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DE69619671D1 - Mehrkanal-totalreflexionsoptik mit steuerbarer divergenz - Google Patents

Mehrkanal-totalreflexionsoptik mit steuerbarer divergenz

Info

Publication number
DE69619671D1
DE69619671D1 DE69619671T DE69619671T DE69619671D1 DE 69619671 D1 DE69619671 D1 DE 69619671D1 DE 69619671 T DE69619671 T DE 69619671T DE 69619671 T DE69619671 T DE 69619671T DE 69619671 D1 DE69619671 D1 DE 69619671D1
Authority
DE
Germany
Prior art keywords
total reflection
reflection optics
channel total
controlled divergence
divergence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69619671T
Other languages
English (en)
Other versions
DE69619671T2 (de
Inventor
M Gibson
Gregory Downing
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
X Ray Optical Systems Inc
Original Assignee
X Ray Optical Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by X Ray Optical Systems Inc filed Critical X Ray Optical Systems Inc
Publication of DE69619671D1 publication Critical patent/DE69619671D1/de
Application granted granted Critical
Publication of DE69619671T2 publication Critical patent/DE69619671T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/02—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diaphragms, collimators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/068—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)
  • Ceramic Products (AREA)
  • Lenses (AREA)
DE69619671T 1995-06-12 1996-06-11 Mehrkanal-totalreflexionsoptik mit steuerbarer divergenz Expired - Fee Related DE69619671T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/489,503 US5604353A (en) 1995-06-12 1995-06-12 Multiple-channel, total-reflection optic with controllable divergence
PCT/US1996/010075 WO1996042088A1 (en) 1995-06-12 1996-06-11 Multiple-channel, total-reflection optic with controllable divergence

Publications (2)

Publication Number Publication Date
DE69619671D1 true DE69619671D1 (de) 2002-04-11
DE69619671T2 DE69619671T2 (de) 2002-09-12

Family

ID=23944143

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69619671T Expired - Fee Related DE69619671T2 (de) 1995-06-12 1996-06-11 Mehrkanal-totalreflexionsoptik mit steuerbarer divergenz

Country Status (9)

Country Link
US (1) US5604353A (de)
EP (1) EP0832491B1 (de)
JP (1) JP3069865B2 (de)
KR (1) KR100256849B1 (de)
CN (1) CN1147876C (de)
AU (1) AU6383996A (de)
DE (1) DE69619671T2 (de)
DK (1) DK0832491T3 (de)
WO (1) WO1996042088A1 (de)

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US6271534B1 (en) 1994-07-08 2001-08-07 Muradin Abubekirovich Kumakhov Device for producing the image of an object using a flux of neutral or charged particles, and an integrated lens for converting such flux of neutral or charged particles
US5838757A (en) * 1995-10-20 1998-11-17 Michael H. Vartanian & Co., Inc. Hard x-ray polycapillary telescope
GB9815968D0 (en) * 1998-07-23 1998-09-23 Bede Scient Instr Ltd X-ray focusing apparatus
EP1044457B1 (de) * 1998-10-21 2004-09-29 Koninklijke Philips Electronics N.V. Röntgenquelle enthaltende röntgen-bestrahlungsvorrichtung mit einem kapillaren optischen system
US6345086B1 (en) 1999-09-14 2002-02-05 Veeco Instruments Inc. X-ray fluorescence system and method
CA2489646C (en) * 2001-06-19 2010-02-09 X-Ray Optical Systems, Inc. Wavelength dispersive xrf system using focusing optic for excitation and a focusing monochromator for collection
US6781060B2 (en) 2002-07-26 2004-08-24 X-Ray Optical Systems Incorporated Electrical connector, a cable sleeve, and a method for fabricating an electrical connection
DE10259696B4 (de) * 2002-12-18 2018-07-05 Immobiliengesellschaft Helmut Fischer Gmbh & Co. Kg Vorrichtung zum Messen der Dicke dünner Schichten
DE10317679B4 (de) * 2003-04-17 2005-03-31 Bruker Axs Gmbh Röntgen-optische Vorrichtung mit Wobbel-Einrichtung
US7023955B2 (en) * 2003-08-12 2006-04-04 X-Ray Optical System, Inc. X-ray fluorescence system with apertured mask for analyzing patterned surfaces
JP4837964B2 (ja) * 2005-09-28 2011-12-14 株式会社島津製作所 Ｘ線集束装置
JP4900660B2 (ja) * 2006-02-21 2012-03-21 独立行政法人物質・材料研究機構 Ｘ線集束素子及びｘ線照射装置
US7412131B2 (en) * 2007-01-02 2008-08-12 General Electric Company Multilayer optic device and system and method for making same
US7366374B1 (en) 2007-05-22 2008-04-29 General Electric Company Multilayer optic device and an imaging system and method using same
US20090041198A1 (en) * 2007-08-07 2009-02-12 General Electric Company Highly collimated and temporally variable x-ray beams
US7742566B2 (en) * 2007-12-07 2010-06-22 General Electric Company Multi-energy imaging system and method using optic devices
WO2009126868A1 (en) * 2008-04-11 2009-10-15 Rigaku Innovative Technologies, Inc. X-ray generator with polycapillary optic
US8488743B2 (en) 2008-04-11 2013-07-16 Rigaku Innovative Technologies, Inc. Nanotube based device for guiding X-ray photons and neutrons
MX2011004622A (es) * 2008-10-30 2011-06-20 Inspired Surgical Technologies Inc Procesador de haz de rayos x.
US8130908B2 (en) * 2009-02-23 2012-03-06 X-Ray Optical Systems, Inc. X-ray diffraction apparatus and technique for measuring grain orientation using x-ray focusing optic
US8369674B2 (en) * 2009-05-20 2013-02-05 General Electric Company Optimizing total internal reflection multilayer optics through material selection
US8208602B2 (en) * 2010-02-22 2012-06-26 General Electric Company High flux photon beams using optic devices
US8311184B2 (en) 2010-08-30 2012-11-13 General Electric Company Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices
US8744048B2 (en) 2010-12-28 2014-06-03 General Electric Company Integrated X-ray source having a multilayer total internal reflection optic device
JP5751665B2 (ja) * 2011-03-01 2015-07-22 国立研究開発法人理化学研究所 Ｘ線分配装置およびｘ線分配システム
US8761346B2 (en) 2011-07-29 2014-06-24 General Electric Company Multilayer total internal reflection optic devices and methods of making and using the same
US9057685B2 (en) 2011-08-15 2015-06-16 X-Ray Optical Systems, Inc. Sample viscosity and flow control for heavy samples, and X-ray analysis applications thereof
US9335280B2 (en) 2011-10-06 2016-05-10 X-Ray Optical Systems, Inc. Mobile transport and shielding apparatus for removable x-ray analyzer
EP3168606A1 (de) 2011-10-26 2017-05-17 X-Ray Optical Systems, Inc. Röntgenmonochromator und halterung
US9739729B2 (en) 2012-09-07 2017-08-22 Carl Zeiss X-ray Microscopy, Inc. Combined confocal X-ray fluorescence and X-ray computerised tomographic system and method
US10327717B2 (en) 2013-08-08 2019-06-25 Controlrad Systems Inc. X-ray reduction system
US9883793B2 (en) 2013-08-23 2018-02-06 The Schepens Eye Research Institute, Inc. Spatial modeling of visual fields
EP3480586B1 (de) * 2017-11-06 2021-02-24 Bruker Nano GmbH Röntgenfluoreszenzspektrometer
DE102019208834B3 (de) * 2019-06-18 2020-10-01 Bruker Axs Gmbh Vorrichtung zum Justieren und Wechseln von Strahlfängern
US20220201830A1 (en) 2020-12-23 2022-06-23 X-Ray Optical Systems, Inc. X-ray source assembly with enhanced temperature control for output stability
US12247934B2 (en) 2022-07-29 2025-03-11 X-Ray Optical Systems, Inc. Polarized, energy dispersive x-ray fluorescence system and method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1318256A (fr) * 1962-03-23 1963-02-15 Atomic Energy Authority Uk Filtrage des rayonnements pénétrants, notamment pour la radiologie
US3997794A (en) * 1974-12-23 1976-12-14 York Richard N Collimator
US4143273A (en) * 1977-04-11 1979-03-06 Ohio-Nuclear, Inc. Variable collimator
US4277684A (en) * 1977-08-18 1981-07-07 U.S. Philips Corporation X-Ray collimator, particularly for use in computerized axial tomography apparatus
US4158143A (en) * 1978-04-07 1979-06-12 Bbc Brown, Boveri & Company Limited Tube for irradiation equipment
JPS5630295A (en) * 1979-08-21 1981-03-26 Oobayashi Seisakusho:Kk Stop device for x-ray
US4450578A (en) * 1982-03-03 1984-05-22 The United States Of America As Represented By The United States Department Of Energy Variable aperture collimator for high energy radiation
NL8500244A (nl) * 1985-01-29 1986-08-18 Optische Ind De Oude Delft Nv Inrichting voor spleetradiografie.
US5016267A (en) * 1986-08-15 1991-05-14 Commonwealth Scientific And Industrial Research Instrumentation for conditioning X-ray or neutron beams
US4910759A (en) * 1988-05-03 1990-03-20 University Of Delaware Xray lens and collimator
US5001737A (en) * 1988-10-24 1991-03-19 Aaron Lewis Focusing and guiding X-rays with tapered capillaries
US5192869A (en) * 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
US5175755A (en) * 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
GB9311134D0 (en) * 1993-05-28 1993-07-14 Univ Leicester Micro-channel plates

Also Published As

Publication number Publication date
EP0832491B1 (de) 2002-03-06
CN1192821A (zh) 1998-09-09
EP0832491A1 (de) 1998-04-01
WO1996042088A1 (en) 1996-12-27
DE69619671T2 (de) 2002-09-12
DK0832491T3 (da) 2002-06-17
KR100256849B1 (ko) 2000-05-15
KR19990022893A (ko) 1999-03-25
US5604353A (en) 1997-02-18
AU6383996A (en) 1997-01-09
JP3069865B2 (ja) 2000-07-24
EP0832491A4 (de) 1998-07-29
JPH11502933A (ja) 1999-03-09
CN1147876C (zh) 2004-04-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee