DE69828104D1 - Plasmabearbeitungs-Verfahren und -Gerät - Google Patents

Plasmabearbeitungs-Verfahren und -Gerät

Info

Publication number: DE69828104D1
Authority: DE; Germany
Prior art keywords: processing method; plasma processing; plasma; processing
Prior art date: 1997-05-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE69828104T

Other languages

English (en)

Other versions

DE69828104T2 (de

Inventor

Koichiro Moriyama

Yukito Aota

Masahiro Kanai

Hirokazu Otoshi

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-05-22

Filing date

1998-05-20

Publication date

2005-01-20

1998-05-20 Application filed by Canon Inc filed Critical Canon Inc

2005-01-20 Publication of DE69828104D1 publication Critical patent/DE69828104D1/de

2005-12-08 Application granted granted Critical

2005-12-08 Publication of DE69828104T2 publication Critical patent/DE69828104T2/de

2018-05-21 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
- H01J37/32155—Frequency modulation
- H01J37/32165—Plural frequencies
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Chemical Vapour Deposition (AREA)
Photovoltaic Devices (AREA)
Drying Of Semiconductors (AREA)
Plasma Technology (AREA)
ing And Chemical Polishing (AREA)

DE69828104T 1997-05-22 1998-05-20 Plasmabearbeitungs-Verfahren und -Gerät Expired - Lifetime DE69828104T2 (de)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
JP13225897		1997-05-22
JP13225897		1997-05-22
JP12889798A JP3630982B2 (ja)	1997-05-22	1998-05-12	プラズマ処理方法及びプラズマ処理装置
JP12889798		1998-05-12

Publications (2)

Publication Number	Publication Date
DE69828104D1 true DE69828104D1 (de)	2005-01-20
DE69828104T2 DE69828104T2 (de)	2005-12-08

Family

ID=26464465

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69828104T Expired - Lifetime DE69828104T2 (de)	1997-05-22	1998-05-20	Plasmabearbeitungs-Verfahren und -Gerät

Country Status (7)

Country	Link
US (1)	US6031198A (de)
EP (1)	EP0880163B1 (de)
JP (1)	JP3630982B2 (de)
KR (1)	KR100268369B1 (de)
CN (1)	CN1132233C (de)
AU (1)	AU740985B2 (de)
DE (1)	DE69828104T2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2000173982A (ja) *	1998-12-01	2000-06-23	Matsushita Electric Ind Co Ltd	プラズマ処理装置およびプラズマ処理方法
WO2000062328A1 (en) *	1999-04-14	2000-10-19	Surface Technology Systems Limited	Method and apparatus for stabilising a plasma
JP2001040478A (ja)	1999-05-27	2001-02-13	Canon Inc	堆積膜形成装置及び堆積膜形成方法
JP2001284267A (ja) *	2000-04-03	2001-10-12	Canon Inc	排気処理方法、プラズマ処理方法及びプラズマ処理装置
JP2002020863A (ja)	2000-05-01	2002-01-23	Canon Inc	堆積膜の形成方法及び形成装置、及び基板処理方法
US20030094239A1 (en) *	2000-06-02	2003-05-22	Quon Bill H.	Apparatus and method for improving electron ecceleration
US6559052B2 (en) *	2000-07-07	2003-05-06	Applied Materials, Inc.	Deposition of amorphous silicon films by high density plasma HDP-CVD at low temperatures
JP4510242B2 (ja)	2000-07-11	2010-07-21	キヤノン株式会社	薄膜形成方法
JP4557400B2 (ja)	2000-09-14	2010-10-06	キヤノン株式会社	堆積膜形成方法
JP3665265B2 (ja) *	2000-12-28	2005-06-29	株式会社日立製作所	プラズマ処理装置
DE10147998A1 (de) *	2001-09-28	2003-04-10	Unaxis Balzers Ag	Verfahren und Vorrichtung zur Erzeugung eines Plasmas
JP4024053B2 (ja) *	2002-02-08	2007-12-19	キヤノンアネルバ株式会社	高周波プラズマ処理方法及び高周波プラズマ処理装置
KR100489624B1 (ko) *	2002-06-21	2005-05-17	주식회사 디엠에스	상압 플라즈마 발생 장치
TWI236701B (en) *	2002-07-24	2005-07-21	Tokyo Electron Ltd	Plasma treatment apparatus and its control method
JP4490142B2 (ja) *	2004-03-22	2010-06-23	株式会社ダイヘン	高周波電源の出力電力制御方法および高周波電源装置
CN101453823B (zh) *	2007-12-06	2011-09-14	北京北方微电子基地设备工艺研究中心有限责任公司	一种控制射频放电系统直流偏压的装置和方法
KR20100007518A (ko) *	2008-07-14	2010-01-22	삼성전자주식회사	증착 장치 및 이를 이용한 박막 증착 방법
US7883682B2 (en) *	2009-02-20	2011-02-08	Conocophillips Company	Carbon dioxide rich off-gas from a two stage gasification process
JP5625624B2 (ja) *	2010-08-27	2014-11-19	東京エレクトロン株式会社	成膜装置、成膜方法及び記憶媒体
JP2014154421A (ja) *	2013-02-12	2014-08-25	Tokyo Electron Ltd	プラズマ処理装置、プラズマ処理方法、および高周波発生器
US9343308B2 (en) *	2013-10-28	2016-05-17	Asm Ip Holding B.V.	Method for trimming carbon-containing film at reduced trimming rate
DE102014205695B4 (de)	2014-03-27	2016-01-28	Christof-Herbert Diener	Niederdruckplasmaanlage mit sequentieller Steuerung
CN105206494B (zh) *	2014-06-18	2017-06-06	北京北方微电子基地设备工艺研究中心有限责任公司	脉冲射频电源的阻抗匹配方法及等离子体设备的匹配方法
GB201514998D0 (en) *	2015-08-24	2015-10-07	Element Six Technologies Ltd	Microwave generators and manufacure of synthetic diamond material
KR102675856B1 (ko) *	2020-01-20	2024-06-17	에이에스엠 아이피 홀딩 비.브이.	박막 형성 방법 및 박막 표면 개질 방법
CN112345814B (zh) *	2020-10-30	2024-07-23	北京北方华创微电子装备有限公司	直流偏压检测方法、装置、治具以及下电极系统

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0798521B2 (ja) *	1986-08-20	1995-10-25	澁谷工業株式会社	回転式重量充填装置
US4888088A (en) *	1989-03-06	1989-12-19	Tegal Corporation	Ignitor for a microwave sustained plasma
US5707486A (en) *	1990-07-31	1998-01-13	Applied Materials, Inc.	Plasma reactor using UHF/VHF and RF triode source, and process
US5487875A (en) *	1991-11-05	1996-01-30	Canon Kabushiki Kaisha	Microwave introducing device provided with an endless circular waveguide and plasma treating apparatus provided with said device
US5567241A (en) *	1993-04-30	1996-10-22	Energy Conversion Devices, Inc.	Method and apparatus for the improved microwave deposition of thin films
JP3137810B2 (ja) *	1993-07-29	2001-02-26	キヤノン株式会社	マイクロ波プラズマ放電停止検知方法、マイクロ波プラズマ処理方法及びマイクロ波プラズマ処理装置
JPH0851228A (ja) *	1994-08-08	1996-02-20	Canon Inc	光起電力素子の作製方法
JP3169337B2 (ja) *	1995-05-30	2001-05-21	キヤノン株式会社	光起電力素子及びその製造方法

1998
- 1998-05-12 JP JP12889798A patent/JP3630982B2/ja not_active Expired - Fee Related
- 1998-05-19 US US09/080,922 patent/US6031198A/en not_active Expired - Lifetime
- 1998-05-20 EP EP98109196A patent/EP0880163B1/de not_active Expired - Lifetime
- 1998-05-20 DE DE69828104T patent/DE69828104T2/de not_active Expired - Lifetime
- 1998-05-21 AU AU68025/98A patent/AU740985B2/en not_active Ceased
- 1998-05-22 KR KR1019980018489A patent/KR100268369B1/ko not_active Expired - Fee Related
- 1998-05-22 CN CN98108961A patent/CN1132233C/zh not_active Expired - Fee Related

Also Published As

Publication number	Publication date
KR100268369B1 (ko)	2000-11-01
EP0880163A2 (de)	1998-11-25
JPH1140396A (ja)	1999-02-12
EP0880163A3 (de)	2000-12-20
JP3630982B2 (ja)	2005-03-23
DE69828104T2 (de)	2005-12-08
AU6802598A (en)	1998-11-26
CN1212456A (zh)	1999-03-31
CN1132233C (zh)	2003-12-24
US6031198A (en)	2000-02-29
EP0880163B1 (de)	2004-12-15
KR19980087289A (ko)	1998-12-05
AU740985B2 (en)	2001-11-22

Publication	Publication Date	Title
DE69828104D1 (de)	2005-01-20	Plasmabearbeitungs-Verfahren und -Gerät
DE69827915D1 (de)	2005-01-05	Verarbeitungsverfahren und -vorrichtung
SG68611A1 (en)	1999-11-16	Plasma processing apparatus and plasma processing method
SG74629A1 (en)	2000-08-22	Drying processing method and apparatus using same
DE69732943D1 (de)	2005-05-12	Datenverarbeitungsvorrichtung und -verfahren
DE69933436D1 (de)	2006-11-16	Bildverarbeitungsvorrichtung und -verfahren
SG70631A1 (en)	2000-02-22	Plasma processing system and plasma processing method
DE69933496D1 (de)	2006-11-23	Bildverarbeitungsvorrichtung und -verfahren
DE69736377D1 (de)	2006-09-07	Bildverarbeitungsgerät und -verfahren
DE69732279D1 (de)	2005-02-24	Bildverarbeitungsgerät und -verfahren
SG52614A1 (en)	1998-09-28	Plasma processing apparatus and plasma processing method
DE69737984D1 (de)	2007-09-20	Bildverarbeitungsverfahren und -gerät
DE69825851D1 (de)	2004-09-30	Bildverarbeitungsvorrichtung und -verfahren
DE69838579D1 (de)	2007-11-29	Bildverarbeitungsvorrichtung und -verfahren
SG76561A1 (en)	2000-11-21	Processing apparatus and method
DE69941941D1 (de)	2010-03-11	Bildverarbeitungsverfahren und -vorrichtung
DE69416489D1 (de)	1999-03-25	Mikrowellenplasma-Bearbeitungsvorrichtung und -verfahren
SG47090A1 (en)	1998-03-20	Plasma processing method and apparatus
SG73518A1 (en)	2000-06-20	Processing apparatus and method using solution
DE69625149D1 (de)	2003-01-16	Mikrowellen-Plasmabearbeitungsgerät und Mikrowellen-Plasmabearbeitungsverfahren
DE69739432D1 (de)	2009-07-16	Informationsverarbeitungsgerät und -verfahren
DE69942078D1 (de)	2010-04-15	Bildverarbeitungsvorrichtung und -verfahren
SG63826A1 (en)	1999-03-30	Substrate processing apparatus and method
DE69733456D1 (de)	2005-07-14	Bildverarbeitungsvorrichtung und -verfahren
DE69736267D1 (de)	2006-08-17	Plasmabehandlungsvorrichtung und -verfahren

Legal Events

Date	Code	Title	Description
2006-01-12	8364	No opposition during term of opposition