722607A (zh) 2016-06-29
RU2659261C2 (ru) 2018-06-29
BR112015032873A2 (pt) 2017-07-25
ES2749119T3 (es) 2020-03-19
JP2016530550A (ja) 2016-09-29
CN105722607B (zh) 2019-06-18
PL3016751T3 (pl) 2019-12-31
HUE047192T2 (hu) 2020-04-28
MX2016000223A (es) 2016-06-15
RU2016103245A (ru) 2017-08-08

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