DE602007000223D1 - Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium - Google Patents

Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium

Info

Publication number: DE602007000223D1
Authority: DE; Germany
Prior art keywords: cleaning; substrate; storage medium; program storage; program
Prior art date: 2006-04-13
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

DE602007000223T

Other languages

English (en)

Inventor

Tsukasa Watanabe

Naoki Shindo

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Tokyo Electron Ltd

Original Assignee

Tokyo Electron Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2006-04-13

Filing date

2007-04-12

Publication date

2008-12-18

2007-04-12 Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd

2008-12-18 Publication of DE602007000223D1 publication Critical patent/DE602007000223D1/de

Status Active legal-status Critical Current

2027-04-13 Anticipated expiration legal-status Critical

Classifications

- H10P52/00—
- H10P72/0416—
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/048—Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations

DE602007000223T 2006-04-13 2007-04-12 Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium Active DE602007000223D1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2006110957A JP4890919B2 (ja)	2006-04-13	2006-04-13	基板洗浄方法、基板洗浄装置、プログラム、および記録媒体

Publications (1)

Publication Number	Publication Date
DE602007000223D1 true DE602007000223D1 (de)	2008-12-18

Family

ID=38230031

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE602007000223T Active DE602007000223D1 (de)	2006-04-13	2007-04-12	Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium

Country Status (6)

Country	Link
US (1)	US8449684B2 (de)
EP (1)	EP1848023B1 (de)
JP (1)	JP4890919B2 (de)
KR (2)	KR101061946B1 (de)
DE (1)	DE602007000223D1 (de)
TW (1)	TW200746284A (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
KR100910190B1 (ko) *	2007-12-17	2009-07-30	주식회사 실트론	웨이퍼 세정장치
KR20100050403A (ko) *	2008-11-04	2010-05-13	주식회사 실트론	대상물의 습식 처리 장치 및 방법과 이에 사용되는 유체 확산판
TW201026849A (en) *	2009-01-09	2010-07-16	Univ Nat Taiwan	Cell pattern and method producing thereof
CN102218413B (zh) *	2011-05-18	2013-08-21	益阳晶益电子有限公司	石英晶片的清洗方法及清洗装置
JP5586734B2 (ja) *	2012-08-07	2014-09-10	東京エレクトロン株式会社	基板洗浄装置、基板洗浄システム、基板洗浄方法および記憶媒体
CN103721973B (zh) *	2013-12-31	2015-09-30	长沙理工大学	一种恒温数控超声波清洗的方法及装置
JP6914050B2 (ja) *	2017-02-15	2021-08-04	東京エレクトロン株式会社	基板処理装置
CN109604253A (zh) *	2018-11-12	2019-04-12	湖南图强科技开发有限公司	一种医用手术设备大批量清洗装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH04199714A (ja) *	1990-11-29	1992-07-20	Kawasaki Steel Corp	超音波洗浄方法及びその装置
US5427622A (en) *	1993-02-12	1995-06-27	International Business Machines Corporation	Method for uniform cleaning of wafers using megasonic energy
JP3259412B2 (ja) *	1993-02-22	2002-02-25	ソニー株式会社	ウエハ洗浄方法
US5656097A (en) *	1993-10-20	1997-08-12	Verteq, Inc.	Semiconductor wafer cleaning system
JP3473063B2 (ja) *	1993-11-15	2003-12-02	松下電器産業株式会社	シリコン基板の洗浄方法
US5505785A (en) *	1994-07-18	1996-04-09	Ferrell; Gary W.	Method and apparatus for cleaning integrated circuit wafers
JPH0839025A (ja) *	1994-07-28	1996-02-13	Olympus Optical Co Ltd	洗浄方法
JPH10109072A (ja) *	1996-10-04	1998-04-28	Puretetsuku:Kk	高周波洗浄装置
JP3331168B2 (ja) *	1997-12-09	2002-10-07	ティーディーケイ株式会社	洗浄方法および装置
US6039055A (en) *	1998-01-08	2000-03-21	International Business Machines Corporation	Wafer cleaning with dissolved gas concentration control
US6372051B1 (en) *	1998-12-04	2002-04-16	Texas Instruments Incorporated	Positive flow, positive displacement rinse tank
JP3658257B2 (ja) *	1998-12-24	2005-06-08	キヤノン株式会社	洗浄方法及び洗浄装置及び電子写真感光体及び電子写真感光体の製造方法
JP2002093765A (ja) *	2000-09-20	2002-03-29	Kaijo Corp	基板洗浄方法および基板洗浄装置
JP2003037093A (ja) *	2001-07-06	2003-02-07	Pacific Internatl Stg Inc	超音波振動装置及びそれを備えた超音波洗浄装置
JP2004193329A (ja) *	2002-12-11	2004-07-08	Dainippon Screen Mfg Co Ltd	基板処理装置
US7111632B2 (en) *	2003-09-22	2006-09-26	Seagate Technology Llc	Ultrasonic cleaning device for removing undesirable particles from an object
US7111517B2 (en) *	2004-07-29	2006-09-26	Agere Systems, Inc.	Apparatus and method for in-situ measuring of vibrational energy in a process bath of a vibrational cleaning system
JP4999338B2 (ja) *	2006-03-15	2012-08-15	東京エレクトロン株式会社	基板洗浄方法、基板洗浄装置、プログラム、および記録媒体

2006
- 2006-04-13 JP JP2006110957A patent/JP4890919B2/ja not_active Expired - Fee Related
2007
- 2007-03-29 KR KR1020070030913A patent/KR101061946B1/ko active Active
- 2007-04-11 US US11/783,748 patent/US8449684B2/en active Active
- 2007-04-12 EP EP07007508A patent/EP1848023B1/de not_active Expired - Fee Related
- 2007-04-12 DE DE602007000223T patent/DE602007000223D1/de active Active
- 2007-04-12 TW TW096112939A patent/TW200746284A/zh unknown
2011
- 2011-03-07 KR KR1020110020020A patent/KR101062255B1/ko not_active Expired - Fee Related

Also Published As

Publication number	Publication date
KR20070101768A (ko)	2007-10-17
EP1848023B1 (de)	2008-11-05
JP2007287790A (ja)	2007-11-01
TWI358761B (de)	2012-02-21
TW200746284A (en)	2007-12-16
KR101062255B1 (ko)	2011-09-06
JP4890919B2 (ja)	2012-03-07
KR101061946B1 (ko)	2011-09-05
EP1848023A1 (de)	2007-10-24
KR20110038000A (ko)	2011-04-13
US8449684B2 (en)	2013-05-28
US20070240736A1 (en)	2007-10-18

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Legal Events

Date	Code	Title	Description
2009-11-26	8364	No opposition during term of opposition