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DE602006001415D1 - Poliervorrichtung - Google Patents

Poliervorrichtung

Info

Publication number
DE602006001415D1
DE602006001415D1 DE602006001415T DE602006001415T DE602006001415D1 DE 602006001415 D1 DE602006001415 D1 DE 602006001415D1 DE 602006001415 T DE602006001415 T DE 602006001415T DE 602006001415 T DE602006001415 T DE 602006001415T DE 602006001415 D1 DE602006001415 D1 DE 602006001415D1
Authority
DE
Germany
Prior art keywords
polisher
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006001415T
Other languages
English (en)
Inventor
Tadakazu Miyashita
Yoshikazu Nakamura
Yoshiyuki Nomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikoshi Machinery Corp
Original Assignee
Fujikoshi Machinery Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikoshi Machinery Corp filed Critical Fujikoshi Machinery Corp
Publication of DE602006001415D1 publication Critical patent/DE602006001415D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • H10P72/7608
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/34Accessories
    • B24B37/345Feeding, loading or unloading work specially adapted to lapping
    • H10P52/00
    • H10P72/7611
    • H10P72/7624

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
DE602006001415T 2005-04-01 2006-03-30 Poliervorrichtung Active DE602006001415D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005106895A JP4642532B2 (ja) 2005-04-01 2005-04-01 研磨装置

Publications (1)

Publication Number Publication Date
DE602006001415D1 true DE602006001415D1 (de) 2008-07-24

Family

ID=36615722

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006001415T Active DE602006001415D1 (de) 2005-04-01 2006-03-30 Poliervorrichtung

Country Status (8)

Country Link
US (1) US7235001B2 (de)
EP (1) EP1707314B1 (de)
JP (1) JP4642532B2 (de)
KR (1) KR101228178B1 (de)
CN (1) CN100591480C (de)
DE (1) DE602006001415D1 (de)
MY (1) MY144252A (de)
TW (1) TWI377113B (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7644922B2 (en) * 2004-06-14 2010-01-12 Wms Gaming Inc. Gaming terminal with transformable cabinet
JP5033354B2 (ja) * 2006-05-29 2012-09-26 不二越機械工業株式会社 ワークセンタリング装置
JP2009194134A (ja) * 2008-02-14 2009-08-27 Ebara Corp 研磨方法及び研磨装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4944119A (en) * 1988-06-20 1990-07-31 Westech Systems, Inc. Apparatus for transporting wafer to and from polishing head
US5885138A (en) * 1993-09-21 1999-03-23 Ebara Corporation Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
JP3580936B2 (ja) * 1996-02-26 2004-10-27 株式会社荏原製作所 ポリッシング装置のプッシャー及びポリッシング装置
US6312312B1 (en) * 1997-10-20 2001-11-06 Ebara Corporation Polishing apparatus
US6332826B1 (en) * 1997-11-21 2001-12-25 Ebara Corporation Polishing apparatus
JPH11347992A (ja) 1998-06-02 1999-12-21 Komoda Kogyo:Kk 配管切断システムおよびこのシステムにおいて使用されるコンピュータ読み取り可能な記録媒体
JP3675237B2 (ja) * 1999-07-09 2005-07-27 株式会社東京精密 平面加工装置
US6358126B1 (en) * 2000-05-23 2002-03-19 Ebara Corporation Polishing apparatus
US6609950B2 (en) * 2000-07-05 2003-08-26 Ebara Corporation Method for polishing a substrate
JP2002184732A (ja) * 2000-12-12 2002-06-28 Ebara Corp 受け渡し装置
JP3920720B2 (ja) * 2002-03-29 2007-05-30 株式会社荏原製作所 基板受渡し方法、基板受渡し機構及び基板研磨装置
KR100472959B1 (ko) * 2002-07-16 2005-03-10 삼성전자주식회사 언로딩구조가 개선된 반도체 웨이퍼의 표면평탄화설비
US7101253B2 (en) * 2002-08-27 2006-09-05 Applied Materials Inc. Load cup for chemical mechanical polishing

Also Published As

Publication number Publication date
TW200635705A (en) 2006-10-16
CN1840290A (zh) 2006-10-04
US20060223421A1 (en) 2006-10-05
MY144252A (en) 2011-08-29
KR20060105511A (ko) 2006-10-11
JP4642532B2 (ja) 2011-03-02
TWI377113B (en) 2012-11-21
KR101228178B1 (ko) 2013-01-30
JP2006281400A (ja) 2006-10-19
EP1707314B1 (de) 2008-06-11
US7235001B2 (en) 2007-06-26
EP1707314A1 (de) 2006-10-04
CN100591480C (zh) 2010-02-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition