DE602004006051D1 - Optisches Projektionssystem - Google Patents

Optisches Projektionssystem

Info

Publication number: DE602004006051D1
Authority: DE; Germany
Prior art keywords: projection system; optical projection; optical; projection
Prior art date: 2003-05-30
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE602004006051T

Other languages

English (en)

Other versions

DE602004006051T2 (de

Inventor

Duk Lee

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Orc Manufacturing Co Ltd

Original Assignee

Orc Manufacturing Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2003-05-30

Filing date

2004-05-28

Publication date

2007-06-06

2004-05-28 Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd

2007-06-06 Publication of DE602004006051D1 publication Critical patent/DE602004006051D1/de

2007-11-22 Application granted granted Critical

2007-11-22 Publication of DE602004006051T2 publication Critical patent/DE602004006051T2/de

2024-05-29 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
- G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Lenses (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

DE602004006051T 2003-05-30 2004-05-28 Optisches Projektionssystem Expired - Lifetime DE602004006051T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2003155292		2003-05-30
JP2003155292A JP3728301B2 (ja)	2003-05-30	2003-05-30	投影光学系

Publications (2)

Publication Number	Publication Date
DE602004006051D1 true DE602004006051D1 (de)	2007-06-06
DE602004006051T2 DE602004006051T2 (de)	2007-11-22

Family

ID=33128327

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE602004006051T Expired - Lifetime DE602004006051T2 (de)	2003-05-30	2004-05-28	Optisches Projektionssystem

Country Status (7)

Country	Link
US (1)	US7006197B2 (de)
EP (1)	EP1482343B1 (de)
JP (1)	JP3728301B2 (de)
KR (1)	KR100659245B1 (de)
CN (1)	CN1297834C (de)
DE (1)	DE602004006051T2 (de)
TW (1)	TWI259288B (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2004354909A (ja) *	2003-05-30	2004-12-16	Orc Mfg Co Ltd	投影露光装置および投影露光方法
US20060158615A1 (en) *	2005-01-18	2006-07-20	Williamson David M	Catadioptric 1x projection system and method
CN100459679C (zh) *	2005-11-24	2009-02-04	台达电子工业股份有限公司	用于投影设备的光机中的成像系统
JP5114061B2 (ja) *	2006-04-26	2013-01-09	株式会社オーク製作所	投影露光装置
WO2007130299A2 (en) *	2006-05-05	2007-11-15	Corning Incorporated	Distortion tuning of a quasi-telecentric imaging lens
DE102006038455A1 (de) *	2006-08-16	2008-02-21	Carl Zeiss Smt Ag	Optisches System für die Halbleiterlithographie
JP5090780B2 (ja) *	2007-04-26	2012-12-05	株式会社オーク製作所	露光描画装置
JP5398185B2 (ja) *	2008-07-09	2014-01-29	キヤノン株式会社	投影光学系、露光装置およびデバイス製造方法
CN103105741B (zh) *	2013-01-22	2015-01-21	北京京东方光电科技有限公司	对位补偿装置及曝光装置
US9488811B2 (en)	2013-08-20	2016-11-08	Ultratech, Inc.	Wynne-Dyson optical system with variable magnification
US11175487B2 (en) *	2017-06-19	2021-11-16	Suss Microtec Photonic Systems Inc.	Optical distortion reduction in projection systems
CN117852663B (zh) *	2024-03-07	2024-12-27	国开启科量子技术(安徽)有限公司	离子寻址装置及离子阱量子计算机
CN118859646B (zh) *	2024-08-30	2025-09-12	源卓微纳科技(苏州)股份有限公司	一种反射式光刻镜头

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5159172A (en) *	1990-08-07	1992-10-27	International Business Machines Corporation	Optical projection system
JPH08179217A (ja)	1994-08-19	1996-07-12	Tamarack Scient Co Inc	ダイソンレンズ系
US5559629A (en) *	1994-08-19	1996-09-24	Tamarack Scientific Co., Inc.	Unit magnification projection system and method
US5557469A (en)	1994-10-28	1996-09-17	Ultratech Stepper, Inc.	Beamsplitter in single fold optical system and optical variable magnification method and system
US5815245A (en) *	1995-03-22	1998-09-29	Etec Systems, Inc.	Scanning lithography system with opposing motion
US5757469A (en) *	1995-03-22	1998-05-26	Etec Systems, Inc.	Scanning lithography system haing double pass Wynne-Dyson optics
US5739964A (en) *	1995-03-22	1998-04-14	Etec Systems, Inc.	Magnification correction for small field scanning
DE10127227A1 (de) *	2001-05-22	2002-12-05	Zeiss Carl	Katadioptrisches Reduktionsobjektiv

2003
- 2003-05-30 JP JP2003155292A patent/JP3728301B2/ja not_active Expired - Fee Related
2004
- 2004-05-03 TW TW093112388A patent/TWI259288B/zh not_active IP Right Cessation
- 2004-05-27 US US10/854,673 patent/US7006197B2/en not_active Expired - Lifetime
- 2004-05-28 CN CNB2004100455450A patent/CN1297834C/zh not_active Expired - Fee Related
- 2004-05-28 DE DE602004006051T patent/DE602004006051T2/de not_active Expired - Lifetime
- 2004-05-28 EP EP04012815A patent/EP1482343B1/de not_active Expired - Lifetime
- 2004-05-29 KR KR1020040038620A patent/KR100659245B1/ko not_active Expired - Fee Related

Also Published As

Publication number	Publication date
US20040240210A1 (en)	2004-12-02
CN1573405A (zh)	2005-02-02
KR20040103458A (ko)	2004-12-08
TWI259288B (en)	2006-08-01
TW200502576A (en)	2005-01-16
US7006197B2 (en)	2006-02-28
DE602004006051T2 (de)	2007-11-22
JP3728301B2 (ja)	2005-12-21
EP1482343B1 (de)	2007-04-25
KR100659245B1 (ko)	2006-12-18
EP1482343A1 (de)	2004-12-01
JP2004354910A (ja)	2004-12-16
CN1297834C (zh)	2007-01-31

Publication	Publication Date	Title
ATE343985T1 (de)	2006-11-15	Linseneinführsystem
DE60300824D1 (de)	2005-07-21	Laserprojektionssystem
IS7706A (is)	2005-02-22	Gerviaugasteinn
GB2420241B (en)	2007-07-11	Optical projection system
DE602004030335D1 (de)	2011-01-13	Optisches element
DE602005008707D1 (de)	2008-09-18	Catadioptrisches projektionsobjektiv
EP1624919A4 (de)	2009-10-28	Maskensystem
DE602004000394D1 (de)	2006-04-20	Linsenabbildungssystem
DE602004021750D1 (de)	2009-08-13	Zweistrahlsystem
DE602004006069D1 (de)	2007-06-06	Linsenabbildungssystem
DE602004020034D1 (de)	2009-04-30	Linsenfassung
DE602004018602D1 (de)	2009-02-05	Mikrospiegel
EP1607794A4 (de)	2008-05-28	Projektor
DE602005018648D1 (de)	2010-02-11	Katadioptrisches projektionsobjektiv
DE602004008684D1 (de)	2007-10-18	Optisches Kommunikationssystem
DE602005004946D1 (de)	2008-04-10	Zoomlinsensystem
DE50209087D1 (de)	2007-02-08	Vergleichendes optisches System
DE602004006051D1 (de)	2007-06-06	Optisches Projektionssystem
DE602004004720D1 (de)	2007-03-29	Optisches Übertragungssystem
DE50208839D1 (de)	2007-01-11	Abstandshalter für Linsensystem
DE60301838D1 (de)	2006-02-23	Optisches Präzisionsausrichtsystem
DE602004005515D1 (de)	2007-05-10	Optisches Projektionssystem
DE602004019142D1 (de)	2009-03-05	Optisches projektionssystem
DE602004009900D1 (de)	2007-12-20	Optisches übertragungssystem
DE602004006752D1 (de)	2007-07-12	Autofokussystem

Legal Events

Date	Code	Title	Description
2008-05-15	8364	No opposition during term of opposition