DE69200926D1 - Verfahren und anordnung zum eichen eines optischen pyrometers und standardplättchen dafür. - Google Patents
Verfahren und anordnung zum eichen eines optischen pyrometers und standardplättchen dafür.Info
- Publication number
- DE69200926D1 DE69200926D1 DE69200926T DE69200926T DE69200926D1 DE 69200926 D1 DE69200926 D1 DE 69200926D1 DE 69200926 T DE69200926 T DE 69200926T DE 69200926 T DE69200926 T DE 69200926T DE 69200926 D1 DE69200926 D1 DE 69200926D1
- Authority
- DE
- Germany
- Prior art keywords
- temperature value
- reference region
- pct
- pyrometer
- calibrating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title abstract 3
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
- G01J5/0007—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/52—Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
- G01J5/53—Reference sources, e.g. standard lamps; Black bodies
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Radiation Pyrometers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| LU87933A LU87933A1 (fr) | 1991-05-02 | 1991-05-02 | Procede et dispositif d'etalonnage d'un pyrometre optique et plaquettes etalons correspondantes |
| PCT/FR1992/000406 WO1992019943A1 (fr) | 1991-05-02 | 1992-05-04 | Procede et dispositif d'etalonnage d'un pyrometre optique et plaquettes etalons correspondantes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE69200926D1 true DE69200926D1 (de) | 1995-01-26 |
Family
ID=19731294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE69200926T Expired - Lifetime DE69200926D1 (de) | 1991-05-02 | 1992-05-04 | Verfahren und anordnung zum eichen eines optischen pyrometers und standardplättchen dafür. |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US5553939A (de) |
| EP (1) | EP0582645B1 (de) |
| JP (1) | JPH06509638A (de) |
| AT (1) | ATE115721T1 (de) |
| CA (1) | CA2108571A1 (de) |
| DE (1) | DE69200926D1 (de) |
| IE (1) | IE72191B1 (de) |
| LU (1) | LU87933A1 (de) |
| PT (1) | PT100448A (de) |
| WO (1) | WO1992019943A1 (de) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19513951C2 (de) * | 1995-04-12 | 2002-04-11 | Zinser Textilmaschinen Gmbh | Verfahren für das Überwachen einer temperaturgeregelten Heizvorrichtung |
| IL117951A (en) * | 1995-09-06 | 1999-09-22 | 3T True Temperature Technologi | Method and apparatus for true temperature determination |
| US5938335A (en) * | 1996-04-08 | 1999-08-17 | Applied Materials, Inc. | Self-calibrating temperature probe |
| US6536944B1 (en) * | 1996-10-09 | 2003-03-25 | Symyx Technologies, Inc. | Parallel screen for rapid thermal characterization of materials |
| US5988874A (en) * | 1997-09-05 | 1999-11-23 | Advanced Micro Devices, Inc. | Black body reference for RTA |
| KR100266328B1 (ko) * | 1997-12-23 | 2000-10-02 | 김규현 | 티타늄실리사이드형성방법및이를이용한티타늄실리사이드의형성온도보정방법 |
| WO2000006981A1 (de) * | 1998-07-28 | 2000-02-10 | Steag Rtp Systems Gmbh | Verfahren und vorrichtung zum kalibrieren von emissivitätsunabhängigen temperaturmessungen |
| DE19934299C2 (de) * | 1998-07-28 | 2003-04-03 | Steag Ast Elektronik Gmbh | Verfahren und Vorrichtung zum Kalibrieren von emissivitätsunabhängigen Temperaturmessungen |
| US6293696B1 (en) * | 1999-05-03 | 2001-09-25 | Steag Rtp Systems, Inc. | System and process for calibrating pyrometers in thermal processing chambers |
| DE19922278B4 (de) * | 1999-05-11 | 2004-02-12 | Virtualfab Technologie Gmbh | Verfahren zur Bestimmung des Emissions- bzw. Absorptionsgrades von Objekten |
| KR20030044378A (ko) * | 2001-11-29 | 2003-06-09 | 주식회사 포스코 | 반사정보를 이용한 방사율 보정 온도계 |
| CN101324470B (zh) * | 2001-12-26 | 2011-03-30 | 加拿大马特森技术有限公司 | 测量温度和热处理的方法及系统 |
| US7052180B2 (en) * | 2002-01-04 | 2006-05-30 | Kelvin Shih | LED junction temperature tester |
| WO2004057650A1 (en) * | 2002-12-20 | 2004-07-08 | Mattson Technology Canada, Inc. | Methods and systems for supporting a workpiece and for heat-treating the workpiece |
| DE102004018578B4 (de) * | 2004-04-16 | 2007-02-22 | Siemens Ag | Verfahren und Vorrichtung zur Erfassung eines Verschmutzungsgrades eines betriebenen Umrichtergerätes |
| JP4683869B2 (ja) * | 2004-07-08 | 2011-05-18 | 独立行政法人理化学研究所 | 半導体デバイスの故障診断方法と装置 |
| US7275861B2 (en) * | 2005-01-31 | 2007-10-02 | Veeco Instruments Inc. | Calibration wafer and method of calibrating in situ temperatures |
| DE102007042779B4 (de) * | 2007-09-07 | 2009-07-09 | Mattson Thermal Products Gmbh | Kalibrationssubstrat und -verfahren |
| US8523427B2 (en) * | 2008-02-27 | 2013-09-03 | Analog Devices, Inc. | Sensor device with improved sensitivity to temperature variation in a semiconductor substrate |
| US9070590B2 (en) | 2008-05-16 | 2015-06-30 | Mattson Technology, Inc. | Workpiece breakage prevention method and apparatus |
| EP2365307B1 (de) * | 2009-05-12 | 2012-07-18 | LayTec Aktiengesellschaft | Verfahren zur Kalibrierung eines Pyrometers, Verfahren zur Bestimmung der Temperatur eines Halbleiterwafers und System zur Bestimmung der Temperatur eines Halbleiterwafers |
| JP5590454B2 (ja) * | 2010-10-05 | 2014-09-17 | 株式会社リコー | 電気素子、集積素子及び電子回路 |
| JP5590459B2 (ja) * | 2010-12-08 | 2014-09-17 | 株式会社リコー | 露点計測装置および気体特性測定装置 |
| JP5590460B2 (ja) * | 2010-12-08 | 2014-09-17 | 株式会社リコー | 露点計測装置および気体特性測定装置 |
| JP5590461B2 (ja) * | 2010-12-08 | 2014-09-17 | 株式会社リコー | 露点計測装置および気体特性測定装置 |
| US8749629B2 (en) * | 2011-02-09 | 2014-06-10 | Siemens Energy, Inc. | Apparatus and method for temperature mapping a turbine component in a high temperature combustion environment |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4475823A (en) * | 1982-04-09 | 1984-10-09 | Piezo Electric Products, Inc. | Self-calibrating thermometer |
| US4502792A (en) * | 1982-12-20 | 1985-03-05 | Shell Oil Company | Apparatus for calibrating a pyrometer |
| DE3601537A1 (de) * | 1986-01-20 | 1987-07-23 | Messerschmitt Boelkow Blohm | Verfahren zum radiometrischen kalibrieren optoelektronischer sensoren |
| GB2186968B (en) * | 1986-02-20 | 1990-03-21 | Metal Box Co Ltd | Temperature monitoring systems |
| US4854727A (en) * | 1987-10-26 | 1989-08-08 | Ag Processing Technologies, Inc. | Emissivity calibration apparatus and method |
| US4969748A (en) * | 1989-04-13 | 1990-11-13 | Peak Systems, Inc. | Apparatus and method for compensating for errors in temperature measurement of semiconductor wafers during rapid thermal processing |
| US5221142A (en) * | 1991-05-20 | 1993-06-22 | Peak Systems, Inc. | Method and apparatus for temperature measurement using thermal expansion |
| US5265957A (en) * | 1992-08-11 | 1993-11-30 | Texas Instruments Incorporated | Wireless temperature calibration device and method |
-
1991
- 1991-05-02 LU LU87933A patent/LU87933A1/fr unknown
-
1992
- 1992-05-04 AT AT92910985T patent/ATE115721T1/de not_active IP Right Cessation
- 1992-05-04 JP JP4509843A patent/JPH06509638A/ja active Pending
- 1992-05-04 CA CA002108571A patent/CA2108571A1/fr not_active Abandoned
- 1992-05-04 US US08/140,157 patent/US5553939A/en not_active Expired - Fee Related
- 1992-05-04 WO PCT/FR1992/000406 patent/WO1992019943A1/fr not_active Ceased
- 1992-05-04 EP EP92910985A patent/EP0582645B1/de not_active Expired - Lifetime
- 1992-05-04 DE DE69200926T patent/DE69200926D1/de not_active Expired - Lifetime
- 1992-05-04 PT PT100448A patent/PT100448A/pt not_active Application Discontinuation
- 1992-07-01 IE IE921487A patent/IE72191B1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP0582645B1 (de) | 1994-12-14 |
| IE921487A1 (en) | 1992-11-04 |
| IE72191B1 (en) | 1997-03-26 |
| EP0582645A1 (de) | 1994-02-16 |
| JPH06509638A (ja) | 1994-10-27 |
| ATE115721T1 (de) | 1994-12-15 |
| PT100448A (pt) | 1994-04-29 |
| WO1992019943A1 (fr) | 1992-11-12 |
| CA2108571A1 (fr) | 1992-11-03 |
| US5553939A (en) | 1996-09-10 |
| LU87933A1 (fr) | 1992-12-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8332 | No legal effect for de |