[go: up one dir, main page]

DE60142951D1 - Evakuationssystem - Google Patents

Evakuationssystem

Info

Publication number
DE60142951D1
DE60142951D1 DE60142951T DE60142951T DE60142951D1 DE 60142951 D1 DE60142951 D1 DE 60142951D1 DE 60142951 T DE60142951 T DE 60142951T DE 60142951 T DE60142951 T DE 60142951T DE 60142951 D1 DE60142951 D1 DE 60142951D1
Authority
DE
Germany
Prior art keywords
evakuationssystem
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60142951T
Other languages
English (en)
Inventor
Norihiko Nomura
Nobuharu Noji
Kiyoshi Yanagisawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Application granted granted Critical
Publication of DE60142951D1 publication Critical patent/DE60142951D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H10P95/00—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D8/00—Cold traps; Cold baffles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S55/00—Gas separation
    • Y10S55/15—Cold traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Treating Waste Gases (AREA)
DE60142951T 2000-11-13 2001-11-12 Evakuationssystem Expired - Lifetime DE60142951D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000345139 2000-11-13
JP2001008325A JP4046474B2 (ja) 2000-11-13 2001-01-16 連続処理型トラップ装置及び該トラップ装置の運転方法

Publications (1)

Publication Number Publication Date
DE60142951D1 true DE60142951D1 (de) 2010-10-14

Family

ID=26603844

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60142951T Expired - Lifetime DE60142951D1 (de) 2000-11-13 2001-11-12 Evakuationssystem

Country Status (6)

Country Link
US (3) US6553811B2 (de)
EP (1) EP1205223B1 (de)
JP (1) JP4046474B2 (de)
KR (1) KR100776315B1 (de)
DE (1) DE60142951D1 (de)
TW (1) TW530122B (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3711226B2 (ja) * 2000-02-23 2005-11-02 大日本印刷株式会社 真空乾燥装置および真空乾燥方法
US6630411B1 (en) * 2002-05-07 2003-10-07 Lsi Logic Corporation Method and apparatus for removing water vapor as a byproduct of chemical reaction in a wafer processing chamber
KR100614656B1 (ko) * 2005-01-25 2006-08-22 삼성전자주식회사 밸브 어셈블리 및 이를 가지는 반도체 제조 장치, 그리고트랩을 세정하는 방법
KR100621660B1 (ko) * 2005-07-01 2006-09-11 주식회사 뉴프로텍 반도체 부산물 트랩장치
JP2009530083A (ja) * 2006-03-14 2009-08-27 プラクスエア・テクノロジー・インコーポレイテッド 選択的分離プロセス
JP5128168B2 (ja) * 2006-04-24 2013-01-23 三菱電線工業株式会社 排気装置
KR100642528B1 (ko) * 2006-07-13 2006-11-10 주식회사 미래보 반도체 생산장비에서의 자동교체식 부산물 포집장치 및그의 제어 방법
TW201018519A (en) 2008-08-19 2010-05-16 Oerlikon Solar Ip Ag Trubbach Hot-trap assembly for trapping unreacted gas by-products
TWI472678B (zh) 2011-08-08 2015-02-11 Inotera Memories Inc 排氣裝置
JP6150716B2 (ja) * 2013-12-02 2017-06-21 住友重機械工業株式会社 コールドトラップ
WO2018070284A1 (ja) 2016-10-14 2018-04-19 株式会社Ihi 気相プロセス用再熱捕集装置
JP6749954B2 (ja) * 2018-02-20 2020-09-02 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、半導体装置の製造方法、プログラム
KR102185404B1 (ko) * 2018-05-31 2020-12-01 대전대학교 산학협력단 회수 가능한 플루오르카본계 전구체를 이용한 반도체 소자 제조용 시스템
US12270119B2 (en) 2019-03-22 2025-04-08 Pyxis Cf Pte. Ltd. Plating apparatus and operation method thereof
KR102188604B1 (ko) * 2019-04-02 2020-12-09 주식회사 미래보 반도체 공정의 반응부산물 포집장치
CN110095575A (zh) * 2019-05-08 2019-08-06 中国科学技术大学 混合气体中单一气体的富集纯化设备
CN211479988U (zh) * 2019-10-14 2020-09-11 Pyxis Cf私人有限公司 湿法处理设备
GB201915858D0 (en) * 2019-10-31 2019-12-18 Agco Int Gmbh Exhaust after treatment cooling system
JP7038770B2 (ja) * 2020-08-12 2022-03-18 株式会社Kokusai Electric 基板処理装置、半導体装置の製造方法、プログラム
CN112146360B (zh) * 2020-09-27 2022-03-04 成都易华天宇试验设备有限责任公司 一种用于真空干燥箱的气体冷却装置及真空干燥箱
CN113097105B (zh) * 2021-03-25 2023-11-21 浙江焜腾红外科技有限公司 二类超晶格制冷红外芯片干法刻蚀装置及刻蚀方法
KR102601305B1 (ko) * 2022-12-27 2023-11-14 크라이오에이치앤아이(주) 공정가스 제거 장치
CN120232596B (zh) * 2025-05-29 2025-08-01 大连瑞驰食品有限公司 一种用于海鲜包装的密封性检测设备

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3719070A (en) * 1971-03-09 1973-03-06 Vetco Offshore Ind Inc Double sealed tubular connector apparatus
US3894741A (en) 1971-04-08 1975-07-15 Gen Electric Self-pressurizing seal for rotary shafts
CA1079042A (en) * 1975-10-31 1980-06-10 James E. Jervis Process for preparing a hermetically sealed assembly
JPS58106186A (ja) 1981-12-18 1983-06-24 Hitachi Ltd トラツプ装置
JPS63159797A (ja) * 1986-12-24 1988-07-02 株式会社神戸製鋼所 放射性物質の輸送兼貯蔵用容器
DE3701544A1 (de) 1987-01-21 1988-08-04 Messer Griesheim Gmbh Verfahren zum entfernen von verunreinigungen aus abgasen
US4831875A (en) 1987-05-01 1989-05-23 Westinghouse Electric Corp. Water trap valve for fail safe operation of an air inleakage monitoring system in a steam turbine
JPH01234567A (ja) * 1988-03-16 1989-09-19 Nec Corp ガス検知システム
JP2603175Y2 (ja) * 1993-07-20 2000-02-28 バブコック日立株式会社 二重シール構造
JPH0714642U (ja) * 1993-08-10 1995-03-10 日本セミコンダクター株式会社 減圧ｃｖｄ装置
JPH0883773A (ja) * 1994-09-13 1996-03-26 Toshiba Corp 薄膜形成装置
US5515734A (en) * 1995-01-10 1996-05-14 Malminen; Kari Variable area flow meter
JPH09113684A (ja) * 1995-10-19 1997-05-02 Toshiba Eng Co Ltd 原子力発電プラントの弁ボンネット部漏洩処理装置
GB2307539B (en) * 1996-02-16 1997-10-08 Solent & Pratt Butterfly valves
JP3238099B2 (ja) * 1996-05-23 2001-12-10 株式会社荏原製作所 真空排気システム
JP3544604B2 (ja) 1996-12-16 2004-07-21 株式会社荏原製作所 切替式トラップ装置
US6332925B1 (en) 1996-05-23 2001-12-25 Ebara Corporation Evacuation system
US5928426A (en) 1996-08-08 1999-07-27 Novellus Systems, Inc. Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors
JPH10176664A (ja) * 1996-12-16 1998-06-30 Ebara Corp シランの回収方法及び装置
US6051053A (en) 1996-12-16 2000-04-18 Ebara Corporation Trapping device and method of operation therefor
US5758882A (en) * 1997-01-24 1998-06-02 Pipeline Seal & Insulator, Inc. Screened gasket for high pressure fluid transmission applications
JP3162647B2 (ja) 1997-03-24 2001-05-08 株式会社荏原製作所 トラップ装置
JP3227105B2 (ja) * 1997-03-24 2001-11-12 株式会社荏原製作所 真空排気システム
JP3162648B2 (ja) * 1997-03-24 2001-05-08 株式会社荏原製作所 トラップ装置
JPH10283013A (ja) * 1997-04-02 1998-10-23 Mitsubishi Heavy Ind Ltd シール装置の異常診断システム
JP3188235B2 (ja) * 1997-12-22 2001-07-16 株式会社荏原製作所 トラップ装置
EP1914423A2 (de) 1998-01-22 2008-04-23 Ebara Corporation Falle und Fallensystem
JP3874524B2 (ja) * 1998-01-22 2007-01-31 株式会社荏原製作所 トラップ装置及びトラップ方法
JP3643474B2 (ja) * 1998-01-30 2005-04-27 株式会社東芝 半導体処理システム及び半導体処理システムの使用方法
JPH11230352A (ja) * 1998-02-10 1999-08-27 Nec Corp 密閉容器及びその試験方法
JPH11248594A (ja) * 1998-03-06 1999-09-17 Mitsubishi Heavy Ind Ltd 容器の漏洩検査方法及び装置
JPH11271167A (ja) * 1998-03-24 1999-10-05 Mitsubishi Heavy Ind Ltd 漏洩制限型シール装置の異常診断方法および異常診断装置
JP2000114185A (ja) * 1998-10-05 2000-04-21 Mitsubishi Electric Corp 未反応昇華性ガストラップ装置およびその洗浄方法
JP4303811B2 (ja) * 1998-11-11 2009-07-29 大陽日酸株式会社 減圧設備における不活性ガスの循環供給方法及び装置
US6244099B1 (en) * 1999-02-26 2001-06-12 Corning Incorporated Draw furnace sealing assembly and method
JP2001132638A (ja) * 1999-11-10 2001-05-18 Ebara Corp トラップ装置

Also Published As

Publication number Publication date
US20020056311A1 (en) 2002-05-16
KR20020037280A (ko) 2002-05-18
EP1205223A1 (de) 2002-05-15
US20040200214A1 (en) 2004-10-14
US20030172713A1 (en) 2003-09-18
KR100776315B1 (ko) 2007-11-13
US6763700B2 (en) 2004-07-20
US6553811B2 (en) 2003-04-29
JP4046474B2 (ja) 2008-02-13
EP1205223B1 (de) 2010-09-01
JP2002206480A (ja) 2002-07-26
US7217306B2 (en) 2007-05-15
TW530122B (en) 2003-05-01

Similar Documents

Publication Publication Date Title
ATE290000T1 (de) Muscarinagonisten
ATE252099T1 (de) Biarylcarboxamide
DE10136334B8 (de) Hochgeschwindigkeitsvertikalresonatoroberflächenemissionslaser
ATE312098T1 (de) Thiazinoxazolidinon
ATA2932001A (de) Schneefräse
DE50106867D1 (de) Kugelgelenk
DE50102988D1 (de) Bodenwischer
DE60142951D1 (de) Evakuationssystem
DE50100710D1 (de) Wischblatt
ATE262530T1 (de) Indolochinazolinone
ATE298751T1 (de) 7-oxopyridoryrimidine
DE50104651D1 (de) Fahrzeugfaltverdeck
DE10192638T1 (de) Bohrstangenladevorrichtung
AR028336A1 (es) 4-hidroxi-tetrahidropiridonas fenilsubstituidas
ATE509008T1 (de) Sulfonylguanidine
DE10196064T1 (de) Halbleiterfotodektionsgerät
DE50011511D1 (de) Blowby-Heizung
AR028061A1 (es) 2-enamino-cetonitrilos fenil-substituidos
DE10052925B4 (de) Schaukelbett
ATE476423T1 (de) Benzoylpyridazine
DE50007634D1 (de) Kardioplegieballonkatheter
DE10195909T1 (de) Viehfüttervorrichtung
DE10085445T1 (de) Drahterodierbearbeitungseinrichtung
AR027982A1 (es) Aril- y heteroarilsulfonatos
ATE284887T1 (de) Thienopyrrolidinone