DE60236994D1 - Halbleiterbauelement und dessen Herstellungsverfahren - Google Patents
Halbleiterbauelement und dessen HerstellungsverfahrenInfo
- Publication number
- DE60236994D1 DE60236994D1 DE60236994T DE60236994T DE60236994D1 DE 60236994 D1 DE60236994 D1 DE 60236994D1 DE 60236994 T DE60236994 T DE 60236994T DE 60236994 T DE60236994 T DE 60236994T DE 60236994 D1 DE60236994 D1 DE 60236994D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- semiconductor component
- semiconductor
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B53/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
- H10B53/40—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors characterised by the peripheral circuit region
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B53/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
- H10B53/30—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors characterised by the memory core region
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
-
- H10W20/056—
-
- H10W20/0698—
-
- H10W20/074—
-
- H10W20/075—
-
- H10W20/077—
-
- H10W20/097—
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002001675A JP4368085B2 (ja) | 2002-01-08 | 2002-01-08 | 半導体装置の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE60236994D1 true DE60236994D1 (de) | 2010-08-26 |
Family
ID=19190641
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60236994T Expired - Lifetime DE60236994D1 (de) | 2002-01-08 | 2002-08-14 | Halbleiterbauelement und dessen Herstellungsverfahren |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6710422B2 (de) |
| EP (1) | EP1326277B1 (de) |
| JP (1) | JP4368085B2 (de) |
| KR (1) | KR100851167B1 (de) |
| CN (1) | CN1240133C (de) |
| DE (1) | DE60236994D1 (de) |
| TW (1) | TW552698B (de) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100559592C (zh) * | 2003-04-15 | 2009-11-11 | 富士通微电子株式会社 | 半导体器件的制造方法 |
| US7002196B2 (en) * | 2003-11-13 | 2006-02-21 | Infineon Technologies Ag | Ferroelectric capacitor devices and FeRAM devices |
| JP2005191345A (ja) * | 2003-12-26 | 2005-07-14 | Nec Electronics Corp | 半導体装置及びその製造方法 |
| JP4803995B2 (ja) * | 2004-06-28 | 2011-10-26 | 富士通セミコンダクター株式会社 | 半導体装置及びその製造方法 |
| JP4785030B2 (ja) * | 2005-01-18 | 2011-10-05 | 富士通セミコンダクター株式会社 | 半導体装置とその製造方法 |
| JP2007073909A (ja) * | 2005-09-09 | 2007-03-22 | Oki Electric Ind Co Ltd | 半導体メモリの製造方法 |
| KR100982712B1 (ko) * | 2005-10-03 | 2010-09-17 | 후지쯔 세미컨덕터 가부시키가이샤 | 강유전체 메모리 장치 및 그 제조 방법, 반도체 장치의제조 방법 |
| CN101326633B (zh) * | 2005-12-02 | 2010-05-26 | 富士通微电子株式会社 | 半导体器件及其制造方法 |
| KR100755673B1 (ko) * | 2006-08-04 | 2007-09-05 | 삼성전자주식회사 | 반도체 소자 제조 방법 및 이에 따라 제조된 반도체 소자 |
| JP2009130188A (ja) * | 2007-11-26 | 2009-06-11 | Seiko Epson Corp | メモリ装置の製造方法 |
| JP5875368B2 (ja) * | 2011-12-28 | 2016-03-02 | キヤノン株式会社 | 半導体装置の製造方法 |
| CN106910708B (zh) * | 2015-12-22 | 2020-06-19 | 中芯国际集成电路制造(上海)有限公司 | 具有局部互连结构的器件及其制造方法 |
| CN109755245B (zh) * | 2017-11-08 | 2020-12-01 | 华邦电子股份有限公司 | 存储器装置及其制造方法 |
| KR102816109B1 (ko) * | 2020-01-10 | 2025-06-05 | 삼성전자주식회사 | 반도체 소자 및 이의 제조 방법 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09116123A (ja) * | 1995-10-20 | 1997-05-02 | Sony Corp | 強誘電体不揮発性半導体記憶装置 |
| JPH1022466A (ja) * | 1996-03-01 | 1998-01-23 | Motorola Inc | 強誘電体不揮発性メモリ・セルおよびメモリ・セルの形成方法 |
| DE19640246A1 (de) * | 1996-09-30 | 1998-04-02 | Siemens Ag | Halbleiteranordnung mit geschützter Barriere für eine Stapelzelle |
| US5773314A (en) | 1997-04-25 | 1998-06-30 | Motorola, Inc. | Plug protection process for use in the manufacture of embedded dynamic random access memory (DRAM) cells |
| JPH11150245A (ja) * | 1997-11-18 | 1999-06-02 | Nec Corp | 半導体装置の製造方法 |
| US6509601B1 (en) * | 1998-07-31 | 2003-01-21 | Samsung Electronics Co., Ltd. | Semiconductor memory device having capacitor protection layer and method for manufacturing the same |
| JP2000307084A (ja) * | 1999-04-23 | 2000-11-02 | Hitachi Ltd | 半導体集積回路装置およびその製造方法 |
| TW454330B (en) | 1999-05-26 | 2001-09-11 | Matsushita Electronics Corp | Semiconductor apparatus and its manufacturing method |
-
2002
- 2002-01-08 JP JP2002001675A patent/JP4368085B2/ja not_active Expired - Fee Related
- 2002-07-31 TW TW091117218A patent/TW552698B/zh active
- 2002-08-06 US US10/212,092 patent/US6710422B2/en not_active Expired - Lifetime
- 2002-08-14 DE DE60236994T patent/DE60236994D1/de not_active Expired - Lifetime
- 2002-08-14 EP EP02255654A patent/EP1326277B1/de not_active Expired - Lifetime
- 2002-09-03 CN CNB02141582XA patent/CN1240133C/zh not_active Expired - Fee Related
- 2002-09-03 KR KR1020020052754A patent/KR100851167B1/ko not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1240133C (zh) | 2006-02-01 |
| EP1326277B1 (de) | 2010-07-14 |
| KR20030060744A (ko) | 2003-07-16 |
| US20030127703A1 (en) | 2003-07-10 |
| TW552698B (en) | 2003-09-11 |
| EP1326277A3 (de) | 2006-06-28 |
| JP4368085B2 (ja) | 2009-11-18 |
| KR100851167B1 (ko) | 2008-08-08 |
| EP1326277A2 (de) | 2003-07-09 |
| US6710422B2 (en) | 2004-03-23 |
| JP2003204040A (ja) | 2003-07-18 |
| CN1431713A (zh) | 2003-07-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8328 | Change in the person/name/address of the agent |
Representative=s name: SEEGER SEEGER LINDNER PARTNERSCHAFT PATENTANWAELTE |