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DE69921944D1 - Lithographische vorrichtung mit hierfür geeignetem spiegelprojektionssystem - Google Patents

Lithographische vorrichtung mit hierfür geeignetem spiegelprojektionssystem

Info

Publication number
DE69921944D1
DE69921944D1 DE69921944T DE69921944T DE69921944D1 DE 69921944 D1 DE69921944 D1 DE 69921944D1 DE 69921944 T DE69921944 T DE 69921944T DE 69921944 T DE69921944 T DE 69921944T DE 69921944 D1 DE69921944 D1 DE 69921944D1
Authority
DE
Germany
Prior art keywords
projection system
lithographic device
mirror projection
suitable mirror
lithographic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69921944T
Other languages
English (en)
Other versions
DE69921944T2 (de
Inventor
J Braat
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Application granted granted Critical
Publication of DE69921944D1 publication Critical patent/DE69921944D1/de
Publication of DE69921944T2 publication Critical patent/DE69921944T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69921944T 1998-05-06 1999-04-22 Lithographische vorrichtung mit hierfür geeignetem spiegelprojektionssystem Expired - Lifetime DE69921944T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP98201483 1998-05-06
EP98201483 1998-05-06
PCT/IB1999/000730 WO1999057596A1 (en) 1998-05-06 1999-04-22 Lithographic apparatus comprising a dedicated mirror projection system

Publications (2)

Publication Number Publication Date
DE69921944D1 true DE69921944D1 (de) 2004-12-23
DE69921944T2 DE69921944T2 (de) 2006-02-09

Family

ID=8233689

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69921944T Expired - Lifetime DE69921944T2 (de) 1998-05-06 1999-04-22 Lithographische vorrichtung mit hierfür geeignetem spiegelprojektionssystem

Country Status (6)

Country Link
US (2) US6396067B1 (de)
EP (1) EP1005664B1 (de)
JP (1) JP3949178B2 (de)
DE (1) DE69921944T2 (de)
TW (1) TW412642B (de)
WO (1) WO1999057596A1 (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6396067B1 (en) * 1998-05-06 2002-05-28 Koninklijke Philips Electronics N.V. Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US7151592B2 (en) 1999-02-15 2006-12-19 Carl Zeiss Smt Ag Projection system for EUV lithography
US6985210B2 (en) * 1999-02-15 2006-01-10 Carl Zeiss Smt Ag Projection system for EUV lithography
TW498184B (en) 1999-06-04 2002-08-11 Asm Lithography Bv Method of manufacturing a device using a lithographic projection apparatus, and device manufactured in accordance with said method
EP1093021A3 (de) 1999-10-15 2004-06-30 Nikon Corporation Projektionsbelichtungssystem sowie ein solches System benutzendes Gerät und Verfahren
TW490598B (en) * 1999-11-30 2002-06-11 Asm Lithography Bv Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus
TWI232356B (en) 2000-09-04 2005-05-11 Asml Netherlands Bv Lithographic projection apparatus, device manufacturing method and device manufactured thereby
EP1679550A1 (de) 2000-11-07 2006-07-12 ASML Netherlands B.V. Lithografische Vorrichtung und Herstellungsverfahren dafür
TW573234B (en) 2000-11-07 2004-01-21 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit device manufacturing method
DE60206908T2 (de) * 2001-01-09 2006-07-20 Carl Zeiss Smt Ag Projektionssystem für die extrem-ultraviolettlithographie
EP1615076A1 (de) * 2001-01-09 2006-01-11 Carl Zeiss SMT AG Projektionssystem für die extrem-ultraviolettlithographie
JP2004158786A (ja) 2002-11-08 2004-06-03 Canon Inc 投影光学系及び露光装置
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
KR101179286B1 (ko) * 2003-10-29 2012-09-03 칼 짜이스 에스엠테 게엠베하 조리개 변경 장치
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005069055A2 (en) 2004-01-14 2005-07-28 Carl Zeiss Smt Ag Catadioptric projection objective
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US7463422B2 (en) 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
KR101391470B1 (ko) 2004-05-17 2014-05-07 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
DE602005008591D1 (de) 2004-06-10 2008-09-11 Zeiss Carl Smt Ag Projektionsobjektiv für eine mikrolithographische projektionsbelichtungsvorrichtung
US7472797B2 (en) * 2004-07-28 2009-01-06 Capitol Vial Inc. Container for collecting and storing breast milk
US7476491B2 (en) 2004-09-15 2009-01-13 Asml Netherlands B.V. Lithographic apparatus, gas supply system, method for purging, and device manufacturing method and device manufactured thereby
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
KR101148589B1 (ko) * 2004-12-23 2012-05-22 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투사 대물렌즈
EP1746463A2 (de) 2005-07-01 2007-01-24 Carl Zeiss SMT AG Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv
KR101127346B1 (ko) 2005-09-13 2012-03-29 칼 짜이스 에스엠티 게엠베하 마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법
KR101314974B1 (ko) 2006-02-17 2013-10-04 칼 짜이스 에스엠티 게엠베하 마이크로리소그래픽 조명 시스템 및 이를 구비한 투사 노출장치
DE102006014380A1 (de) 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
DE102007033967A1 (de) * 2007-07-19 2009-01-29 Carl Zeiss Smt Ag Projektionsobjektiv
WO2009115180A1 (en) * 2008-03-20 2009-09-24 Carl Zeiss Smt Ag Projection objective for microlithography
DE102008000800A1 (de) 2008-03-20 2009-09-24 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie
DE102008033342A1 (de) 2008-07-16 2010-01-21 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie
CN102422225B (zh) 2009-03-06 2014-07-09 卡尔蔡司Smt有限责任公司 用于微光刻的照明光学系统与光学系统
KR101535230B1 (ko) 2009-06-03 2015-07-09 삼성전자주식회사 Ｅｕｖ 마스크용 공간 영상 측정 장치 및 방법
DE102012212753A1 (de) 2012-07-20 2014-01-23 Carl Zeiss Smt Gmbh Projektionsoptik

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW318255B (de) * 1995-05-30 1997-10-21 Philips Electronics Nv
US5805365A (en) * 1995-10-12 1998-09-08 Sandia Corporation Ringfield lithographic camera
US5815310A (en) * 1995-12-12 1998-09-29 Svg Lithography Systems, Inc. High numerical aperture ring field optical reduction system
US5686728A (en) * 1996-05-01 1997-11-11 Lucent Technologies Inc Projection lithography system and method using all-reflective optical elements
US6199991B1 (en) * 1997-11-13 2001-03-13 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US5973826A (en) * 1998-02-20 1999-10-26 Regents Of The University Of California Reflective optical imaging system with balanced distortion
US6014252A (en) * 1998-02-20 2000-01-11 The Regents Of The University Of California Reflective optical imaging system
US6255661B1 (en) * 1998-05-06 2001-07-03 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US6396067B1 (en) * 1998-05-06 2002-05-28 Koninklijke Philips Electronics N.V. Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US6072852A (en) * 1998-06-09 2000-06-06 The Regents Of The University Of California High numerical aperture projection system for extreme ultraviolet projection lithography
US6118577A (en) * 1998-08-06 2000-09-12 Euv, L.L.C Diffractive element in extreme-UV lithography condenser
US6368763B2 (en) * 1998-11-23 2002-04-09 U.S. Philips Corporation Method of detecting aberrations of an optical imaging system
DE19910724A1 (de) * 1999-03-11 2000-09-14 Zeiss Carl Fa Mikrolithographie-Projektionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
US6033079A (en) * 1999-03-15 2000-03-07 Hudyma; Russell High numerical aperture ring field projection system for extreme ultraviolet lithography
JP3770542B2 (ja) * 1999-07-22 2006-04-26 コーニング インコーポレイテッド 遠紫外軟ｘ線投影リソグラフィー法およびマスク装置
TW573234B (en) * 2000-11-07 2004-01-21 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit device manufacturing method

Also Published As

Publication number Publication date
US6800861B2 (en) 2004-10-05
EP1005664A1 (de) 2000-06-07
TW412642B (en) 2000-11-21
JP2002509653A (ja) 2002-03-26
EP1005664B1 (de) 2004-11-17
DE69921944T2 (de) 2006-02-09
US20020171048A1 (en) 2002-11-21
WO1999057596A1 (en) 1999-11-11
JP3949178B2 (ja) 2007-07-25
US6396067B1 (en) 2002-05-28

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Legal Events

Date Code Title Description
8320 Willingness to grant licences declared (paragraph 23)
8332 No legal effect for de
8370 Indication related to discontinuation of the patent is to be deleted
8364 No opposition during term of opposition