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DE602007007468D1 - Magnetische Linsenanordnung - Google Patents

Magnetische Linsenanordnung

Info

Publication number
DE602007007468D1
DE602007007468D1 DE602007007468T DE602007007468T DE602007007468D1 DE 602007007468 D1 DE602007007468 D1 DE 602007007468D1 DE 602007007468 T DE602007007468 T DE 602007007468T DE 602007007468 T DE602007007468 T DE 602007007468T DE 602007007468 D1 DE602007007468 D1 DE 602007007468D1
Authority
DE
Germany
Prior art keywords
lens arrangement
magnetic lens
magnetic
arrangement
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007007468T
Other languages
English (en)
Inventor
Pavel Adamec
Carlo Salvesen
Ivo Liska
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Original Assignee
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH filed Critical ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Publication of DE602007007468D1 publication Critical patent/DE602007007468D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/14—Lenses magnetic
    • H01J2237/1405—Constructional details
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
DE602007007468T 2007-07-27 2007-07-27 Magnetische Linsenanordnung Active DE602007007468D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP07014812A EP2019414B1 (de) 2007-07-27 2007-07-27 Magnetische Linsenanordnung

Publications (1)

Publication Number Publication Date
DE602007007468D1 true DE602007007468D1 (de) 2010-08-12

Family

ID=38814666

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602007007468T Active DE602007007468D1 (de) 2007-07-27 2007-07-27 Magnetische Linsenanordnung

Country Status (3)

Country Link
US (1) US7928405B2 (de)
EP (1) EP2019414B1 (de)
DE (1) DE602007007468D1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE602007007468D1 (de) * 2007-07-27 2010-08-12 Integrated Circuit Testing Magnetische Linsenanordnung
TWI502616B (zh) * 2014-08-08 2015-10-01 Nat Univ Tsing Hua 桌上型電子顯微鏡以及其廣域可調式磁透鏡
US10777382B2 (en) * 2017-11-21 2020-09-15 Focus-Ebeam Technology (Beijing) Co., Ltd. Low voltage scanning electron microscope and method for specimen observation
EP3913654A1 (de) * 2020-05-20 2021-11-24 FEI Company Axiale ausrichtungsanordnung und ladungsträgerteilchenmikroskop mit einer solchen ausrichtungsanordnung
CN114256043B (zh) 2020-12-02 2024-04-05 聚束科技（北京）有限公司 一种电子束系统
CN114220725B (zh) 2020-12-02 2024-05-07 聚束科技（北京）有限公司 一种电子显微镜
JP7307768B2 (ja) * 2021-07-08 2023-07-12 日本電子株式会社 走査電子顕微鏡および対物レンズ

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4039810A (en) * 1976-06-30 1977-08-02 International Business Machines Corporation Electron projection microfabrication system
US4096386A (en) * 1977-04-04 1978-06-20 Taylor-Kincaid Company Light reflecting electrostatic electron lens
JPS5842935B2 (ja) * 1978-04-07 1983-09-22 日本電子株式会社 走査電子顕微鏡等の対物レンズ
JPS5945171B2 (ja) * 1979-12-28 1984-11-05 日本電子株式会社 電子レンズ
JPS57118357A (en) * 1981-01-14 1982-07-23 Jeol Ltd Objective lens for scan type electron microscope
JPS587755A (ja) * 1981-07-06 1983-01-17 Jeol Ltd 電子レンズ
US4585942A (en) * 1983-03-17 1986-04-29 Jeol Ltd. Transmission electron microscope
JPS6095843A (ja) * 1983-10-28 1985-05-29 Hitachi Ltd 電子ビ−ム装置
FR2584234B1 (fr) * 1985-06-28 1988-12-09 Cameca Testeur de circuit integre a faisceau d'electrons
JPS62295346A (ja) * 1986-06-12 1987-12-22 Hitachi Ltd 電子レンズ
GB2192092A (en) * 1986-06-25 1987-12-31 Philips Electronic Associated Magnetic lens system
US4823006A (en) * 1987-05-21 1989-04-18 Electroscan Corporation Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope
JPH0760661B2 (ja) * 1988-07-22 1995-06-28 株式会社日立製作所 電子顕微鏡
JPH02181350A (ja) 1989-01-06 1990-07-16 Hitachi Ltd 磁区観察機能を備えた透過形電子顕微鏡
JP3106586B2 (ja) * 1991-09-19 2000-11-06 株式会社日立製作所 電子顕微鏡等の対物レンズ
US5780859A (en) * 1996-02-16 1998-07-14 Act Advanced Circuit Testing Gesellschaft Electrostatic-magnetic lens arrangement
US5729022A (en) * 1996-09-26 1998-03-17 Etec Systems, Inc. Composite concentric-gap magnetic lens and deflector with conical pole pieces
DE19845329C2 (de) 1998-03-10 2001-09-27 Erik Essers Rasterelektronenmikroskop
EP0969493A1 (de) * 1998-07-03 2000-01-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Gerät und Verfahren zur Probenuntersuchung mittels Ladungsträgerstrahlen
US6362486B1 (en) * 1998-11-12 2002-03-26 Schlumberger Technologies, Inc. Magnetic lens for focusing a charged particle beam
US6130432A (en) * 1999-04-13 2000-10-10 International Business Machines Corporation Particle beam system with dynamic focusing
US6768117B1 (en) * 2000-07-25 2004-07-27 Applied Materials, Inc. Immersion lens with magnetic shield for charged particle beam system
JP2002134051A (ja) * 2000-10-20 2002-05-10 Seiko Instruments Inc 電磁界重畳型レンズ及びこれを用いた電子線装置
WO2002037527A1 (fr) * 2000-11-02 2002-05-10 Ebara Corporation Appareil a faisceau electronique et procede de production de dispositif utilisant cet appareil
EP1271605A4 (de) * 2000-11-02 2009-09-02 Ebara Corp Elektronenstrahlgerät und verfahren zur herstellung von halbleiter vorrichtungen mittels eines solchen gerätes.
US6723997B2 (en) * 2001-10-26 2004-04-20 Jeol Ltd. Aberration corrector for instrument utilizing charged-particle beam
JP2003331770A (ja) * 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
KR100496643B1 (ko) * 2003-10-25 2005-06-20 한국전자통신연구원 마이크로칼럼 전자빔 장치의 자체정렬 적층 금속 박막전자빔 렌즈 및 그 제작방법
US7420164B2 (en) 2004-05-26 2008-09-02 Ebara Corporation Objective lens, electron beam system and method of inspecting defect
EP1605492B1 (de) 2004-06-11 2015-11-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Teilchenstrahlgerät mit Gegenfeldspektrometer
JP4588602B2 (ja) * 2005-09-30 2010-12-01 株式会社トプコン 静電偏向器の製造方法
JP4795847B2 (ja) * 2006-05-17 2011-10-19 株式会社日立ハイテクノロジーズ 電子レンズ及びそれを用いた荷電粒子線装置
US7825386B2 (en) * 2006-10-25 2010-11-02 Hermes-Microvision, Inc. System and method for a charged particle beam
DE602007007468D1 (de) * 2007-07-27 2010-08-12 Integrated Circuit Testing Magnetische Linsenanordnung
EP2019413B1 (de) * 2007-07-27 2010-03-31 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Elektrostatische Linsenanordnung

Also Published As

Publication number Publication date
EP2019414A1 (de) 2009-01-28
EP2019414B1 (de) 2010-06-30
US20090039280A1 (en) 2009-02-12
US7928405B2 (en) 2011-04-19

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