DE60327777D1 - DEVICE FOR TREATING DISK-LIKE OBJECTS WITH LIQUIDS - Google Patents
DEVICE FOR TREATING DISK-LIKE OBJECTS WITH LIQUIDSInfo
- Publication number
- DE60327777D1 DE60327777D1 DE60327777T DE60327777T DE60327777D1 DE 60327777 D1 DE60327777 D1 DE 60327777D1 DE 60327777 T DE60327777 T DE 60327777T DE 60327777 T DE60327777 T DE 60327777T DE 60327777 D1 DE60327777 D1 DE 60327777D1
- Authority
- DE
- Germany
- Prior art keywords
- liquids
- objects
- disk
- carrier
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H10P95/00—
-
- H10P72/0406—
-
- H10P72/0404—
Landscapes
- Weting (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Coating Apparatus (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
- Centrifugal Separators (AREA)
Abstract
A device is suggested which includes a carrier ( 1 ) for receiving the disk-shaped object ( 10 ), a liquid supply device ( 17 ) for applying liquid onto a disk-shaped object ( 10 ) located on the carrier ( 1 ), and a liquid catch ring ( 2 ), which is positioned essentially coaxially around the carrier ( 1 ) and is rotatable around the axis of the liquid catch ring ( 2 ).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AT0095402A AT500984B1 (en) | 2002-06-25 | 2002-06-25 | DEVICE FOR LIQUID TREATMENT OF DISK OBJECTS |
| PCT/EP2003/006441 WO2004001812A1 (en) | 2002-06-25 | 2003-06-18 | Device for liquid treatment of disk-shaped objects |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE60327777D1 true DE60327777D1 (en) | 2009-07-09 |
Family
ID=29783642
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60327777T Expired - Lifetime DE60327777D1 (en) | 2002-06-25 | 2003-06-18 | DEVICE FOR TREATING DISK-LIKE OBJECTS WITH LIQUIDS |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7122084B2 (en) |
| EP (1) | EP1532661B1 (en) |
| JP (1) | JP4557715B2 (en) |
| KR (1) | KR100958364B1 (en) |
| CN (1) | CN100375228C (en) |
| AT (2) | AT500984B1 (en) |
| AU (1) | AU2003242729A1 (en) |
| DE (1) | DE60327777D1 (en) |
| TW (1) | TW594873B (en) |
| WO (1) | WO2004001812A1 (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004019731A1 (en) * | 2004-04-20 | 2005-11-10 | Sse Sister Semiconductor Equipment Gmbh | Device for the rotary coating of substrates |
| US20070254098A1 (en) * | 2006-04-28 | 2007-11-01 | Applied Materials, Inc. | Apparatus for single-substrate processing with multiple chemicals and method of use |
| TWI359456B (en) | 2006-12-15 | 2012-03-01 | Lam Res Ag | Device and method for wet treating plate-like arti |
| US7849865B2 (en) * | 2007-01-05 | 2010-12-14 | Semitool, Inc. | System for processing a workpiece |
| CN101992165B (en) * | 2009-08-27 | 2012-10-24 | 沈阳芯源微电子设备有限公司 | Device for chemical liquid spraying treatment of round lamellar object |
| TWI421928B (en) * | 2010-06-10 | 2014-01-01 | Grand Plastic Technology Co Ltd | Automatic cleaning method for spin cleaning and etching wet processor |
| DE202010015018U1 (en) * | 2010-11-07 | 2011-04-14 | Bohnet, Hans | Arrangement for producing structured substrates |
| JP5309118B2 (en) * | 2010-12-17 | 2013-10-09 | 東京エレクトロン株式会社 | Substrate liquid processing equipment |
| US20150017805A1 (en) * | 2013-07-09 | 2015-01-15 | Raymon F. Thompson | Wafer processing apparatus having independently rotatable wafer support and processing dish |
| US10707099B2 (en) | 2013-08-12 | 2020-07-07 | Veeco Instruments Inc. | Collection chamber apparatus to separate multiple fluids during the semiconductor wafer processing cycle |
| US9768041B2 (en) | 2013-08-12 | 2017-09-19 | Veeco Precision Surface Processing Llc | Collection chamber apparatus to separate multiple fluids during the semiconductor wafer processing cycle |
| US11342215B2 (en) | 2017-04-25 | 2022-05-24 | Veeco Instruments Inc. | Semiconductor wafer processing chamber |
| FR3079443B1 (en) | 2018-03-29 | 2021-05-14 | Association Pour Les Transferts De Tech Du Mans | ADDITIVE MANUFACTURING PROCESS OF AN ELASTOMERIC PART, MANUFACTURING PLANT AND ASSOCIATED PART |
| JP7096112B2 (en) | 2018-09-13 | 2022-07-05 | キオクシア株式会社 | Semiconductor manufacturing equipment and methods for manufacturing semiconductor equipment |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT389959B (en) * | 1987-11-09 | 1990-02-26 | Sez Semiconduct Equip Zubehoer | DEVICE FOR SETTING DISC-SHAPED OBJECTS, ESPECIALLY SILICONE DISC |
| JPH0669545B2 (en) * | 1987-11-23 | 1994-09-07 | タツモ株式会社 | Coating device |
| FR2636546B1 (en) * | 1988-09-15 | 1991-03-15 | Sulzer Electro Tech | METHOD AND DEVICE FOR THE UNIFORMLY REGULAR APPLICATION OF A RESIN LAYER ON A SUBSTRATE |
| JPH04119524A (en) * | 1990-09-10 | 1992-04-21 | Fuji Electric Co Ltd | Rotary surface processor |
| JP3241058B2 (en) * | 1991-03-28 | 2001-12-25 | 大日本スクリーン製造株式会社 | Rotary coating device and rotary coating method |
| JP2591555B2 (en) * | 1991-12-20 | 1997-03-19 | 東京応化工業株式会社 | Coating device |
| US5439519A (en) * | 1992-04-28 | 1995-08-08 | Tokyo Ohka Kogyo Co., Ltd. | Solution applying apparatus |
| US5211753A (en) * | 1992-06-15 | 1993-05-18 | Swain Danny C | Spin coating apparatus with an independently spinning enclosure |
| JP3395264B2 (en) * | 1993-07-26 | 2003-04-07 | 東京応化工業株式会社 | Rotating cup type coating device |
| US5489341A (en) * | 1993-08-23 | 1996-02-06 | Semitool, Inc. | Semiconductor processing with non-jetting fluid stream discharge array |
| US5656082A (en) * | 1994-04-04 | 1997-08-12 | Tatsumo Kabushiki Kaisha | Liquid applying apparatus utilizing centrifugal force |
| JP3250090B2 (en) * | 1995-06-27 | 2002-01-28 | 東京エレクトロン株式会社 | Cleaning treatment apparatus and cleaning treatment method |
| JPH0945611A (en) * | 1995-07-27 | 1997-02-14 | Dainippon Screen Mfg Co Ltd | Rotating substrate coating device |
| TW344097B (en) * | 1996-04-09 | 1998-11-01 | Tokyo Electron Co Ltd | Photoresist treating device of substrate and photoresist treating method |
| JP3396377B2 (en) * | 1996-07-22 | 2003-04-14 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| JP3390313B2 (en) * | 1996-12-05 | 2003-03-24 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| US6027602A (en) * | 1997-08-29 | 2000-02-22 | Techpoint Pacific Singapore Pte. Ltd. | Wet processing apparatus |
| JP3555724B2 (en) * | 1997-09-04 | 2004-08-18 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| JP2000343046A (en) * | 1999-06-02 | 2000-12-12 | Kurita Water Ind Ltd | Single wafer cleaning equipment |
| JP2001077082A (en) * | 1999-09-06 | 2001-03-23 | Takata Corp | Chamber structure for recovering treating liquid |
| TW399743U (en) * | 1999-09-15 | 2000-07-21 | Ind Tech Res Inst | Wafer back protection device |
| JP4426036B2 (en) * | 1999-12-02 | 2010-03-03 | 東京エレクトロン株式会社 | Substrate processing equipment |
| ATE417356T1 (en) * | 2000-10-31 | 2008-12-15 | Sez Ag | DEVICE FOR LIQUID TREATMENT OF DISK-SHAPED OBJECTS |
| JP3740377B2 (en) | 2001-03-05 | 2006-02-01 | 東京エレクトロン株式会社 | Liquid supply device |
| JP2003007664A (en) * | 2001-06-22 | 2003-01-10 | Ses Co Ltd | Single wafer substrate cleaning method and single wafer substrate cleaning apparatus |
-
2002
- 2002-06-25 AT AT0095402A patent/AT500984B1/en not_active IP Right Cessation
-
2003
- 2003-06-18 JP JP2004514771A patent/JP4557715B2/en not_active Expired - Fee Related
- 2003-06-18 AU AU2003242729A patent/AU2003242729A1/en not_active Abandoned
- 2003-06-18 AT AT03760646T patent/ATE432530T1/en not_active IP Right Cessation
- 2003-06-18 CN CNB038146991A patent/CN100375228C/en not_active Expired - Fee Related
- 2003-06-18 US US10/518,517 patent/US7122084B2/en not_active Expired - Fee Related
- 2003-06-18 WO PCT/EP2003/006441 patent/WO2004001812A1/en not_active Ceased
- 2003-06-18 EP EP03760646A patent/EP1532661B1/en not_active Expired - Lifetime
- 2003-06-18 DE DE60327777T patent/DE60327777D1/en not_active Expired - Lifetime
- 2003-06-18 KR KR1020047019593A patent/KR100958364B1/en not_active Expired - Fee Related
- 2003-06-20 TW TW092116803A patent/TW594873B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR20050013119A (en) | 2005-02-02 |
| EP1532661A1 (en) | 2005-05-25 |
| TW200400557A (en) | 2004-01-01 |
| AU2003242729A1 (en) | 2004-01-06 |
| JP2005530605A (en) | 2005-10-13 |
| WO2004001812A1 (en) | 2003-12-31 |
| AT500984B1 (en) | 2007-05-15 |
| EP1532661B1 (en) | 2009-05-27 |
| KR100958364B1 (en) | 2010-05-17 |
| TW594873B (en) | 2004-06-21 |
| CN100375228C (en) | 2008-03-12 |
| US20050223975A1 (en) | 2005-10-13 |
| JP4557715B2 (en) | 2010-10-06 |
| ATE432530T1 (en) | 2009-06-15 |
| US7122084B2 (en) | 2006-10-17 |
| AT500984A1 (en) | 2006-05-15 |
| CN1663023A (en) | 2005-08-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8327 | Change in the person/name/address of the patent owner |
Owner name: LAM RESEARCH AG, VILLACH, AT |
|
| 8364 | No opposition during term of opposition |