DE60140481D1 - Verfahren zur herstellung einer zwischen elektroden eingefügten inselstruktur und deren anwendung auf transistoren - Google Patents
Verfahren zur herstellung einer zwischen elektroden eingefügten inselstruktur und deren anwendung auf transistorenInfo
- Publication number
- DE60140481D1 DE60140481D1 DE60140481T DE60140481T DE60140481D1 DE 60140481 D1 DE60140481 D1 DE 60140481D1 DE 60140481 T DE60140481 T DE 60140481T DE 60140481 T DE60140481 T DE 60140481T DE 60140481 D1 DE60140481 D1 DE 60140481D1
- Authority
- DE
- Germany
- Prior art keywords
- transistors
- electrodes
- producing
- application
- island structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/014—Manufacture or treatment of FETs having zero-dimensional [0D] or one-dimensional [1D] channels, e.g. quantum wire FETs, single-electron transistors [SET] or Coulomb blockade transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
- H10D30/402—Single electron transistors; Coulomb blockade transistors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/962—Quantum dots and lines
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thin Film Transistor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0016488A FR2818439B1 (fr) | 2000-12-18 | 2000-12-18 | Procede de fabrication d'un ilot de matiere confine entre des electrodes, et applications aux transistors |
| PCT/FR2001/004018 WO2002050886A1 (fr) | 2000-12-18 | 2001-12-17 | Procede de fabrication d'un ilot de matiere confine entre des electrodes, et applications aux transistors |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE60140481D1 true DE60140481D1 (de) | 2009-12-24 |
Family
ID=8857791
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60140481T Expired - Lifetime DE60140481D1 (de) | 2000-12-18 | 2001-12-17 | Verfahren zur herstellung einer zwischen elektroden eingefügten inselstruktur und deren anwendung auf transistoren |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7041539B2 (de) |
| EP (1) | EP1346405B1 (de) |
| DE (1) | DE60140481D1 (de) |
| FR (1) | FR2818439B1 (de) |
| WO (1) | WO2002050886A1 (de) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7015546B2 (en) * | 2000-02-23 | 2006-03-21 | Semiconductor Research Corporation | Deterministically doped field-effect devices and methods of making same |
| JP4920872B2 (ja) * | 2002-03-28 | 2012-04-18 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | ナノワイヤの製造方法 |
| KR100454135B1 (ko) * | 2002-10-10 | 2004-10-26 | 삼성전자주식회사 | 비휘발성 기억소자의 형성방법 |
| US7256464B2 (en) * | 2005-08-29 | 2007-08-14 | United Microelectronics Corp. | Metal oxide semiconductor transistor and fabrication method thereof |
| US8530355B2 (en) * | 2005-12-23 | 2013-09-10 | Infineon Technologies Ag | Mixed orientation semiconductor device and method |
| US20090146222A1 (en) * | 2007-12-06 | 2009-06-11 | Systems On Silicon Manufacturing Co. Pte. Ltd. | Method for fabrication of single electron transistors |
| US7879678B2 (en) * | 2008-02-28 | 2011-02-01 | Versatilis Llc | Methods of enhancing performance of field-effect transistors and field-effect transistors made thereby |
| JP4555358B2 (ja) * | 2008-03-24 | 2010-09-29 | 富士フイルム株式会社 | 薄膜電界効果型トランジスタおよび表示装置 |
| KR101539669B1 (ko) * | 2008-12-16 | 2015-07-27 | 삼성전자주식회사 | 코어-쉘 타입 구조물 형성방법 및 이를 이용한 트랜지스터 제조방법 |
| US11198270B2 (en) | 2008-12-30 | 2021-12-14 | Nanosys, Inc. | Quantum dot films, lighting devices, and lighting methods |
| US8343575B2 (en) | 2008-12-30 | 2013-01-01 | Nanosys, Inc. | Methods for encapsulating nanocrystals and resulting compositions |
| US10214686B2 (en) | 2008-12-30 | 2019-02-26 | Nanosys, Inc. | Methods for encapsulating nanocrystals and resulting compositions |
| WO2010077226A1 (en) * | 2008-12-30 | 2010-07-08 | Nanosys, Inc. | Methods for encapsulating nanocrystals and resulting compositions |
| CN103228983A (zh) | 2010-11-10 | 2013-07-31 | 纳米系统公司 | 量子点薄膜、照明器件及照明方法 |
| WO2018057015A1 (en) | 2016-09-24 | 2018-03-29 | Intel Corporation | Single electron transistors |
| US11276756B2 (en) | 2016-09-30 | 2022-03-15 | Intel Corporation | Quantum dot devices with single electron transistor detectors |
| FR3057105A1 (fr) * | 2016-10-05 | 2018-04-06 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif a boite(s) quantique(s) comportant des dopants localises dans une couche semi-conductrice mince |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3613594B2 (ja) * | 1993-08-19 | 2005-01-26 | 株式会社ルネサステクノロジ | 半導体素子およびこれを用いた半導体記憶装置 |
| US6042998A (en) * | 1993-09-30 | 2000-03-28 | The University Of New Mexico | Method and apparatus for extending spatial frequencies in photolithography images |
| US5844279A (en) * | 1995-09-14 | 1998-12-01 | Kabushiki Kaisha Toshiba | Single-electron semiconductor device |
| KR0170472B1 (ko) * | 1995-12-21 | 1999-02-01 | 정선종 | 주사관통현미경의 저전압진공증착을 이용한 상온작동 단일전자트랜지스터의 제조방법 |
| US5972744A (en) * | 1996-04-05 | 1999-10-26 | Matsushita Electric Industrial Co., Ltd. | Quantum effect device, method of manufacturing the same |
| FR2749977B1 (fr) | 1996-06-14 | 1998-10-09 | Commissariat Energie Atomique | Transistor mos a puits quantique et procedes de fabrication de celui-ci |
| FR2762931B1 (fr) * | 1997-05-05 | 1999-06-11 | Commissariat Energie Atomique | Dispositif a base d'ilots quantiques et procede de fabrication |
| US6204517B1 (en) * | 1998-04-09 | 2001-03-20 | Texas Instruments-Acer Incorporated | Single electron transistor memory array |
| US6472705B1 (en) * | 1998-11-18 | 2002-10-29 | International Business Machines Corporation | Molecular memory & logic |
| US6198113B1 (en) * | 1999-04-22 | 2001-03-06 | Acorn Technologies, Inc. | Electrostatically operated tunneling transistor |
| US6414333B1 (en) * | 2000-03-10 | 2002-07-02 | Samsung Electronics Co., Ltd. | Single electron transistor using porous silicon |
| US6527968B1 (en) * | 2000-03-27 | 2003-03-04 | Applied Materials Inc. | Two-stage self-cleaning silicon etch process |
-
2000
- 2000-12-18 FR FR0016488A patent/FR2818439B1/fr not_active Expired - Fee Related
-
2001
- 2001-12-17 US US10/450,966 patent/US7041539B2/en not_active Expired - Fee Related
- 2001-12-17 DE DE60140481T patent/DE60140481D1/de not_active Expired - Lifetime
- 2001-12-17 WO PCT/FR2001/004018 patent/WO2002050886A1/fr not_active Ceased
- 2001-12-17 EP EP01995728A patent/EP1346405B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US7041539B2 (en) | 2006-05-09 |
| EP1346405B1 (de) | 2009-11-11 |
| FR2818439A1 (fr) | 2002-06-21 |
| FR2818439B1 (fr) | 2003-09-26 |
| EP1346405A1 (de) | 2003-09-24 |
| WO2002050886A1 (fr) | 2002-06-27 |
| US20040075123A1 (en) | 2004-04-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |