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DE602006002187D1 - Lichtemittierende Anzeigentafel - Google Patents

Lichtemittierende Anzeigentafel

Info

Publication number
DE602006002187D1
DE602006002187D1 DE602006002187T DE602006002187T DE602006002187D1 DE 602006002187 D1 DE602006002187 D1 DE 602006002187D1 DE 602006002187 T DE602006002187 T DE 602006002187T DE 602006002187 T DE602006002187 T DE 602006002187T DE 602006002187 D1 DE602006002187 D1 DE 602006002187D1
Authority
DE
Germany
Prior art keywords
light
display panel
emitting display
emitting
panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006002187T
Other languages
English (en)
Inventor
Samsung Sd Choi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Display Co Ltd
Original Assignee
Samsung SDI Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung SDI Co Ltd filed Critical Samsung SDI Co Ltd
Publication of DE602006002187D1 publication Critical patent/DE602006002187D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/421Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs having a particular composition, shape or crystalline structure of the active layer
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6729Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/673Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
    • H10D30/6733Multi-gate TFTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/674Thin-film transistors [TFT] characterised by the active materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6757Thin-film transistors [TFT] characterised by the structure of the channel, e.g. transverse or longitudinal shape or doping profile
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441Interconnections, e.g. scanning lines
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
DE602006002187T 2005-06-22 2006-06-22 Lichtemittierende Anzeigentafel Active DE602006002187D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050053975A KR100624314B1 (ko) 2005-06-22 2005-06-22 발광표시장치 및 박막트랜지스터

Publications (1)

Publication Number Publication Date
DE602006002187D1 true DE602006002187D1 (de) 2008-09-25

Family

ID=37026972

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006002187T Active DE602006002187D1 (de) 2005-06-22 2006-06-22 Lichtemittierende Anzeigentafel

Country Status (6)

Country Link
US (1) US9196747B2 (de)
EP (1) EP1737046B1 (de)
JP (1) JP2007005766A (de)
KR (1) KR100624314B1 (de)
CN (1) CN1885552B (de)
DE (1) DE602006002187D1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100778514B1 (ko) 2006-08-09 2007-11-22 삼성에스디아이 주식회사 유기 발광 표시 장치
KR100786846B1 (ko) 2006-11-10 2007-12-20 삼성에스디아이 주식회사 유기전계발광표시장치 및 유기전계발광표시장치의 검출장치
JP2010039397A (ja) 2008-08-08 2010-02-18 Sony Corp 表示装置及び電子機器
KR20100036624A (ko) * 2008-09-30 2010-04-08 삼성전자주식회사 박막트랜지스터 기판 및 이를 갖는 유기발광 표시장치
JP5494115B2 (ja) * 2010-03-29 2014-05-14 ソニー株式会社 表示装置及び電子機器
KR101374477B1 (ko) * 2010-10-22 2014-03-14 엘지디스플레이 주식회사 유기발광다이오드 표시장치
WO2013015091A1 (en) 2011-07-22 2013-01-31 Semiconductor Energy Laboratory Co., Ltd. Light-emitting device
KR101996038B1 (ko) * 2012-08-31 2019-07-03 엘지디스플레이 주식회사 평판표시장치
KR20150005105A (ko) * 2013-07-04 2015-01-14 삼성디스플레이 주식회사 표시 장치
KR20150054040A (ko) * 2013-11-08 2015-05-20 삼성디스플레이 주식회사 박막 트랜지스터 기판 및 이를 포함하는 유기 발광 표시 장치
KR102270081B1 (ko) 2014-09-16 2021-06-29 삼성디스플레이 주식회사 유기 발광 표시 장치
KR102300026B1 (ko) * 2015-01-08 2021-09-09 삼성디스플레이 주식회사 표시 장치
JP6662665B2 (ja) * 2015-03-19 2020-03-11 株式会社半導体エネルギー研究所 液晶表示装置及び該液晶表示装置を用いた電子機器
CN106663697B (zh) * 2015-03-27 2019-11-12 堺显示器制品株式会社 薄膜晶体管及显示面板
CN107086227B (zh) * 2017-05-11 2020-02-21 京东方科技集团股份有限公司 发光电路、电子装置、薄膜晶体管及其制备方法
KR102420080B1 (ko) * 2017-05-19 2022-07-13 삼성디스플레이 주식회사 다채널 박막 트랜지스터 및 이를 포함하는 화소
KR102723333B1 (ko) * 2020-05-14 2024-10-29 삼성디스플레이 주식회사 플렉서블 표시 장치

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US6229506B1 (en) * 1997-04-23 2001-05-08 Sarnoff Corporation Active matrix light emitting diode pixel structure and concomitant method
US6512269B1 (en) 2000-09-07 2003-01-28 International Business Machines Corporation High-voltage high-speed SOI MOSFET
JP4789369B2 (ja) * 2001-08-08 2011-10-12 株式会社半導体エネルギー研究所 表示装置及び電子機器
CN1207617C (zh) 2001-11-15 2005-06-22 Nec液晶技术株式会社 平面开关模式有源矩阵型液晶显示器件及其制造方法
JP2003241688A (ja) * 2002-02-18 2003-08-29 Matsushita Electric Ind Co Ltd 表示装置
CN100365827C (zh) 2002-03-25 2008-01-30 株式会社液晶先端技术开发中心 薄膜晶体管、电路装置及液晶显示器
JP4900756B2 (ja) 2002-04-16 2012-03-21 セイコーエプソン株式会社 半導体装置の製造方法、電気光学装置、集積回路、および電子機器
US6933529B2 (en) 2002-07-11 2005-08-23 Lg. Philips Lcd Co., Ltd. Active matrix type organic light emitting diode device and thin film transistor thereof
JP3949040B2 (ja) 2002-09-25 2007-07-25 東北パイオニア株式会社 発光表示パネルの駆動装置
JP2004340981A (ja) * 2003-03-14 2004-12-02 Sony Corp 液晶表示装置
CN1328796C (zh) 2003-04-09 2007-07-25 友达光电股份有限公司 薄膜晶体管的双栅极布局结构
KR100560780B1 (ko) * 2003-07-07 2006-03-13 삼성에스디아이 주식회사 유기전계 발광표시장치의 화소회로 및 그의 구동방법
US6937215B2 (en) * 2003-11-03 2005-08-30 Wintek Corporation Pixel driving circuit of an organic light emitting diode display panel
KR100599726B1 (ko) * 2003-11-27 2006-07-12 삼성에스디아이 주식회사 발광 표시 장치 및 그 표시 패널과 구동 방법
KR100557731B1 (ko) * 2003-12-27 2006-03-06 엘지.필립스 엘시디 주식회사 유기전계 발광소자와 그 제조방법
KR100979263B1 (ko) 2003-12-29 2010-08-31 엘지디스플레이 주식회사 액티브 매트릭스형 유기전계발광 소자용 구동용박막트랜지스터 및 상기 구동용 박막트랜지스터를포함하는 액티브 매트릭스형 유기전계발광 소자
KR100684712B1 (ko) * 2004-03-09 2007-02-20 삼성에스디아이 주식회사 발광 표시 장치
KR101076424B1 (ko) * 2004-03-31 2011-10-25 엘지디스플레이 주식회사 일렉트로 루미네센스 패널의 프리차지 방법 및 장치
KR100592641B1 (ko) * 2004-07-28 2006-06-26 삼성에스디아이 주식회사 화소 회로 및 그것을 채용한 유기 발광 표시 장치
KR100602361B1 (ko) * 2004-09-22 2006-07-19 삼성에스디아이 주식회사 디멀티플렉서 및 이를 이용한 발광 표시장치와 그의구동방법
KR100604057B1 (ko) * 2004-09-24 2006-07-24 삼성에스디아이 주식회사 화소 및 이를 이용한 발광 표시장치
KR100739318B1 (ko) * 2004-11-22 2007-07-12 삼성에스디아이 주식회사 화소회로 및 발광 표시장치
US7872620B2 (en) * 2005-04-29 2011-01-18 Seoul National University Industry Foundation Pixel structure using voltage programming-type for active matrix organic light emitting device

Also Published As

Publication number Publication date
KR100624314B1 (ko) 2006-09-19
JP2007005766A (ja) 2007-01-11
US20060290633A1 (en) 2006-12-28
EP1737046A1 (de) 2006-12-27
CN1885552B (zh) 2010-12-29
US9196747B2 (en) 2015-11-24
CN1885552A (zh) 2006-12-27
EP1737046B1 (de) 2008-08-13

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: SAMSUNG MOBILE DISPLAY CO. LTD., SUWON, GYEONG, KR

8364 No opposition during term of opposition