EP0861575B1 - Four-nozzle plasma generator for forming an activated jet - Google Patents
Four-nozzle plasma generator for forming an activated jet Download PDFInfo
- Publication number
- EP0861575B1 EP0861575B1 EP96934313A EP96934313A EP0861575B1 EP 0861575 B1 EP0861575 B1 EP 0861575B1 EP 96934313 A EP96934313 A EP 96934313A EP 96934313 A EP96934313 A EP 96934313A EP 0861575 B1 EP0861575 B1 EP 0861575B1
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- European Patent Office
- Prior art keywords
- plasma
- diaphragm
- electrode chambers
- enclosure
- generator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000007789 gas Substances 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 210000000188 diaphragm Anatomy 0.000 description 29
- 230000004907 flux Effects 0.000 description 20
- 238000009792 diffusion process Methods 0.000 description 9
- 230000005855 radiation Effects 0.000 description 8
- 230000009471 action Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000003213 activating effect Effects 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000010276 construction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 230000001954 sterilising effect Effects 0.000 description 2
- 238000004659 sterilization and disinfection Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 241001415961 Gaviidae Species 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000004157 plasmatron Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000002226 simultaneous effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/44—Plasma torches using an arc using more than one torch
Definitions
- the invention relates to a plasma generator with four nozzles for the formation of an activated jet, according to the preamble of claim 1.
- This generator can be used in particular in surface treatment process (sterilization, cleaning, stripping, modification, deposit of recovery and films), of dispersed materials and monoliths, as well as for obtaining chemicals in electronics, automotive, food, medicine, chemistry, manufacture of machines and tools, etc.
- the object of the invention is to propose a generator for plasma with four nozzles to obtain a gas jet activated of controllable composition, stable form, long resource for continuous work and optimal action on objects to be treated.
- the invention relates to a plasma generator with four nozzles comprising two chambers with anode electrodes and two cathode electrode chambers, connected to sources of direct current and generating four plasma jets, the shape and trajectory are created using a system of external magnetic fields, so that the jets plasma form a single plasma flow with an area lowered temperature control unit in which is introduced the chemical component and / or the materials to treat, the electrode chambers of this generator being arranged in an enclosure into which a gas is introduced, this enclosure being composed of a concave flange to which are fixed the electrode chambers and a first flat diaphragm, water-cooled and provided with an orifice circular central arranged at the junction of the jets of plasma from the electrode chambers and crossed by the current.
- the generator comprises, in downstream of the first diaphragm, a second diaphragm, cooled to water, whose orifice with a variable diameter, less than that of the plasma flow, this diaphragm being fixed to the enclosure through a circular wall, allowing the evacuation of part of the plasma and gases introduced into the enclosure.
- the solution proposed by the present invention consists in modify the four nozzle plasma generator of art anterior, so as to create an activated composition flow controlled and effective action on the treated surface, while increasing the lifetime of the generator. Is equivalent to eliminate the disadvantages of the known four-nozzle generator described above, i.e. to suppress the flows of convection and reduce the radiation flux acting on the electrode chambers, their fasteners and while intensifying the action on the surface treated activated components of the flow created by the generator, reducing the amount of plasma reaching the surface to be treated.
- the four nozzle generators shown in the Figures 1 and 2 include, like the known prototype described above, four electrode chambers 1, a system magnetic for shape and trajectory control plasma jets 7, a tube for the introduction of chemical components and / or products to be activated in the plasma funnel.
- the new element of the construction of the generator is the enclosure, ventilated by a gas introduced by the nozzles 9, to which the chambers are fixed electrodes 1.
- the enclosure consists of a cooled concave flange 2 with water and the water-cooled diaphragm system.
- Figures 1a and 1b illustrate the case where the diaphragm includes a diaphragm in the form of a flange annular cooled 5, whose internal diameter is such that it allows the passage of the plasma flow inside which the products to be activated are introduced via the nozzle 3, and the peripheral flow of gas introduced into the enclosure by the nozzles 9.
- This gas stabilizes the plasma flow and prevents formation of vortices and their contact with the electrodes, their fixing and supply parts.
- the accompanying flow of gas, passing peripherally through the orifice of the diaphragm 5 stabilizes plasma flow, decreases mixing plasma with surrounding gases, decreases the transfer of radical heat of the plasma flow, which lengthens the jet resulting from plasma.
- the diaphragm 5 whose opening 8 is relatively small, greatly reduces radiation from plasma 6 directed towards the electrode chambers.
- Figures 2a and 2b illustrate the case where the diaphragms includes, in addition to diaphragm 5 whose functions are exposed above, a diaphragm 10 cooled with water, adjustable hole, the diameter of which is smaller than that of the plasma flow and which only allows the flow of gas activated.
- the diaphragm 10 is fixed to the enclosure by through a circular wall 11.
- the gas from nozzles (9) as well as the activating plasma are evacuated by through orifices 12.
- This diaphragm eliminates peripheral plasma gases and accompanying gases which are an obstacle to the diffusion of activated particles towards the surface to be treated.
- the diaphragm 10 also makes it possible to obtain a uniform distribution of temperature and composition of the activated stream from the proposed generator.
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Nozzles (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Plasma Technology (AREA)
Description
L'invention concerne un générateur de plasma à quatre
buses pour la formation d'un jet activé, selon le préambule de
la revendication 1.The invention relates to a plasma generator with four
nozzles for the formation of an activated jet, according to the preamble of
Ce générateur peut être utilisé notamment dans les processus de traitement de surfaces (stérilisation, nettoyage, décapage, modification, dépôt de recouvrement et de films), de matériaux dispersés et monolithes, ainsi que pour l'obtention de produits chimiques dans les domaines de l'électronique, l'automobile, l'alimentaire, la médecine, la chimie, la fabrication de machines et d'outils, etc.This generator can be used in particular in surface treatment process (sterilization, cleaning, stripping, modification, deposit of recovery and films), of dispersed materials and monoliths, as well as for obtaining chemicals in electronics, automotive, food, medicine, chemistry, manufacture of machines and tools, etc.
On connaít des générateurs de plasma à quatre buses
contenant deux chambres à électrodes anodes et cathodes,
connectées à des sources de courant continu et qui génèrent
quatre jets de plasma dont la forme et la trajectoire se
créent à l'aide d'un champ magnétique extérieur de sorte que
les jets de plasma, en convergeant, forment un flux unique de
plasma dont la température dans la zone centrale, dans
laquelle sont introduits les produits chimiques et/ou les
matériaux à traiter, est surbaissée par rapport aux zones
peripheriques. De tels dispositifs sont décrits dans le document
"Bases de la réalisation de la méthode de traitement dynamique
par plasma de la surface d'un corps solide" P. P. Koulik et
autres, "Plasmochimie 87", Moscou 1987, partie 2, pp. 58 à 96, ainsi que dans les demandes de brevet FR 2 678 467 et GB 2 271 044.We know plasma generators with four nozzles
containing two chambers with anode and cathode electrodes,
connected to direct current sources and which generate
four plasma jets whose shape and trajectory
create using an external magnetic field so that
the plasma jets, by converging, form a unique flow of
plasma whose temperature in the central area, in
which chemicals and / or
materials to be treated, is lowered compared to the zones
peripheral devices. Such devices are described in the document
"Basics of the realization of the dynamic processing method
by plasma from the surface of a solid body "P. P. Koulik and
others, "Plasmochimie 87", Moscow 1987,
La construction des chambres à électrodes (anode et cathode) est décrite dans le document "Plasmatron à deux jets Frounze", I.I. Lenbaïev, V.S. Enguelsht, "Ilim" ,1983.The construction of the electrode chambers (anode and cathode) is described in the document "Plasmatron with two jets Frounze ", I.I. Lenbayev, V.S. Enguelsht," Ilim ", 1983.
L'avantage de tels générateurs selon l'art antérieur est dû d'une part à la configuration spécifique des flux de plasma qui a la forme d'un entonnoir de plasma, ce qui permet d'introduire et de traiter de manière efficace différents produits. D'autre part, le courant électrique qui traverse le jet de plasma le chauffant et l'activant avec des pertes minimales, vu l'absence de parois refroidies, implique que le rendement de ce dispositif est haut.The advantage of such generators according to the prior art is due on the one hand to the specific configuration of plasma flows which is shaped like a plasma funnel, which allows to introduce and effectively treat different products. On the other hand, the electric current flowing through the plasma jet heating and activating it with losses minimal, given the absence of cooled walls, implies that the performance of this device is high.
Un tel dispositif peut être utilisé de manière efficace
pour la stérilisation de surfaces, leur nettoyage,
modification, décapage et dépôt de recouvrements et de films.
Son exploitation a cependant permis d'observer les
désavantages suivants :
Le but de l'invention est de proposer un générateur de plasma à quatre buses permettant d'obtenir un jet de gaz activé de composition contrôlable, de forme stable, à longue ressource de travail continu et d'action optimale sur les objets à traiter.The object of the invention is to propose a generator for plasma with four nozzles to obtain a gas jet activated of controllable composition, stable form, long resource for continuous work and optimal action on objects to be treated.
A cet effet, l'invention concerne un générateur de plasma à quatre buses comportant deux chambres à électrodes anodes et deux chambres à électrodes cathodes, connectées à des sources de courant continu et générant quatre jets de plasma dont la forme et la trajectoire sont créés à l'aide d'un système de champs magnétiques extérieurs, de telle manière que les jets de plasma forment un flux de plasma unique présentant une zone centrale de température surbaissée dans laquelle est introduite la composante chimique et/ou le matériaux à traiter, les chambres à électrodes de ce générateur étant disposées dans une enceinte dans laquelle on introduit un gaz, cette enceinte étant composée d'une bride concave à laquelle sont fixées les chambres à électrodes et d'un premier diaphragme plat, refroidi à l'eau et pourvu d'un orifice central circulaire disposé à l'endroit de la jonction des jets de plasma issus des chambres à électrodes et traversés par le courant.To this end, the invention relates to a plasma generator with four nozzles comprising two chambers with anode electrodes and two cathode electrode chambers, connected to sources of direct current and generating four plasma jets, the shape and trajectory are created using a system of external magnetic fields, so that the jets plasma form a single plasma flow with an area lowered temperature control unit in which is introduced the chemical component and / or the materials to treat, the electrode chambers of this generator being arranged in an enclosure into which a gas is introduced, this enclosure being composed of a concave flange to which are fixed the electrode chambers and a first flat diaphragm, water-cooled and provided with an orifice circular central arranged at the junction of the jets of plasma from the electrode chambers and crossed by the current.
Selon un mode d'exécution, le générateur comporte, en aval du premier diaphragme, un second diaphragme, refroidi à l'eau, dont l'orifice à un diamètre variable, inférieur à celui du flux de plasma, ce diaphragme étant fixé à l'enceinte par l'intermédiaire d'une paroi circulaire, permettant l'évacuation d'une partie du plasma et des gaz introduits dans l'enceinte.According to one embodiment, the generator comprises, in downstream of the first diaphragm, a second diaphragm, cooled to water, whose orifice with a variable diameter, less than that of the plasma flow, this diaphragm being fixed to the enclosure through a circular wall, allowing the evacuation of part of the plasma and gases introduced into the enclosure.
La solution proposée par la présente invention consiste à modifier le générateur de plasma à quatre buses de l'art antérieur, de manière à créer un flux activé de composition contrôlée et d'action efficace sur la surface traitée, tout en augmentant le temps de vie du générateur. Cela revient à liquider les désavantages du générateur à quatre buses connu décrit plus haut, c'est-à-dire à supprimer les flux de convection et réduire les flux de radiation agissant sur les chambres à électrodes, leurs éléments de fixation et d'alimentation, tout en intensifiant l'action sur la surface traitée des composantes activées du flux créé par le générateur, en réduisant la quantité de plasma atteignant la surface à traiter.The solution proposed by the present invention consists in modify the four nozzle plasma generator of art anterior, so as to create an activated composition flow controlled and effective action on the treated surface, while increasing the lifetime of the generator. Is equivalent to eliminate the disadvantages of the known four-nozzle generator described above, i.e. to suppress the flows of convection and reduce the radiation flux acting on the electrode chambers, their fasteners and while intensifying the action on the surface treated activated components of the flow created by the generator, reducing the amount of plasma reaching the surface to be treated.
On décrit ci-après le générateur selon l'invention, en se référant au dessin sur lequel:
- les figures 1a et 1b illustrent un premier exemple de
générateur selon l'invention, respectivement selon une vue du
côté du diaphragme (le diaphragme étant montré en traitillés)
et en section latérale; les repères relatifs à ces deux
figures sont les suivants:
- 1. Chambres à électrodes
- 2. Bride concave de l'enceinte, refroidie à l'eau
- 3. Buse d'introduction des composantes chimiques et/ou des matériaux à traiter.
- 4. Jets de plasma
- 5. Diaphragme plat refroidi à l'eau
- 6. Flux résultant de plasma
- 7. Système magnétique
- 8. Orifice circulaire du diaphragme
- 9. Tuyères d'introduction du gaz.
- les figures 2a et 2b illustrent un second exemple de
générateur selon l'invention, respectivement selon une vue du
côté des diaphragmes (les diaphragmes étant montrés en
traitillés) et en section latérale; les repères relatifs à ces
deux figures sont les suivants:
- 1. Chambres à électrodes
- 2. Bride concave de l'enceinte, refroidie à l'eau
- 3. Buse d'introduction des composantes chimiques et/ou des matériaux à traiter
- 4. Jets de plasma
- 5. Diaphragme plat refroidi à l'eau
- 6. Flux résultant de plasma
- 7. Système magnétique
- 8. Orifice circulaire du diaphragme
- 9. Tuyères d'introduction du gaz
- 10. Deuxième diaphragme, ajustable, refroidi à l'eau
- 11. Paroi circulaire
- 12. Orifice d'évacuation du plasma et du gaz introduit dans l'enceinte
- 13. Jet résultant de gaz activé
- la figure 3 est un schéma illustrant la fonction des diaphragmes d'après la distribution de la température (T) et de la composition (C) du flux issu du générateur, à différentes distances des chambres à électrodes.
- FIGS. 1a and 1b illustrate a first example of a generator according to the invention, respectively according to a view from the side of the diaphragm (the diaphragm being shown in dashed lines) and in lateral section; the references relating to these two figures are as follows:
- 1. Electrode chambers
- 2. Concave flange of the enclosure, water cooled
- 3. Nozzle for introducing the chemical components and / or the materials to be treated.
- 4. Plasma jets
- 5. Water-cooled flat diaphragm
- 6. Flux resulting from plasma
- 7. Magnetic system
- 8. Circular diaphragm opening
- 9. Nozzles for introducing gas.
- FIGS. 2a and 2b illustrate a second example of a generator according to the invention, respectively according to a view from the side of the diaphragms (the diaphragms being shown in dashed lines) and in lateral section; the references relating to these two figures are as follows:
- 1. Electrode chambers
- 2. Concave flange of the enclosure, water cooled
- 3. Nozzle for introducing the chemical components and / or the materials to be treated
- 4. Plasma jets
- 5. Water-cooled flat diaphragm
- 6. Flux resulting from plasma
- 7. Magnetic system
- 8. Circular diaphragm opening
- 9. Gas introduction nozzles
- 10. Second diaphragm, adjustable, water cooled
- 11. Circular wall
- 12. Plasma and gas discharge opening introduced into the enclosure
- 13. Jet resulting from activated gas
- FIG. 3 is a diagram illustrating the function of the diaphragms according to the distribution of the temperature (T) and of the composition (C) of the flux coming from the generator, at different distances from the electrode chambers.
Les générateurs à quatre buses représentés sur les
figures 1 et 2 comportent, comme le prototype connu décrit
plus haut, quatre chambres à électrodes 1, un système
magnétique pour le contrôle de la forme et de la trajectoire
des jets de plasma 7, un tube pour l'introduction des
composantes chimiques et/ou des produits à activer dans
l'entonnoir de plasma. Le nouvel élément de la construction du
générateur est l'enceinte, ventilée par un gaz introduit par
les tuyères 9, à laquelle sont fixées les chambres à
électrodes 1.The four nozzle generators shown in the
Figures 1 and 2 include, like the known prototype described
above, four
L'enceinte est constituée d'une bride concave 2 refroidie
à l'eau et du système de diaphragmes refroidis à l'eau.The enclosure consists of a cooled
Les figures 1a et 1b illustrent le cas où le système de
diaphragme comprend un diaphragme sous forme de bride
annulaire refroidie 5, dont le diamètre intérieur est tel
qu'il permet le passage du flux de plasma à l'intérieur duquel
sont introduits par la buse 3 les produits à activer, et le
flux périphérique de gaz introduit dans l'enceinte par les
tuyères 9.Figures 1a and 1b illustrate the case where the
diaphragm includes a diaphragm in the form of a flange
annular cooled 5, whose internal diameter is such
that it allows the passage of the plasma flow inside which
the products to be activated are introduced via the
Ce gaz stabilise le flux de plasma et empêche la
formation de tourbillons et leur contact avec les chambres à
électrodes, leurs pièces de fixation et d'alimentation. Les
jets de plasma issus des chambres à électrodes convergent et
se joignent dans le plan du diaphragme 8. Le flux accompagnant
de gaz, passant périphériquement à travers l'orifice du
diaphragme 5 stabilise le flux de plasma, diminue le mélange
de plasma avec les gaz environnants, diminue le transfert de
chaleur radical du flux de plasma, ce qui allonge le jet
résultant de plasma. Le diaphragme 5 dont l'orifice 8 est
relativement petit, réduit fortement la radiation du flux de
plasma 6 dirigée vers les chambres à électrodes.This gas stabilizes the plasma flow and prevents
formation of vortices and their contact with the
electrodes, their fixing and supply parts. The
plasma jets from the converging electrode chambers and
join in the plane of the
Les figures 2a et 2b illustrent le cas où le système de
diaphragmes comprend, outre le diaphragme 5 dont les fonctions
sont exposées plus haut, un diaphragme 10 refroidi à l'eau,
d'orifice ajustable, dont le diamètre est plus petit que celui
du flux de plasma et qui laisse passer seulement le flux de
gaz activé.Figures 2a and 2b illustrate the case where the
diaphragms includes, in addition to
Le diaphragme 10 est fixé à l'enceinte par
l'intermédiaire d'une paroi circulaire 11. Le gaz issu des
tuyères (9) ainsi que le plasma activant sont évacués par
l'intermédiaire d'orifices 12. Ce diaphragme permet d'éliminer
les gaz de plasma périphériques et les gaz d'accompagnement
qui sont un obstacle à la diffusion des particules activées
vers la surface à traiter. Comme le montre le schéma de la
figure 3, le diaphragme 10 permet aussi d'obtenir une
distribution uniforme de la température et de la composition
du flux activé issu du générateur proposé.The
Claims (2)
- A four-nozzle plasma generator comprising two anode electrode chambers and two cathode electrode chambers connected to DC power sources and generating four plasma jets of which the shape and the trajectory are determined by an external magnetic field system, such that the plasma jets form a single plasma stream with a central zone of lowered temperature into which the chemical component and/or materials to be treated are introduced,
characterised in that the electrode chambers are arranged in an enclosure into which a gas is introduced, this enclosure consisting of a concave flange to which the electrode chambers are fixed and a first flat water-cooled diaphragm provided with a central circular aperture positioned at the point of convergence of the plasma jets from the electrode chambers and through which the current passes. - Generator according to claim 1, characterised in that it comprises, downstream of the first diaphragm, a second water-cooled diaphragm, with an aperture of variable diameter, smaller than that of the plasma stream, this diaphragm being fixed to the enclosure by means of a circular wall, enabling evacuation of a part of the plasma and gases introduced into the enclosure.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH3208/95 | 1995-11-13 | ||
| CH320895 | 1995-11-13 | ||
| CH320895 | 1995-11-13 | ||
| PCT/CH1996/000401 WO1997018692A1 (en) | 1995-11-13 | 1996-11-12 | Four-nozzle plasma generator for forming an activated jet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0861575A1 EP0861575A1 (en) | 1998-09-02 |
| EP0861575B1 true EP0861575B1 (en) | 2000-07-05 |
Family
ID=4251004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP96934313A Expired - Lifetime EP0861575B1 (en) | 1995-11-13 | 1996-11-12 | Four-nozzle plasma generator for forming an activated jet |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6278241B1 (en) |
| EP (1) | EP0861575B1 (en) |
| DE (1) | DE69609191T2 (en) |
| ES (1) | ES2150693T3 (en) |
| WO (1) | WO1997018692A1 (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6287687B1 (en) | 1998-05-08 | 2001-09-11 | Asten, Inc. | Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same |
| US6146462A (en) * | 1998-05-08 | 2000-11-14 | Astenjohnson, Inc. | Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same |
| AU2002212616A1 (en) * | 2000-11-10 | 2002-05-21 | Apit Corp. Sa | Atmospheric plasma method for treating sheet electricity conducting materials and device therefor |
| KR100464856B1 (en) * | 2002-11-07 | 2005-01-05 | 삼성전자주식회사 | Method for etching a surface of workpiece and a backside of silicon substrate |
| SG114754A1 (en) * | 2004-02-25 | 2005-09-28 | Kulicke & Soffa Investments | Laser cleaning system for a wire bonding machine |
| JP4449645B2 (en) * | 2004-08-18 | 2010-04-14 | 島津工業有限会社 | Plasma spraying equipment |
| FR2879933B1 (en) * | 2004-12-28 | 2007-03-30 | Satelec Soc | GAS PLASMA STERILIZATION DEVICE FORMED FROM A MIXTURE OF NITROGEN AND HYDROGEN |
| US20060219754A1 (en) * | 2005-03-31 | 2006-10-05 | Horst Clauberg | Bonding wire cleaning unit and method of wire bonding using same |
| US9472382B2 (en) * | 2007-04-23 | 2016-10-18 | Plasmology4, Inc. | Cold plasma annular array methods and apparatus |
| GB0902784D0 (en) * | 2009-02-19 | 2009-04-08 | Gasplas As | Plasma reactor |
| DE102009045200B4 (en) * | 2009-09-30 | 2021-02-11 | Inter-Consult Gmbh | Method and device for processing components of electrical machines |
| US9036309B2 (en) | 2010-09-16 | 2015-05-19 | General Electric Company | Electrode and plasma gun configuration for use with a circuit protection device |
| US8330069B2 (en) | 2010-09-16 | 2012-12-11 | General Electric Company | Apparatus and system for arc elmination and method of assembly |
| FR3074048B1 (en) * | 2017-10-23 | 2024-08-30 | Soc Pour La Conception Des Applications Des Techniques Electroniques | DEVICE FOR STERILIZING AN OBJECT WITH FLOW DEFLECTOR |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4982067A (en) * | 1988-11-04 | 1991-01-01 | Marantz Daniel Richard | Plasma generating apparatus and method |
| GB2271124B (en) | 1990-12-26 | 1995-09-27 | Opa | Method and apparatus for plasma treatment of a material |
| GB2271044B (en) * | 1990-12-26 | 1995-06-21 | Opa | Apparatus for plasma-arc machining |
| JP3166226B2 (en) | 1991-07-10 | 2001-05-14 | 住友電気工業株式会社 | Diamond production method and production equipment |
| EP0903059A1 (en) * | 1996-05-31 | 1999-03-24 | IPEC Precision, Inc. | Apparatus for generating and deflecting a plasma jet |
-
1996
- 1996-11-12 EP EP96934313A patent/EP0861575B1/en not_active Expired - Lifetime
- 1996-11-12 US US09/068,706 patent/US6278241B1/en not_active Expired - Fee Related
- 1996-11-12 WO PCT/CH1996/000401 patent/WO1997018692A1/en not_active Ceased
- 1996-11-12 ES ES96934313T patent/ES2150693T3/en not_active Expired - Lifetime
- 1996-11-12 DE DE69609191T patent/DE69609191T2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO1997018692A1 (en) | 1997-05-22 |
| US6278241B1 (en) | 2001-08-21 |
| DE69609191D1 (en) | 2000-08-10 |
| EP0861575A1 (en) | 1998-09-02 |
| ES2150693T3 (en) | 2000-12-01 |
| DE69609191T2 (en) | 2001-03-22 |
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