DE69730370D1 - Niederdruck-CVD-System - Google Patents

Niederdruck-CVD-System

Info

Publication number: DE69730370D1
Authority: DE; Germany
Prior art keywords: low pressure; pressure cvd; cvd system; low; pressure
Prior art date: 1996-03-15
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE69730370T

Other languages

English (en)

Other versions

DE69730370T2 (de

Inventor

Taroh Uchiyama

Yukio Yoshikawa

Takashi Tsukamoto

Jiro Nishihama

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

AGC Inc

Original Assignee

Asahi Glass Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1996-03-15

Filing date

1997-03-13

Publication date

2004-09-30

1996-03-15 Priority claimed from JP08729696A external-priority patent/JP3473263B2/ja

1996-12-27 Priority claimed from JP35780996A external-priority patent/JP3861350B2/ja

1997-03-13 Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd

2004-09-30 Application granted granted Critical

2004-09-30 Publication of DE69730370D1 publication Critical patent/DE69730370D1/de

2005-09-01 Publication of DE69730370T2 publication Critical patent/DE69730370T2/de

2017-03-14 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- H10P14/20—
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/08—Reaction chambers; Selection of materials therefor

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
General Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Crystallography & Structural Chemistry (AREA)
Mechanical Engineering (AREA)
Chemical Vapour Deposition (AREA)

DE69730370T 1996-03-15 1997-03-13 Niederdruck-CVD-System Expired - Lifetime DE69730370T2 (de)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
JP8729696		1996-03-15
JP08729696A JP3473263B2 (ja)	1996-03-15	1996-03-15	低圧ｃｖｄ装置
JP35780996		1996-12-27
JP35780996A JP3861350B2 (ja)	1996-12-27	1996-12-27	低圧ｃｖｄ装置

Publications (2)

Publication Number	Publication Date
DE69730370D1 true DE69730370D1 (de)	2004-09-30
DE69730370T2 DE69730370T2 (de)	2005-09-01

Family

ID=26428584

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69730370T Expired - Lifetime DE69730370T2 (de)	1996-03-15	1997-03-13	Niederdruck-CVD-System

Country Status (5)

Country	Link
US (1)	US5902406A (de)
EP (1)	EP0795897B1 (de)
KR (1)	KR100440992B1 (de)
DE (1)	DE69730370T2 (de)
TW (1)	TW506620U (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6331212B1 (en) *	2000-04-17	2001-12-18	Avansys, Llc	Methods and apparatus for thermally processing wafers
US6758909B2 (en) *	2001-06-05	2004-07-06	Honeywell International Inc.	Gas port sealing for CVD/CVI furnace hearth plates
US6776848B2 (en)	2002-01-17	2004-08-17	Applied Materials, Inc.	Motorized chamber lid
US7041231B2 (en) *	2003-01-06	2006-05-09	Triumph Brands, Inc.	Method of refurbishing a transition duct for a gas turbine system
SG125934A1 (en) *	2003-02-27	2006-10-30	Asahi Glass Co Ltd	Outer tube made of silicon carbide and thermal treatment system for semiconductors
KR101052448B1 (ko)	2003-03-28	2011-07-28	아사히 가라스 가부시키가이샤	반도체 열처리 장치
US7390535B2 (en)	2003-07-03	2008-06-24	Aeromet Technologies, Inc.	Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings
US8246749B2 (en) *	2005-07-26	2012-08-21	Hitachi Kokusai Electric, Inc.	Substrate processing apparatus and semiconductor device producing method
US8375891B2 (en) *	2006-09-11	2013-02-19	Ulvac, Inc.	Vacuum vapor processing apparatus
US7762809B2 (en) *	2006-10-13	2010-07-27	Tokyo Electron Limited	Heat treatment apparatus
US20080232424A1 (en) *	2007-03-23	2008-09-25	Honeywell International Inc.	Hearth plate including side walls defining a processing volume
US7731494B2 (en) *	2007-08-22	2010-06-08	A.S.M. International N.V.	System for use in a vertical furnace
JP5136574B2 (ja) *	2009-05-01	2013-02-06	東京エレクトロン株式会社	プラズマ処理装置及びプラズマ処理方法
US20120279401A1 (en) *	2011-05-06	2012-11-08	Prince Castle LLC	Egg Scrambler for Preparing Scrambled Eggs
US10136472B2 (en)	2012-08-07	2018-11-20	Plansee Se	Terminal for mechanical support of a heating element
WO2015146563A1 (ja)	2014-03-27	2015-10-01	日本碍子株式会社	セラミックスプレートと金属製の円筒部材との接合構造
US10872804B2 (en) *	2017-11-03	2020-12-22	Asm Ip Holding B.V.	Apparatus and methods for isolating a reaction chamber from a loading chamber resulting in reduced contamination

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2943634C2 (de) *	1979-10-29	1983-09-29	Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt	Epitaxiereaktor
EP0164928A3 (de) *	1984-06-04	1987-07-29	Texas Instruments Incorporated	Senkrechter Heisswandreaktor zur chemischen Abscheidung aus der Gasphase
JPH07120634B2 (ja) *	1988-12-27	1995-12-20	東京エレクトロン東北株式会社	処理装置
JP3007432B2 (ja) *	1991-02-19	2000-02-07	東京エレクトロン株式会社	熱処理装置
JPH0590214A (ja) *	1991-09-30	1993-04-09	Tokyo Ohka Kogyo Co Ltd	同軸型プラズマ処理装置
JP3234617B2 (ja) *	1991-12-16	2001-12-04	東京エレクトロン株式会社	熱処理装置用基板支持具
JP2825172B2 (ja) *	1992-07-10	1998-11-18	東京エレクトロン株式会社	減圧処理装置および減圧処理方法
JP3073627B2 (ja) *	1993-06-14	2000-08-07	東京エレクトロン株式会社	熱処理装置
US5484484A (en) *	1993-07-03	1996-01-16	Tokyo Electron Kabushiki	Thermal processing method and apparatus therefor
US5578132A (en) *	1993-07-07	1996-11-26	Tokyo Electron Kabushiki Kaisha	Apparatus for heat treating semiconductors at normal pressure and low pressure
JPH088194A (ja) *	1994-06-16	1996-01-12	Kishimoto Sangyo Kk	気相成長機構および熱処理機構における加熱装置
JP3982844B2 (ja) *	1995-01-12	2007-09-26	株式会社日立国際電気	半導体製造装置及び半導体の製造方法

1997
- 1997-03-12 TW TW090204676U patent/TW506620U/zh not_active IP Right Cessation
- 1997-03-13 EP EP97104321A patent/EP0795897B1/de not_active Expired - Lifetime
- 1997-03-13 DE DE69730370T patent/DE69730370T2/de not_active Expired - Lifetime
- 1997-03-14 KR KR1019970008789A patent/KR100440992B1/ko not_active Expired - Fee Related
- 1997-03-14 US US08/818,096 patent/US5902406A/en not_active Expired - Lifetime

Also Published As

Publication number	Publication date
KR19980063270A (ko)	1998-10-07
EP0795897A2 (de)	1997-09-17
DE69730370T2 (de)	2005-09-01
EP0795897B1 (de)	2004-08-25
TW506620U (en)	2002-10-11
KR100440992B1 (ko)	2004-09-18
EP0795897A3 (de)	2000-11-22
US5902406A (en)	1999-05-11

Publication	Publication Date	Title
DE69633580D1 (de)	2004-11-11	Drucksystem
DE69728393D1 (de)	2004-05-06	Gleichdrucksitzsystem
DE19881221D2 (de)	2000-01-27	Druckmittelanlage
DE69839652D1 (de)	2008-08-07	Drucksystem
DE69729472D1 (de)	2004-07-15	Phonopneumograph system
DE69726292D1 (de)	2003-12-24	Erdnahen-orbit-startsystem
DE19882311T1 (de)	2000-05-11	Verbessertes Rohrleitungssystem
DE69703705D1 (de)	2001-01-18	Kommunikationssystem
DE69701989D1 (de)	2000-06-15	Verringerung des übersprechens zwischen kommunikationssystemen
NO972093L (no)	1997-11-10	Pumpesystem
DE69720680D1 (de)	2003-05-15	Abdichtungssystem
DE69707052D1 (de)	2001-11-08	Druckregler
DE69732134D1 (de)	2005-02-03	Druckregelungssystem
DE69730370D1 (de)	2004-09-30	Niederdruck-CVD-System
FI954227A7 (fi)	1996-03-10	Painesuojajärjestelmä
ATA210196A (de)	2000-11-15	Druckausgleichsvorrichtung
DK0850010T3 (da)	2000-09-25	Børstetryksystem
DE69716662D1 (de)	2002-12-05	Dichtungssystem
DE59704507D1 (de)	2001-10-11	Druckmittelanlage
DE19781852T1 (de)	1999-07-01	Fluidübertragungssystem
DE69737589D1 (de)	2007-05-24	Akustisches system
NO985866D0 (no)	1998-12-14	Fortoejnings-system
DE19782185T1 (de)	1999-11-18	Pumpensystem
FI962312A7 (fi)	1997-12-01	Puhelinjärjestelmä
DE69736424D1 (de)	2006-09-14	Drucksystem

Legal Events

Date	Code	Title	Description
2005-10-06	8364	No opposition during term of opposition