DE69823283D1 - Reinigungszusammensetzung - Google Patents

Reinigungszusammensetzung

Info

Publication number: DE69823283D1
Authority: DE; Germany
Prior art keywords: cleaning composition; cleaning; composition
Prior art date: 1997-08-12
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE69823283T

Other languages

English (en)

Other versions

DE69823283T2 (de

Inventor

Norio Ishikawa

Kiyoto Mori

Hidemitsu Aoki

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Kanto Chemical Co Inc

Renesas Electronics Corp

Original Assignee

Kanto Chemical Co Inc

NEC Electronics Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-08-12

Filing date

1998-08-11

Publication date

2004-05-27

1998-08-11 Application filed by Kanto Chemical Co Inc, NEC Electronics Corp filed Critical Kanto Chemical Co Inc

2004-05-27 Application granted granted Critical

2004-05-27 Publication of DE69823283D1 publication Critical patent/DE69823283D1/de

2005-04-28 Publication of DE69823283T2 publication Critical patent/DE69823283T2/de

2018-08-12 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- H10P70/277—
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/265—Carboxylic acids or salts thereof
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3245—Aminoacids
- H10P70/00—
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Organic Chemistry (AREA)
Chemical Kinetics & Catalysis (AREA)
Oil, Petroleum & Natural Gas (AREA)
Wood Science & Technology (AREA)
Life Sciences & Earth Sciences (AREA)
Health & Medical Sciences (AREA)
Emergency Medicine (AREA)
Manufacturing & Machinery (AREA)
Microelectronics & Electronic Packaging (AREA)
Cleaning Or Drying Semiconductors (AREA)
Detergent Compositions (AREA)

DE69823283T 1997-08-12 1998-08-11 Reinigungszusammensetzung Expired - Lifetime DE69823283T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP22894397		1997-08-12
JP22894397		1997-08-12

Publications (2)

Publication Number	Publication Date
DE69823283D1 true DE69823283D1 (de)	2004-05-27
DE69823283T2 DE69823283T2 (de)	2005-04-28

Family

ID=16884291

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69823283T Expired - Lifetime DE69823283T2 (de)	1997-08-12	1998-08-11	Reinigungszusammensetzung

Country Status (6)

Country	Link
US (1)	US6080709A (de)
EP (1)	EP0897975B1 (de)
KR (1)	KR100533194B1 (de)
CN (1)	CN1203163C (de)
DE (1)	DE69823283T2 (de)
TW (1)	TW387936B (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6896826B2 (en) *	1997-01-09	2005-05-24	Advanced Technology Materials, Inc.	Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
US6755989B2 (en) *	1997-01-09	2004-06-29	Advanced Technology Materials, Inc.	Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
US6231677B1 (en) *	1998-02-27	2001-05-15	Kanto Kagaku Kabushiki Kaisha	Photoresist stripping liquid composition
US6332988B1 (en)	1999-06-02	2001-12-25	International Business Machines Corporation	Rework process
US6419554B2 (en) *	1999-06-24	2002-07-16	Micron Technology, Inc.	Fixed abrasive chemical-mechanical planarization of titanium nitride
US6436302B1 (en) *	1999-08-23	2002-08-20	Applied Materials, Inc.	Post CU CMP polishing for reduced defects
JP3307375B2 (ja) *	1999-10-04	2002-07-24	日本電気株式会社	半導体装置の製造方法
US6592433B2 (en) *	1999-12-31	2003-07-15	Intel Corporation	Method for defect reduction
AU2001241190A1 (en) *	2000-03-21	2001-10-03	Wako Pure Chemical Industries, Ltd.	Semiconductor wafer cleaning agent and cleaning method
US6627546B2 (en)	2001-06-29	2003-09-30	Ashland Inc.	Process for removing contaminant from a surface and composition useful therefor
JP3787085B2 (ja)	2001-12-04	2006-06-21	関東化学株式会社	フォトレジスト残渣除去液組成物
TWI339680B (en) *	2002-02-19	2011-04-01	Kanto Kagaku	Washing liquid composition for semiconductor substrate
AU2003225178A1 (en) *	2002-04-24	2003-11-10	Ekc Technology, Inc.	Oxalic acid as a cleaning product for aluminium, copper and dielectric surfaces
JP4221191B2 (ja) *	2002-05-16	2009-02-12	関東化学株式会社	Ｃｍｐ後洗浄液組成物
JP4752270B2 (ja) *	2002-11-08	2011-08-17	和光純薬工業株式会社	洗浄液及びそれを用いた洗浄方法
JP4375991B2 (ja) *	2003-04-09	2009-12-02	関東化学株式会社	半導体基板洗浄液組成物
TWI286679B (en) *	2003-06-04	2007-09-11	Kao Corp	Removing agent composition
JP4628209B2 (ja) *	2004-11-18	2011-02-09	花王株式会社	剥離剤組成物
KR20090073376A (ko) *	2007-12-31	2009-07-03	삼성전자주식회사	위상 반전 마스크 세정용 조성물, 위상 반전 마스크의 세정방법 및 위상 반전 마스크의 제조 방법
EP2417241A4 (de) *	2009-04-08	2014-10-15	Sunsonix	Verfahren und vorrichtung zur entfernung von kontaminationsmaterial aus substraten
TR201815028T4 (tr) *	2009-11-23	2018-11-21	MetCon LLC	Elektro parlatma yöntemleri.
JP2013521646A (ja) *	2010-03-05	2013-06-10	ラムリサーチコーポレーション	ダマシン処理によるサイドウォールポリマー用の洗浄溶液
WO2011158634A1 (ja)	2010-06-18	2011-12-22	三菱瓦斯化学株式会社	銅層及びモリブデン層を含む多層構造膜用エッチング液
US8580103B2 (en)	2010-11-22	2013-11-12	Metcon, Llc	Electrolyte solution and electrochemical surface modification methods
JP6066552B2 (ja)	2011-12-06	2017-01-25	関東化學株式会社	電子デバイス用洗浄液組成物
CN104412376B (zh)	2012-07-17	2017-02-08	三井化学株式会社	半导体装置及其制造方法及冲洗液
KR102819244B1 (ko) *	2022-02-25	2025-06-12	(주)제이쓰리	반도체 웨이퍼용 세정액 조성물

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4209418A (en) *	1978-07-18	1980-06-24	Union Carbide Corporation	Gelatin benzimidazole blends as inhibitors for carboxylic acids
US4226640A (en) *	1978-10-26	1980-10-07	Kraftwerk Union Aktiengesellschaft	Method for the chemical decontamination of nuclear reactor components
CA1136398A (en) *	1979-12-10	1982-11-30	William A. Seddon	Decontaminating reagents for radioactive systems
US4357254A (en) *	1981-01-12	1982-11-02	Chemical Sciences, Inc.	Cleaning composition
US4452643A (en) *	1983-01-12	1984-06-05	Halliburton Company	Method of removing copper and copper oxide from a ferrous metal surface
US4822854A (en) *	1987-09-23	1989-04-18	The Drackett Company	Cleaning compositions containing a colorant stabilized against fading
US5154197A (en) *	1990-05-18	1992-10-13	Westinghouse Electric Corp.	Chemical cleaning method for steam generators utilizing pressure pulsing
US5108514A (en) *	1991-02-08	1992-04-28	Kisner Kim T	In-situ method for cleaning swimming pools without draining the water
US5489735A (en) *	1994-01-24	1996-02-06	D'muhala; Thomas F.	Decontamination composition for removing norms and method utilizing the same
DE19525521B4 (de) *	1994-07-15	2007-04-26	Lam Research Corp.(N.D.Ges.D.Staates Delaware), Fremont	Verfahren zum Reinigen von Substraten
TW416987B (en) *	1996-06-05	2001-01-01	Wako Pure Chem Ind Ltd	A composition for cleaning the semiconductor substrate surface
US5759437A (en) *	1996-10-31	1998-06-02	International Business Machines Corporation	Etching of Ti-W for C4 rework

1998
- 1998-08-04 TW TW087112784A patent/TW387936B/zh not_active IP Right Cessation
- 1998-08-10 CN CNB981162703A patent/CN1203163C/zh not_active Expired - Fee Related
- 1998-08-11 US US09/131,976 patent/US6080709A/en not_active Expired - Lifetime
- 1998-08-11 DE DE69823283T patent/DE69823283T2/de not_active Expired - Lifetime
- 1998-08-11 EP EP98115097A patent/EP0897975B1/de not_active Expired - Lifetime
- 1998-08-12 KR KR1019980032742A patent/KR100533194B1/ko not_active Expired - Lifetime

Also Published As

Publication number	Publication date
CN1203163C (zh)	2005-05-25
TW387936B (en)	2000-04-21
EP0897975A1 (de)	1999-02-24
CN1210886A (zh)	1999-03-17
KR19990023555A (ko)	1999-03-25
EP0897975B1 (de)	2004-04-21
US6080709A (en)	2000-06-27
KR100533194B1 (ko)	2006-09-20
DE69823283T2 (de)	2005-04-28

Publication	Publication Date	Title
MA24653A1 (fr)	1999-04-01	Compositions nettoyantes
FI970563A0 (fi)	1997-02-10	Parannettu puhdistuskoostumus
DE69823283D1 (de)	2004-05-27	Reinigungszusammensetzung
IS5430A (is)	2000-04-06	Ný samsetning
ID22931A (id)	1999-12-16	Komposisi-komposisi herbisidal
BR9709321A (pt)	1999-08-10	Composição detergente
ID25507A (id)	2000-10-05	Komposisi pencucian
DK1298194T3 (da)	2006-11-27	Staniolholdige sammensætninger
BR9709304A (pt)	1999-08-10	Composições de limpeza
ID25508A (id)	2000-10-05	Komposisi dematologis
BR9706659A (pt)	1999-06-08	Composição detergente
ATE321118T1 (de)	2006-04-15	Reinigungszusammensetzung
BR9710145A (pt)	1999-08-10	Composições de limpeza
ID21255A (id)	1999-05-12	Komposisi deterjen
DE69521804D1 (de)	2001-08-23	Reinigungszusammensetzungen
BR9706289A (pt)	1999-06-08	Composição detergente
BR9707452A (pt)	1999-07-20	Composição detergente
DE69819704D1 (de)	2003-12-18	Waschmittelzusammensetzung
ID23250A (id)	2000-03-30	Komposisi paroksetin
ID25650A (id)	2000-10-19	Komposisi-komposisi sampo
DE69706351D1 (de)	2001-10-04	Reinigungszusammensetzung
ID22707A (id)	1999-12-09	Komposisi pembersih
ID21906A (id)	1999-08-12	Komposisi adesif
BR9506925A (pt)	1997-11-18	Composição de limpeza
DE69708859D1 (de)	2002-01-17	Reinigungszusammensetzungen

Legal Events

Date	Code	Title	Description
2005-06-02	8364	No opposition during term of opposition
2012-08-28	R082	Change of representative	Ref document number: 897975 Country of ref document: EP Representative=s name: DR. VOLKER VOSSIUS, CORINNA VOSSIUS, TILMAN VO, DE
2012-10-18	R081	Change of applicant/patentee	Ref document number: 897975 Country of ref document: EP Owner name: RENESAS ELECTRONICS CORPORATION, JP Free format text: FORMER OWNER: NEC ELECTRONICS CORP., KANTO KAGAKU K.K., , JP Effective date: 20120828 Ref document number: 897975 Country of ref document: EP Owner name: KANTO KAGAKU K.K., JP Free format text: FORMER OWNER: NEC ELECTRONICS CORP., KANTO KAGAKU K.K., , JP Effective date: 20120828
2012-10-18	R082	Change of representative	Ref document number: 897975 Country of ref document: EP Representative=s name: DR. VOLKER VOSSIUS, CORINNA VOSSIUS, TILMAN VO, DE Effective date: 20120828