DE60305683D1 - Stabilisierte infrarotempfindliche, polymerisierbare systeme - Google Patents
Stabilisierte infrarotempfindliche, polymerisierbare systemeInfo
- Publication number
- DE60305683D1 DE60305683D1 DE60305683T DE60305683T DE60305683D1 DE 60305683 D1 DE60305683 D1 DE 60305683D1 DE 60305683 T DE60305683 T DE 60305683T DE 60305683 T DE60305683 T DE 60305683T DE 60305683 D1 DE60305683 D1 DE 60305683D1
- Authority
- DE
- Germany
- Prior art keywords
- infrared sensitive
- nitrogen atom
- polymerizable systems
- stabilized infrared
- compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 125000005842 heteroatom Chemical group 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 2
- 125000004433 nitrogen atom Chemical group N* 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000001072 heteroaryl group Chemical group 0.000 abstract 1
- -1 mercapto compounds Chemical class 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 239000002243 precursor Substances 0.000 abstract 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 1
- 239000011593 sulfur Substances 0.000 abstract 1
- 125000003396 thiol group Chemical group [H]S* 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
- B41M5/465—Infrared radiation-absorbing materials, e.g. dyes, metals, silicates, C black
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/109—Polyester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/131,866 US6884568B2 (en) | 2000-10-17 | 2002-04-25 | Stabilized infrared-sensitive polymerizable systems |
| US131866 | 2002-04-25 | ||
| PCT/EP2003/004271 WO2003091022A1 (en) | 2002-04-25 | 2003-04-24 | Stabilized infrared-sensitive polymerizable systems |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60305683D1 true DE60305683D1 (de) | 2006-07-06 |
| DE60305683T2 DE60305683T2 (de) | 2006-12-28 |
Family
ID=29268746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60305683T Expired - Lifetime DE60305683T2 (de) | 2002-04-25 | 2003-04-24 | Stabilisierte infrarotempfindliche, polymerisierbare systeme |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6884568B2 (de) |
| EP (1) | EP1497122B1 (de) |
| JP (1) | JP2005523484A (de) |
| CN (1) | CN1329190C (de) |
| AT (1) | ATE327888T1 (de) |
| AU (1) | AU2003233055A1 (de) |
| BR (1) | BR0309663A (de) |
| DE (1) | DE60305683T2 (de) |
| WO (1) | WO2003091022A1 (de) |
Families Citing this family (52)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
| JP2003502449A (ja) | 1999-06-10 | 2003-01-21 | ハネウエル・インターナシヨナル・インコーポレーテツド | フォトリソグラフィ用スピンオンガラス反射防止コーティング |
| JP4156784B2 (ja) * | 2000-07-25 | 2008-09-24 | 富士フイルム株式会社 | ネガ型画像記録材料及び画像形成方法 |
| JP2002082429A (ja) * | 2000-09-08 | 2002-03-22 | Fuji Photo Film Co Ltd | ネガ型画像記録材料 |
| US7261998B2 (en) * | 2001-04-04 | 2007-08-28 | Eastman Kodak Company | Imageable element with solvent-resistant polymeric binder |
| US20040091811A1 (en) * | 2002-10-30 | 2004-05-13 | Munnelly Heidi M. | Hetero-substituted aryl acetic acid co-initiators for IR-sensitive compositions |
| US6846614B2 (en) * | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
| US7056639B2 (en) * | 2001-08-21 | 2006-06-06 | Eastman Kodak Company | Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid |
| JP4381143B2 (ja) | 2001-11-15 | 2009-12-09 | ハネウェル・インターナショナル・インコーポレーテッド | フォトリソグラフィー用スピンオン反射防止膜 |
| US7659046B2 (en) * | 2002-04-10 | 2010-02-09 | Eastman Kodak Company | Water-developable infrared-sensitive printing plate |
| US7172850B2 (en) * | 2002-04-10 | 2007-02-06 | Eastman Kodak Company | Preparation of solvent-resistant binder for an imageable element |
| JP4137577B2 (ja) * | 2002-09-30 | 2008-08-20 | 富士フイルム株式会社 | 感光性組成物 |
| JP2004126050A (ja) * | 2002-09-30 | 2004-04-22 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| ATE428558T1 (de) * | 2002-09-30 | 2009-05-15 | Fujifilm Corp | Polymerisierbare zusammensetzung und flachdruckplattenvorläufer |
| CN100590525C (zh) * | 2002-12-18 | 2010-02-17 | 富士胶片株式会社 | 可聚合组合物和平版印刷版前体 |
| JP4150261B2 (ja) * | 2003-01-14 | 2008-09-17 | 富士フイルム株式会社 | 平版印刷版原版の製版方法 |
| JP4458778B2 (ja) * | 2003-02-20 | 2010-04-28 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた平版印刷版原版 |
| JP2004252201A (ja) * | 2003-02-20 | 2004-09-09 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4048133B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 感光性組成物及びそれを用いた平版印刷版原版 |
| JP4048134B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP2004252285A (ja) * | 2003-02-21 | 2004-09-09 | Fuji Photo Film Co Ltd | 感光性組成物及びそれを用いた平版印刷版原版 |
| JP4299639B2 (ja) * | 2003-07-29 | 2009-07-22 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた画像記録材料 |
| JP2005099284A (ja) * | 2003-09-24 | 2005-04-14 | Fuji Photo Film Co Ltd | 感光性組成物及び平版印刷版原版 |
| US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US6902866B1 (en) * | 2003-11-24 | 2005-06-07 | Gary Ganghui Teng | Thermosensitive lithographic printing plate comprising specific acrylate monomers |
| DE102004003143A1 (de) * | 2004-01-21 | 2005-08-18 | Kodak Polychrome Graphics Gmbh | Strahlungsempfindliche Zusammensetzungen mit mercapto-funktionalisierten, radikalisch polymerisierbaren Monomeren |
| JP4411226B2 (ja) * | 2005-02-22 | 2010-02-10 | 富士フイルム株式会社 | 感光性平版印刷版 |
| JP4524235B2 (ja) * | 2005-03-29 | 2010-08-11 | 富士フイルム株式会社 | 平版印刷版原版 |
| ATE526156T1 (de) * | 2006-06-02 | 2011-10-15 | Fujifilm Corp | Bildaufzeichnungsmaterial, flachdruckplattenvorläufer und flachdruckverfahren damit |
| US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
| JP5166016B2 (ja) * | 2007-12-28 | 2013-03-21 | 株式会社シンク・ラボラトリー | ネガ型感光性組成物 |
| JP5155677B2 (ja) * | 2008-01-22 | 2013-03-06 | 富士フイルム株式会社 | 平版印刷版原版、およびその製版方法 |
| US8084182B2 (en) | 2008-04-29 | 2011-12-27 | Eastman Kodak Company | On-press developable elements and methods of use |
| US20100151385A1 (en) | 2008-12-17 | 2010-06-17 | Ray Kevin B | Stack of negative-working imageable elements |
| US8034538B2 (en) | 2009-02-13 | 2011-10-11 | Eastman Kodak Company | Negative-working imageable elements |
| US20100215919A1 (en) | 2009-02-20 | 2010-08-26 | Ting Tao | On-press developable imageable elements |
| US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
| US8318405B2 (en) | 2009-03-13 | 2012-11-27 | Eastman Kodak Company | Negative-working imageable elements with overcoat |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| US8247163B2 (en) | 2009-06-12 | 2012-08-21 | Eastman Kodak Company | Preparing lithographic printing plates with enhanced contrast |
| US8257907B2 (en) | 2009-06-12 | 2012-09-04 | Eastman Kodak Company | Negative-working imageable elements |
| US8383319B2 (en) | 2009-08-25 | 2013-02-26 | Eastman Kodak Company | Lithographic printing plate precursors and stacks |
| RU2571098C2 (ru) | 2009-09-15 | 2015-12-20 | Майлан Груп | Сополимеры, полимерные частицы, содержащие упомянутые сополимеры, и сополимерные связующие для композиций радиационно-чувствительных покрытий для негативных копировальных радиационно-чувствительных литографических печатных форм |
| US8329383B2 (en) * | 2009-11-05 | 2012-12-11 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| BR112012030319A2 (pt) | 2010-09-14 | 2016-08-09 | Mylan Group | copolímeros para composições de revestimentos sensíveis à radiação infravermelha próxima para placas de impressão litográfica térmicas de funcionamento positivo |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| EP2916171B1 (de) * | 2014-03-03 | 2017-05-31 | Agfa Graphics Nv | Verfahren zum Herstellen eines Lithographiedruckformvorläufers |
| CN104788987B (zh) * | 2015-02-02 | 2017-06-09 | 北京印刷学院 | 链转移近红外染料及其高分子聚合乳液制备方法及应用 |
| EP3202862A3 (de) * | 2015-03-10 | 2017-10-25 | Basf Se | Chromophore zusammensetzungen |
| EP3194502A4 (de) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen |
| US20170021656A1 (en) | 2015-07-24 | 2017-01-26 | Kevin Ray | Lithographic imaging and printing with negative-working photoresponsive printing members |
| CN105218806B (zh) * | 2015-11-02 | 2018-01-16 | 国网吉林省电力有限公司电力科学研究院 | 一种侧链含三唑基团的聚芳醚类聚合物及其制备方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4410621A (en) | 1981-04-03 | 1983-10-18 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan |
| US4937159A (en) | 1985-11-20 | 1990-06-26 | The Mead Corporation | Photosensitive materials and compositions containing ionic dye compounds as initiators and thiols as autooxidizers |
| DE68917099T2 (de) | 1988-12-07 | 1995-01-05 | Kao Corp | Produktion von sekundären aliphatischen Aminen. |
| DE69512113T2 (de) | 1994-03-14 | 2000-05-25 | Kodak Polychrome Graphics Llc, Norwalk | Strahlungsempfindliche Zusammensetzung, enthaltend ein Resolharz, ein Novolakharz, einen Infrarotabsorber und ein Triazin, und seine Verwendung in lithographischen Druckplatten |
| US5491046A (en) | 1995-02-10 | 1996-02-13 | Eastman Kodak Company | Method of imaging a lithographic printing plate |
| EP0819985B1 (de) | 1996-07-19 | 2002-06-05 | Agfa-Gevaert | Strahlungsempfindliches Bildaufzeichnungselement und Verfahren zur Herstellung von lithographischen Druckplatten mit diesem Element |
| US6060222A (en) | 1996-11-19 | 2000-05-09 | Kodak Polcyhrome Graphics Llc | 1Postitve-working imaging composition and element and method of forming positive image with a laser |
| EP0889363B1 (de) | 1997-07-03 | 2005-10-05 | E.I. Du Pont De Nemours And Company | Nahinfrarot-empfindliche abbildbare/photopolymerisierbare Zusammensetzungen, Media und verbundene Verfahren |
| JP3844853B2 (ja) | 1997-07-22 | 2006-11-15 | 富士写真フイルム株式会社 | ネガ型画像記録材料 |
| JP2000086670A (ja) | 1997-08-26 | 2000-03-28 | Showa Denko Kk | 有機ホウ素酸塩の安定化剤および感光性組成物 |
| US6352811B1 (en) | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| DE19906823C2 (de) * | 1999-02-18 | 2002-03-14 | Kodak Polychrome Graphics Gmbh | IR-Empfindliche Zusammensetzung und deren Verwendung zur Herstellung von Druckplatten |
| US6391524B2 (en) | 1999-11-19 | 2002-05-21 | Kodak Polychrome Graphics Llc | Article having imagable coatings |
| US6309792B1 (en) | 2000-02-18 | 2001-10-30 | Kodak Polychrome Graphics Llc | IR-sensitive composition and use thereof for the preparation of printing plate precursors |
| US6660446B2 (en) | 2000-05-30 | 2003-12-09 | Fuji Photo Film Co., Ltd. | Heat-sensitive composition and planographic printing plate |
| US6864040B2 (en) * | 2001-04-11 | 2005-03-08 | Kodak Polychrome Graphics Llc | Thermal initiator system using leuco dyes and polyhalogene compounds |
| US6846614B2 (en) * | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
| JP2003114520A (ja) * | 2001-10-05 | 2003-04-18 | Fuji Photo Film Co Ltd | 光重合性組成物及びそれを用いた記録材料 |
-
2002
- 2002-04-25 US US10/131,866 patent/US6884568B2/en not_active Expired - Fee Related
-
2003
- 2003-04-24 AU AU2003233055A patent/AU2003233055A1/en not_active Abandoned
- 2003-04-24 WO PCT/EP2003/004271 patent/WO2003091022A1/en not_active Ceased
- 2003-04-24 BR BR0309663-7A patent/BR0309663A/pt not_active Application Discontinuation
- 2003-04-24 AT AT03727351T patent/ATE327888T1/de not_active IP Right Cessation
- 2003-04-24 JP JP2003587621A patent/JP2005523484A/ja active Pending
- 2003-04-24 EP EP03727351A patent/EP1497122B1/de not_active Expired - Lifetime
- 2003-04-24 DE DE60305683T patent/DE60305683T2/de not_active Expired - Lifetime
- 2003-04-24 CN CNB038117975A patent/CN1329190C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1655932A (zh) | 2005-08-17 |
| JP2005523484A (ja) | 2005-08-04 |
| DE60305683T2 (de) | 2006-12-28 |
| BR0309663A (pt) | 2005-02-22 |
| CN1329190C (zh) | 2007-08-01 |
| US20020197564A1 (en) | 2002-12-26 |
| ATE327888T1 (de) | 2006-06-15 |
| AU2003233055A1 (en) | 2003-11-10 |
| WO2003091022A1 (en) | 2003-11-06 |
| US6884568B2 (en) | 2005-04-26 |
| EP1497122A1 (de) | 2005-01-19 |
| EP1497122B1 (de) | 2006-05-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE327888T1 (de) | Stabilisierte infrarotempfindliche, polymerisierbare systeme | |
| ES2180580T3 (es) | Compuestos de oxazolilo sustituidos para el tratamiento de la inflamacion. | |
| DE60132171D1 (de) | Tocopherole, tocotrienole, andere chrome und seitenketten-derivate und ihre verwendung | |
| ES2196396T3 (es) | Compuestos heteroaromaticos de 5 miembros conteniendo oxigeno o azufre como inhibidores del factor xa. | |
| AU2003248978A1 (en) | Fused heteroaryl derivatives for use as p38 kinase inhibitors in the treatment of i.a. rheumatoid arthristis | |
| EA200800873A1 (ru) | Конденсированные гетероциклические соединения, полезные в качестве модуляторов киназы | |
| IS7391A (is) | ACC hindrar | |
| WO2003018022A8 (en) | 2-amino-4-heteroarylaminopyrimidine derivatives for use in the treatment of cancer | |
| MXPA04000646A (es) | Agente antiviral. | |
| UY26695A1 (es) | Activadores para amino sustituidos de la fenilamida glucoquinasa | |
| CY1113813T1 (el) | Νεες ενωσεις που εχουν ανασταλτικη δραστικοτητα εναντια στον εξαρτωμενο απο το νατριο μεταφορεα | |
| EA200401398A1 (ru) | Замещённые фенилацетамиды и их применение в качестве активаторов глюкокиназы | |
| DE602005023343D1 (de) | Pyrimidinderivate als gpcr-agonisten | |
| MXPA06013125A (es) | Enzima recombinante con sensibilidad alterada a la retroalimentacion. | |
| BR9814361A (pt) | Inibição de quinase raf usando uréiasheterocìclicas substituìdas por arila eheteroarila | |
| ATE435203T1 (de) | N-sulfonylpyrrole und ihre verwendung als histondeacetylaseinhibitoren | |
| DE60327750D1 (de) | Pde4-inhibitoren mit heterobrückensubstituiertem 8-arylchinolin | |
| AR003106A1 (es) | Compuestos anti-sida de piperadinil y piperazinil alquil substituidos. | |
| ATE355265T1 (de) | Biphenylcarboxamidderivate und ihre verwendung als p38 kinase inhibitoren | |
| NO20060426L (no) | Kannabinoid reseptormodulator | |
| ATE330963T1 (de) | Amorphe feste modifikation von bis(2,4- dicumylphenyl) pentaerythritdiphosphit | |
| ECSP066658A (es) | Alfahidroxiamidas como antagonistas o agonistas inversos de bradiquinina | |
| DE69923676D1 (de) | Bestimmte heteroaryl substituierte thiol inhibitoren von endothelin wechselnden enzymen | |
| ES465927A1 (es) | Un procedimiento para la produccion de compuestos tricicli- cos | |
| BRPI0409995A (pt) | composto, e, agente anti-leishmánia |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: KODAK GRAPHIC COMMUNICATIONS GMBH, 37520 OSTER, DE |