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DE69909214D1 - Halbleitervorrichtung mit ausgerichteten Oxidöffnungen und Kontaktierung einer Zwischenschicht - Google Patents

Halbleitervorrichtung mit ausgerichteten Oxidöffnungen und Kontaktierung einer Zwischenschicht

Info

Publication number
DE69909214D1
DE69909214D1 DE69909214T DE69909214T DE69909214D1 DE 69909214 D1 DE69909214 D1 DE 69909214D1 DE 69909214 T DE69909214 T DE 69909214T DE 69909214 T DE69909214 T DE 69909214T DE 69909214 D1 DE69909214 D1 DE 69909214D1
Authority
DE
Germany
Prior art keywords
contacting
semiconductor device
intermediate layer
aligned oxide
oxide openings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69909214T
Other languages
English (en)
Other versions
DE69909214T2 (de
Inventor
Vijaysekhar Jayaraman
Jonathan Geske
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gore Enterprise Holdings Inc
Original Assignee
Gore Enterprise Holdings Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gore Enterprise Holdings Inc filed Critical Gore Enterprise Holdings Inc
Application granted granted Critical
Publication of DE69909214D1 publication Critical patent/DE69909214D1/de
Publication of DE69909214T2 publication Critical patent/DE69909214T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18338—Non-circular shape of the structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
    • H01S5/041—Optical pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
DE69909214T 1998-11-05 1999-11-04 Halbleitervorrichtung mit ausgerichteten Oxidöffnungen und Kontaktierung einer Zwischenschicht Expired - Fee Related DE69909214T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/186,848 US6314118B1 (en) 1998-11-05 1998-11-05 Semiconductor device with aligned oxide apertures and contact to an intervening layer
US186848 1998-11-05

Publications (2)

Publication Number Publication Date
DE69909214D1 true DE69909214D1 (de) 2003-08-07
DE69909214T2 DE69909214T2 (de) 2004-04-22

Family

ID=22686506

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69909214T Expired - Fee Related DE69909214T2 (de) 1998-11-05 1999-11-04 Halbleitervorrichtung mit ausgerichteten Oxidöffnungen und Kontaktierung einer Zwischenschicht

Country Status (5)

Country Link
US (2) US6314118B1 (de)
EP (1) EP0999621B1 (de)
JP (1) JP2000151015A (de)
KR (1) KR20000035147A (de)
DE (1) DE69909214T2 (de)

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US7167495B2 (en) * 1998-12-21 2007-01-23 Finisar Corporation Use of GaAs extended barrier layers between active regions containing nitrogen and AlGaAs confining layers
US6975660B2 (en) 2001-12-27 2005-12-13 Finisar Corporation Vertical cavity surface emitting laser including indium and antimony in the active region
US7058112B2 (en) 2001-12-27 2006-06-06 Finisar Corporation Indium free vertical cavity surface emitting laser
US6922426B2 (en) 2001-12-20 2005-07-26 Finisar Corporation Vertical cavity surface emitting laser including indium in the active region
US7257143B2 (en) * 1998-12-21 2007-08-14 Finisar Corporation Multicomponent barrier layers in quantum well active regions to enhance confinement and speed
US7435660B2 (en) * 1998-12-21 2008-10-14 Finisar Corporation Migration enhanced epitaxy fabrication of active regions having quantum wells
US7286585B2 (en) 1998-12-21 2007-10-23 Finisar Corporation Low temperature grown layers with migration enhanced epitaxy adjacent to an InGaAsN(Sb) based active region
US7095770B2 (en) 2001-12-20 2006-08-22 Finisar Corporation Vertical cavity surface emitting laser including indium, antimony and nitrogen in the active region
US20030219917A1 (en) * 1998-12-21 2003-11-27 Johnson Ralph H. System and method using migration enhanced epitaxy for flattening active layers and the mechanical stabilization of quantum wells associated with vertical cavity surface emitting lasers
US7408964B2 (en) 2001-12-20 2008-08-05 Finisar Corporation Vertical cavity surface emitting laser including indium and nitrogen in the active region
KR100708081B1 (ko) * 2000-05-18 2007-04-16 삼성전자주식회사 선택적 산화법에 의한 표면광 레이저의 어퍼쳐 제조 장치및 방법
US7065124B2 (en) * 2000-11-28 2006-06-20 Finlsar Corporation Electron affinity engineered VCSELs
US6990135B2 (en) * 2002-10-28 2006-01-24 Finisar Corporation Distributed bragg reflector for optoelectronic device
US6905900B1 (en) * 2000-11-28 2005-06-14 Finisar Corporation Versatile method and system for single mode VCSELs
US6904072B2 (en) * 2001-12-28 2005-06-07 Finisar Corporation Vertical cavity surface emitting laser having a gain guide aperture interior to an oxide confinement layer
US7295586B2 (en) 2002-02-21 2007-11-13 Finisar Corporation Carbon doped GaAsSb suitable for use in tunnel junctions of long-wavelength VCSELs
US6822995B2 (en) 2002-02-21 2004-11-23 Finisar Corporation GaAs/AI(Ga)As distributed bragg reflector on InP
KR100465915B1 (ko) * 2002-04-15 2005-01-13 한국과학기술원 수직공진 표면발광 레이저
TW595059B (en) * 2002-05-03 2004-06-21 Osram Opto Semiconductors Gmbh Optically pumped semiconductor laser device
US6949473B2 (en) * 2002-05-24 2005-09-27 Finisar Corporation Methods for identifying and removing an oxide-induced dead zone in a semiconductor device structure
US6965626B2 (en) * 2002-09-03 2005-11-15 Finisar Corporation Single mode VCSEL
US6813293B2 (en) * 2002-11-21 2004-11-02 Finisar Corporation Long wavelength VCSEL with tunnel junction, and implant
US20040222363A1 (en) * 2003-05-07 2004-11-11 Honeywell International Inc. Connectorized optical component misalignment detection system
US20040247250A1 (en) * 2003-06-03 2004-12-09 Honeywell International Inc. Integrated sleeve pluggable package
US7298942B2 (en) 2003-06-06 2007-11-20 Finisar Corporation Pluggable optical optic system having a lens fiber stop
US7433381B2 (en) 2003-06-25 2008-10-07 Finisar Corporation InP based long wavelength VCSEL
US7277461B2 (en) * 2003-06-27 2007-10-02 Finisar Corporation Dielectric VCSEL gain guide
US7054345B2 (en) 2003-06-27 2006-05-30 Finisar Corporation Enhanced lateral oxidation
US7075962B2 (en) * 2003-06-27 2006-07-11 Finisar Corporation VCSEL having thermal management
US7149383B2 (en) * 2003-06-30 2006-12-12 Finisar Corporation Optical system with reduced back reflection
US6961489B2 (en) 2003-06-30 2005-11-01 Finisar Corporation High speed optical system
US20060056762A1 (en) * 2003-07-02 2006-03-16 Honeywell International Inc. Lens optical coupler
US7210857B2 (en) * 2003-07-16 2007-05-01 Finisar Corporation Optical coupling system
US20050013539A1 (en) * 2003-07-17 2005-01-20 Honeywell International Inc. Optical coupling system
US6887801B2 (en) * 2003-07-18 2005-05-03 Finisar Corporation Edge bead control method and apparatus
US7031363B2 (en) * 2003-10-29 2006-04-18 Finisar Corporation Long wavelength VCSEL device processing
US7095768B2 (en) 2004-02-17 2006-08-22 Jds Uniphase Corporation Index guided VCSEL and method of fabrication
CN1305191C (zh) * 2004-04-06 2007-03-14 北京工业大学 三轴自对准法制备内腔接触式垂直腔面发射激光器
US7920612B2 (en) * 2004-08-31 2011-04-05 Finisar Corporation Light emitting semiconductor device having an electrical confinement barrier near the active region
US7596165B2 (en) * 2004-08-31 2009-09-29 Finisar Corporation Distributed Bragg Reflector for optoelectronic device
US7829912B2 (en) * 2006-07-31 2010-11-09 Finisar Corporation Efficient carrier injection in a semiconductor device
CN101432936B (zh) 2004-10-01 2011-02-02 菲尼萨公司 具有多顶侧接触的垂直腔面发射激光器
US7860137B2 (en) 2004-10-01 2010-12-28 Finisar Corporation Vertical cavity surface emitting laser with undoped top mirror
US8031752B1 (en) 2007-04-16 2011-10-04 Finisar Corporation VCSEL optimized for high speed data
JP5302635B2 (ja) * 2008-11-13 2013-10-02 パナソニック株式会社 多層配線基板
US8687201B2 (en) 2012-08-31 2014-04-01 Lightlab Imaging, Inc. Optical coherence tomography control systems and methods
DE102015116970A1 (de) * 2015-10-06 2017-04-06 Osram Opto Semiconductors Gmbh Halbleiterlaser und Verfahren zur Herstellung eines Halbleiterlasers
US10897122B2 (en) 2018-04-20 2021-01-19 Hewlett Packard Enterprise Development Lp Optical apparatus for optical transceivers
CN111803797B (zh) * 2020-06-10 2022-07-08 殷硕仑 一种短波红外集成医疗光源及应用
US11936163B2 (en) 2020-08-24 2024-03-19 Changchun Institute Of Optics, Fine Mechanics And Physics Radiation emitter
EP3961829B1 (de) * 2020-08-24 2023-10-04 Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences Strahlungsemitter
US12308618B2 (en) * 2021-04-26 2025-05-20 Lumentum Operations Llc Matrix addressable vertical cavity surface emitting laser array
US12334711B2 (en) * 2021-05-19 2025-06-17 Mellanox Technologies, Ltd. Fabricating semiconductor devices, such as VCSELs, with an oxide confinement layer

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US5563094A (en) * 1989-03-24 1996-10-08 Xerox Corporation Buried reverse bias junction configurations in semiconductor structures employing photo induced evaporation enhancement during in situ epitaxial growth and device structures utilizing the same
US5327448A (en) * 1992-03-30 1994-07-05 The Board Of Trustees Of The University Of Illinois Semiconductor devices and techniques for controlled optical confinement
US5550081A (en) * 1994-04-08 1996-08-27 Board Of Trustees Of The University Of Illinois Method of fabricating a semiconductor device by oxidizing aluminum-bearing 1H-V semiconductor in water vapor environment
US5513204A (en) 1995-04-12 1996-04-30 Optical Concepts, Inc. Long wavelength, vertical cavity surface emitting laser with vertically integrated optical pump
DE19523267A1 (de) 1995-06-27 1997-01-02 Bosch Gmbh Robert Lasermodul
US5719891A (en) * 1995-12-18 1998-02-17 Picolight Incorporated Conductive element with lateral oxidation barrier
US5881085A (en) 1996-07-25 1999-03-09 Picolight, Incorporated Lens comprising at least one oxidized layer and method for forming same
US5729566A (en) * 1996-06-07 1998-03-17 Picolight Incorporated Light emitting device having an electrical contact through a layer containing oxidized material
US5914976A (en) 1997-01-08 1999-06-22 W. L. Gore & Associates, Inc. VCSEL-based multi-wavelength transmitter and receiver modules for serial and parallel optical links
US5903588A (en) * 1997-03-06 1999-05-11 Honeywell Inc. Laser with a selectively changed current confining layer
US5991326A (en) * 1998-04-14 1999-11-23 Bandwidth9, Inc. Lattice-relaxed verticle optical cavities
US6201264B1 (en) * 1999-01-14 2001-03-13 Lumileds Lighting, U.S., Llc Advanced semiconductor devices fabricated with passivated high aluminum content III-V materials

Also Published As

Publication number Publication date
EP0999621B1 (de) 2003-07-02
US6314118B1 (en) 2001-11-06
DE69909214T2 (de) 2004-04-22
JP2000151015A (ja) 2000-05-30
US20010019569A1 (en) 2001-09-06
US6372533B2 (en) 2002-04-16
EP0999621A1 (de) 2000-05-10
KR20000035147A (ko) 2000-06-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee