DE60136667D1 - Präzisionsträgerplatte - Google Patents

Präzisionsträgerplatte

Info

Publication number: DE60136667D1
Authority: DE; Germany
Prior art keywords: carrier plate; precision carrier; precision; plate; carrier
Prior art date: 2000-02-21
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE60136667T

Other languages

English (en)

Inventor

Hiroyuki Sawai

Hiroshi Ishii

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Sharp Corp

Original Assignee

Sharp Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2000-02-21

Filing date

2001-02-21

Publication date

2009-01-08

2000-02-21 Priority claimed from JP2000042676A external-priority patent/JP3481540B2/ja

2000-03-01 Priority claimed from JP2000055243A external-priority patent/JP3540239B2/ja

2001-02-21 Application filed by Sharp Corp filed Critical Sharp Corp

2009-01-08 Application granted granted Critical

2009-01-08 Publication of DE60136667D1 publication Critical patent/DE60136667D1/de

2021-02-22 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

DE60136667T 2000-02-21 2001-02-21 Präzisionsträgerplatte Expired - Lifetime DE60136667D1 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2000042676A JP3481540B2 (ja)	2000-02-21	2000-02-21	ステージ装置
JP2000055243A JP3540239B2 (ja)	2000-03-01	2000-03-01	ステージ装置

Publications (1)

Publication Number	Publication Date
DE60136667D1 true DE60136667D1 (de)	2009-01-08

Family

ID=26585737

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE60136667T Expired - Lifetime DE60136667D1 (de)	2000-02-21	2001-02-21	Präzisionsträgerplatte

Country Status (3)

Country	Link
US (1)	US6538348B2 (de)
EP (1)	EP1128216B1 (de)
DE (1)	DE60136667D1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4474020B2 (ja) *	2000-06-23	2010-06-02	キヤノン株式会社	移動装置及び露光装置
JP4061044B2 (ja) *	2001-10-05	2008-03-12	住友重機械工業株式会社	基板移動装置
JP4011919B2 (ja) *	2002-01-16	2007-11-21	キヤノン株式会社	移動装置及び露光装置並びに半導体デバイスの製造方法
JP3762401B2 (ja) *	2002-09-30	2006-04-05	キヤノン株式会社	位置決め装置及び露光装置並びにデバイスの製造方法
US6903808B2 (en) *	2003-10-29	2005-06-07	Anvik Corporation	Alignable low-profile substrate chuck for large-area projection lithography
JP2005223958A (ja) *	2004-02-03	2005-08-18	Fujitsu Component Ltd	アクチュエータ
JP4327672B2 (ja) *	2004-07-14	2009-09-09	住友重機械工業株式会社	移動体位置制御装置及びこの制御装置を用いたステージ装置
US7579720B2 (en) *	2007-01-28	2009-08-25	Hiwin Mikrosystem Corp.	Origin microadjustment mechanism for a linear motor
US7535193B2 (en) *	2007-06-18	2009-05-19	Xradia, Inc.	Five axis compensated rotating stage
JP2009016385A (ja) *	2007-06-29	2009-01-22	Canon Inc	ステージ装置、露光装置及びデバイス製造方法
JP4377424B2 (ja) *	2007-07-31	2009-12-02	住友重機械工業株式会社	反力処理装置
US8267388B2 (en) *	2007-09-12	2012-09-18	Xradia, Inc.	Alignment assembly
US7804206B2 (en) *	2008-02-03	2010-09-28	Hiwin Mikrosystem Corp.	Two-dimension linear platform
TWI396249B (zh) *	2009-03-02	2013-05-11	Inotera Memories Inc	晶圓離子佈值機之移動模組
US8459622B2 (en) *	2010-04-21	2013-06-11	Seagate Technology Llc	Noncontact positioning of a workpiece
CN102768468B (zh)	2011-05-03	2015-07-22	上海微电子装备有限公司	用于光刻设备的粗动台的质心测校的方法
JP6057577B2 (ja) *	2012-07-13	2017-01-11	キヤノン株式会社	ステージ装置、リソグラフィ装置および物品の製造方法
JP5912143B2 (ja)	2014-03-04	2016-04-27	株式会社新川	ボンディング装置
US10031427B2 (en) *	2015-09-30	2018-07-24	Applied Materials, Inc.	Methods and apparatus for vibration damping stage
CN215865089U (zh) *	2021-06-17	2022-02-18	三赢科技（深圳）有限公司	电机位移测试系统

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2651732B2 (ja)	1990-01-31	1997-09-10	シャープ株式会社	直線駆動装置
DE69009841T2 (de)	1989-04-17	1994-12-22	Sharp K.K., Osaka	Linearantriebsgerät.
JPH03273607A (ja) *	1990-03-23	1991-12-04	Canon Inc	移動テーブル装置
US5528118A (en) *	1994-04-01	1996-06-18	Nikon Precision, Inc.	Guideless stage with isolated reaction stage
JP3800616B2 (ja)	1994-06-27	2006-07-26	株式会社ニコン	目標物移動装置、位置決め装置及び可動ステージ装置
US5623853A (en) *	1994-10-19	1997-04-29	Nikon Precision Inc.	Precision motion stage with single guide beam and follower stage
US5812420A (en) *	1995-09-05	1998-09-22	Nikon Corporation	Vibration-preventive apparatus and exposure apparatus
JP3266515B2 (ja) *	1996-08-02	2002-03-18	キヤノン株式会社	露光装置、デバイス製造方法およびステージ装置
JP3963410B2 (ja) *	1997-04-22	2007-08-22	キヤノン株式会社	位置決め装置およびこれを用いた露光装置
US6028376A (en) *	1997-04-22	2000-02-22	Canon Kabushiki Kaisha	Positioning apparatus and exposure apparatus using the same
JPH11168064A (ja) *	1997-09-22	1999-06-22	Nikon Corp	ステージ駆動方法、ステージ装置、及び露光装置
US6127790A (en) *	1998-11-23	2000-10-03	Electroglas, Inc.	Method and apparatus for passively trimming sawyer motors to correct for yaw errors

2001
- 2001-02-21 DE DE60136667T patent/DE60136667D1/de not_active Expired - Lifetime
- 2001-02-21 US US09/788,448 patent/US6538348B2/en not_active Expired - Fee Related
- 2001-02-21 EP EP01301561A patent/EP1128216B1/de not_active Expired - Lifetime

Also Published As

Publication number	Publication date
US6538348B2 (en)	2003-03-25
EP1128216A2 (de)	2001-08-29
EP1128216A3 (de)	2003-11-05
US20010019229A1 (en)	2001-09-06
EP1128216B1 (de)	2008-11-26

Publication	Publication Date	Title
DE60142862D1 (de)	2010-09-30	Substrathaltevorrichtung
DE60232056D1 (de)	2009-06-04	Plattenkassette
DE60136667D1 (de)	2009-01-08	Präzisionsträgerplatte
DE50103020D1 (de)	2004-09-02	Positioniereinheit
DK1263725T3 (da)	2005-01-17	Hidtil ukendte forbindelser
DE50108537D1 (de)	2006-02-02	Haltevorrichtung
DE50113706D1 (de)	2008-04-17	Träger
DE60220697D1 (de)	2007-07-26	Plattenkassette
DE50101883D1 (de)	2004-05-13	Mikrotiterplatte
EP1373099A4 (de)	2008-05-28	Einführvorrichtung für dünne wafer
DE60130271D1 (de)	2007-10-11	Werstückträger
DE10080545D2 (de)	2002-01-31	Werktisch
DE50007505D1 (de)	2004-09-23	Positioniervorrichtung
DE69907647D1 (de)	2003-06-12	Plattenschieber
ATA10122001A (de)	2002-12-15	Höhenverstellbare trägerplatte
DE60132579D1 (de)	2008-03-13	Raupenplatte
DE60111418D1 (de)	2005-07-14	Verbesserter plattenhalter
DE60129984D1 (de)	2007-09-27	Plattenhaltevorrichtung
DE50107062D1 (de)	2005-09-15	Rückentrage
ATA5832001A (de)	2003-12-15	Belagsplatte
DE60038397D1 (de)	2008-04-30	Plattengerät
ATA12582003A (de)	2003-12-15	Belagsplatte
ES1045210Y (es)	2001-02-01	Portaplantillas.
ATA3182001A (de)	2005-12-15	Belagsplatte
SE0003059D0 (sv)	2000-08-30	Bärare

Legal Events

Date	Code	Title	Description
2009-12-17	8364	No opposition during term of opposition