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DE69500707D1 - Haltevorrichtung - Google Patents

Haltevorrichtung

Info

Publication number
DE69500707D1
DE69500707D1 DE69500707T DE69500707T DE69500707D1 DE 69500707 D1 DE69500707 D1 DE 69500707D1 DE 69500707 T DE69500707 T DE 69500707T DE 69500707 T DE69500707 T DE 69500707T DE 69500707 D1 DE69500707 D1 DE 69500707D1
Authority
DE
Germany
Prior art keywords
holding device
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69500707T
Other languages
English (en)
Other versions
DE69500707T2 (de
Inventor
Shigeru Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP1363894A external-priority patent/JPH07219636A/ja
Priority claimed from JP16918794A external-priority patent/JP3275544B2/ja
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Publication of DE69500707D1 publication Critical patent/DE69500707D1/de
Application granted granted Critical
Publication of DE69500707T2 publication Critical patent/DE69500707T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • H10P72/50—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Control Of Position Or Direction (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69500707T 1994-02-07 1995-02-07 Haltevorrichtung Expired - Fee Related DE69500707T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1363894A JPH07219636A (ja) 1994-02-07 1994-02-07 ステージ装置
JP16918794A JP3275544B2 (ja) 1994-07-21 1994-07-21 ステージ装置

Publications (2)

Publication Number Publication Date
DE69500707D1 true DE69500707D1 (de) 1997-10-23
DE69500707T2 DE69500707T2 (de) 1998-02-12

Family

ID=26349458

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69500707T Expired - Fee Related DE69500707T2 (de) 1994-02-07 1995-02-07 Haltevorrichtung

Country Status (3)

Country Link
US (1) US5660381A (de)
EP (1) EP0668606B1 (de)
DE (1) DE69500707T2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2343399B (en) * 1997-03-28 2001-04-18 Preco Ind Inc Web or sheet-fed apparatus having high-speed positioning mechanism
EP0916447A3 (de) * 1997-11-18 2000-03-22 Borgotec Tecnologie Per L'Automazione S.p.A. Verfahren und Vorrichtung zum Ausrichten eines Werkstücks auf einem Werkzeugmaschinentisch
JPH11312635A (ja) * 1998-04-28 1999-11-09 Ushio Inc コンタクト露光方法
JP3678079B2 (ja) * 1999-10-26 2005-08-03 ウシオ電機株式会社 マスクとワークの間隔設定手段を備えたコンタクト露光装置
TW513339B (en) * 2002-02-08 2002-12-11 Hannstar Display Corp Adjustable optical measuring tool for LCD panel
KR100674440B1 (ko) * 2005-08-12 2007-01-25 주식회사 파이컴 프로브 카드 제조 방법 및 장치
KR100807090B1 (ko) * 2007-03-28 2008-02-26 에스엔유 프리시젼 주식회사 기판 지지장치와 이를 이용한 엘씨디 셀의 씰패턴 검사장치
TWI347469B (en) * 2007-04-27 2011-08-21 Hon Hai Prec Ind Co Ltd Fixation device and method for controlling thereof
US8459622B2 (en) * 2010-04-21 2013-06-11 Seagate Technology Llc Noncontact positioning of a workpiece
NL2013783B1 (en) * 2014-11-12 2016-10-07 Phenom-World Holding B V Sample stage.

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3466514A (en) * 1967-06-26 1969-09-09 Ibm Method and apparatus for positioning objects in preselected orientations
US3626769A (en) * 1970-04-06 1971-12-14 Ibm Apparatus for positioning workpieces in selected translational and rotational orientations
CH633740A5 (fr) * 1980-01-25 1982-12-31 Charmilles Sa Ateliers Machine-outil comprenant une table mobile.
JPS5972727A (ja) * 1982-10-19 1984-04-24 Matsushita Electric Ind Co Ltd 位置合わせ用テ−ブル
US4544311A (en) * 1983-03-15 1985-10-01 Micronix Partners Mask alignment apparatus
NL8500930A (nl) * 1985-03-29 1986-10-16 Philips Nv Verplaatsingsinrichting met voorgespannen contactloze lagers.
US4667415A (en) * 1985-11-29 1987-05-26 Gca Corporation Microlithographic reticle positioning system
DD297758A7 (de) * 1987-03-13 1992-01-23 ������@������������k�� Positionierungseinrichtung fuer die herstellung von halbleiterbauelementen
DE68911330T2 (de) * 1988-02-08 1994-05-26 Toshiba Kawasaki Kk Vorrichtung mit einem Ausrichtungsgestell.
JPH01242989A (ja) * 1988-03-24 1989-09-27 Kazuya Hirose テーブルの縦横移動旋回機構
US5140242A (en) * 1990-04-30 1992-08-18 International Business Machines Corporation Servo guided stage system

Also Published As

Publication number Publication date
EP0668606A2 (de) 1995-08-23
EP0668606B1 (de) 1997-09-17
US5660381A (en) 1997-08-26
EP0668606A3 (de) 1995-09-06
DE69500707T2 (de) 1998-02-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee