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DE69121201D1 - Verfahren und Gerät zur Erzeugung hochauflösender optischer Bilder - Google Patents

Verfahren und Gerät zur Erzeugung hochauflösender optischer Bilder

Info

Publication number
DE69121201D1
DE69121201D1 DE69121201T DE69121201T DE69121201D1 DE 69121201 D1 DE69121201 D1 DE 69121201D1 DE 69121201 T DE69121201 T DE 69121201T DE 69121201 T DE69121201 T DE 69121201T DE 69121201 D1 DE69121201 D1 DE 69121201D1
Authority
DE
Germany
Prior art keywords
generating high
optical images
resolution optical
resolution
images
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69121201T
Other languages
English (en)
Inventor
Hans-E Dipl Phys Korth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE69121201D1 publication Critical patent/DE69121201D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
    • G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Radiology & Medical Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biophysics (AREA)
  • Optics & Photonics (AREA)
  • Analytical Chemistry (AREA)
  • Microscoopes, Condenser (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69121201T 1991-08-27 1991-08-27 Verfahren und Gerät zur Erzeugung hochauflösender optischer Bilder Expired - Lifetime DE69121201D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP91114365A EP0529125B1 (de) 1991-08-27 1991-08-27 Verfahren und Gerät zur Erzeugung hochauflösender optischer Bilder

Publications (1)

Publication Number Publication Date
DE69121201D1 true DE69121201D1 (de) 1996-09-05

Family

ID=8207077

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69121201T Expired - Lifetime DE69121201D1 (de) 1991-08-27 1991-08-27 Verfahren und Gerät zur Erzeugung hochauflösender optischer Bilder

Country Status (3)

Country Link
US (1) US5327223A (de)
EP (1) EP0529125B1 (de)
DE (1) DE69121201D1 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5867604A (en) * 1995-08-03 1999-02-02 Ben-Levy; Meir Imaging measurement system
US6403124B1 (en) * 1997-04-16 2002-06-11 Sigma-Tau Industrie Farmaceutiche Riunite S.P.A. Storage and maintenance of blood products including red blood cells and platelets
US6030827A (en) * 1998-01-23 2000-02-29 I-Stat Corporation Microfabricated aperture-based sensor
US6867406B1 (en) * 1999-03-23 2005-03-15 Kla-Tencor Corporation Confocal wafer inspection method and apparatus using fly lens arrangement
JP2004505312A (ja) * 2000-07-27 2004-02-19 ゼテティック・インスティチュート 近距離場顕微鏡検査におけるサブ波長アパチャ・アレイの位置および方向の制御
JP2004505256A (ja) * 2000-07-27 2004-02-19 ゼテティック・インスティチュート 共振器により強化された光透過機能を有する多重光源アレイ
EP1446703A2 (de) * 2001-11-07 2004-08-18 Applied Materials, Inc. Matrixbelichtungsgerät
JP2005533365A (ja) 2001-11-07 2005-11-04 アプライド　マテリアルズ　インコーポレイテッド マスクレスの光子−電子スポット格子アレイ印刷装置
EP1606575A4 (de) * 2003-01-27 2006-12-27 Zetetic Inst Leckende geführte wellenmoden, die in der interferometrischen konfokalen mikroskopie zur messung von grabeneigenschaften verwendet werden
US7084983B2 (en) * 2003-01-27 2006-08-01 Zetetic Institute Interferometric confocal microscopy incorporating a pinhole array beam-splitter
WO2004068186A2 (en) 2003-01-27 2004-08-12 Zetetic Institute Interferometric confocal microscopy incorporating a pihnole array beam-splitter
JP2006516766A (ja) * 2003-02-04 2006-07-06 ゼテテック インスティテュート 非共焦点、共焦点、および、干渉型共焦点顕微鏡観察で生じる基板−媒体界面における屈折率ミスマッチ作用の補償
WO2004074881A2 (en) * 2003-02-19 2004-09-02 Zetetic Institute Method and apparatus for dark field interferometric confocal microscopy
US7133139B2 (en) * 2003-02-19 2006-11-07 Zetetic Institute Longitudinal differential interferometric confocal microscopy
WO2004090582A2 (en) 2003-04-01 2004-10-21 Zetetic Institute Method for constructing a catadioptric lens system
WO2004090465A2 (en) * 2003-04-01 2004-10-21 Zetetic Institute Apparatus and method for joint measurement of fields of scattered/reflected or transmitted orthogonally polarized beams by an object in interferometry
EP1608933A4 (de) * 2003-04-03 2007-03-21 Zetetic Inst Vorrichtung und verfahren zur messung von feldern rückgestreuter und vorwärtsgestreuter bzw. reflektierter strahlen durch ein objekt bei der interferometrie
WO2005008214A2 (en) * 2003-07-07 2005-01-27 Zetetic Institute Apparatus and method for ellipsometric measurements with high spatial resolution
US7084984B2 (en) 2003-07-07 2006-08-01 Zetetic Institute Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology
US7355722B2 (en) * 2003-09-10 2008-04-08 Zetetic Institute Catoptric and catadioptric imaging systems with adaptive catoptric surfaces
WO2005031397A2 (en) * 2003-09-26 2005-04-07 Zetetic Institute Catoptric and catadioptric imaging systems with pellicle and aperture-array beam-splitters and non-adaptive and adaptive catoptric surfaces
WO2005033747A2 (en) * 2003-10-01 2005-04-14 Zetetic Institute Method and apparatus for enhanced resolution of high spatial frequency components of images using standing wave beams in non-interferometric and interferometric microscopy
WO2005078382A1 (en) * 2004-01-22 2005-08-25 Mosong Cheng Apparatus and method for super-resolution optical microscopy
WO2005108914A2 (en) * 2004-05-06 2005-11-17 Zetetic Institute Apparatus and methods for measurement of critical dimensions of features and detection of defects in uv, vuv, and euv lithography masks
TW200538704A (en) * 2004-05-21 2005-12-01 Zetetic Inst Apparatus and methods for overlay, alignment mark, and critical dimension metrologies based on optical interferometry
US7161680B2 (en) * 2004-08-16 2007-01-09 Zetetic Institute Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry
WO2006023612A2 (en) * 2004-08-19 2006-03-02 Zetetic Institute Sub-nanometer overlay, critical dimension, and lithography tool projection optic metrology systems based on measurement of exposure induced changes in photoresist on wafers
WO2006034065A2 (en) * 2004-09-20 2006-03-30 Zetetic Institute Catoptric imaging systems comprising pellicle and/or aperture-array beam-splitters and non-adaptive and /or adaptive catoptric surfaces
US20110026141A1 (en) * 2009-07-29 2011-02-03 Geoffrey Louis Barrows Low Profile Camera and Vision Sensor
CN106876311B (zh) * 2010-02-17 2021-01-05 株式会社尼康 搬送装置、搬送方法、曝光装置、以及元件制造方法
EP2553513B1 (de) * 2010-03-28 2020-10-28 Ecole Polytechnique Federale de Lausanne (EPFL) Refraktionstomografie mit komplexem index und erhöhter auflösung
CN104237982B (zh) * 2014-09-11 2015-12-30 南京理工大学 一种纳米尺度固体混合浸没透镜

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0112401B1 (de) * 1982-12-27 1987-04-22 International Business Machines Corporation Optisches Nahfeldabtastmikroskop
US4659429A (en) * 1983-08-03 1987-04-21 Cornell Research Foundation, Inc. Method and apparatus for production and use of nanometer scale light beams
US4806004A (en) * 1987-07-10 1989-02-21 California Institute Of Technology Scanning microscopy
DE3725234C1 (en) * 1987-07-30 1989-02-02 Edith Dipl-Phys Straubel Method for the visualisation of molecular structures of the surface of liquids
US4967077A (en) * 1989-05-09 1990-10-30 The United States Of America As Represented By The Secretary Of The Air Force Multiple aperture arrays for optical and radio frequency signals
FR2651332B1 (fr) * 1989-08-28 1994-05-06 Ardt Microscope en champ proche en reflexion utilisant un guide d'ondes comme sonde de ce champ.

Also Published As

Publication number Publication date
US5327223A (en) 1994-07-05
EP0529125A1 (de) 1993-03-03
EP0529125B1 (de) 1996-07-31

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Legal Events

Date Code Title Description
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