[go: up one dir, main page]

EP3003583A1 - Specific device for cleaning electronic components and/or circuits - Google Patents

Specific device for cleaning electronic components and/or circuits

Info

Publication number
EP3003583A1
EP3003583A1 EP14731754.9A EP14731754A EP3003583A1 EP 3003583 A1 EP3003583 A1 EP 3003583A1 EP 14731754 A EP14731754 A EP 14731754A EP 3003583 A1 EP3003583 A1 EP 3003583A1
Authority
EP
European Patent Office
Prior art keywords
mixer
fluid
components
nozzles
tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP14731754.9A
Other languages
German (de)
French (fr)
Other versions
EP3003583B1 (en
Inventor
Michel Bourdat
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to SI201432004T priority Critical patent/SI3003583T1/en
Publication of EP3003583A1 publication Critical patent/EP3003583A1/en
Application granted granted Critical
Publication of EP3003583B1 publication Critical patent/EP3003583B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/048Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B01F23/2323Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles by circulating the flow in guiding constructions or conduits
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/235Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids for making foam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30Injector mixers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30Injector mixers
    • B01F25/31Injector mixers in conduits or tubes through which the main component flows
    • B01F25/313Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/50Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
    • B01F25/53Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle in which the mixture is discharged from and reintroduced into a receptacle through a recirculation tube, into which an additional component is introduced
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/102Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/14Removing waste, e.g. labels, from cleaning liquid

Definitions

  • the present invention relates to a specific device for cleaning components and / or electronic circuits such as for example electronic boards or substrates based on silicon.
  • the present invention may find application, for example, but not exclusively, in the field of microelectronic production.
  • the invention can also find applications in the field of electronic production. Indeed, for example during a welding phase Surface Mounted Components "CMS" in a welding oven, cream or solder residues are formed and remain glued either on the surface of the card or on the components that can cause malfunctions of the electronic card. It is therefore advisable to clean the board after welding operations.
  • CMS Surface Mounted Components
  • solder residues on an electronic card are particularly difficult to remove by the complex topography of an electronic card but also by its fragility.
  • US Patent No. 6,454,867 entitled “Method and Machine for Cleaning Objects in Plate Form” discloses a machine and its cleaning method for cleaning electronic boards of their residues using an immersion technique.
  • Said machine comprises a washing tank where the object to be washed is totally immersed in a vertical position and is parallel to the walls of the washing tank. The latter is filled with a liquid azeotropic liquid cleaning fluid.
  • a recovery system and a cleaning liquid filtering system allow the circulation and filtering of the liquid in a closed loop.
  • the method proposed by the patent US Pat. No. 6,454,867 implements an ultrasound generator in the wash tank to facilitate the stalling of the particles to be removed.
  • This technique greatly improves cleaning quality but can not be used for cleaning electronic boards dedicated to avionics. Indeed, the presence of many high-tech electronic components and especially components such as quartz makes the use of ultrasound prohibited by regulation.
  • the invention aims to overcome these disadvantages. More particularly, the invention aims to allow the cleaning of components and / or electronic circuits soiled by residues of different densities, sizes and natures and in particular glue or solder cream. In particular, the invention aims to allow the removal of residues placed in places difficult to access such as under an integrated circuit of an electronic card.
  • the invention can be implemented in the field of avionics. It will also preferably eliminate residues in via holes in printed circuit boards. The invention thus aims to increase cleaning performance and elimination of residues on electronic boards for applications in avionics, for example, or on semiconductor components deposited on substrates based on flexible Kapton.
  • the invention proposes a specific device for cleaning components and / or electronic circuits comprising:
  • a fluid injection system comprising nozzles for projecting fluid jets onto the components and / or the electronic circuit to be cleaned
  • the cleaning device further comprises a fluid mixer having a first inlet adapted to receive a pressurized liquid, a second inlet adapted to receive pressurized gas, an outlet adapted to supply two-phase fluid to the injection system, the first inlet being coupled to the outlet to using an internal pipe, the second inlet being fed with gas under pressure and connected to an injector for injecting said gas into the internal pipe.
  • a fluid mixer having a first inlet adapted to receive a pressurized liquid, a second inlet adapted to receive pressurized gas, an outlet adapted to supply two-phase fluid to the injection system, the first inlet being coupled to the outlet to using an internal pipe, the second inlet being fed with gas under pressure and connected to an injector for injecting said gas into the internal pipe.
  • the mixer proposed here for the cleaning device makes it possible to produce a two-phase fluid in which the gas is intimately mixed with the liquid and forms therein microbubbles.
  • the use of a jet of such a two-phase fluid for cleaning components and / or electronic circuits soiled by solder residues makes it possible, thanks to the properties of the two-phase fluid, to greatly improve the cleaning efficiencies. Indeed, when the two-phase fluid comes into contact with the surface to be cleaned of components and / or electronic circuits, a microbubble release phenomenon on the surface of the components and / or electronic circuits comparable to an ultrasonic cavitation phenomenon occurs. This technique removes even glue residues while avoiding the use of ultrasound and can be used in the field of avionics.
  • the injection system is such that the pressure at the nozzles is less than or equal to 5 bars, which makes it possible to obtain efficient cleaning without degrading the components and / or electronic circuits of a very high quality. brittle.
  • the injector of the mixer injects the gas under pressure into the center of the internal pipe of the fluid mixer.
  • the concentric position of the injector relative to the internal pipe avoids the formation of gas bubble packets in the two-phase fluid.
  • the difference between the fluid pressure and the gas pressure inside the fluid mixer is of the order of 1 bar. It has indeed been noted that this pressure difference, the gas being in excess pressure with respect to the liquid, made it possible to produce a very homogeneous two-phase fluid and therefore very effective for cleaning.
  • the pressure difference between the injected gas and the liquid receiving this gas will thus for example be between 0.5 and 2 bars.
  • the cleaning device comprises a tank of overflow to recover the liquid from the first tank. Said liquid which thus flows into the overflow tank is freed of heavy residues remaining at the bottom of the first tank.
  • a suction of liquid inside the overflow tank is advantageously carried out by means of a hydraulic device which connects the overflow tank to the fluid mixer. The latter is then through one of these inputs supplied with liquid already rid of the largest washing residues.
  • the mixer is advantageously placed downstream of a filter.
  • the fluid mixer has a Y-shape facilitating mixing between the gas and the liquid therein. This shape thus allows the creation of microbubbles of gas in the liquid from the overflow tank.
  • the fluid mixer is advantageously placed upstream of the first tank to facilitate the integration of the mixer within the cleaning device.
  • An embodiment of the present invention provides that the means for the nozzles to scan the surface of the components and / or electronic circuits to be cleaned includes means for vertically moving the support means. It may also be provided, possibly in addition to this embodiment, to achieve effective cleaning, that these means for the nozzles to perform the scanning of the surface of the components and / or electronic circuits to be cleaned include means for horizontally moving the nozzles.
  • a preferred embodiment provides the combination of component support movements and / or electronic circuits and nozzles to greatly increase cleaning efficiency. It is then possible to more easily remove the residues on electronic boards and / or components.
  • an advantageous embodiment of the invention further provides that the system injection of a two-phase fluid on the components and / or the electronic circuits to be cleaned comprises two networks of nozzles connected to each other and placed on both sides of the components and / or electronic circuits thus allowing simultaneous cleaning of the two faces of the components and / or electronic circuits .
  • the distance between said components and / or electronic circuits to clean networks of nozzles is adjustable.
  • the fluid mixer comprises a conical narrowing making it possible to homogenize the distribution of gas bubbles in the fluid.
  • the two-phase fluid does not have groups or packets of gas bubbles.
  • the pressurized gas injected into the second inlet of the fluid mixer is a neutral gas.
  • the diameter of the internal pipe of the fluid mixer has a diameter of between 15 and 25 mm.
  • the injector of the mixer has an internal diameter of less than 4 mm.
  • the injector of the mixer has an internal diameter of less than 4 mm.
  • FIG. 1 is a block diagram of the device of the invention.
  • FIG. 2 is a diagrammatic view on an enlarged scale of part of the device of FIG. 1.
  • Figure 1 shows a device 1 comprising a first tank 2, a second tank called overflow tank 4, both of generally parallelepipedal shapes and adapted to contain a liquid.
  • Support means 8 disposed inside the first tank 2 maintain components and / or electronic circuits 6 to be cleaned immersed in the liquid contained therein.
  • Said components and / or electronic circuits 6 to be cleaned are, for example, substrates based on silicon that can be flexible or chip assemblies based on semiconductor. It can also be electronic cards or screen printing stencils.
  • the first tank 2 also called cleaning tank, consists of metal walls made of stainless steel. It comprises inter alia a first vertical vertical wall 21, a lower horizontal bottom 22 and an inner vertical wall 23, said overflow wall with an upper end edge 231 at a height less than that of an upper extreme edge 21 1 of the wall external vertical 21.
  • the inner vertical wall 23 is designed such that the liquid contained in the first tank 2 overflows above the upper end edge 231 to flow into the overflow tank 4 adjacent to the first tank 2.
  • the overflow tank 4 is also made of stainless steel metal walls. It comprises inter alia a first vertical vertical wall 42, a horizontal bottom 41 and a second vertical wall which corresponds to the upper part of the inner vertical wall 23 of the first tank 2. In addition, the two tanks are open upwards and the lower horizontal bottom 22 of the first tank 2 is at an altitude lower than the altitude of the horizontal bottom 41 of the overflow tank 4.
  • the components and / or the electronic circuits 6 to be cleaned are placed parallel to the vertical vertical wall 21 of the first tank 2 so that they can not come into contact with the lower horizontal bottom 22 of the first tank 2 so as not to disturb the flow of the liquid in said first tank 2.
  • the components and / or the electronic circuits 6 to be cleaned are maintained by the support means 8. These may be a hook system or arm allowing the total immersion of the components and / or electronic circuits 6 to be cleaned in the first tank 2.
  • the support means 8 can perform a vertical movement (represented by a double arrow in Figure 1) controlled by a suitable control device not shown in Figure 1.
  • the device 1 also comprises two hydraulic devices for the circulation of the liquid contained in the two tanks.
  • a first hydraulic device 12 is associated with the first tank 2. It allows the flow of liquid in the first tank 2 with a suction mouth 121 placed at the bottom of the first tank 2 and a return by an end 122 of the first hydraulic device 12 preferably placed at the top of the vertical vertical wall 21 of the first tank 2, thus allowing the reinjection of the liquid into the first tank 2.
  • This first hydraulic device 12 allows the recovery, filtering and injection of the liquid contained in the first tank 2. It comprises for this purpose a valve V1, a pump P1 and a filter F1.
  • the valve V1 can be controlled electrically or manually and allows, among other things, during potential incidents to isolate the first tank 2.
  • the filter F1 is disposed within the first hydraulic device 12 and is placed for example downstream of the valve V1, to ensure filtering and thereby elimination of cleaning residues of the liquid coming from the first tank 2.
  • the pump P1 may be a finned pump or magnetic drive for example and is used for the circulation of the liquid in the first hydraulic device 12.
  • a manually or electrically controlled valve V5 is positioned here downstream of the pump P1 to allow the liquid contained in the first tank 2 to be drained into a recovery tank (not shown in FIG. 1), for example using the pump. P1.
  • This valve V5 is mounted on a bypass of the first hydraulic device 12.
  • a second hydraulic device 14 comprises a valve V2, a pump P2, a filter F2 and a mixer 16.
  • This second hydraulic device 14 makes it possible, among other things, to suck the liquid into the overflow tank 4 and reinject it into the first tank 2
  • a suction mouth 142 is placed so that the suction of the liquid preferably occurs at the bottom of the wall 42 of the overflow tank 4.
  • the return of the liquid is made through a fluid injection system placed in the first tank 2.
  • the valve V2 placed on the second hydraulic device 14 can be manually controlled or electrically controlled type for example solenoid valve. This valve V2 allows during an incident potential to isolate the overflow tank 4 for safety reasons.
  • the liquid contained in the overflow tank 4 is sucked by means of the pump P2, placed here downstream of the valve V2.
  • the filter F2 placed downstream of the pump P2 allows the filtering, that is to say the elimination of cleaning residues of the liquid coming from the overflow tank 4, these residues coming, among others, from the components and / or circuits 6 electronics to clean ..
  • the mixer 16 is placed downstream of the filter F2 on the second hydraulic device 14 and is placed upstream of the first tank 2. It has a first inlet 161 adapted to receive a liquid under pressure from the filter F2 powered by the pump P2 in the second hydraulic device 14, a second inlet 162 adapted to receive a gas under pressure and an outlet 163.
  • FIG. 2 is a schematic view on an enlarged scale of the mixer 16.
  • the first input 161 is coupled to the output 163 by means of an internal pipe of the mixer 16.
  • the second inlet 162 is connected to the outside of the mixer 16 to a source of pressurized gas.
  • the second inlet 162 is connected to an injector for injecting said gas into the internal pipe.
  • the internal diameter of the injector is for example of the order of 2 mm with an outer diameter of about 4 mm.
  • the mixer 16 thus has a shape of Y.
  • the injector is positioned in the center of the internal pipe of the mixer 16, that is to say concentrically with respect to the internal pipe.
  • the injector penetrates sufficiently into the internal pipe and its end in the inner pipe is close to the conical narrowing 164 of the inner pipe so that the injection of pressurized gas at the center of the internal pipe allows the creation of a two-phase fluid. Due to this conical narrowing 164 the two-phase fluid is accelerated which homogenizes the distribution of gas bubbles.
  • the gas injected into the second inlet 162 may be a neutral gas, for example nitrogen, which makes it possible to clean bare or highly oxidizable copper parts, for example power modules used for energy management in vehicles. electric.
  • the injected gas may be a protective or reducing gas.
  • the pressure of the gas injected into the second inlet 162 is greater than 0.5 to 2 bar, preferably of the order of 1 bar, above the pressure of the liquid and has a flow rate of the order of 10 liters / min. .
  • the flow rates and the pressures of the inputs of the mixer 16 are adjustable.
  • the flow rate and the pressure within the second hydraulic device 14 as well as at the second inlet 162 of the mixer 16 are sufficient to meet the cleaning requirements of the components and / or the electronic circuits 6 to be cleaned.
  • the fluid injection system comprises two networks of nozzles 1001 and 1003 immersed in the first tank 2. These two networks of nozzles 1001 and 1003 have nozzles 10 placed so that the streams coming from these nozzles 10 are jets of liquid laminar cylindrical and arrive perpendicular to the surface of the components and / or electronic circuits 6 to clean (see Figure 1).
  • Said nozzle networks 1001 and 1003 consist of at least one line comprising at least one nozzle 10 and at least one column comprising at least one nozzle 10.
  • the number of nozzles 10, that is to say the number of lines and columns, the nozzle networks 1001 and 1003 can be modified according to the size of the components and / or the electronic circuits 6 to be cleaned.
  • the nozzle networks 1001 and 1003 are placed parallel to the components and / or the electronic circuits. 6 to be cleaned on both sides (see Figure 1).
  • the distance separating the components and / or the electronic circuits 6 to be cleaned from the nozzle is of the order of 2 to 5 cm.
  • the network of nozzles 1003 is supplied with two-phase fluid from the hydraulic device 14 by means of a hydraulic supply device 1002 connecting the first network of nozzles 1001 to the second network of nozzles 1003.
  • the pressure of the two-phase fluid jet Nozzle level 10 is preferably less than 5 bar. Although relatively low, this pressure allows efficient cleaning of the components or cards to be cleaned while ensuring not to damage the cleaned objects.
  • the hydraulic feed device 1002 is preferably situated at the bottom of the first tank 2 without however touching its bottom horizontal bottom 22 so as not to hinder the circulation of the liquid in the first tank 2.
  • first network of nozzles 1001 and the second network of nozzles 1003 can, with the aid of a scanning device not shown in FIG. 1, carry out a movement perpendicular to the plane of FIG. This movement thus makes it possible to sweep, using the fluid jets, the faces of the components and / or the electronic circuits 6 to be cleaned using the two networks of nozzles.
  • This scanning device can also be coupled to the movement of the support means 8.
  • the combined movements then favor the elimination of the residues placed under integrated circuits.
  • the removal of residues placed in via holes is also improved using this technique.
  • the distance between each network of nozzles and the components and / or the electronic circuits 6 to be cleaned is determined in such a way that the efficiency of the two-phase fluid jets is maximum: this can be for example of the order from 5 to 10 cm.
  • a pressure regulating device (not shown in the figures), using for example pressure sensors, is used to control the pressure of the liquid as well as that of the gas.
  • a device for regulating the temperature of the liquid for example using a temperature sensor.
  • the gas may for example be at room temperature.
  • a temperature control of the gas can also be considered. Thus, it is possible to perfectly control the characteristics of the two-phase fluid.
  • the cleaning of screen printing masks is optimized by such a device. It has been noticed that the presence of microbubbles in the fluid injected by the nozzles on the components and / or the electronic circuits to be cleaned allowed a very high cleaning efficiency even against products such as glue deemed to be impossible to be eliminated by cleaning.
  • the invention is not limited by the nature and shape of the vessel (s).
  • the embodiment of the device shown in Figure 1 is only a non-limiting example.
  • the materials constituting the tanks may be of a different nature than that stated in the description. Any variant technically feasible embodiment within the scope of the skilled person may be preferred to the embodiments described.
  • the number of filters on the hydraulic lines or the type of pumps is not limited to the examples given here for purely illustrative purposes.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Detergent Compositions (AREA)

Abstract

The invention relates to a device (1) for cleaning electronic components and/or circuits (6). Said cleaning device comprises a first vessel (2) containing a liquid, support means (8), a fluid injection system comprising nozzles (10) allowing the projection of jets of fluid, means allowing the jets from the nozzles (10) to sweep the surface of the components (6), and a fluid mixer (16) comprising a first inlet (161) suitable for receiving a pressurised liquid, a second inlet (162) suitable for receiving a pressurised gas, and an outlet (163) designed to supply the injection system with two-phase fluid, the first inlet (161) being coupled to the outlet (163) by means of an inner duct, the second inlet (162) being coupled to a pressurised gas supply and to an injector for injecting said gas into the inner duct.

Description

DISPOSITIF SPÉCIFIQUE DE NETTOYAGE DE COMPOSANTS ET/OU DE  SPECIFIC DEVICE FOR CLEANING COMPONENTS AND / OR

CIRCUITS ÉLECTRONIQUES  ELECTRONIC CIRCUITS

La présente invention concerne un dispositif spécifique de nettoyage de composants et/ou de circuits électroniques tels que par exemple des cartes électroniques ou des substrats à base de silicium. The present invention relates to a specific device for cleaning components and / or electronic circuits such as for example electronic boards or substrates based on silicon.

La présente invention peut trouver son application par exemple, mais pas exclusivement, dans le domaine de la production microélectronique. L'invention peut également trouver des applications dans le domaine de la production électronique. En effet, lors par exemple d'une phase de soudure de Composants Montés en Surface « CMS » dans un four à soudure, des résidus de crème ou de soudure se forment et restent collés soit à la surface de la carte ou sur les composants pouvant provoquer des disfonctionnements de la carte électronique. Il convient donc de nettoyer la carte après les opérations de soudure.  The present invention may find application, for example, but not exclusively, in the field of microelectronic production. The invention can also find applications in the field of electronic production. Indeed, for example during a welding phase Surface Mounted Components "CMS" in a welding oven, cream or solder residues are formed and remain glued either on the surface of the card or on the components that can cause malfunctions of the electronic card. It is therefore advisable to clean the board after welding operations.

Le nettoyage de composants et/ou de circuits électroniques ayant subi au préalable par exemple des étapes de soudure ou de collage, nécessite des appareils et des processus de nettoyage performants.  The cleaning of components and / or electronic circuits having previously undergone, for example, welding or gluing steps, requires efficient cleaning devices and processes.

Les résidus de soudure sur une carte électronique sont particulièrement difficiles à supprimer de par la topographie complexe d'une carte électronique mais également de par sa fragilité.  The solder residues on an electronic card are particularly difficult to remove by the complex topography of an electronic card but also by its fragility.

Le brevet n° US 6,454,867 nommé « Method and Machine for Cleaning Objects in Plate Form » présente une machine et son procédé de nettoyage permettant de nettoyer des cartes électroniques de leurs résidus à l'aide d'une technique d'immersion. Ladite machine comporte un bac de lavage où l'objet à laver est totalement immergé en position verticale et est parallèle aux parois du bac de lavage. Ce dernier est rempli d'un liquide de nettoyage de type liquide azéotropique. Afin de diminuer les coûts mais également l'impact sur l'environnement d'un tel dispositif un système de récupération et un système de filtrage du liquide de nettoyage permettent la circulation et le filtrage du liquide en boucle fermée.  US Patent No. 6,454,867, entitled "Method and Machine for Cleaning Objects in Plate Form" discloses a machine and its cleaning method for cleaning electronic boards of their residues using an immersion technique. Said machine comprises a washing tank where the object to be washed is totally immersed in a vertical position and is parallel to the walls of the washing tank. The latter is filled with a liquid azeotropic liquid cleaning fluid. In order to reduce the costs but also the environmental impact of such a device a recovery system and a cleaning liquid filtering system allow the circulation and filtering of the liquid in a closed loop.

Afin d'améliorer l'efficacité du lavage, le procédé proposé par le brevet n° US 6,454,867 met en œuvre un générateur d'ultrasons dans le bac de lavage pour faciliter le décrochage des particules à éliminer. Cette technique améliore fortement la qualité des nettoyages mais ne peut être utilisée pour le nettoyage de cartes électroniques dédiées à l'avionique. En effet, la présence de nombreux composants électroniques de hautes technicités et surtout de composants tels que des quartz rend l'utilisation d'ultrasons interdite par la réglementation. In order to improve the efficiency of the washing, the method proposed by the patent US Pat. No. 6,454,867 implements an ultrasound generator in the wash tank to facilitate the stalling of the particles to be removed. This technique greatly improves cleaning quality but can not be used for cleaning electronic boards dedicated to avionics. Indeed, the presence of many high-tech electronic components and especially components such as quartz makes the use of ultrasound prohibited by regulation.

En outre, de telles techniques rencontrent des difficultés lors de la suppression de certains résidus comme par exemple de la colle sur des masques de sérigraphie ou dans des parties difficiles d'accès telles que par exemple sous un circuit intégré.  In addition, such techniques encounter difficulties in the removal of certain residues such as glue on screen-printing masks or in difficult access areas such as for example in an integrated circuit.

L'invention vise donc à pallier ces inconvénients. Plus particulièrement l'invention vise à permettre le nettoyage de composants et/ou de circuits électroniques souillés par des résidus de densités, de tailles et de natures différentes et notamment de la colle ou de la crème à braser. En particulier, l'invention vise à permettre la suppression de résidus placés dans des endroits difficiles d'accès tels que sous un circuit intégré d'une carte électronique. Avantageusement, l'invention pourra être mise en œuvre dans le domaine de l'avionique. Elle permettra aussi de préférence d'éliminer des résidus dans des trous de via dans des circuits imprimés. L'invention vise ainsi à l'augmentation des performances de nettoyage et d'élimination des résidus sur des cartes électroniques pour des applications dans l'avionique par exemple ou sur composants semi-conducteurs déposés sur des substrats à base de Kapton souple.  The invention therefore aims to overcome these disadvantages. More particularly, the invention aims to allow the cleaning of components and / or electronic circuits soiled by residues of different densities, sizes and natures and in particular glue or solder cream. In particular, the invention aims to allow the removal of residues placed in places difficult to access such as under an integrated circuit of an electronic card. Advantageously, the invention can be implemented in the field of avionics. It will also preferably eliminate residues in via holes in printed circuit boards. The invention thus aims to increase cleaning performance and elimination of residues on electronic boards for applications in avionics, for example, or on semiconductor components deposited on substrates based on flexible Kapton.

À cet effet, l'invention propose un dispositif spécifique de nettoyage de composants et/ou de circuits électroniques comprenant :  For this purpose, the invention proposes a specific device for cleaning components and / or electronic circuits comprising:

- une première cuve contenant un liquide,  a first tank containing a liquid,

- des moyens de support permettant de tenir immergés les composants et/ou le circuit électronique dans la première cuve,  - Support means for immersing the components and / or the electronic circuit in the first tank,

- un système d'injection de fluide comportant des buses permettant la projection de jets de fluide sur les composants et/ou le circuit électronique à nettoyer,  a fluid injection system comprising nozzles for projecting fluid jets onto the components and / or the electronic circuit to be cleaned,

- des moyens permettant aux jets de fluide provenant des buses de balayer la surface des composants et/ou du circuit électronique à nettoyer.  means for the jets of fluid coming from the nozzles to sweep the surface of the components and / or the electronic circuit to be cleaned.

Selon la présente invention le dispositif de nettoyage comporte en outre un mélangeur de fluides comportant une première entrée adaptée pour recevoir un liquide sous pression, une seconde entrée adaptée pour recevoir un gaz sous pression, une sortie conçue pour alimenter en fluide diphasique le système d'injection, la première entrée étant couplée à la sortie à l'aide d'une canalisation interne, la seconde entrée étant alimentée en gaz sous pression et reliée à un injecteur pour injecter ledit gaz dans la canalisation interne. According to the present invention the cleaning device further comprises a fluid mixer having a first inlet adapted to receive a pressurized liquid, a second inlet adapted to receive pressurized gas, an outlet adapted to supply two-phase fluid to the injection system, the first inlet being coupled to the outlet to using an internal pipe, the second inlet being fed with gas under pressure and connected to an injector for injecting said gas into the internal pipe.

Le mélangeur proposé ici pour le dispositif de nettoyage permet de réaliser un fluide diphasique au sein duquel le gaz est intimement mélangé au liquide et forme dans celui-ci des microbulles. L'utilisation d'un jet d'un tel fluide diphasique pour le nettoyage de composants et/ou de circuits électroniques souillés par des résidus de soudure permet grâce aux propriétés du fluide diphasique d'améliorer très fortement les rendements de nettoyage. En effet, lorsque le fluide diphasique vient en contact avec la surface à nettoyer des composants et/ou de circuits électroniques, un phénomène de libération de microbulles à la surface des composants et/ou des circuits électroniques comparable à un phénomène de cavitation d'ultrasons se produit. Cette technique permet de retirer même des résidus de colle tout en évitant l'utilisation d'ultrasons et peut ainsi être utilisée dans le domaine de l'avionique.  The mixer proposed here for the cleaning device makes it possible to produce a two-phase fluid in which the gas is intimately mixed with the liquid and forms therein microbubbles. The use of a jet of such a two-phase fluid for cleaning components and / or electronic circuits soiled by solder residues makes it possible, thanks to the properties of the two-phase fluid, to greatly improve the cleaning efficiencies. Indeed, when the two-phase fluid comes into contact with the surface to be cleaned of components and / or electronic circuits, a microbubble release phenomenon on the surface of the components and / or electronic circuits comparable to an ultrasonic cavitation phenomenon occurs. This technique removes even glue residues while avoiding the use of ultrasound and can be used in the field of avionics.

Dans un exemple de réalisation avantageux, le système d'injection est tel que la pression au niveau des buses est inférieure ou égale à 5 bars, ce qui permet d'obtenir un nettoyage efficace sans dégrader les composants et/ou circuits électroniques de nature très fragile.  In an advantageous exemplary embodiment, the injection system is such that the pressure at the nozzles is less than or equal to 5 bars, which makes it possible to obtain efficient cleaning without degrading the components and / or electronic circuits of a very high quality. brittle.

Afin d'obtenir un fluide diphasique homogène l'injecteur du mélangeur injecte le gaz sous pression au centre de la canalisation interne du mélangeur de fluides. La position concentrique de l'injecteur par rapport à la canalisation interne permet d'éviter la formation de paquets de bulles de gaz dans le fluide diphasique.  In order to obtain a homogeneous two-phase fluid, the injector of the mixer injects the gas under pressure into the center of the internal pipe of the fluid mixer. The concentric position of the injector relative to the internal pipe avoids the formation of gas bubble packets in the two-phase fluid.

La différence entre la pression du fluide et la pression du gaz à l'intérieur du mélangeur de fluides est de l'ordre de 1 bar. On a en effet remarqué que cette différence de pression, le gaz étant en surpression par rapport au liquide, permettait de réaliser un fluide diphasique très homogène et de ce fait très efficace pour le nettoyage. La différence de pression entre le gaz injecté et le liquide recevant ce gaz sera ainsi par exemple comprise entre 0,5 et 2 bars.  The difference between the fluid pressure and the gas pressure inside the fluid mixer is of the order of 1 bar. It has indeed been noted that this pressure difference, the gas being in excess pressure with respect to the liquid, made it possible to produce a very homogeneous two-phase fluid and therefore very effective for cleaning. The pressure difference between the injected gas and the liquid receiving this gas will thus for example be between 0.5 and 2 bars.

Avantageusement, le dispositif de nettoyage comporte une cuve de débordement permettant de récupérer le liquide provenant de la première cuve. Ledit liquide qui s'écoule ainsi dans la cuve de débordement est débarrassé des résidus lourds qui restent au fond de la première cuve. Advantageously, the cleaning device comprises a tank of overflow to recover the liquid from the first tank. Said liquid which thus flows into the overflow tank is freed of heavy residues remaining at the bottom of the first tank.

Une aspiration de liquide à l'intérieur de la cuve de débordement est avantageusement effectuée à l'aide d'un dispositif hydraulique qui connecte la cuve de débordement au mélangeur de fluides. Ce dernier est alors par une de ces entrées alimenté en liquide déjà débarrassé des plus gros résidus de lavage.  A suction of liquid inside the overflow tank is advantageously carried out by means of a hydraulic device which connects the overflow tank to the fluid mixer. The latter is then through one of these inputs supplied with liquid already rid of the largest washing residues.

Afin de protéger mieux encore le mélangeur de fluides des résidus de nettoyage provenant de la cuve de débordement, le mélangeur est avantageusement placé en aval d'un filtre.  In order to further protect the fluid mixer from cleaning residues from the overflow vessel, the mixer is advantageously placed downstream of a filter.

Selon un mode de réalisation de l'invention, le mélangeur de fluides a une forme en Y facilitant le mélange entre le gaz et le liquide à l'intérieur de celui-ci. Cette forme permet ainsi la création de microbulles de gaz dans le liquide provenant de la cuve de débordement. De plus, le mélangeur de fluides est avantageusement placé en amont de la première cuve afin de faciliter l'intégration du mélangeur au sein du dispositif de nettoyage.  According to one embodiment of the invention, the fluid mixer has a Y-shape facilitating mixing between the gas and the liquid therein. This shape thus allows the creation of microbubbles of gas in the liquid from the overflow tank. In addition, the fluid mixer is advantageously placed upstream of the first tank to facilitate the integration of the mixer within the cleaning device.

Une forme de réalisation de la présente invention prévoit que les moyens permettant aux buses de réaliser le balayage de la surface des composants et/ou des circuits électroniques à nettoyer comportent des moyens pour déplacer verticalement les moyens de support. On peut également prévoir, éventuellement en complément de cette forme de réalisation, pour réaliser un nettoyage efficace, que ces moyens permettant aux buses de réaliser le balayage de la surface des composants et/ou des circuits électroniques à nettoyer comportent des moyens pour déplacer horizontalement les buses. Une forme de réalisation préférée prévoit la combinaison des mouvements du support des composants et/ou des circuits électroniques et des buses pour augmenter grandement l'efficacité du nettoyage. Il est alors possible de supprimer plus aisément les résidus sur des cartes électroniques et/ou composants.  An embodiment of the present invention provides that the means for the nozzles to scan the surface of the components and / or electronic circuits to be cleaned includes means for vertically moving the support means. It may also be provided, possibly in addition to this embodiment, to achieve effective cleaning, that these means for the nozzles to perform the scanning of the surface of the components and / or electronic circuits to be cleaned include means for horizontally moving the nozzles. A preferred embodiment provides the combination of component support movements and / or electronic circuits and nozzles to greatly increase cleaning efficiency. It is then possible to more easily remove the residues on electronic boards and / or components.

Afin de diminuer le temps de nettoyage mais également afin de préserver les composants et/ou les circuits électroniques à nettoyer de toutes contraintes mécaniques créées par la projection d'un fluide, une forme de réalisation avantageuse de l'invention prévoit en outre que le système d'injection d'un fluide diphasique sur les composants et/ou les circuits électroniques à nettoyer comporte deux réseaux de buses reliés entre eux et placés des deux cotés des composants et/ou des circuits électroniques permettant ainsi un nettoyage simultané des deux faces des composants et/ou des circuits électroniques. In order to reduce the cleaning time but also to preserve the components and / or the electronic circuits to be cleaned of any mechanical stresses created by the projection of a fluid, an advantageous embodiment of the invention further provides that the system injection of a two-phase fluid on the components and / or the electronic circuits to be cleaned comprises two networks of nozzles connected to each other and placed on both sides of the components and / or electronic circuits thus allowing simultaneous cleaning of the two faces of the components and / or electronic circuits .

Avantageusement, en fonction de l'épaisseur des composants et/ou des circuits électroniques à nettoyer, la distance qui sépare lesdits composants et/ou circuits électroniques à nettoyer des réseaux de buses est réglable.  Advantageously, depending on the thickness of the components and / or electronic circuits to be cleaned, the distance between said components and / or electronic circuits to clean networks of nozzles is adjustable.

Dans un mode de réalisation préféré, le mélangeur de fluides comporte un rétrécissement conique permettant de rendre homogène la répartition des bulles de gaz dans le fluide. Ainsi, le fluide diphasique ne comporte pas de groupes ou de paquets de bulles de gaz.  In a preferred embodiment, the fluid mixer comprises a conical narrowing making it possible to homogenize the distribution of gas bubbles in the fluid. Thus, the two-phase fluid does not have groups or packets of gas bubbles.

Avantageusement, le gaz sous pression injecté dans la seconde entrée du mélangeur de fluides est un gaz neutre. Ainsi, il est possible de nettoyer des composants et ou des circuits électroniques utilisant des matériaux très facilement oxydables comme par exemple du cuivre.  Advantageously, the pressurized gas injected into the second inlet of the fluid mixer is a neutral gas. Thus, it is possible to clean components and or electronic circuits using very easily oxidizable materials such as copper.

Dans un exemple de réalisation, le diamètre de la canalisation interne du mélangeur de fluides présente un diamètre compris entre 15 et 25 mm.  In an exemplary embodiment, the diameter of the internal pipe of the fluid mixer has a diameter of between 15 and 25 mm.

L'injecteur du mélangeur présente quant à lui par exemple un diamètre intérieur inférieur à 4 mm. Ainsi avec un diamètre relativement faible de l'injecteur, il est plus facile de réaliser un fluide diphasique homogène et de contrôler les paramètres caractéristiques du fluide diphasique.  For its part, the injector of the mixer has an internal diameter of less than 4 mm. Thus, with a relatively small diameter of the injector, it is easier to produce a homogeneous two-phase fluid and to control the characteristic parameters of the two-phase fluid.

D'autres caractéristiques et avantages de l'invention apparaîtront encore à la lecture de la description qui va suivre. Celle-ci est purement illustrative et doit être lue en regard du dessin annexé dans lequel :  Other features and advantages of the invention will become apparent on reading the description which follows. This is purely illustrative and should be read in conjunction with the accompanying drawing in which:

- La Figure 1 est un schéma fonctionnel du dispositif de l'invention, et - Figure 1 is a block diagram of the device of the invention, and

- La Figure 2 est une vue schématique à échelle agrandie d'une partie du dispositif de la figure 1 . FIG. 2 is a diagrammatic view on an enlarged scale of part of the device of FIG. 1.

La Figure 1 montre un dispositif 1 comprenant une première cuve 2, une seconde cuve dite cuve de débordement 4, toutes deux de formes globalement parallélépipédiques et adaptées pour contenir un liquide.  Figure 1 shows a device 1 comprising a first tank 2, a second tank called overflow tank 4, both of generally parallelepipedal shapes and adapted to contain a liquid.

Des moyens de support 8 disposés à l'intérieur de la première cuve 2 maintiennent des composants et/ou des circuits électroniques 6 à nettoyer immergés dans le liquide contenu dans celle-ci. Lesdits composants et/ou circuits électroniques 6 à nettoyer sont par exemple des substrats à base de silicium pouvant être souples ou d'assemblages de puces à base de semiconducteur. Il peut s'agir également de cartes électroniques ou encore de pochoirs de sérigraphie. Support means 8 disposed inside the first tank 2 maintain components and / or electronic circuits 6 to be cleaned immersed in the liquid contained therein. Said components and / or electronic circuits 6 to be cleaned are, for example, substrates based on silicon that can be flexible or chip assemblies based on semiconductor. It can also be electronic cards or screen printing stencils.

La première cuve 2, dite également cuve de nettoyage, est constituée de parois métalliques en acier inoxydable. Elle comprend entre autres une première paroi verticale externe 21 , un fond horizontal inférieur 22 et une paroi verticale interne 23, dite paroi de débordement avec un bord extrême supérieur 231 à une hauteur inférieure à celle d'un bord extrême supérieur 21 1 de la paroi verticale externe 21 . La paroi verticale interne 23 est conçue de telle sorte que le liquide contenu dans la première cuve 2 déborde au-dessus du bord extrême supérieur 231 pour s'écouler dans la cuve de débordement 4 adjacente à la première cuve 2.  The first tank 2, also called cleaning tank, consists of metal walls made of stainless steel. It comprises inter alia a first vertical vertical wall 21, a lower horizontal bottom 22 and an inner vertical wall 23, said overflow wall with an upper end edge 231 at a height less than that of an upper extreme edge 21 1 of the wall external vertical 21. The inner vertical wall 23 is designed such that the liquid contained in the first tank 2 overflows above the upper end edge 231 to flow into the overflow tank 4 adjacent to the first tank 2.

La cuve de débordement 4 est également constituée de parois métalliques en acier inoxydable. Elle comprend entre autres une première paroi verticale externe 42, un fond horizontal 41 et une seconde paroi verticale qui correspond à la partie supérieure de la paroi verticale interne 23 de la première cuve 2. De plus, les deux cuves sont ouvertes vers le haut et le fond horizontal inférieur 22 de la première cuve 2 est à une altitude inférieure à l'altitude du fond horizontal 41 de la cuve de débordement 4.  The overflow tank 4 is also made of stainless steel metal walls. It comprises inter alia a first vertical vertical wall 42, a horizontal bottom 41 and a second vertical wall which corresponds to the upper part of the inner vertical wall 23 of the first tank 2. In addition, the two tanks are open upwards and the lower horizontal bottom 22 of the first tank 2 is at an altitude lower than the altitude of the horizontal bottom 41 of the overflow tank 4.

Les composants et/ou les circuits électroniques 6 à nettoyer, comme présenté sur la Figure 1 , sont placés parallèlement à la paroi verticale externe 21 de la première cuve 2 de telle sorte qu'ils ne puissent pas venir en contact avec le fond horizontal inférieur 22 de la première cuve 2 afin de ne pas déranger l'écoulement du liquide dans ladite première cuve 2. Les composants et/ou les circuits électroniques 6 à nettoyer sont maintenus par les moyens de support 8. Ces derniers peuvent être un système à crochets ou à bras permettant l'immersion totale des composants et/ou des circuits électroniques 6 à nettoyer dans la première cuve 2. De plus, les moyens de support 8 peuvent effectuer un mouvement vertical (représenté par une double flèche sur la Figure 1 ) contrôlé par un dispositif de commande adapté non représenté sur la Figure 1 .  The components and / or the electronic circuits 6 to be cleaned, as shown in FIG. 1, are placed parallel to the vertical vertical wall 21 of the first tank 2 so that they can not come into contact with the lower horizontal bottom 22 of the first tank 2 so as not to disturb the flow of the liquid in said first tank 2. The components and / or the electronic circuits 6 to be cleaned are maintained by the support means 8. These may be a hook system or arm allowing the total immersion of the components and / or electronic circuits 6 to be cleaned in the first tank 2. In addition, the support means 8 can perform a vertical movement (represented by a double arrow in Figure 1) controlled by a suitable control device not shown in Figure 1.

Le dispositif 1 comprend également deux dispositifs hydrauliques permettant la circulation du liquide contenu dans les deux cuves.  The device 1 also comprises two hydraulic devices for the circulation of the liquid contained in the two tanks.

Un premier dispositif hydraulique 12 est associé à la première cuve 2. Il permet la circulation du liquide dans la première cuve 2 à l'aide d'une bouche d'aspiration 121 placée au fond de la première cuve 2 et d'un retour par une extrémité 122 du premier dispositif hydraulique 12 placée de préférence en haut de la paroi verticale externe 21 de la première cuve 2, permettant ainsi la réinjection du liquide dans la première cuve 2. A first hydraulic device 12 is associated with the first tank 2. It allows the flow of liquid in the first tank 2 with a suction mouth 121 placed at the bottom of the first tank 2 and a return by an end 122 of the first hydraulic device 12 preferably placed at the top of the vertical vertical wall 21 of the first tank 2, thus allowing the reinjection of the liquid into the first tank 2.

Ce premier dispositif hydraulique 12 permet la récupération, le filtrage et l'injection du liquide contenu dans la première cuve 2. Il comporte à cet effet une vanne V1 , une pompe P1 et un filtre F1 .  This first hydraulic device 12 allows the recovery, filtering and injection of the liquid contained in the first tank 2. It comprises for this purpose a valve V1, a pump P1 and a filter F1.

La vanne V1 peut être commandée électriquement ou manuellement et permet entre autres lors de potentiels incidents d'isoler la première cuve 2.  The valve V1 can be controlled electrically or manually and allows, among other things, during potential incidents to isolate the first tank 2.

Le filtre F1 est disposé au sein du premier dispositif hydraulique 12 et est placé par exemple en aval de la vanne V1 , pour assurer un filtrage et par là même une élimination de résidus de nettoyage du liquide provenant de la première cuve 2.  The filter F1 is disposed within the first hydraulic device 12 and is placed for example downstream of the valve V1, to ensure filtering and thereby elimination of cleaning residues of the liquid coming from the first tank 2.

La pompe P1 peut être une pompe à ailettes ou à entraînement magnétique par exemple et est utilisée pour la circulation du liquide dans le premier dispositif hydraulique 12.  The pump P1 may be a finned pump or magnetic drive for example and is used for the circulation of the liquid in the first hydraulic device 12.

Une vanne V5 commandée manuellement ou électriquement est positionnée ici en aval de la pompe P1 pour permettre de purger le liquide contenu dans la première cuve 2 dans une cuve de récupération (non représentée sur la Figure 1 ) par exemple à l'aide de la pompe P1 . Cette vanne V5 est montée sur une dérivation du premier dispositif hydraulique 12.  A manually or electrically controlled valve V5 is positioned here downstream of the pump P1 to allow the liquid contained in the first tank 2 to be drained into a recovery tank (not shown in FIG. 1), for example using the pump. P1. This valve V5 is mounted on a bypass of the first hydraulic device 12.

Un second dispositif hydraulique 14 comporte une vanne V2, une pompe P2, un filtre F2 et un mélangeur 16. Ce second dispositif hydraulique 14 permet entre autres d'aspirer le liquide dans la cuve de débordement 4 et de le réinjecter dans la première cuve 2. Pour ce faire, une bouche d'aspiration 142 est placée de sorte que l'aspiration du liquide se produise de préférence en bas de la paroi 42 de la cuve de débordement 4. Le retour du liquide est fait par le biais d'un système d'injection de fluide placé dans la première cuve 2.  A second hydraulic device 14 comprises a valve V2, a pump P2, a filter F2 and a mixer 16. This second hydraulic device 14 makes it possible, among other things, to suck the liquid into the overflow tank 4 and reinject it into the first tank 2 To do this, a suction mouth 142 is placed so that the suction of the liquid preferably occurs at the bottom of the wall 42 of the overflow tank 4. The return of the liquid is made through a fluid injection system placed in the first tank 2.

La vanne V2, placée sur le second dispositif hydraulique 14, peut être à commande manuelle ou bien à commande électrique de type par exemple électrovanne. Cette vanne V2 permet lors d'un potentiel incident d'isoler la cuve de débordement 4 pour des raisons de sécurité.  The valve V2, placed on the second hydraulic device 14, can be manually controlled or electrically controlled type for example solenoid valve. This valve V2 allows during an incident potential to isolate the overflow tank 4 for safety reasons.

Le liquide contenu dans la cuve de débordement 4 est aspiré à l'aide de la pompe P2, placée ici en aval de la vanne V2. Le filtre F2 placé en aval de la pompe P2 permet le filtrage, c'est-à-dire l'élimination de résidus de nettoyage du liquide provenant de la cuve de débordement 4, ces résidus provenant entre autres des composants et/ou des circuits électroniques 6 à nettoyer.. The liquid contained in the overflow tank 4 is sucked by means of the pump P2, placed here downstream of the valve V2. The filter F2 placed downstream of the pump P2 allows the filtering, that is to say the elimination of cleaning residues of the liquid coming from the overflow tank 4, these residues coming, among others, from the components and / or circuits 6 electronics to clean ..

Le mélangeur 16 est placé en aval du filtre F2 sur le second dispositif hydraulique 14 et est placé en amont de la première cuve 2. Il comporte une première entrée 161 adaptée pour recevoir un liquide sous une pression provenant du filtre F2 propulsé par la pompe P2 dans le second dispositif hydraulique 14, une seconde entrée 162 adaptée pour recevoir un gaz sous pression et une sortie 163. La Figure 2 est une vue schématique à échelle agrandie du mélangeur 16.  The mixer 16 is placed downstream of the filter F2 on the second hydraulic device 14 and is placed upstream of the first tank 2. It has a first inlet 161 adapted to receive a liquid under pressure from the filter F2 powered by the pump P2 in the second hydraulic device 14, a second inlet 162 adapted to receive a gas under pressure and an outlet 163. FIG. 2 is a schematic view on an enlarged scale of the mixer 16.

Toutes les valeurs numériques données ici sont indiquées à titre purement illustratif et non limitatif.  All the numerical values given here are given for purely illustrative and non-limiting purposes.

La première entrée 161 est couplée à la sortie 163 à l'aide d'une canalisation interne du mélangeur 16. Le diamètre de la canalisation interne est par exemple de l'ordre de 16 mm (1 mm = 0,001 m) jusqu'à un rétrécissement conique 164 permettant de passer d'un diamètre de canalisation de 16 mm (du côté de la première entrée 161 ) à un diamètre de canalisation de 13 mm (du côté de la sortie 163) (Figure 2).  The first input 161 is coupled to the output 163 by means of an internal pipe of the mixer 16. The diameter of the internal pipe is for example of the order of 16 mm (1 mm = 0.001 m) to a tapered narrowing 164 to change from a pipe diameter of 16 mm (the side of the first inlet 161) to a pipe diameter of 13 mm (the output side 163) (Figure 2).

La seconde entrée 162 est reliée à l'extérieur du mélangeur 16 à une source de gaz sous pression. Dans le mélangeur 16, la seconde entrée 162 est raccordée à un injecteur pour injecter ledit gaz au sein de la canalisation interne. Le diamètre intérieur de l'injecteur est par exemple de l'ordre de 2 mm avec un diamètre extérieur de l'ordre de 4 mm. Le mélangeur 16 présente ainsi une forme de Y.  The second inlet 162 is connected to the outside of the mixer 16 to a source of pressurized gas. In the mixer 16, the second inlet 162 is connected to an injector for injecting said gas into the internal pipe. The internal diameter of the injector is for example of the order of 2 mm with an outer diameter of about 4 mm. The mixer 16 thus has a shape of Y.

Dans un mode de réalisation avantageux, l'injecteur est positionné au centre de la canalisation interne du mélangeur 16, c'est-à-dire de manière concentrique par rapport à la canalisation interne. En outre, l'injecteur pénètre suffisamment dans la canalisation interne et son extrémité dans la canalisation interne est proche du rétrécissement conique 164 de la canalisation interne de sorte que l'injection du gaz sous pression au centre de la canalisation interne permet la création d'un fluide diphasique. Grâce à ce rétrécissement conique 164 le fluide diphasique est accéléré ce qui homogénéise la répartition des bulles de gaz. Le gaz injecté dans la seconde entrée 162 peut être un gaz neutre comme par exemple de l'azote ce qui permet de nettoyer des pièces en cuivre nu ou hautement oxydables comme par exemple des power-modules utilisés pour la gestion d'énergie dans des véhicules électriques. Également, le gaz injecté peut être un gaz protecteur ou réducteur. In an advantageous embodiment, the injector is positioned in the center of the internal pipe of the mixer 16, that is to say concentrically with respect to the internal pipe. In addition, the injector penetrates sufficiently into the internal pipe and its end in the inner pipe is close to the conical narrowing 164 of the inner pipe so that the injection of pressurized gas at the center of the internal pipe allows the creation of a two-phase fluid. Due to this conical narrowing 164 the two-phase fluid is accelerated which homogenizes the distribution of gas bubbles. The gas injected into the second inlet 162 may be a neutral gas, for example nitrogen, which makes it possible to clean bare or highly oxidizable copper parts, for example power modules used for energy management in vehicles. electric. Also, the injected gas may be a protective or reducing gas.

La pression du liquide injecté dans la première entrée 161 est de l'ordre de 3 à 5 bars (1 bar = 105 Pascals) avec un débit de 20 litres/min. La pression du gaz injecté dans la seconde entrée 162 est supérieure de 0,5 à 2 bars, préférentiellement de l'ordre de 1 bar, au-dessus de la pression du liquide et a un débit de l'ordre de 10 litres/min. Avantageusement, les débits et les pressions des entrées du mélangeur 16 sont réglables. The pressure of the liquid injected into the first inlet 161 is of the order of 3 to 5 bar (1 bar = 10 5 Pascals) with a flow rate of 20 liters / min. The pressure of the gas injected into the second inlet 162 is greater than 0.5 to 2 bar, preferably of the order of 1 bar, above the pressure of the liquid and has a flow rate of the order of 10 liters / min. . Advantageously, the flow rates and the pressures of the inputs of the mixer 16 are adjustable.

Le débit et la pression au sein du second dispositif hydraulique 14 ainsi qu'au niveau de la deuxième entrée 162 du mélangeur 16 sont suffisants pour répondre aux besoins de nettoyage des composants et/ou des circuits électroniques 6 à nettoyer.  The flow rate and the pressure within the second hydraulic device 14 as well as at the second inlet 162 of the mixer 16 are sufficient to meet the cleaning requirements of the components and / or the electronic circuits 6 to be cleaned.

Le système d'injection de fluide comporte deux réseaux de buses 1001 et 1003 immergés dans la première cuve 2. Ces deux réseaux de buses 1001 et 1003 présentent des buses 10 placées de sorte que les jets provenant de ces buses 10 soient des jets de liquide laminaires de forme cylindrique et arrivent perpendiculairement à la surface des composants et/ou des circuits électroniques 6 à nettoyer (cf. Figure 1 ).  The fluid injection system comprises two networks of nozzles 1001 and 1003 immersed in the first tank 2. These two networks of nozzles 1001 and 1003 have nozzles 10 placed so that the streams coming from these nozzles 10 are jets of liquid laminar cylindrical and arrive perpendicular to the surface of the components and / or electronic circuits 6 to clean (see Figure 1).

Lesdits réseaux de buses 1001 et 1003 sont constitués d'au moins une ligne comportant au moins une buse 10 et d'au moins une colonne comportant au moins une buse 10. Le nombre de buses 10, c'est-à-dire le nombre de lignes et de colonnes, sur les réseaux de buses 1001 et 1003 est modifiable en fonction de la taille des composants et/ou des circuits électroniques 6 à nettoyer.  Said nozzle networks 1001 and 1003 consist of at least one line comprising at least one nozzle 10 and at least one column comprising at least one nozzle 10. The number of nozzles 10, that is to say the number of lines and columns, the nozzle networks 1001 and 1003 can be modified according to the size of the components and / or the electronic circuits 6 to be cleaned.

De plus, afin de préserver les composants et/ou les circuits électroniques 6 à nettoyer de toutes contraintes mécaniques crées par la pulvérisation de liquide sur ses deux faces opposées les réseaux de buses 1001 et 1003 sont placés parallèlement aux composants et/ou aux circuits électroniques 6 à nettoyer de part et d'autre de ceux-ci (cf. Figure 1 ). Afin de protéger des composants et/ou des circuits électroniques 6 fragiles comme par exemple des semi-conducteurs sur Kapton souple la distance séparant les composants et/ou les circuits électroniques 6 à nettoyer de la buse est de l'ordre de 2 à 5 cm. Le réseau de buses 1003 est alimenté en fluide diphasique provenant du dispositif hydraulique 14 à l'aide d'un dispositif d'alimentation hydraulique 1002 reliant le premier réseau de buses 1001 au second réseau de buses 1003. La pression du jet de fluide diphasique au niveau des buses 10 est de préférence inférieure à 5 bars. Bien que relativement faible, cette pression permet un nettoyage efficace des composants ou cartes à nettoyer tout en garantissant de ne pas endommager les objets nettoyés. In addition, in order to preserve the components and / or the electronic circuits 6 to be cleaned of any mechanical stresses created by the spraying of liquid on its two opposite faces, the nozzle networks 1001 and 1003 are placed parallel to the components and / or the electronic circuits. 6 to be cleaned on both sides (see Figure 1). In order to protect fragile electronic components and / or circuits 6 such as soft Kapton semiconductors the distance separating the components and / or the electronic circuits 6 to be cleaned from the nozzle is of the order of 2 to 5 cm. The network of nozzles 1003 is supplied with two-phase fluid from the hydraulic device 14 by means of a hydraulic supply device 1002 connecting the first network of nozzles 1001 to the second network of nozzles 1003. The pressure of the two-phase fluid jet Nozzle level 10 is preferably less than 5 bar. Although relatively low, this pressure allows efficient cleaning of the components or cards to be cleaned while ensuring not to damage the cleaned objects.

Le dispositif d'alimentation hydraulique 1002 est situé de préférence en bas de la première cuve 2 sans toutefois toucher son fond horizontal inférieur 22 afin de ne pas gêner la circulation du liquide dans la première cuve 2.  The hydraulic feed device 1002 is preferably situated at the bottom of the first tank 2 without however touching its bottom horizontal bottom 22 so as not to hinder the circulation of the liquid in the first tank 2.

De plus, le premier réseau de buses 1001 et le second réseau de buses 1003 peuvent à l'aide d'un dispositif de balayage non représenté sur la Figure 1 effectuer un mouvement perpendiculaire au plan de la Figure 1 . Ce mouvement permet ainsi de balayer à l'aide des jets de fluides les faces des composants et/ou des circuits électroniques 6 à nettoyer à l'aide des deux réseaux de buses.  In addition, the first network of nozzles 1001 and the second network of nozzles 1003 can, with the aid of a scanning device not shown in FIG. 1, carry out a movement perpendicular to the plane of FIG. This movement thus makes it possible to sweep, using the fluid jets, the faces of the components and / or the electronic circuits 6 to be cleaned using the two networks of nozzles.

Ce dispositif de balayage peut également être couplé au mouvement des moyens de support 8. Les mouvements combinés favorisent alors l'élimination des résidus placés sous des circuits intégrés. De plus, l'élimination de résidus placés dans des trous de via est également améliorée à l'aide de cette technique.  This scanning device can also be coupled to the movement of the support means 8. The combined movements then favor the elimination of the residues placed under integrated circuits. In addition, the removal of residues placed in via holes is also improved using this technique.

En outre, la distance entre chaque réseau de buses et les composants et/ou les circuits électroniques 6 à nettoyer est déterminée de telle sorte que l'efficacité des jets de fluide diphasique soit maximale : celle-ci peut être par exemple de l'ordre de 5 à 10 cm.  In addition, the distance between each network of nozzles and the components and / or the electronic circuits 6 to be cleaned is determined in such a way that the efficiency of the two-phase fluid jets is maximum: this can be for example of the order from 5 to 10 cm.

Dans un autre exemple de réalisation, un dispositif de régulation de pression (non représenté sur les figures), utilisant par exemple des capteurs de pression, est utilisé pour contrôler la pression du liquide ainsi que celle du gaz. Afin d'améliorer les performances ainsi que la reproductibilité des nettoyages il peut être également utilisé un dispositif de régulation en température du liquide utilisant par exemple un capteur de température. Le gaz peut être par exemple à température ambiante. Toutefois, un contrôle de température du gaz peut aussi être envisagé. Ainsi, il est possible de contrôler parfaitement les caractéristiques du fluide diphasique. In another exemplary embodiment, a pressure regulating device (not shown in the figures), using for example pressure sensors, is used to control the pressure of the liquid as well as that of the gas. In order to improve the performances as well as the reproducibility of the cleanings, it is also possible to use a device for regulating the temperature of the liquid, for example using a temperature sensor. The gas may for example be at room temperature. However, a temperature control of the gas can also be considered. Thus, it is possible to perfectly control the characteristics of the two-phase fluid.

Un nettoyage efficace de cartes électroniques, et plus spécialement de cartes électroniques pour des applications avioniques, est maintenant possible grâce à un dispositif tel que décrit ci-dessus. En effet, l'utilisation d'un jet de fluide diphasique en lieu et place d'un générateur d'ultrasons permet au dispositif d'être efficace lors du nettoyage sans détériorer ou endommager les composants électroniques, même ceux contenant un quartz.  Effective cleaning of electronic boards, and more particularly electronic boards for avionics applications, is now possible through a device as described above. Indeed, the use of a diphasic fluid jet instead of an ultrasonic generator allows the device to be effective during cleaning without damaging or damaging electronic components, even those containing a quartz.

De plus, l'efficacité du jet diphasique étant indépendante de la nature des matériaux comme par exemple de la colle ou de la crème à braser, le nettoyage de masques de sérigraphie est optimisé grâce à un tel dispositif. Il a été remarqué que la présence de microbulles dans le fluide injecté par les buses sur les composants et/ou les circuits électroniques à nettoyer permettait une très grande efficacité de nettoyage même à rencontre de produits tels la colle réputés comme ne pouvant pas être éliminés par nettoyage.  Moreover, since the efficiency of the diphasic jet is independent of the nature of the materials, for example glue or solder cream, the cleaning of screen printing masks is optimized by such a device. It has been noticed that the presence of microbubbles in the fluid injected by the nozzles on the components and / or the electronic circuits to be cleaned allowed a very high cleaning efficiency even against products such as glue deemed to be impossible to be eliminated by cleaning.

On appréciera que l'invention n'est pas limitée par la nature et la forme de la ou des cuves. Également, la forme de réalisation du dispositif montré Figure 1 n'est qu'un exemple non limitatif. Les matériaux constituant les cuves peuvent être de nature différente que celle énoncée dans la description. Toute variante de réalisation techniquement envisageable à la portée de l'homme du métier peut être préférée aux modes de réalisation décrits. Ainsi, le nombre de filtres sur les canalisations hydrauliques ou le type de pompes n'est pas limité aux exemples donnés ici à titre purement illustratif.  It will be appreciated that the invention is not limited by the nature and shape of the vessel (s). Also, the embodiment of the device shown in Figure 1 is only a non-limiting example. The materials constituting the tanks may be of a different nature than that stated in the description. Any variant technically feasible embodiment within the scope of the skilled person may be preferred to the embodiments described. Thus, the number of filters on the hydraulic lines or the type of pumps is not limited to the examples given here for purely illustrative purposes.

La description ci-dessus a été donnée à titre illustratif seulement et n'est pas limitative de la portée de l'invention.  The above description has been given for illustrative purposes only and is not limiting of the scope of the invention.

Claims

REVENDICATIONS 1 . Dispositif spécifique de nettoyage (1 ) de composants et/ou de circuits électroniques (6), comprenant : 1. Specific device (1) for cleaning components and / or electronic circuits (6), comprising: - une première cuve (2) contenant un liquide,  a first tank (2) containing a liquid, - des moyens de support (8) permettant de tenir immergés les composants et/ou le circuit électronique (6) dans la première cuve (2), - support means (8) for immersing the components and / or the electronic circuit (6) in the first tank (2), - un système d'injection de fluide comportant des buses (10) permettant la projection de jets de fluide sur les composants et/ou le circuit électronique (6) à nettoyer, a fluid injection system comprising nozzles (10) for projecting fluid jets onto the components and / or the electronic circuit (6) to be cleaned, - des moyens permettant aux jets de fluide provenant des buses (10) de balayer la surface des composants et/ou du circuit électronique (6) à nettoyer,  means enabling the jets of fluid coming from the nozzles (10) to sweep the surface of the components and / or the electronic circuit (6) to be cleaned, caractérisé en ce qu'il comporte en outre un mélangeur (16) de fluides comportant une première entrée (161 ) adaptée pour recevoir un liquide sous pression, une seconde entrée (162) adaptée pour recevoir un gaz sous pression, une sortie (163) conçue pour alimenter en fluide diphasique le système d'injection, la première entrée (161 ) étant couplée à la sortie (163) à l'aide d'une canalisation interne, la seconde entrée (162) étant alimentée en gaz sous pression et reliée à un injecteur pour injecter ledit gaz dans la canalisation interne.  characterized in that it further comprises a fluid mixer (16) having a first inlet (161) adapted to receive a pressurized liquid, a second inlet (162) adapted to receive pressurized gas, an outlet (163) designed to supply two-phase fluid to the injection system, the first inlet (161) being coupled to the outlet (163) by means of an internal pipe, the second inlet (162) being supplied with pressurized gas and connected an injector for injecting said gas into the internal pipe. 2. Dispositif selon la revendication 1 , caractérisé en ce que le système d'injection est tel que la pression au niveau des buses (10) est inférieure ou égale à 5 bars. 2. Device according to claim 1, characterized in that the injection system is such that the pressure at the nozzles (10) is less than or equal to 5 bars. 3. Dispositif selon l'une des revendications 1 ou 2, caractérisé en ce que l'injecteur injecte le gaz sous pression au centre de la canalisation interne du mélangeur (16) de fluides. 3. Device according to one of claims 1 or 2, characterized in that the injector injects the gas under pressure in the center of the internal pipe of the mixer (16) of fluids. 4. Dispositif selon l'une des revendications 1 à 3, caractérisé en ce que la différence entre la pression du fluide et la pression du gaz à l'intérieur du mélangeur (16) de fluides est de l'ordre de 1 bar. 4. Device according to one of claims 1 to 3, characterized in that the difference between the pressure of the fluid and the pressure of the gas inside the mixer (16) fluids is of the order of 1 bar. 5. Dispositif selon l'une des revendications 1 à 4, caractérisé en ce que le dispositif de nettoyage comporte une cuve de débordement (4). 5. Device according to one of claims 1 to 4, characterized in that the cleaning device comprises an overflow tank (4). 6. Dispositif selon la revendication 5, caractérisé en ce qu'un dispositif hydraulique (14) connecte la cuve de débordement (4) au mélangeur (16) de fluides. 6. Device according to claim 5, characterized in that a hydraulic device (14) connects the overflow tank (4) to the fluid mixer (16). 7. Dispositif selon l'une des revendications 1 à 6, caractérisé en ce que le mélangeur (16) de fluides est placé en aval d'un filtre (F2). 7. Device according to one of claims 1 to 6, characterized in that the mixer (16) of fluids is placed downstream of a filter (F2). 8. Dispositif selon l'une des revendications 1 à 7, caractérisé en ce que le mélangeur (16) de fluides a une forme en Y. 8. Device according to one of claims 1 to 7, characterized in that the mixer (16) fluids has a Y shape. 9. Dispositif selon l'une des revendications 1 à 8, caractérisé en ce que le mélangeur (16) de fluides est placé en amont de la première cuve (2). 9. Device according to one of claims 1 to 8, characterized in that the mixer (16) of fluids is placed upstream of the first vessel (2). 10. Dispositif selon l'une des revendications 1 à 9, caractérisé en ce que les moyens permettant aux buses (10) de réaliser le balayage de la surface des composants et/ou du circuit électronique (6) comportent des moyens pour déplacer verticalement les moyens de support (8). 10. Device according to one of claims 1 to 9, characterized in that the means allowing the nozzles (10) to scan the surface of the components and / or the electronic circuit (6) comprise means for vertically moving the support means (8). 1 1 . Dispositif selon l'une des revendications 1 à 10, caractérisé en ce que le système d'injection de fluide comporte des moyens pour déplacer horizontalement les buses (10). 1 1. Device according to one of claims 1 to 10, characterized in that the fluid injection system comprises means for horizontally moving the nozzles (10). 12. Dispositif selon l'une des revendications 1 à 1 1 , caractérisé en ce que le système d'injection de fluide comporte deux réseaux de buses (1001 , 1003) reliés entre eux et placés des deux cotés des composants et/ou des circuits électroniques (6) à nettoyer. 12. Device according to one of claims 1 to 1 1, characterized in that the fluid injection system comprises two networks of nozzles (1001, 1003) interconnected and placed on both sides of the components and / or circuits electronic (6) to clean. 13. Dispositif selon l'une des revendications 1 à 12, caractérisé en ce que la distance séparant les composants et/ou le circuit électronique (6) des buses (10) est réglable. 13. Device according to one of claims 1 to 12, characterized in that the distance between the components and / or the electronic circuit (6) of the nozzles (10) is adjustable. 14. Dispositif selon l'une des revendications 1 à 1 3, caractérisé en ce que la canalisation interne du mélangeur (16) de fluides comporte un rétrécissement conique (164). 14. Device according to one of claims 1 to 1 3, characterized in that the internal pipe of the fluid mixer (16) comprises a conical narrowing (164). 15. Dispositif selon l'une des revendications 1 à 14, caractérisé en ce que le gaz sous pression injecté dans la seconde entrée (162) du mélangeur (16) de fluides est un gaz neutre. 15. Device according to one of claims 1 to 14, characterized in that the pressurized gas injected into the second inlet (162) of the mixer (16) of fluids is a neutral gas. 16. Dispositif selon l'une des revendications 1 à 1 5, caractérisé en ce que la canalisation interne du mélangeur (16) de fluides présente un diamètre compris entre 15 et 25 mm. 16. Device according to one of claims 1 to 1 5, characterized in that the internal pipe of the mixer (16) of fluids has a diameter of between 15 and 25 mm. 17. Dispositif selon l'une des revendications 1 à 16, caractérisé en ce que l'injecteur du mélangeur (16) présente un diamètre intérieur inférieur à 4mm. 17. Device according to one of claims 1 to 16, characterized in that the injector of the mixer (16) has an internal diameter of less than 4mm.
EP14731754.9A 2013-05-31 2014-05-28 Specific process for cleaning electronic components and/or circuits Active EP3003583B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SI201432004T SI3003583T1 (en) 2013-05-31 2014-05-28 Specific process for cleaning electronic components and/or circuits

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1355011A FR3006209B1 (en) 2013-05-31 2013-05-31 DEVICE AND METHOD FOR CLEANING PLATE-SHAPED OBJECTS
PCT/FR2014/051270 WO2014191690A1 (en) 2013-05-31 2014-05-28 Specific device for cleaning electronic components and/or circuits

Publications (2)

Publication Number Publication Date
EP3003583A1 true EP3003583A1 (en) 2016-04-13
EP3003583B1 EP3003583B1 (en) 2022-11-09

Family

ID=49274763

Family Applications (1)

Application Number Title Priority Date Filing Date
EP14731754.9A Active EP3003583B1 (en) 2013-05-31 2014-05-28 Specific process for cleaning electronic components and/or circuits

Country Status (9)

Country Link
US (1) US10099262B2 (en)
EP (1) EP3003583B1 (en)
CN (1) CN105408032A (en)
ES (1) ES2934153T3 (en)
FI (1) FI3003583T3 (en)
FR (1) FR3006209B1 (en)
HK (1) HK1222821A1 (en)
SI (1) SI3003583T1 (en)
WO (1) WO2014191690A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106862215B (en) * 2017-02-22 2020-05-08 京东方科技集团股份有限公司 Method for rinsing display panel by using rinsing machine
CN116021426A (en) * 2021-10-26 2023-04-28 联芯集成电路制造(厦门)有限公司 Wafer polishing pad cleaning process and polishing pad cleaning nozzle
CN115621803B (en) * 2022-01-18 2023-11-03 荣耀终端有限公司 Electronic equipment slot cleaning tool and electronic equipment slot cleaning method
CN116347784B (en) * 2023-04-03 2024-05-31 上海铭控传感技术有限公司 Electronic circuit board cleaning system and method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4863643A (en) * 1988-09-13 1989-09-05 Cochran David W Apparatus for dissolution of gas in liquid
SU1688948A1 (en) * 1989-07-04 1991-11-07 Институт Машиноведения Им.А.А.Благонравова Method of cleaning parts
JPH06210252A (en) * 1993-01-21 1994-08-02 Uchinami Techno Clean:Kk Underwater washing method and apparatus therefor
CN1150397A (en) * 1994-04-14 1997-05-21 株式会社东芝 Washing method and washing device
CN1197410A (en) * 1996-10-25 1998-10-28 和泉电气株式会社 Solution mixture process and appts. of gas and liquid
ATE259681T1 (en) * 1998-04-16 2004-03-15 Semitool Inc METHOD AND APPARATUS FOR TREATING A WORKPIECE, SUCH AS A SEMICONDUCTOR WAFER
FR2785558B1 (en) 1998-11-06 2001-01-12 Michel Pierre Bernard Bourdat CLEANING MACHINE FOR PLATES, ESPECIALLY SCREEN STENCILS
US7392814B2 (en) * 2004-12-24 2008-07-01 Dainippon Screen Mfg. Co., Ltd. Substrate processing apparatus and method
JP2008153322A (en) * 2006-12-15 2008-07-03 Dainippon Screen Mfg Co Ltd Two-fluid nozzle, substrate processing apparatus, and substrate processing method
US20080230092A1 (en) * 2007-03-23 2008-09-25 Alexander Sou-Kang Ko Method and apparatus for single-substrate cleaning
NO328780B1 (en) * 2007-11-15 2010-05-10 Yara Int Asa Apparatus and method for forming and distributing bubbles in a gas / liquid mixture
JP5290398B2 (en) * 2009-03-04 2013-09-18 日本碍子株式会社 Ultrasonic cleaning method and ultrasonic cleaning apparatus
JP2011192779A (en) * 2010-03-15 2011-09-29 Kurita Water Ind Ltd Method and system for cleaning electronic material
JP5872382B2 (en) * 2012-05-24 2016-03-01 ジルトロニック アクチエンゲゼルシャフトSiltronic AG Ultrasonic cleaning method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2014191690A1 *

Also Published As

Publication number Publication date
US10099262B2 (en) 2018-10-16
HK1222821A1 (en) 2017-07-14
FI3003583T3 (en) 2023-01-13
WO2014191690A1 (en) 2014-12-04
CN105408032A (en) 2016-03-16
ES2934153T3 (en) 2023-02-17
SI3003583T1 (en) 2023-01-31
FR3006209B1 (en) 2016-05-06
EP3003583B1 (en) 2022-11-09
FR3006209A1 (en) 2014-12-05
US20160114358A1 (en) 2016-04-28

Similar Documents

Publication Publication Date Title
EP3003583A1 (en) Specific device for cleaning electronic components and/or circuits
CN103118770B (en) Filter membrane cleaning method and film filter
EP1834708A3 (en) Substrate cleaning method, substrate cleaning system and program storage medium
FR2969997A1 (en) DEVICE FOR RECYLCING AND PROCESSING A WASHING WATER CHARGED WITH PARTICULATES, IN PARTICULAR CEMENTITIES
CN101530853A (en) Device and method for automatically cleaning silk-screen printing plate for solar cells
EP1126976B1 (en) Method and machine for cleaning objects in plate form
JP2008253373A (en) Ultrasonic cleaning device, dishwasher using the same, and ultrasonic cleaning method
US10994311B2 (en) Specific device for cleaning electronic components and/or circuits
EP1075878A1 (en) Flushing vessel with ultra-clean liquid
JPH1129794A5 (en)
CN103341324A (en) Cleaning method and cleaning system of tubular membrane
WO2007054360A1 (en) Liquid filtration system
CN102017063A (en) Wafer stack cleaning
CN205236539U (en) Ultrasonic cleaning machine
CN202134514U (en) An ultrasonic cleaning device for monocrystalline silicon wafers
TWI537085B (en) Flux cleaning method
CN203400890U (en) Flux cleaning unit
JP2016036785A (en) Cleaning device
CN102842486A (en) Ultrasonic washing device for single crystal silicon wafer
TW201330940A (en) Cleaning method
JP2012104682A (en) Cleaning apparatus
WO2006013284A1 (en) Automated system for ultrasonic cleaning or scouring submerged surfaces and in particular immersed parts of a boat
TWM369541U (en) Stage device
JP2000058495A (en) Substrate cleaning equipment
CN116116812A (en) Net belt transmission through type ultrasonic cleaning mechanism

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20151202

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

AX Request for extension of the european patent

Extension state: BA ME

DAX Request for extension of the european patent (deleted)
111L Licence recorded

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Free format text: EXCLUSIVE LICENSE

Name of requester: M.B. TECH, FR

Effective date: 20190315

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

RIC1 Information provided on ipc code assigned before grant

Ipc: B01F 3/04 20060101ALI20210323BHEP

Ipc: B01F 5/10 20060101ALI20210323BHEP

Ipc: B01F 5/04 20060101ALI20210323BHEP

Ipc: B08B 3/10 20060101ALI20210323BHEP

Ipc: B08B 3/04 20060101AFI20210323BHEP

INTG Intention to grant announced

Effective date: 20210408

GRAJ Information related to disapproval of communication of intention to grant by the applicant or resumption of examination proceedings by the epo deleted

Free format text: ORIGINAL CODE: EPIDOSDIGR1

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE

INTC Intention to grant announced (deleted)
GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

INTG Intention to grant announced

Effective date: 20211213

RIN1 Information on inventor provided before grant (corrected)

Inventor name: BOURDAT, MICHEL

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

111L Licence recorded

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Free format text: EXCLUSIVE LICENSE

Name of requester: M.B. TECH, FR

Effective date: 20190315

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

Ref country code: AT

Ref legal event code: REF

Ref document number: 1530017

Country of ref document: AT

Kind code of ref document: T

Effective date: 20221115

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602014085473

Country of ref document: DE

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: FRENCH

REG Reference to a national code

Ref country code: ES

Ref legal event code: FG2A

Ref document number: 2934153

Country of ref document: ES

Kind code of ref document: T3

Effective date: 20230217

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG9D

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20221109

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 1530017

Country of ref document: AT

Kind code of ref document: T

Effective date: 20221109

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20230309

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20230209

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: RS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20230309

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20230210

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SM

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602014085473

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

Ref country code: AL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20230810

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20230531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20230528

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20230531

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20230531

REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20230528

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20230528

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20230531

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20221109

REG Reference to a national code

Ref country code: DE

Ref legal event code: R082

Ref document number: 602014085473

Country of ref document: DE

Representative=s name: PLASSERAUD IP GMBH, DE

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20250313

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FI

Payment date: 20250423

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20250513

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20250521

Year of fee payment: 12

Ref country code: ES

Payment date: 20250610

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20250508

Year of fee payment: 12

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20140528

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: TR

Payment date: 20250516

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CZ

Payment date: 20250526

Year of fee payment: 12

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: SI

Payment date: 20250424

Year of fee payment: 12

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20140528