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DE69835324D1 - Dampfphasenabscheidungsgerät mit kathodischem Lichtbogen (Ringförmige Kathode) - Google Patents

Dampfphasenabscheidungsgerät mit kathodischem Lichtbogen (Ringförmige Kathode)

Info

Publication number
DE69835324D1
DE69835324D1 DE69835324T DE69835324T DE69835324D1 DE 69835324 D1 DE69835324 D1 DE 69835324D1 DE 69835324 T DE69835324 T DE 69835324T DE 69835324 T DE69835324 T DE 69835324T DE 69835324 D1 DE69835324 D1 DE 69835324D1
Authority
DE
Germany
Prior art keywords
vapor deposition
deposition device
cathodic arc
arc vapor
annular cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69835324T
Other languages
English (en)
Other versions
DE69835324T2 (de
Inventor
Russel A Beers
Robert E Hendricks
Dean N Marszal
Robert J Wright
Allan A Noetzel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RTX Corp
Original Assignee
United Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Technologies Corp filed Critical United Technologies Corp
Application granted granted Critical
Publication of DE69835324D1 publication Critical patent/DE69835324D1/de
Publication of DE69835324T2 publication Critical patent/DE69835324T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE69835324T 1997-08-30 1998-08-28 Dampfphasenabscheidungsgerät mit kathodischem Lichtbogen (Ringförmige Kathode) Expired - Lifetime DE69835324T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/919,131 US5972185A (en) 1997-08-30 1997-08-30 Cathodic arc vapor deposition apparatus (annular cathode)
US919131 1997-08-30

Publications (2)

Publication Number Publication Date
DE69835324D1 true DE69835324D1 (de) 2006-09-07
DE69835324T2 DE69835324T2 (de) 2007-08-23

Family

ID=25441556

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69835324T Expired - Lifetime DE69835324T2 (de) 1997-08-30 1998-08-28 Dampfphasenabscheidungsgerät mit kathodischem Lichtbogen (Ringförmige Kathode)

Country Status (6)

Country Link
US (1) US5972185A (de)
EP (1) EP0905272B1 (de)
JP (1) JPH11140630A (de)
KR (1) KR100569044B1 (de)
DE (1) DE69835324T2 (de)
SG (1) SG67548A1 (de)

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JP3104701B1 (ja) * 1999-08-18 2000-10-30 日新電機株式会社 アーク式蒸発源
US6936145B2 (en) * 2002-02-28 2005-08-30 Ionedge Corporation Coating method and apparatus
KR100811446B1 (ko) 2003-11-17 2008-03-07 동부일렉트로닉스 주식회사 이온주입장치용 캐소우드 바이어스 와이어 구조
US7084573B2 (en) * 2004-03-05 2006-08-01 Tokyo Electron Limited Magnetically enhanced capacitive plasma source for ionized physical vapor deposition
US8241468B2 (en) 2004-12-13 2012-08-14 United Technologies Corporation Method and apparatus for cathodic arc deposition of materials on a substrate
US20070138019A1 (en) * 2005-12-21 2007-06-21 United Technologies Corporation Platinum modified NiCoCrAlY bondcoat for thermal barrier coating
US7214409B1 (en) 2005-12-21 2007-05-08 United Technologies Corporation High strength Ni-Pt-Al-Hf bondcoat
JP2009540932A (ja) * 2006-06-21 2009-11-26 プロテウス バイオメディカル インコーポレイテッド 陰極アーク製作構造物を備えるインプラント型医療デバイス
JP5614991B2 (ja) 2007-02-14 2014-10-29 プロテウス デジタル ヘルス， インコーポレイテッド 大表面積電極を有する体内型電源
US8088260B2 (en) * 2007-08-14 2012-01-03 United Technologies Corporation Puck for cathodic arc coating with continuous groove to control arc
CN101861659A (zh) * 2007-12-12 2010-10-13 新港有限公司 性能提高的光学镀膜半导体器件及相关生产方法
US8641963B2 (en) 2008-07-08 2014-02-04 United Technologies Corporation Economic oxidation and fatigue resistant metallic coating
US20120193227A1 (en) * 2011-02-02 2012-08-02 Tryon Brian S Magnet array for a physical vapor deposition system
US9153422B2 (en) 2011-08-02 2015-10-06 Envaerospace, Inc. Arc PVD plasma source and method of deposition of nanoimplanted coatings
US9359669B2 (en) 2011-12-09 2016-06-07 United Technologies Corporation Method for improved cathodic arc coating process
EP3372707B1 (de) 2013-03-15 2022-06-29 Raytheon Technologies Corporation Spallationsbeständige wärmesperrenbeschichtung
EP3055441B1 (de) 2013-10-08 2022-01-12 Raytheon Technologies Corporation Vorrichtung und verfahren zur beschichtung eines werkstücks mittels kathodischer lichtbogenverdampfung
EP3071732B1 (de) 2013-11-19 2019-11-13 United Technologies Corporation Artikel mit beschichtung mit veränderlicher zusammensetzung
WO2015146043A1 (ja) * 2014-03-24 2015-10-01 パナソニックＩｐマネジメント株式会社 磁気センサ
US10094890B2 (en) * 2014-10-09 2018-10-09 Panasonic Intellectual Property Management Co., Ltd. Magnetic sensor
US10371244B2 (en) 2015-04-09 2019-08-06 United Technologies Corporation Additive manufactured gear for a geared architecture gas turbine engine
US20170198601A1 (en) 2016-01-12 2017-07-13 United Technologies Corporation Internally cooled ni-base superalloy component with spallation-resistant tbc system
US20210147974A1 (en) * 2017-06-08 2021-05-20 Board Of Trustees Of Michigan State University Magnetic-field-assisted plasma coating system
CN108642452B (zh) * 2018-06-08 2020-07-03 芜湖市亿仑电子有限公司 一种电容器金属化薄膜加工真空镀膜机
WO2020014448A1 (en) 2018-07-11 2020-01-16 Board Of Trustees Of Michigan State University Vertically oriented plasma reactor
US12224165B2 (en) 2019-12-06 2025-02-11 Board Of Trustees Of Michigan State University Magnetic-field-assisted plasma coating system
CN117966103B (zh) * 2024-02-04 2024-06-18 浙江晟霖益嘉科技有限公司 一种蒸发真空设备生产线

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Also Published As

Publication number Publication date
SG67548A1 (en) 1999-09-21
KR100569044B1 (ko) 2006-06-21
EP0905272B1 (de) 2006-07-26
EP0905272A2 (de) 1999-03-31
JPH11140630A (ja) 1999-05-25
DE69835324T2 (de) 2007-08-23
EP0905272A3 (de) 2000-12-06
US5972185A (en) 1999-10-26
KR19990024031A (ko) 1999-03-25

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Legal Events

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