EP2098381B1 - Method and device for stamping workpieces - Google Patents

Description

The state of the art

The invention is based on a method for embossing along a preferably stationary transport path guided workpieces, for. As panels, with a film, preferably laminating or transfer film, z. B. hot stamping foil, wherein the workpieces surfaces, preferably formed as chamfer surfaces surfaces that extend on the workpieces along the transport path and be embossed. An embossing device arranged on the transport path is used which has at least two support rollers and a circumferentially driven embossing belt of silicone, elastomer, rubber or plastic which forms an embossing path in the area between the support rollers by means of pressure rollers. In the embossing path, the embossing of the surface to be embossed of the workpiece takes place while the relevant surface passes the embossing path along the transport path.

The invention is based on an embossing device, which for embossing guided along a transport path workpieces, for. As panels is formed. The embossing is carried out with a film, preferably laminating or transfer film, z. B. hot stamping foil, wherein the workpieces are embossed on surfaces which are preferably formed as chamfer surfaces. The chamfer surfaces extend along the transport route. The embossing device has at least two support rollers and a circumferential embossing belt made of silicone, elastomer, rubber or plastic, which in the area between the support rollers acted upon by pressure rollers forms an embossing path in which the embossing of the chamfer surface takes place while the surface of the workpiece to be embossed embossing path along the Transport route happened. In the embossing path, in the case of the use of a hot stamping foil, the foil is applied to the workpiece guided in the transport path under the influence of pressure and temperature via the embossing belt. In practice, this is called impressing or embossing the workpiece with the film.

Such devices for embossing are z. B. from the DE 41 21 766 C2 , of the DE 102 16 139 C1 and the DE 103 52 700 B3 known. These documents describe embossing devices each having two back-up rolls and a driven idler roll arranged in a triangle configuration with a circumferential embossing belt. These embossing devices each have an embossing path, which is formed between the two guide rollers. Between the two guide rollers, which form the so-called support rollers with which the embossing belt is pressed under pressure on the surface to be embossed of the workpiece, so-called stabilizing or stabilizing rollers can be arranged as pressure rollers, with their axes of rotation parallel to the axes of the support rollers. They are arranged with their outer surface of the support rollers and ensure that a uniform contact pressure of the embossing belt is realized over the entire embossing path formed between the two support rollers.

The embossing of workpieces with chamfered edges, which are designed to be constant over the length of the chamfers, can be carried out with the known embossing devices with high precision at high embossing speed.

However, if workpieces with a chamfer angle, ie an angularly chamfered edge, the configuration of which varies over the length of the chamfer, are to be embossed, the conventional embossing devices have complications in that the application of the film does not take place precisely and permanently.

The task

The invention has for its object to provide a stamping method and an embossing device, which allow a proper embossing of surfaces whose configuration varies over the length.

The solution according to the invention

This object is achieved by the invention with a stamping method according to patent claim 1 and a stamping device according to patent claim 16.

This solution provides that the pressure layer of the embossing belt is secured and supported on the surface to be embossed in the embossing path in the area between the support rollers via pressure rollers. The pressure rollers are arranged between the support rollers and act on the embossing belt in the region of the embossing path, by rolling on the embossing belt in the section of the embossing path on the side of the embossing belt which faces away from the film. The pressure rollers are tracked depending on the variation of the design of the area to be embossed. By varying the configuration of the surface to be embossed, it is to be understood that the area to be embossed, over its length running along the transport path, has an irregular course in its shape design, ie, a variation, for example, in the shape of the surface. B. with regard to the distance position and / or the angular position. The tracking of the pressure rollers means that the pressure rollers are tracked with their outer surfaces forming the pressure surfaces on the embossing belt, depending on the variation of the configuration of the surface to be embossed, ie, for example, with respect to their distance position and / or their angular position of the surface to be embossed. This can be done by the pressure rollers are mounted correspondingly movable, so that their axes of rotation are mounted slidably in terms of their distance position and / or their angular position in the embossing device. Additionally or alternatively, the tracking of the pressure rollers can take place in that they have a correspondingly elastically deformable jacket. With the elastic deformation of the shell is in a similar manner as in the mobile storage of the pressure rollers ultimately the outer surface of the pressure rollers, which form the pressure surface to the embossing belt, tracked according to the variation of the surface to be embossed. Instead of a plurality of pressure rollers between the support rollers, only one pressure roller can be provided, ie, the single pressure roller can replace the plurality of pressure rollers. It can be tracked in the same way or the same way as the multiple pressure rollers.

In order to ensure a safe tracking, the tracking is preferably carried out automatically, for. B. by the movably mounted pressure rollers are spring-loaded, motor, in particular servo motor, z. B. with electronically controlled and controlled servomotors or pneumatically controlled.

Preferably, the pressure rollers are in their maximum extended position with its outer surface, which form the pressure surfaces for embossing belt, spaced above the tangential plane of the support rollers. In the maximum retracted position, the pressure rollers are preferably arranged with their pressure surfaces in the region of the tangential plane of the support rollers. The embossing process is usually under the pressure effect of the pressure rollers when they are arranged protruding in a more or less extended position with their contact surfaces on the tangential plane of the support rollers and roll on the inside of the adjacent to the surface to be embossed with the interposition of the film embossing belt. Extending beyond the tangential plane means that the pressure surfaces of the pressure rollers are arranged at least in sections on the side of the tangential plane facing the embossing belt. This arrangement relative to the tangential plane of the support rollers is preferably in question, when the tangential plane is arranged stationary to the transport path. However, embodiments are also conceivable in which the support rollers are similar to the pressure rollers to some extent traceable and thus their tangential plane is not stationary.

The measure of the distance position of the pressure rollers to the tangential plane is chosen depending on the distance of the support rollers, in such a way that the embossing belt in its course between the first support roller and the adjacent first pressure roller forms an acute angle with the tangential plane of the support rollers. A shallow angle is sought in order to ensure that the workpiece passing through the embossing device is well entrained with the embossing belt and that disadvantageous jerking of the workpiece and uneven course of the embossing belt are prevented. Preferably, an angle is adjusted by 1 ° to 3 °. This corresponds to a distance between the outer side of the pressure rollers and the tangential plane of the support rollers of the order of 1.5 mm with an axial distance of the support rollers of 20 mm.

In preferred embodiments it is provided that the pressure rollers are guided in the course of tracking so that the embossing belt acting outside of the pressure rollers in a maximum retracted position and / or a maximum compressed operating state of the pressure rollers extends at least approximately in the region of the tangential plane of the support rollers.

In order to obtain a precise and fast tracking of the pressure rollers depending on the variation of the configuration of the surface to be embossed, the tracking of the pressure rollers takes place individually or in groups, preferably independently of one another. This can be done via separate movable storage of the individual pressure rollers or separate movable storage of the pressure roller groups. The individual pressure rollers or pressure roller groups are in this case preferably mounted movably to the tangential plane of the support rollers. The individual pressure rollers or the pressure roller groups can thus be tracked independently of each other. The deflection of the pressure rollers can be done by spring action and / or motor loading, preferably with separate spring or Motorbeaufschlagung the individual pressure rollers or pressure roller groups. It can be preferably provided for the movable bearing, that the pivot bearing of the pressure rollers spring-loaded directly or indirectly and / or motor-mounted movable are. It can also be provided that the pivot bearing of the pressure rollers are movably mounted in a carrier and / or housing of the embossing device.

In order to form the embossing path as long as possible and to obtain the best possible resolution, the outside diameter of the pressure rollers is preferably chosen to be relatively small in comparison to the diameter of the support rollers.

In preferred embodiments, it is provided that the tracking of the pressure rollers takes place by means of a link with sliding guide, in which a pivot bearing of the pressure roller is guided. It can be advantageously provided that the backdrop in relation to the tangential plane of the support rollers and / or in relation to the transport path is kept movable or immovable.

In preferred embodiments, it is provided that the embossing device and / or the support rollers is arranged stationary to the transport path.

It can be provided that the position of the embossing device and / or the support rollers is adjusted in the course of tracking with respect to the transport path, preferably under spring action and / or via another control.

As far as the surface to be embossed is concerned, it may be a matter of various surfaces of the workpieces, in particular beveled surfaces of the workpieces. The workpieces may be formed as a plate-shaped body, for. B. panels. As regards the variation of the configuration of the surface to be embossed, it can be provided that the variation of the configuration of the surface to be embossed is designed according to a predetermined desired variation. It can be provided that the desired variation has periodic repetitions. It can also be provided that the variation of the design of the surface to be embossed consists of a desired variation and a composed production error-related variation, wherein the target variation is greater than the production error-induced variation is formed.

The variation of the configuration of the surface to be embossed can be designed with regard to the angular position and / or the distance with respect to the position of the transport path. It is possible in this case that the configuration of the surface to be embossed is already varied for a single workpiece and / or that the design of the surface to be embossed is varied for at least two successive workpieces, i. the design of the surface to be embossed of the first workpiece is different than the configuration of the surface to be embossed of the subsequent workpiece.

In all the described embodiments can also be provided that between the support rollers only a pressure roller is arranged, which is tracked in the same or corresponding manner. The term used "pressure rollers arranged between the backup rolls" is in this sense, i. also to be understood in the sense of "a pressure roller arranged between the support rollers".

Embodiments will be described below with reference to figures.

Figur 1

eine schematische Draufsicht einer Prägevorrichtung mit Prägeeinrichtung und Peripherieeinrichtungen

Figur 1 a

eine Detaildraufsicht der Prägeeinrichtung in Figur 1 mit zur Tangentialebene der Stützwalzen in ihrer Höhenposition beweglich gelagerten Druckrollen

Figur 1b1

eine Detaildraufsicht einer alternativen Ausführung der Prägeeinrichtung in Figur 1 mit zur Tangentialebene der Stützwalzen in ihrer Winkelposition beweglich gelagerten Druckrollen

Figur 1b2

eine Detailfrontansicht einer der Druckrollen in Figur 1b mit schwenkbarer Kulissenführung

Figur 2

eine Draufsicht auf eine Paneele mit an gegenüberliegenden Seiten jeweils abgefaster Kante mit einer Fasenfläche mit über die Länge der Fase variiertem Fasenwinkel

Figur 2a

eine Schnittansicht in Schnittebene entlang der Schnittlinie A-A in Figur 2

Figur 2b

eine Schnittansicht in Schnittebene entlang der Schnittlinie B-B in Figur 2

Figur 2c

eine Schnittansicht in Schnittebene entlang der Schnittlinie C-C in Figur 2

Figur 2x

eine schematische Schnittansicht in Schnittebene entlang der Schnittlinie X-X in Figur 1, wobei ausschnittsweise eine Paneele in der Ausführung gemäß Figur 2 und eine mit der Fasenfläche zusammenwirkende Prägeeinrichtung mit dazwischen angeordneter Transferfolie gezeigt ist

Figur 3

eine Figur 2 entsprechende Draufsicht auf eine Paneele mit an gegenüberliegenden Seiten abgefaster Kante mit jeweils zwei aneinander angrenzenden, winkelig zueinander angeordneten Fasenflächen, wobei eine Fasenfläche über ihre Länge im Winkel variiert

Figur 3a

eine Schnittansicht in Schnittebene entlang der Schnittlinie A-A in Figur 3

Figur 3b

eine Schnittansicht in Schnittebene entlang der Schnittlinie B-B in Figur 3

Figur 3c

eine Schnittansicht in Schnittebene entlang der Schnittlinie C-C in Figur 3

Figur 3x

eine Figur 2x entsprechende schematische Schnittansicht in Schnittebene entlang der Schnittlinie X-X in Figur 1, wobei ausschnittsweise eine Paneele in der Ausführung gemäß Figur 3 und eine mit den Fasenflächen zusammenwirkende Prägeeinrichtung mit dazwischen angeordneter Transferfolie gezeigt ist

Figur 3y

eine Schnittansicht entsprechend Figur 3x, wobei aber im Unterschied zu Figur 3 zwei separate Prägeeinrichtungen mit gemeinsamer dazwischen angeordneter Transferfolie gezeigt ist.

Figur 3z

eine Schnittansicht entsprechend Figur 3y, wobei aber im Unterschied zu Figur 3y zwei separate Transferfolien zum Beprägen der beiden Fasenflächen vorgesehen sind

Figur 4

eine Figur 2 entsprechende Draufsicht auf eine Paneele mit an gegenüberliegenden Seiten abgefaster Kante mit jeweils zwei aneinander angrenzenden, winkelig zueinander angeordneten Fasenflächen, wobei eine Fasenfläche über ihre Länge in der Tiefe variiert

Figur 4a

eine Schnittansicht in Schnittebene entlang der Schnittlinie A-A in Figur 4

Figur 4b

eine Schnittansicht in Schnittebene entlang der Schnittlinie B-B in Figur 4

Figur 4c

eine Schnittansicht in Schnittebene entlang der Schnittlinie C-C in Figur 4

Figur 5

eine schematische Draufsicht einer Prägevorrichtung entsprechend Figur 1, wobei jedoch die Prägevorrichtung zwei hintereinander geschaltete Prägeeinrichtungen aufweist

Show

FIG. 1

a schematic plan view of an embossing device with embossing device and peripheral devices

FIG. 1 a

a detailed plan view of the embossing device in FIG. 1 with pressure rollers movably mounted in its height position to the tangential plane of the support rollers

FIG. 1b1

a detailed plan view of an alternative embodiment of the embossing device in FIG. 1 with pressure rollers movably mounted in its angular position to the tangential plane of the support rollers

FIG. 1b2

a detail front view of one of the pressure rollers in FIG. 1b with swivel slotted guide

FIG. 2

a plan view of a panel with at opposite sides each chamfered edge with a chamfer surface with varied over the length of the chamfer chamfer angle

FIG. 2a

a sectional view in section plane along the section line AA in FIG. 2

FIG. 2b

a sectional view in section plane along the section line BB in FIG. 2

Figure 2c

a sectional view in section plane along the section line CC in FIG. 2

Figure 2x

a schematic sectional view in section plane along the section line XX in FIG. 1 , wherein a detail of a panel in the embodiment according to FIG. 2 and an embossing means cooperating with the chamfer surface is shown with transfer foil disposed therebetween

FIG. 3

a FIG. 2 corresponding plan view of a panel with abgefaster on opposite sides edge with two adjacent, angularly arranged to each other Chamfer surfaces, wherein a chamfer surface varies in angle over its length

FIG. 3a

a sectional view in section plane along the section line AA in FIG. 3

FIG. 3b

a sectional view in section plane along the section line BB in FIG. 3

Figure 3c

a sectional view in section plane along the section line CC in FIG. 3

FIG. 3x

a Figure 2x corresponding schematic sectional view in section plane along the section line XX in FIG. 1 , wherein a detail of a panel in the embodiment according to FIG. 3 and an embossing means cooperating with the chamfer surfaces is shown with transfer foil disposed therebetween

Figure 3y

a sectional view accordingly FIG. 3x , but unlike FIG. 3 two separate embossing means with a common transfer film arranged therebetween is shown.

Figure 3z

a sectional view accordingly Figure 3y , but unlike Figure 3y two separate transfer sheets are provided for embossing the two chamfer surfaces

FIG. 4

a FIG. 2 corresponding plan view of a panel with abgefaster on opposite sides edge with two adjacent, angularly arranged to each other Bevel surfaces, wherein a chamfer surface varies in depth over its length

FIG. 4a

a sectional view in section plane along the section line AA in FIG. 4

FIG. 4b

a sectional view in section plane along the section line BB in FIG. 4

Figure 4c

a sectional view in section plane along the section line CC in FIG. 4

FIG. 5

a schematic plan view of an embossing device according to FIG. 1 However, wherein the embossing device comprises two successive embossing means

The structure and operation of the embossing device with reference to FIG. 1

The embossing device in FIG. 1 comprises an embossing device 1, which is arranged on a transport path 2. Along the transport path 2 to be impressed workpieces 3 are performed.

The embossing device 1 is formed of two support rollers 1a, a deflection roller 1b and a circumferentially driven around these three rollers support body belt, referred to in the following embossing belt 1c. The embossing band 1c is designed as a silicone band. A metal reinforcement of the silicone strip is possible and preferred in order to increase the mechanical stability of the silicone strip. Likewise, an embodiment with elastomers, rubbers or plastics in question, in principle so materials that have similar properties as silicones, namely a high temperature resistance and as constant and easily adjustable elasticity over the highest possible temperature range.

The embossing device 1 has as in FIG. 1 recognizable, triangle configuration, that is, the two support rollers 1a and the guide roller 1b are arranged in a triangular configuration, so that the circumferential embossing belt 1c has a substantially triangular orbit. In the region of the base side between the two support rollers 1a, the embossing path 1p of the embossing device 1 is arranged, specifically in a section of the outer surface of the embossing belt 1c, which is acted upon by the three pressure rollers 1d.

In the triangle configuration enclosed by the stamping tape 1c, in each case a heating device 1h is arranged in the region of the two legs relative to the deflection roller 1b. This ensures that the embossing belt 1 c is heated and thus in the embossing path 1 p of the embossing process can be carried out under the action of pressure and temperature. This is necessary in the use of a hot stamping foil so that during the embossing process the transfer layer of the hot stamping foil is properly detached from the carrier foil and impressed on the surface of the workpiece to be embossed. By the heaters 1h the embossing belt 1 c is heated. During the circulation of the embossing belt 1 c in the orbit cools the embossing belt in the embossing path 1p in its longitudinal extent.

An essential feature of the embossing device 1 is that between the support rollers 1a, the pressure rollers 1d are arranged, which deflect the embossing belt 1c to the surface to be printed of the workpiece 3 to the outside and there press on the surface to be embossed, so that the pressure rollers in their Position can be tracked if the configuration of the surface to be embossed varies with respect to their distance position and / or angular position along the embossing path, as is the case with the workpieces used and in conjunction with the Figures 2 and 3 is explained. This tracking of the pressure rollers 1d takes place in FIG. 1 on the spring loading of the pressure rollers automatically. Different embodiments of embossing devices, which differ by different construction of the pressure roller device, will still be in connection with the FIGS. 1a, 1b, 1c . 2x . 3x . 3y and 3z described in detail.

First, reference will continue to be made to FIG. 1 in order to first describe the embossing process and the function of the embossing device 1 in more detail. The embossing section 1 p of the embossing device 1 is arranged along the transport path 2. The transport route 2 is part of an in FIG. 1 Transport device, not shown, in which the workpieces 3 arranged one behind the other are moved past the embossing devices 1, 1 at a feed speed. The feed rate corresponds to the rotational speed of the embossing belt 1c. The workpieces 3 are arranged fixed in the transport path 2 on a not shown in detail with the relevant feed speed driven conveyor belt. The attachment is such that the workpieces 3 are taken with the conveyor belt without play and are fixed in position on the conveyor belt in the longitudinal and transverse directions. This fixation can take place, for example, in that the workpieces are braced via fastening elements with the conveyor belt or are fixed on the surface of the conveyor belt via a suction device in conjunction with frictional engagement.

In the embossing process, the chamfer surface of the workpieces 3 is stamped with a foil 4. In the illustrated examples, the film 4 is in each case designed as a hot embossing film which has a transfer layer 4a and a carrier film 4b.

The stamping foil 4 is in FIG. 1 supplied from a film feeding device 5a of the embossing device 1. The film feed device 5a comprises a film unwinder 5a1 and a plurality of deflection rollers 5a2. The stamping foil 4 is the embossing device 1 in FIG. 1 fed so that the embossing device 1 is passed from the workpieces 3 from left to right. The embossing device 1 forms the embossing path 1p in which the workpieces which have just been passed through the embossing device 1 are embossed with the embossing film 4 which is just passing. The embossing path 1p is formed by the pressure region of the embossing belt 1c on the workpiece to be embossed. This pressure area is formed on the outside of the embossing belt 1 c in the outer region of the pressure rollers 1d. The embossing path 1c thus extends in the area between the two terminal pressure rollers 1d. The pressure rollers 1d are roller-shaped rollers. They are mounted axially parallel to the support rollers 1a and have a smaller diameter than the support rollers.

In the embossing process, which takes place in the region of the embossing path, the transfer layer 4a is impressed under the action of pressure and elevated temperature on the surface 3a to be embossed of the workpiece 3 and detached from the carrier film 4b when using a hot stamping foil 4 with transfer layer 4a and carrier film 4b.

The untransferred carrier film 4b is drawn off as waste via the film removal device 5b at the end of the second embossing device 1 from the embossed surface. The Folienabführeinrichtung 5b has for this purpose in FIG. 1 a film unwinder 5b1, which peels off the carrier film 4b via deflection rollers 5b2 and winds on a cross-wound bobbin of the film unwinder 5b1.

The workpieces in the embodiments of Figures 2, 3 and 4

The workpieces 3 used in the present case are in the form of panels, preferably floor panels, which each have a chamfered edge on opposite sides. In the Figures 2 and 3 Two embodiments of panels are shown.

At the in FIG. 2 shown first embodiment of the panel 3 is on the opposite sides of the edge each chamfered to form a Chamfer surface 3a, wherein the chamfer angle α varies over the length of the chamfer. In the sectional views in the Figures 2a, 2b and 2c it is shown that the bevel angles α are different at the three interfaces. The lower edge of the chamfer surface 3a is parallel to the plane of the panels or parallel to the flat bottom and top edges of the panels and thus linear. In this case, however, the upper edge of the chamfer surface is not linear due to the variation of the flank angle, in the case shown in a wave structure running.

At the in FIG. 3 illustrated second embodiment of the panels 3, the two opposite edges are also chamfered, but in contrast to FIG. 2 such that in each case 2 chamfer surfaces 3a1, 3a2 adjoin each other at an angle. The upper chamfer surface 3a1 has the chamfer angle α1 and the lower chamfer surface the chamfer angle α2, wherein both the chamfer angle α1 and the chamfer angle α2 varies over the length of the chamfer, as shown in the sectional views in FIG Figures 3a, 3b and 3c can be seen.

At the in FIG. 4 illustrated third embodiment of the panel 3, the chamfer surface 3a varies not in their angle, but in their depth, because the chamfer surface 3a by a (not shown) milling head was produced, which is oszilierend "more" or "deeply immersed" in the wood, while its angular position to the panel is kept constant. This results in characteristic "mountains" and "valleys" in the chamfer surface 3a with symmetrically running edges, such as FIG. 4 in plan view in conjunction with the sectional views of Figures 4a, 4b and 4c shows. As can be seen in the figures, the lower chamfer surface 3a2 extends at a constant chamfer angle in a common plane in alignment over the entire length of the panels. The upper chamfer surface 3a1 is wave-like with troughs and wave crests, but the chamfer angle always remains constant. For the upper chamfer surface 3a1, there is a broad extension in the region of the wave troughs and a less broad extension in the region of the wave crests. For the lower chamfer surface 3a2 the situation reversed. FIG. 4b FIG. 12 is a sectional view in a wide-width region of the upper land surface 3a1. FIG. Figure 4c FIG. 12 is a sectional view in a narrow widthwise area of the upper land surface 3a1 and FIG FIG. 4a a sectional view in a region of average width extension of the upper chamfer surface 3a1.

In order to obtain a uniform embossing of the chamfer surface running irregularly over its length, it is provided that the embossing device 1, as described with reference to FIGS FIG. 1 already described, a pressure roller device whose pressure rollers 1d are mounted in the embossing device 1 so that they are tracked during the embossing process the irregular course of the surface to be embossed

The embossing devices in the embodiments of Figures 1a, 1b1 and 1b2

In FIG. 1a and in FIGS. 1b1 and 1b2 two different embodiments of such embossing device 1 are shown. They differ in each case in the pressure roller device.

In the embodiment in FIG. 1a the pressure rollers 1d are mounted so that they are movable with respect to their distance position Ix to the stationary tangential plane V of the support rollers 1 a. The stationary tangential plane V is the tangential plane of the outer sides of the support rollers 1a, between which the embossing belt 1 c is clamped to form the embossing path 1p. On the pivot bearing 1l of the pressure rollers 1d act compression springs 1f. These are based on stationary in the embossing device and thereby act on the pivot bearing 1l to the inside of the embossing belt 1c out and the rotational position 1l and or the compression springs 1f are guided in perpendicular to the stationary tangential plane V extending sliding bearings 1s, wherein at the ends of the pressure rollers 1d arranged pivot bearing 1l are guided in opposite sliding bearings 1s.

By the spring action of the pivot bearing 1 l, the pressure rollers 1 d are respectively urged outward and extended more or less against the tangential plane V of the support roller. The outer edge of the pressure rollers 1d acting on the embossing belt 1c are at a distance above the stationary tangential plane V of the support rollers 1a. They form the tangential plane T, as in FIG. 1a recognizable, at a distance parallel to the tangent plane V is arranged.

In the embossing device of the embossing device 1, the pressure rollers 1d are driven so far outward under the action of the springs 1f that they deflect the embossing belt 1c in contact with the surface to be embossed and press it, while unrolling on the underside of the embossing belt. The counterpressure forms the surface to be embossed of the guided in the transport path 2 workpiece 3 (see FIG. 1 ). It should also be mentioned that the sliding guides 1s, in which the individual pressure rollers 1d are mounted with their pivot bearings, are each designed as separate sliding bearings 1s and thus the individual pressure rollers 1d in the embossing position each depend on the respective location of the respective elements to be embossed Area can be extended. Depending on the angular position of the surface to be embossed, the pressure rollers 1d can thus also be angularly pivoted, in that the terminal pivot bearings 1l of the pressure rollers assume different vertical positions in the opposite sliding bearings 1s.

In the embodiment of the embossing device in FIGS. 1b1 and 1b2 the pressure rollers 1d are guided in a pivotable link device 1k. Here are the pivot bearing 1l of the pressure rollers 1 d guided in opposite guide slots of the link device 1 k and not shown springs 1f, as in FIG. 1 , also spring-loaded to the inside of the embossing belt 1c. In this case, the pressure rollers 1d are angularly displaced with their axis of rotation relative to the tangential plane V of the support rollers, namely by adjusting one of the angular positions of the deflection surface wx corresponding to the area to be embossed. Advantage of this over the Embodiment in FIG. 1a is that a particularly accurate and fast-response tracking is guaranteed, especially when taking place over a short distance large changes in angle of the surface to be printed. In contrast, in the embodiment in FIG. 1a ensures a particularly accurate and fast response tracking when the distance position of the area to be embossed varies particularly strong.

The stamping of the embossing device according to FIG 2x

Figure 2x shows the embossing device 1 in the imprinting on a panel according to FIG. 2 ie with chamfered edge with a chamfer surface 3a. As can be seen, the pressure roller is pivoted in the illustrated embossing position with respect to the tangential plane V of the support rollers 1a by the deflection angle wx. As well as in FIG. 1b2 can be seen, is the pivot point for pivoting the support rollers 1a at or near the corner 3a1 of the angularly varying chamfer surface 3a.

As in Figure 2x recognizable, the width of the embossing belt 1c is greater than the width of the beveled surface 3a to be embossed. The width of the embossing belt 1c is selected so that it is wider than the maximum width of the chamfer surface 3a. The same applies to the axial extent of the pressure roller 1d. As in FIG. 2 in conjunction with the sectional views in the Figures 2a, 2b, and 2c Namely, the width of the chamfer surface 3a varies over the length of the chamfer. Therefore, the width of the transfer film 4 is greater than the maximum width of the chamfered beveled surface 3a of the workpiece selected. The transfer film 4 projects over the beveled chamfer surface 3a on both sides in the imprinting position.

The embossing takes place exclusively in the region in which the embossing belt 1c comes to rest during the embossing process under pressure on the chamfer surface 3a and the intermediate transfer film. The remaining portions of the film, which are not applied to the chamfer surface 3a, remain on the support film 4b as non-distinctive components and adhere to the projecting distinct components at the edge of the chamfer surface 3a. They are removed in the embossing process subsequent steps on brushes or the like.

The embossing of the embossing devices according to the figures 3x, 3y and 3z

FIG. 3x shows the embossing of an embossing device when embossing a panel according to FIG. 3 ie with chamfered edge with two chamfer surfaces 3a1, 3a2. At the in FIG. 3x The embossing device 1 used is the tracking of the pressure rollers 1 and the embossing belt 1c characterized in that both the embossing belt and the peripheral skirt of the pressure rollers 1 d are elastically deformable so that they are adapted to the angular configuration of the chamfer over the length the chamfer changes, adapt by appropriate elastic deformation. In the central axis of rotation, the pressure roller 1d is rigid, ie not deformable. As in FIG. 3x shown, the elastic deformation is realized only in the circumferential shell of the pressure roller 1 d with rigid linear axis of rotation. In a corresponding manner, also the embossing band 1 c is elastically deformed. As in FIG. 3x recognizable, the embossing of the two chamfer surfaces 3a1, 3a2, which are at an obtuse angle with each other, takes place with a common foil 4. This foil 4 has a width which covers the width of the two chamfer surfaces 3a1 and 3a2 and, as in FIG Figure 2x something overhangs on the edge. As for the width of the embossing belt 1 c, applies to the embodiment of FIG. 3x corresponding, as above for the embodiment of Figure 2x explained.

The Figures 3y and 3z also show the Prägestellung when embossing a panel of FIG. 3 , In contrast to the embodiment in FIG. 3x however, are in the Figures 3y and 3z the upper chamfer surface 3a1 and the lower chamfer surface 3a2 are each assigned separate embossing means 1,1. The embossing devices 1, 1 are arranged such that the embossing lines are arranged at an angle to one another, namely at an angle corresponding to the obtuse angle formed by the two adjoining chamfer surfaces 3a1 and 3a2. This means that the embossing path 1p of the first embossing device 1 lies in the plane of the first chamfer surface 3a1 and the embossing path 1p of the first embossing device 3a second embossing device 1 lies in the plane of the second chamfer surface 3a2. The embossing lines 1 p thus form the same obtuse angle with each other as the planes of the chamfer surfaces 3a1, 3a2.

The two embossing devices 1.1 in Figure 3y are preferably arranged close to each other. They can be combined as a common unit, for example with a common carrier, wherein the embossing means are arranged directly adjacent to each other at an angle to each other. However, this arrangement without offset of the embossing lines in the longitudinal direction is only possible if the width dimensions of the embossing devices 1.1 allow this. Such a side-by-side arrangement is particularly suitable when the obtuse angle formed by the chamfer surfaces 3a1 and 3a2 is relatively small.

alternative to Figure 3y For example, instead of directly next to one another, the embossing devices 1, 1 arranged in angled planes relative to one another can be arranged offset to one another in the longitudinal direction of the embossing path 1 p. This is the universally applicable design which is always possible when the angle formed by the chamfer surfaces 3a1, 3a2 adjacent one another is not sufficiently obtuse or the embossing means 1,1 are too wide to be disposed immediately adjacent to each other. In this alternative embodiment, therefore, the embossing means 1,1 are arranged one behind the other in the longitudinal direction of the embossing line, and as close as possible, so that the parallel staggered embossing 1 p follow the embossing means with only a very small clearance in the longitudinal direction of each other. The minimum clearance is on the order of the sum of the two half diameters of the successive terminal backup rollers of the two embossing devices. Due to the smallest possible clear distance, a better handling of the embossing foil 4 is achieved with a stamping foil 4 common to both embossing devices 1, so that this embossing foil 4 practically can not warp or wrinkle within the small clear distance and thus the embossing process in each case second embossing device is not adversely affected.

In Figure 3z takes place, as can be seen, the embossing of the two chamfer surfaces 3a1 and 3a2 in contrast to Figure 3y not with a common stamping foil 4, but with two separate stamping foils 4. The angular arrangement of the stamping devices 1, 1 and stamping lines 1p is the same as that in FIG Figure 3y is available. In this case, however, the two embossing devices 1, 1 are each fed with a separate embossing foil 4, preferably via a respective separate foil feed device for each embossing device. The embossing devices 1,1 can according to the Figure 3y be discussed criteria either immediately adjacent to each other angularly adjacent to each other or arranged one behind the other in the longitudinal direction to each other.

In addition, it should be mentioned that at all in the Figures 2x . 3x . 3y and 3z arrangements shown, instead of the respective one embossing device 1 for each bevel surface a1 and a2 also a plurality of embossing means 1 for each chamfer surface in the longitudinal direction of the embossing path 1p successively offset, but can be arranged linearly aligned with each other. With such double, triple or multiple embossing devices a higher embossing speed is possible. The embossing devices assigned in succession to the respective chamfer surfaces thus each form a composite embossing path, which is composed of the embossing paths 1p of the individual embossing devices arranged one behind the other in a line in succession. This allows the increase of the embossing speed.

The structure and operation of the embossing device with double embossing device with reference to FIG. 5

In FIG. 4 is an embossing device accordingly FIG. 1 shown, however, equipped with two successively arranged embossing means 1,1 for the embossment of a chamfer surface of the workpiece 3. The embossing device 1,1, as can be seen, constructed identically. They are the same design as the embossing device in FIG. 1 , The embossing devices 1.1 in FIG. 4 are along the Transport distance 2 offset arranged one behind the other. The device in FIG. 4 also has Folienzuführ- and Folienabführeinrichtungen 5a and 5b, as well as in FIG. 1 are provided.

If the embossing devices 1, 1 each operate with separate embossing foils, ie in their embossing path 1 p each transfer a separate embossing foil assigned to them, separate embossing devices 1 and 2 are required for the embossing devices 1, 1. Essential in the sequential arrangement of the embossing means is that on the one hand due to the composite extended embossing lines higher embossing speeds and thus higher production rates are possible and on the other hand with the composite embossing line a particularly accurate embossing of such areas is possible, which vary in their design over the length of the embossing surface , Because of the extended composite embossing path, namely a plurality of pressure rollers 1d, each of which follows the variation of the course of the embossing path, are provided. This allows a finer division of the embossing path and improved tracking of the pressure rollers or embossing belt.

LIST OF REFERENCE NUMBERS

1

embosser

1a

supporting roll

1b

deflecting

1c

embossing tape

1d

pressure roller

1l

Swivel bearing of the pressure roller

1 k

scenery

1s

sliding bearings

1f

feather

1p

embossing section

1 h

heater

lx

Auslenkstrecke

wx

angle of deflection

2

transport distance

3

workpiece

3a1

chamfer

3a2

chamfer

4

stamping foil

4a

transfer layer

4b

support film

5a

Sheet feeder

5a1

ribbon supply hub

5a2

guide rollers

5b

Foil take-off device

5b1

foil take

5b2

guide rollers

V

Tangential plane of the support rollers 1a

T

Tangential plane of the pressure rollers 1d

Claims (17)

1. Process for the punching of work pieces (3) which are guided along a preferably stationary transport route (2), e.g. panels, with foil, preferably laminating foil or transfer foil, e.g. hot embossing foil, whereby the work pieces display formed surfaces, preferably chamfer surfaces (3a), which extend along the transport route (2) and are punched using a punching device (1) arranged on the transport route (2), which possesses at least two supporting rollers (1a) and pressing rollers (1d) arranged between the supporting rollers (1a) and a punching tape (1c) made of silicone, elastomer, rubber or plastic revolving around the supporting rollers (1a) and pressing rollers (1d), which in the area between the supporting rollers (1a) forms a punching route (1p) loaded using the pressing rollers (1d) in which the punching of the surface (3a) to be punched is carried out while the surface of the punching route (1p) to be punched passes along the transport route (2)
   characterised in that
   the design of the surface (3 a) to be punched is formed either of at least one of the work pieces guided along the transport route (2) and/or the design of the surfaces (3a) to be punched is formed of at least two work pieces arranged one after the other along the transport route (2) in accordance with a predetermined reference variation with regard to the angular position and/or the distance with reference to the position of the transport route (2), and
   that during the punching process the pressing rollers (1d) are updated whenever there is a change of the angular position and/or the distance of their rotational axes with reference to the transport route (2) and/or in reference to the tangential level (V) of the supporting rollers (1a) depending on the variation of the design of the surface (3a) to be punched and/or are elastically deformed in terms of their scope, depending on the variation of the design of the surface (3 a) to be punched in the sense of an updating of the outer surface of the pressure rollers (1d) loading the punching tape (1c).
2. Process according to one of the preceding claims
   characterised in that
   in the course of the updating process the pressing rollers are guided in such a way that they protrude, with their outside loading the punching tape (1c), over the tangential level (V) of the supporting rollers (1a).
3. Process according to one of the preceding claims
   characterised in that
   in the course of the updating process the pressing rollers are guided in such a way that the outside of the pressure rollers (1d) loading the punching tape (1c) run in a maximally extended position and/or in a minimally compressed operating condition of the pressure rollers (1d) at a distance to the tangential level (V) of the pressure roller (1a) which is formed in such a way that the progression of the punching tape (1c) in the area between the first supporting roller (1a) and the first pressure roller (1d) next to it forms an acute angle with the tangential level of the supporting rollers (1a), whereby the acute angle is preferably between 1° and 3°.
4. Process according to one of the preceding claims
   characterised in that
   the updating of the pressure rollers (1d) is achieved by means of direct or indirect spring loading and/or motor loading of the bearing shafts of the pressure rollers.
5. Process according to claim 4
   characterised in that
   the spring and/or motor loading on the pressure rollers (1d) operate individually or in groups.
6. Process according to one of the preceding claims
   characterised in that
   the updating of the pressure rollers (1d) is achieved by means of a sliding block with a sliding block guide into which a pivot bearing (11) of the pressure roller (1d) is guided.
7. Process according to one of claims 1 to 6
   characterised in that
   the punching device is equipped with just one pressure roller (1d) instead of several pressure rollers (1d) arranged between the supporting rollers (1a).
8. Punching device for the punching of work pieces which are guided along a transport route (2), e.g. panels, with foil, preferably laminating foil or transfer foil, e.g. hot embossing foil, whereby the work pieces are punched on surfaces, preferably surfaces formed as chamfer surfaces (3a) which extend along the transport route (2), comprising at least two supporting rollers (1a) and pressing rollers (1d) arranged between the supporting rollers (1a) and a punching tape (1c) made of silicone, elastomer, rubber or plastic revolving around the supporting rollers (1a) and pressing rollers (1d), which in the area between the supporting rollers (1a) loaded by pressing rollers (1d) forms a punching route in which the punching takes place, while the surface (3a) of the work piece to be passes the punching route along the transport route (2)
   characterised in that
   the pressure rollers (1d) are supported with movable bearing shafts in reference to the tangential level (V) of the supporting rollers (1a), which are updatable depending on the variation of the design of the surface (3a) to be punched and/or possess a cladding which can be elastically deformed in such a way that the outside of the pressure rollers (1d) can be updated depending on the variation of the design of the chamfer surface.
9. Punching device according to claim 8
   characterised in that
   the pressure rollers (1d) are loaded in such a way that the outside of the pressure rollers (1d) loading the punching tape (1c) is linked across or protrude over the tangential level (V) of the supporting rollers.
10. Punching device according to claim 9
    characterised in that
    at least one of the pressure rollers (1d) is supported flexibly with their rotational axis parallel and/or at an angle to the tangential level (V) of the supporting rollers (1a).
11. Punching device according to one of claims 8 to 10
    characterised in that
    the pressure rollers (1d) are individually, independently of one another, or in groups, spring loaded and/or motor loaded.
12. Punching device according to one of claims 9 to 11
    characterised in that
    at least one pivot bearing (11) or at least one of the pressure rollers (1d) is guided into a sliding block with any change in the distance and/or the angular position of its pivot bearing with reference to the tangential level (V) of the supporting rollers (1a).
13. Punching device according to claim 12
    characterised in that
    the pivot bearing (11) is guided into the sliding block guide by means of spring loading or motor loading.
14. Punching device according to claims 12 or 13
    characterised in that
    the sliding block to the tangential level (V) of the supporting rollers (1a) is designed to be either fixed or movable.
15. Punching device according to one of the claims 12 to 14
    characterised in that
    the sliding block rod is supported in a swivel bearing which is designed so as to be movable or fixed in relation to the tangential level (V) of the supporting rollers.
16. Punching device according to one of the claims 8 to 15
    characterised in that
    at least one of the pressure rollers (1d) is guided at its opposite ends to opposite sliding blocks.
17. Punching device according to one of the claims 8 to16
    characterised in that
    instead of the several pressure rollers (1d) arranged between the supporting rollers (1a), just one pressure roller (1d) is provided.

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