DE69211164D1 - Photoelektrischer Umwandler und Bildverarbeitungseinrichtung, die von diesem Gebrauch macht - Google Patents
Photoelektrischer Umwandler und Bildverarbeitungseinrichtung, die von diesem Gebrauch machtInfo
- Publication number
- DE69211164D1 DE69211164D1 DE69211164T DE69211164T DE69211164D1 DE 69211164 D1 DE69211164 D1 DE 69211164D1 DE 69211164 T DE69211164 T DE 69211164T DE 69211164 T DE69211164 T DE 69211164T DE 69211164 D1 DE69211164 D1 DE 69211164D1
- Authority
- DE
- Germany
- Prior art keywords
- image processing
- processing device
- makes use
- photoelectric converter
- photoelectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/162—Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
- H10F77/166—Amorphous semiconductors
- H10F77/1662—Amorphous semiconductors including only Group IV materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/223—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PIN barrier
- H10F30/2235—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PIN barrier the devices comprising Group IV amorphous materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/197—Bipolar transistor image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
- H10F71/103—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material including only Group IV materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3012595A JPH04261071A (ja) | 1991-01-11 | 1991-01-11 | 光電変換装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE69211164D1 true DE69211164D1 (de) | 1996-07-11 |
| DE69211164T2 DE69211164T2 (de) | 1996-11-21 |
Family
ID=11809706
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69211164T Expired - Fee Related DE69211164T2 (de) | 1991-01-11 | 1992-01-10 | Photoelektrischer Umwandler und Bildverarbeitungseinrichtung, die von diesem Gebrauch macht |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5414275A (de) |
| EP (1) | EP0494691B1 (de) |
| JP (1) | JPH04261071A (de) |
| CA (1) | CA2059176C (de) |
| DE (1) | DE69211164T2 (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1277856B1 (it) * | 1995-02-09 | 1997-11-12 | Univ Roma | Rivelatore di radiazione ultravioletta in film sottile, con opzione di elevata selettivita' spettrale. |
| US5838176A (en) * | 1996-07-11 | 1998-11-17 | Foveonics, Inc. | Correlated double sampling circuit |
| US6018187A (en) * | 1998-10-19 | 2000-01-25 | Hewlett-Packard Cmpany | Elevated pin diode active pixel sensor including a unique interconnection structure |
| JP3832615B2 (ja) * | 1999-08-26 | 2006-10-11 | 株式会社島津製作所 | 放射線検出装置 |
| US6620996B2 (en) * | 2000-05-29 | 2003-09-16 | Kyocera Corporation | Photoelectric conversion device |
| US7205525B2 (en) * | 2003-09-05 | 2007-04-17 | Analog Devices, Inc. | Light conversion apparatus with topside electrode |
| JP5325473B2 (ja) * | 2008-06-20 | 2013-10-23 | 富士フイルム株式会社 | 光電変換素子及び固体撮像素子 |
| JP2012114160A (ja) * | 2010-11-22 | 2012-06-14 | Panasonic Corp | 固体撮像装置及びその製造方法 |
| CN114335032A (zh) * | 2020-09-29 | 2022-04-12 | 群创光电股份有限公司 | 电子装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4523214A (en) * | 1981-07-03 | 1985-06-11 | Fuji Photo Film Co., Ltd. | Solid state image pickup device utilizing microcrystalline and amorphous silicon |
| US4680607A (en) * | 1984-05-11 | 1987-07-14 | Sanyo Electric Co., Ltd. | Photovoltaic cell |
| JPS61104678A (ja) * | 1984-10-29 | 1986-05-22 | Mitsubishi Electric Corp | アモルフアス太陽電池 |
| US4600801A (en) * | 1984-11-02 | 1986-07-15 | Sovonics Solar Systems | Fluorinated, p-doped microcrystalline silicon semiconductor alloy material |
| JPH0812905B2 (ja) * | 1986-07-11 | 1996-02-07 | キヤノン株式会社 | 光電変換装置及びその製造方法 |
| US4695859A (en) * | 1986-10-20 | 1987-09-22 | Energy Conversion Devices, Inc. | Thin film light emitting diode, photonic circuit employing said diode imager employing said circuits |
| EP0277016B1 (de) * | 1987-01-29 | 1998-04-15 | Canon Kabushiki Kaisha | Photovoltaischer Wandler |
| JPS63182551U (de) * | 1987-05-15 | 1988-11-24 | ||
| US5085711A (en) * | 1989-02-20 | 1992-02-04 | Sanyo Electric Co., Ltd. | Photovoltaic device |
| JP2860138B2 (ja) * | 1989-03-29 | 1999-02-24 | キヤノン株式会社 | 半導体装置およびこれを用いた光電変換装置 |
-
1991
- 1991-01-11 JP JP3012595A patent/JPH04261071A/ja active Pending
-
1992
- 1992-01-10 CA CA002059176A patent/CA2059176C/en not_active Expired - Fee Related
- 1992-01-10 EP EP92100361A patent/EP0494691B1/de not_active Expired - Lifetime
- 1992-01-10 DE DE69211164T patent/DE69211164T2/de not_active Expired - Fee Related
-
1993
- 1993-12-06 US US08/161,441 patent/US5414275A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CA2059176A1 (en) | 1992-07-12 |
| EP0494691A2 (de) | 1992-07-15 |
| DE69211164T2 (de) | 1996-11-21 |
| EP0494691B1 (de) | 1996-06-05 |
| CA2059176C (en) | 1999-09-14 |
| JPH04261071A (ja) | 1992-09-17 |
| US5414275A (en) | 1995-05-09 |
| EP0494691A3 (en) | 1992-12-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |