DE69838154D1 - Belichtungseinheit, Belichtungssystem und Verfahren zur Herstellung einer Vorrichtung - Google Patents

Belichtungseinheit, Belichtungssystem und Verfahren zur Herstellung einer Vorrichtung

Info

Publication number: DE69838154D1
Authority: DE; Germany
Prior art keywords: exposure; making; exposure unit; unit; exposure system
Prior art date: 1997-03-04
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE69838154T

Other languages

English (en)

Other versions

DE69838154T2 (de

Inventor

Takashi Nakamura

Yasuyoshi Yamada

Satoshi Kyotoku

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-03-04

Filing date

1998-02-25

Publication date

2007-09-13

1997-03-04 Priority claimed from JP6398497A external-priority patent/JP3472066B2/ja

1997-11-07 Priority claimed from JP9320625A external-priority patent/JPH11145050A/ja

1998-02-25 Application filed by Canon Inc filed Critical Canon Inc

2007-09-13 Publication of DE69838154D1 publication Critical patent/DE69838154D1/de

2008-04-17 Application granted granted Critical

2008-04-17 Publication of DE69838154T2 publication Critical patent/DE69838154T2/de

2018-02-26 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
- H10P76/00—

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

DE69838154T 1997-03-04 1998-02-25 Belichtungseinheit, Belichtungssystem und Verfahren zur Herstellung einer Vorrichtung Expired - Lifetime DE69838154T2 (de)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
JP6398497		1997-03-04
JP6398497A JP3472066B2 (ja)	1997-03-04	1997-03-04	露光装置、半導体生産システム及び半導体製造方法
JP32062597		1997-11-07
JP9320625A JPH11145050A (ja)	1997-11-07	1997-11-07	半導体露光装置システム、半導体露光装置およびデバイス製造方法

Publications (2)

Publication Number	Publication Date
DE69838154D1 true DE69838154D1 (de)	2007-09-13
DE69838154T2 DE69838154T2 (de)	2008-04-17

Family

ID=26405115

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69838154T Expired - Lifetime DE69838154T2 (de)	1997-03-04	1998-02-25	Belichtungseinheit, Belichtungssystem und Verfahren zur Herstellung einer Vorrichtung

Country Status (5)

Country	Link
US (1)	US6185474B1 (de)
EP (1)	EP0863439B1 (de)
KR (1)	KR19980079878A (de)
DE (1)	DE69838154T2 (de)
TW (1)	TW376542B (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR100315912B1 (ko) *	1998-04-27	2002-02-19	윤종용	파일서버를이용한자동화시스템과그제어방법
US6094605A (en) *	1998-07-06	2000-07-25	Storage Technology Corporation	Virtual automated cartridge system
JP4365934B2 (ja) *	1999-05-10	2009-11-18	キヤノン株式会社	露光装置、半導体製造装置およびデバイス製造方法
KR100510065B1 (ko) *	1999-06-22	2005-08-26	주식회사 하이닉스반도체	반도체 제조를 위한 오버레이 장비 자동화 방법
JP2002075820A (ja) *	2000-08-24	2002-03-15	Hitachi Ltd	半導体製造装置の使用許諾システムおよび使用許諾方法
JP2002252161A (ja) *	2001-02-23	2002-09-06	Hitachi Ltd	半導体製造システム
US20040111339A1 (en) *	2001-04-03	2004-06-10	Asyst Technologies, Inc.	Distributed control system architecture and method for a material transport system
JP2003031639A (ja) *	2001-07-17	2003-01-31	Canon Inc	基板処理装置、基板の搬送方法及び露光装置
JP2003045947A (ja) *	2001-07-27	2003-02-14	Canon Inc	基板処理装置及び露光装置
CN1996552B (zh) *	2001-08-31	2012-09-05	克罗辛自动化公司	晶片机
US6978284B2 (en) *	2002-03-21	2005-12-20	International Business Machines Corporation	System and method for designating and deleting expired files
JP4126189B2 (ja) *	2002-04-10	2008-07-30	株式会社日立ハイテクノロジーズ	検査条件設定プログラム、検査装置および検査システム
KR100478730B1 (ko) *	2002-07-30	2005-03-24	주식회사 제일	기판 주변 노광 장치
US6735493B1 (en)	2002-10-21	2004-05-11	Taiwan Semiconductor Manufacturing Co., Ltd.	Recipe management system
KR101340110B1 (ko) *	2008-09-30	2013-12-10	가부시키가이샤 섬코	반도체 제조 공장
US8504526B2 (en)	2010-06-04	2013-08-06	Commvault Systems, Inc.	Failover systems and methods for performing backup operations
US11449394B2 (en)	2010-06-04	2022-09-20	Commvault Systems, Inc.	Failover systems and methods for performing backup operations, including heterogeneous indexing and load balancing of backup and indexing resources
CN103186052B (zh) *	2011-12-28	2015-04-22	无锡华润上华科技有限公司	一种光刻参数优化方法
US9563518B2 (en)	2014-04-02	2017-02-07	Commvault Systems, Inc.	Information management by a media agent in the absence of communications with a storage manager
CN108028506B (zh) *	2015-10-19	2020-06-26	极光先进雷射株式会社	激光装置管理系统
US10474548B2 (en)	2016-09-30	2019-11-12	Commvault Systems, Inc.	Heartbeat monitoring of virtual machines for initiating failover operations in a data storage management system, using ping monitoring of target virtual machines
US11200124B2 (en)	2018-12-06	2021-12-14	Commvault Systems, Inc.	Assigning backup resources based on failover of partnered data storage servers in a data storage management system
US11099956B1 (en)	2020-03-26	2021-08-24	Commvault Systems, Inc.	Snapshot-based disaster recovery orchestration of virtual machine failover and failback operations
US11645175B2 (en)	2021-02-12	2023-05-09	Commvault Systems, Inc.	Automatic failover of a storage manager
US12360942B2 (en)	2023-01-19	2025-07-15	Commvault Systems, Inc.	Selection of a simulated archiving plan for a desired dataset

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0616475B2 (ja) *	1987-04-03	1994-03-02	三菱電機株式会社	物品の製造システム及び物品の製造方法
US4974166A (en) *	1987-05-18	1990-11-27	Asyst Technologies, Inc.	Processing systems with intelligent article tracking
EP0346801B1 (de) *	1988-06-17	1996-12-27	Siemens Aktiengesellschaft	Verfahren und Anordnung zur Ausführung eines Programms in einem heterogenen Mehrrechnersystem
US5091849A (en) *	1988-10-24	1992-02-25	The Walt Disney Company	Computer image production system utilizing first and second networks for separately transferring control information and digital image data
JPH04286311A (ja)	1991-03-15	1992-10-12	Canon Inc	半導体露光装置
JP3336436B2 (ja)	1991-04-02	2002-10-21	株式会社ニコン	リソグラフィシステム、情報収集装置、露光装置、及び半導体デバイス製造方法
JP2877998B2 (ja)	1991-09-03	1999-04-05	キヤノン株式会社	半導体製造装置
JP3309478B2 (ja) *	1993-02-26	2002-07-29	ソニー株式会社	チップ管理システムおよびその入力処理方法とロット処理方法およびチップ管理システムによるチップ製造方法
JPH07141005A (ja) *	1993-06-21	1995-06-02	Hitachi Ltd	半導体集積回路装置の製造方法および製造装置
US5432702A (en) *	1994-06-17	1995-07-11	Advanced Micro Devices Inc.	Bar code recipe selection system using workstation controllers
JP3892493B2 (ja) *	1995-11-29	2007-03-14	大日本スクリーン製造株式会社	基板処理システム

1998
- 1998-02-24 TW TW087102644A patent/TW376542B/zh not_active IP Right Cessation
- 1998-02-25 DE DE69838154T patent/DE69838154T2/de not_active Expired - Lifetime
- 1998-02-25 EP EP98301384A patent/EP0863439B1/de not_active Expired - Lifetime
- 1998-03-02 US US09/034,019 patent/US6185474B1/en not_active Expired - Lifetime
- 1998-03-04 KR KR1019980007071A patent/KR19980079878A/ko not_active Ceased

Also Published As

Publication number	Publication date
KR19980079878A (ko)	1998-11-25
EP0863439A2 (de)	1998-09-09
EP0863439B1 (de)	2007-08-01
TW376542B (en)	1999-12-11
US6185474B1 (en)	2001-02-06
DE69838154T2 (de)	2008-04-17
EP0863439A3 (de)	2000-01-19

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Legal Events

Date	Code	Title	Description
2008-08-21	8364	No opposition during term of opposition