|
NO302060B1
(no)
*
|
1995-05-02 |
1998-01-12 |
Nkt Res Center As |
Fremgangsmåte og elektrodesystem for eksitering av et plasma
|
|
US6093660A
(en)
*
|
1996-03-18 |
2000-07-25 |
Hyundai Electronics Industries Co., Ltd. |
Inductively coupled plasma chemical vapor deposition technology
|
|
US6177711B1
(en)
*
|
1996-09-19 |
2001-01-23 |
Canon Kabushiki Kaisha |
Photoelectric conversion element
|
|
US5849628A
(en)
*
|
1996-12-09 |
1998-12-15 |
Micron Technology, Inc. |
Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same
|
|
US6087580A
(en)
*
|
1996-12-12 |
2000-07-11 |
Energy Conversion Devices, Inc. |
Semiconductor having large volume fraction of intermediate range order material
|
|
US6329270B1
(en)
*
|
1997-03-07 |
2001-12-11 |
Sharp Laboratories Of America, Inc. |
Laser annealed microcrystalline film and method for same
|
|
JP3327811B2
(ja)
*
|
1997-05-13 |
2002-09-24 |
キヤノン株式会社 |
酸化亜鉛薄膜の製造方法、それを用いた光起電力素子及び半導体素子基板の製造方法
|
|
JP3369439B2
(ja)
*
|
1997-06-05 |
2003-01-20 |
科学技術振興事業団 |
光応答電極および湿式太陽電池
|
|
US6531193B2
(en)
|
1997-07-07 |
2003-03-11 |
The Penn State Research Foundation |
Low temperature, high quality silicon dioxide thin films deposited using tetramethylsilane (TMS) for stress control and coverage applications
|
|
JPH1154773A
(ja)
*
|
1997-08-01 |
1999-02-26 |
Canon Inc |
光起電力素子及びその製造方法
|
|
US6337224B1
(en)
*
|
1997-11-10 |
2002-01-08 |
Kaneka Corporation |
Method of producing silicon thin-film photoelectric transducer and plasma CVD apparatus used for the method
|
|
JP3581546B2
(ja)
*
|
1997-11-27 |
2004-10-27 |
キヤノン株式会社 |
微結晶シリコン膜形成方法および光起電力素子の製造方法
|
|
JP3768672B2
(ja)
*
|
1998-02-26 |
2006-04-19 |
キヤノン株式会社 |
積層型光起電力素子
|
|
JPH11246971A
(ja)
*
|
1998-03-03 |
1999-09-14 |
Canon Inc |
微結晶シリコン系薄膜の作製方法及び作製装置
|
|
US6303945B1
(en)
*
|
1998-03-16 |
2001-10-16 |
Canon Kabushiki Kaisha |
Semiconductor element having microcrystalline semiconductor material
|
|
DE19837365A1
(de)
*
|
1998-08-18 |
2000-03-02 |
Forschungszentrum Juelich Gmbh |
Solarzelle mit Clustern im aktiven Bereich
|
|
DE69936906T2
(de)
*
|
1998-10-12 |
2008-05-21 |
Kaneka Corp. |
Verfahren zur Herstellung einer siliziumhaltigen photoelektrischen Dünnschicht-Umwandlungsanordnung
|
|
JP3364180B2
(ja)
|
1999-01-18 |
2003-01-08 |
三菱重工業株式会社 |
非晶質シリコン太陽電池
|
|
DE69942604D1
(de)
*
|
1999-02-26 |
2010-09-02 |
Kaneka Corp |
Herstellungsverfahren für eine auf Silizium basierende Dünnfilmsolarzelle
|
|
JP3046965B1
(ja)
*
|
1999-02-26 |
2000-05-29 |
鐘淵化学工業株式会社 |
非晶質シリコン系薄膜光電変換装置の製造方法
|
|
JP3589581B2
(ja)
*
|
1999-02-26 |
2004-11-17 |
株式会社カネカ |
タンデム型の薄膜光電変換装置の製造方法
|
|
JP2001028453A
(ja)
*
|
1999-07-14 |
2001-01-30 |
Canon Inc |
光起電力素子及びその製造方法、建築材料並びに発電装置
|
|
US6472248B2
(en)
|
1999-07-04 |
2002-10-29 |
Canon Kabushiki Kaisha |
Microcrystalline series photovoltaic element and process for fabrication of same
|
|
US6880866B2
(en)
*
|
2000-02-25 |
2005-04-19 |
Intier Automotive Closures Inc. |
Vehicle door latch
|
|
US7199303B2
(en)
*
|
2000-03-13 |
2007-04-03 |
Sony Corporation |
Optical energy conversion apparatus
|
|
US6468829B2
(en)
|
2000-05-16 |
2002-10-22 |
United Solar Systems Corporation |
Method for manufacturing high efficiency photovoltaic devices at enhanced depositions rates
|
|
JP4032610B2
(ja)
*
|
2000-06-16 |
2008-01-16 |
富士電機アドバンストテクノロジー株式会社 |
非単結晶薄膜太陽電池の製造方法
|
|
JP2002206168A
(ja)
*
|
2000-10-24 |
2002-07-26 |
Canon Inc |
シリコン系薄膜の形成方法、シリコン系半導体層の形成方法及び光起電力素子
|
|
JP3557457B2
(ja)
*
|
2001-02-01 |
2004-08-25 |
東北大学長 |
SiC膜の製造方法、及びSiC多層膜構造の製造方法
|
|
JP4866534B2
(ja)
|
2001-02-12 |
2012-02-01 |
エーエスエム アメリカ インコーポレイテッド |
半導体膜の改良された堆積方法
|
|
EP1462541B1
(de)
*
|
2001-12-03 |
2015-03-04 |
Nippon Sheet Glass Company, Limited |
Verfahren zur bildung von dünnfilm.
|
|
US7186630B2
(en)
|
2002-08-14 |
2007-03-06 |
Asm America, Inc. |
Deposition of amorphous silicon-containing films
|
|
JP2004296598A
(ja)
*
|
2003-03-26 |
2004-10-21 |
Canon Inc |
太陽電池
|
|
US7005160B2
(en)
*
|
2003-04-24 |
2006-02-28 |
Asm America, Inc. |
Methods for depositing polycrystalline films with engineered grain structures
|
|
US7265036B2
(en)
*
|
2004-07-23 |
2007-09-04 |
Applied Materials, Inc. |
Deposition of nano-crystal silicon using a single wafer chamber
|
|
EP1789604B1
(de)
*
|
2004-08-04 |
2011-09-28 |
Oerlikon Solar AG, Trübbach |
Haftschicht für dünnschichttransistor
|
|
WO2007000469A1
(en)
*
|
2005-06-29 |
2007-01-04 |
Oc Oerlikon Balzers Ag |
Method for manufacturing flat substrates
|
|
US7906723B2
(en)
*
|
2008-04-30 |
2011-03-15 |
General Electric Company |
Compositionally-graded and structurally-graded photovoltaic devices and methods of fabricating such devices
|
|
WO2007025062A2
(en)
*
|
2005-08-25 |
2007-03-01 |
Wakonda Technologies, Inc. |
Photovoltaic template
|
|
US7521341B2
(en)
*
|
2005-11-09 |
2009-04-21 |
Industrial Technology Research Institute |
Method of direct deposition of polycrystalline silicon
|
|
UA81965C2
(xx)
*
|
2006-02-14 |
2008-02-25 |
Александра Николаевна Шмирева |
Інтегральний тонкоплівковий фотомодуль$интегральный тонкопленочный модуль
|
|
US7235736B1
(en)
*
|
2006-03-18 |
2007-06-26 |
Solyndra, Inc. |
Monolithic integration of cylindrical solar cells
|
|
US20070272297A1
(en)
*
|
2006-05-24 |
2007-11-29 |
Sergei Krivoshlykov |
Disordered silicon nanocomposites for photovoltaics, solar cells and light emitting devices
|
|
US7655542B2
(en)
*
|
2006-06-23 |
2010-02-02 |
Applied Materials, Inc. |
Methods and apparatus for depositing a microcrystalline silicon film for photovoltaic device
|
|
TWI411146B
(en)
*
|
2006-08-14 |
2013-10-01 |
|
Diamond-like carbon electronic devices and methods of manufacture
|
|
US20100093127A1
(en)
*
|
2006-12-27 |
2010-04-15 |
Emcore Solar Power, Inc. |
Inverted Metamorphic Multijunction Solar Cell Mounted on Metallized Flexible Film
|
|
US7582515B2
(en)
*
|
2007-01-18 |
2009-09-01 |
Applied Materials, Inc. |
Multi-junction solar cells and methods and apparatuses for forming the same
|
|
US20080173350A1
(en)
*
|
2007-01-18 |
2008-07-24 |
Applied Materials, Inc. |
Multi-junction solar cells and methods and apparatuses for forming the same
|
|
US8203071B2
(en)
*
|
2007-01-18 |
2012-06-19 |
Applied Materials, Inc. |
Multi-junction solar cells and methods and apparatuses for forming the same
|
|
US20080223440A1
(en)
*
|
2007-01-18 |
2008-09-18 |
Shuran Sheng |
Multi-junction solar cells and methods and apparatuses for forming the same
|
|
US20080188062A1
(en)
*
|
2007-02-02 |
2008-08-07 |
Chi-Lin Chen |
Method of forming microcrystalline silicon film
|
|
US20080245414A1
(en)
*
|
2007-04-09 |
2008-10-09 |
Shuran Sheng |
Methods for forming a photovoltaic device with low contact resistance
|
|
US7875486B2
(en)
*
|
2007-07-10 |
2011-01-25 |
Applied Materials, Inc. |
Solar cells and methods and apparatuses for forming the same including I-layer and N-layer chamber cleaning
|
|
TW200905730A
(en)
*
|
2007-07-23 |
2009-02-01 |
Ind Tech Res Inst |
Method for forming a microcrystalline silicon film
|
|
US9054206B2
(en)
*
|
2007-08-17 |
2015-06-09 |
Semiconductor Energy Laboratory Co., Ltd. |
Method for manufacturing semiconductor device
|
|
US20090104733A1
(en)
*
|
2007-10-22 |
2009-04-23 |
Yong Kee Chae |
Microcrystalline silicon deposition for thin film solar applications
|
|
CN101842875A
(zh)
|
2007-11-02 |
2010-09-22 |
应用材料股份有限公司 |
在沉积处理间实施的等离子处理
|
|
US8927392B2
(en)
*
|
2007-11-02 |
2015-01-06 |
Siva Power, Inc. |
Methods for forming crystalline thin-film photovoltaic structures
|
|
JP5416460B2
(ja)
*
|
2008-04-18 |
2014-02-12 |
株式会社半導体エネルギー研究所 |
薄膜トランジスタおよび薄膜トランジスタの作製方法
|
|
CN102007586B
(zh)
|
2008-04-18 |
2013-09-25 |
株式会社半导体能源研究所 |
薄膜晶体管及其制造方法
|
|
KR101635625B1
(ko)
*
|
2008-04-18 |
2016-07-01 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
박막 트랜지스터 및 그 제작 방법
|
|
US8053294B2
(en)
|
2008-04-21 |
2011-11-08 |
Semiconductor Energy Laboratory Co., Ltd. |
Manufacturing method of thin film transistor by controlling generation of crystal nuclei of microcrystalline semiconductor film
|
|
US7888167B2
(en)
*
|
2008-04-25 |
2011-02-15 |
Semiconductor Energy Laboratory Co., Ltd. |
Photoelectric conversion device and method for manufacturing the same
|
|
US8049215B2
(en)
*
|
2008-04-25 |
2011-11-01 |
Semiconductor Energy Laboratory Co., Ltd. |
Thin film transistor
|
|
JP5436017B2
(ja)
*
|
2008-04-25 |
2014-03-05 |
株式会社半導体エネルギー研究所 |
半導体装置
|
|
JP5542364B2
(ja)
|
2008-04-25 |
2014-07-09 |
株式会社半導体エネルギー研究所 |
薄膜トランジスタの作製方法
|
|
JP5377061B2
(ja)
*
|
2008-05-09 |
2013-12-25 |
株式会社半導体エネルギー研究所 |
光電変換装置
|
|
US20090293954A1
(en)
*
|
2008-05-30 |
2009-12-03 |
Semiconductor Energy Laboratory Co., Ltd. |
Photoelectric Conversion Device And Method For Manufacturing The Same
|
|
EP2291856A4
(de)
*
|
2008-06-27 |
2015-09-23 |
Semiconductor Energy Lab |
Dünnfilmtransistor
|
|
KR101602252B1
(ko)
*
|
2008-06-27 |
2016-03-10 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
박막 트랜지스터, 반도체장치 및 전자기기
|
|
KR20100021845A
(ko)
*
|
2008-08-18 |
2010-02-26 |
삼성전자주식회사 |
적층형 태양 전지
|
|
US8895842B2
(en)
*
|
2008-08-29 |
2014-11-25 |
Applied Materials, Inc. |
High quality TCO-silicon interface contact structure for high efficiency thin film silicon solar cells
|
|
US8236603B1
(en)
|
2008-09-04 |
2012-08-07 |
Solexant Corp. |
Polycrystalline semiconductor layers and methods for forming the same
|
|
US8283667B2
(en)
*
|
2008-09-05 |
2012-10-09 |
Semiconductor Energy Laboratory Co., Ltd. |
Thin film transistor
|
|
US20100059110A1
(en)
*
|
2008-09-11 |
2010-03-11 |
Applied Materials, Inc. |
Microcrystalline silicon alloys for thin film and wafer based solar applications
|
|
TWI514595B
(zh)
*
|
2008-09-24 |
2015-12-21 |
半導體能源研究所股份有限公司 |
光電轉換裝置及其製造方法
|
|
JP5498762B2
(ja)
*
|
2008-11-17 |
2014-05-21 |
株式会社半導体エネルギー研究所 |
薄膜トランジスタの作製方法
|
|
JP5503946B2
(ja)
*
|
2008-11-28 |
2014-05-28 |
株式会社半導体エネルギー研究所 |
光電変換装置
|
|
WO2010088366A1
(en)
|
2009-01-28 |
2010-08-05 |
Wakonda Technologies, Inc. |
Large-grain crystalline thin-film structures and devices and methods for forming the same
|
|
US8304336B2
(en)
*
|
2009-02-17 |
2012-11-06 |
Korea Institute Of Industrial Technology |
Method for fabricating solar cell using inductively coupled plasma chemical vapor deposition
|
|
US20110014782A1
(en)
*
|
2009-02-21 |
2011-01-20 |
Atomic Energy Council-Institute Of Nuclear Energy Research |
Apparatus and Method for Growing a Microcrystalline Silicon Film
|
|
CN103730515B
(zh)
|
2009-03-09 |
2016-08-17 |
株式会社半导体能源研究所 |
半导体器件
|
|
US9312156B2
(en)
*
|
2009-03-27 |
2016-04-12 |
Semiconductor Energy Laboratory Co., Ltd. |
Thin film transistor
|
|
JP5888802B2
(ja)
|
2009-05-28 |
2016-03-22 |
株式会社半導体エネルギー研究所 |
トランジスタを有する装置
|
|
US20110168259A1
(en)
*
|
2009-07-13 |
2011-07-14 |
Sanyo Electric Co., Ltd. |
Thin film solar cell and manufacturing method thereof
|
|
US20110114177A1
(en)
*
|
2009-07-23 |
2011-05-19 |
Applied Materials, Inc. |
Mixed silicon phase film for high efficiency thin film silicon solar cells
|
|
JP4642126B2
(ja)
*
|
2009-08-05 |
2011-03-02 |
シャープ株式会社 |
積層型光起電力素子および積層型光起電力素子の製造方法
|
|
WO2011046664A2
(en)
*
|
2009-10-15 |
2011-04-21 |
Applied Materials, Inc. |
A barrier layer disposed between a substrate and a transparent conductive oxide layer for thin film silicon solar cells
|
|
US20110088760A1
(en)
*
|
2009-10-20 |
2011-04-21 |
Applied Materials, Inc. |
Methods of forming an amorphous silicon layer for thin film solar cell application
|
|
US20110126875A1
(en)
*
|
2009-12-01 |
2011-06-02 |
Hien-Minh Huu Le |
Conductive contact layer formed on a transparent conductive layer by a reactive sputter deposition
|
|
KR101836067B1
(ko)
*
|
2009-12-21 |
2018-03-08 |
가부시키가이샤 한도오따이 에네루기 켄큐쇼 |
박막 트랜지스터와 그 제작 방법
|
|
TWI535028B
(zh)
*
|
2009-12-21 |
2016-05-21 |
半導體能源研究所股份有限公司 |
薄膜電晶體
|
|
US8610226B2
(en)
*
|
2009-12-28 |
2013-12-17 |
Sharp Kabushiki Kaisha |
Photosensor element, photosensor circuit, thin-film transistor substrate, and display panel
|
|
US8476744B2
(en)
|
2009-12-28 |
2013-07-02 |
Semiconductor Energy Laboratory Co., Ltd. |
Thin film transistor with channel including microcrystalline and amorphous semiconductor regions
|
|
TWI401812B
(zh)
*
|
2009-12-31 |
2013-07-11 |
Metal Ind Res Anddevelopment Ct |
Solar battery
|
|
WO2011087878A2
(en)
*
|
2010-01-18 |
2011-07-21 |
Applied Materials, Inc. |
Manufacture of thin film solar cells with high conversion efficiency
|
|
US20110232753A1
(en)
*
|
2010-03-23 |
2011-09-29 |
Applied Materials, Inc. |
Methods of forming a thin-film solar energy device
|
|
US8410486B2
(en)
|
2010-05-14 |
2013-04-02 |
Semiconductor Energy Labortory Co., Ltd. |
Method for manufacturing microcrystalline semiconductor film and method for manufacturing semiconductor device
|
|
WO2011142443A1
(en)
|
2010-05-14 |
2011-11-17 |
Semiconductor Energy Laboratory Co., Ltd. |
Microcrystalline silicon film, manufacturing method thereof, semiconductor device, and manufacturing method thereof
|
|
US8778745B2
(en)
|
2010-06-29 |
2014-07-15 |
Semiconductor Energy Laboratory Co., Ltd. |
Method for manufacturing semiconductor device
|
|
CN102386072B
(zh)
|
2010-08-25 |
2016-05-04 |
株式会社半导体能源研究所 |
微晶半导体膜的制造方法及半导体装置的制造方法
|
|
US8704230B2
(en)
|
2010-08-26 |
2014-04-22 |
Semiconductor Energy Laboratory Co., Ltd. |
Semiconductor device and manufacturing method thereof
|
|
US9230826B2
(en)
|
2010-08-26 |
2016-01-05 |
Semiconductor Energy Laboratory Co., Ltd. |
Etching method using mixed gas and method for manufacturing semiconductor device
|
|
TWI538218B
(zh)
|
2010-09-14 |
2016-06-11 |
半導體能源研究所股份有限公司 |
薄膜電晶體
|
|
US8338240B2
(en)
|
2010-10-01 |
2012-12-25 |
Semiconductor Energy Laboratory Co., Ltd. |
Method for manufacturing transistor
|
|
JP2012089708A
(ja)
|
2010-10-20 |
2012-05-10 |
Semiconductor Energy Lab Co Ltd |
微結晶シリコン膜の作製方法、半導体装置の作製方法
|
|
US8450158B2
(en)
|
2010-11-04 |
2013-05-28 |
Semiconductor Energy Laboratory Co., Ltd. |
Method for forming microcrystalline semiconductor film and method for manufacturing semiconductor device
|
|
US8394685B2
(en)
|
2010-12-06 |
2013-03-12 |
Semiconductor Energy Laboratory Co., Ltd. |
Etching method and manufacturing method of thin film transistor
|
|
ES2385871B1
(es)
*
|
2011-01-07 |
2013-06-12 |
Universidad Politécnica De Valencia |
Material fotovoltaico multiunión tipo p-i-n, dispositivo cerámico fotovoltaico que lo comprende y métodos de obtención de los mismos.
|
|
US9048327B2
(en)
|
2011-01-25 |
2015-06-02 |
Semiconductor Energy Laboratory Co., Ltd. |
Microcrystalline semiconductor film, method for manufacturing the same, and method for manufacturing semiconductor device
|
|
WO2012127769A1
(ja)
*
|
2011-03-22 |
2012-09-27 |
パナソニック株式会社 |
半導体薄膜の形成方法、半導体装置、半導体装置の製造方法、基板及び薄膜基板
|
|
CN102244081B
(zh)
*
|
2011-07-05 |
2012-11-07 |
南开大学 |
一种高稳定性非晶硅/微晶硅叠层太阳电池及制备方法
|
|
CN116297401A
(zh)
*
|
2023-03-30 |
2023-06-23 |
苏州迈为科技股份有限公司 |
微晶硅薄膜沉积工艺的研究方法及其应用
|