DE60025283T2 - Photosensitive composition and planographic printing plate using this composition - Google Patents

Abstract

The present invention provides a photosensitive composition comprising an infrared absorbing agent represented by the following formula (I) and a polymer compound which is insoluble in water and soluble in an aqueous alkali solution and becoming soluble in an aqueous alkali solution by radiation of an infrared laser. In the formula described below, R<1> and R<2> independently represent an alkyl group having 1 to 18 carbon atoms or an alkyl group having 9 to 30 carbon atoms and Z represents a heptamethine group which may have a substituent. The definitions of other substituents are shown in the specification. According to the present invention, a photosensitive composition having high development latitude and storage stability, together with a positive type planographic printing plate for direct plate-making which can form an image with high sensitivity by using an infrared laser, are provided. <CHEM>

Description

BACKGROUND OF THE INVENTION:

Field of the invention:

The The present invention relates to a photosensitive composition, which is suitable as a positive type image recording material, and a planographic printing plate using the photosensitive Composition and in particular a photosensitive composition and a planographic printing plate using the same, wherein the photosensitive composition is a positive-type image can form using an infrared laser, the composition for one Planographic printing plate for so-called direct plate production suitable is what the writing by the heat of an infrared laser, thermal head etc. possible and be performed directly on the basis of digital signals from a computer and so on can.

Description of the related Prior art:

Together with the recent Development of a solid state laser and a semiconductor laser that emits near-infrared light to emit infrared is a system for the production of plates directly from digital data of a computer using this Infrared laser noticed.

A) Positive type printing plate (material) for direct plate making using an infrared laser is disclosed in JP-A-7-285275. This invention relates to an image-recording material obtained by Adding a material that absorbs light to produce Warmth, and a positive-type photosensitive compound such as a quinone diazide compound, to a resin that is in an aqueous Alkali solution is soluble. The positive photosensitive compound functions as a dissolution preventing agent, what the solubility in an aqueous alkaline solution soluble Resin substantially reduced, in a picture part. In a non-picture part On the other hand, the composition is decomposed by heat to have non-dissolution preventing ability developed, and can eventually through development under simultaneous Forming an image to be removed. It was as a result of Inventors of the present invention found that a positive image even if these quinone azide compounds are not be added to the image recording material. However, an image-recording material, from which these quinone azide compounds are simply excluded the disadvantage that the stability the sensitivity to the density of a developer, namely the Developmental depth (development latitude) resulting worsened becomes.

meanwhile It is known that onium salts and compounds that are insoluble in are an alkali and hydrogen-hydrogen bonds can enter, a Significant influence to prevent the dissolution of an alkali-soluble Possess polymers in an alkali. As an image recording material, which is adapted to an infrared laser, show compositions from a cationic infrared absorption dye as a solubility suppressive One in an aqueous medium alkaline solution soluble Polymers a positive effect, as described in WO 97/39894. The positive effect is the image-forming effect, by the one polymer film of the laser-irradiated part has the solution-suppressing ability using the generated heat loses when an infrared absorption dye absorbs laser light.

His Image-recording feature is on the surface of a photosensitive Material, irradiated with a laser, enough. However, insufficient image recording properties become in the deep part of the photosensitive material due to thermal Obtained diffusion. That is why it is difficult to get irradiated ON-OFF Parts / non-irradiated parts with appropriate alkali development provide, which leads to the problem that a good picture is not (i.e., low sensitivity, low depth of development). The development depth mentioned here means a permissible range, in which a good picture can be formed when the alkali concentration changed by a developer becomes.

EP 0 901 902 describes a positive photosensitive composition for use with an infrared laser, wherein the composition comprises: a polymer compound soluble in an aqueous alkaline solution, a compound that is compatible with the aqueous alkaline solution-soluble polymer compound, thereby increasing the solubility in an aqueous alkaline solution soluble polymer compound is lowered in an aqueous alkaline solution, wherein the effect of reducing the solubility is reduced by heating, and a compound which generates heat upon absorption of light, wherein the thermal decomposition temperature of each of these compounds is greater than 150 ° C.

EP 0 909 657 relates to a positive-type photosensitive imaging material for an infrared laser and a positive-type photosensitive composition for an infrared laser. The image-forming material comprises a substrate, a layer containing not less than 50% by weight of a copolymer containing not less than 10% by mole of specific monomers as a copolymerization component, a layer containing not less than 50% by weight of one in an aqueous alkaline A solution of soluble resin having a phenolic hydroxy group, wherein the layers are laminated on the substrate in a specific order, whereby the second layer contains at least one compound which generates heat upon absorption of light.

SUMMARY OF THE INVENTION:

Corresponding It is an object of the present invention to provide a photosensitive composition, which has a broad developmental depth and has high image recording properties and exhibits high storage stability (i.e., their image recording properties are not diminished, even if they are for stored for a long period of time) and also the provision a positive-type planographic printing plate using the photosensitive composition, wherein the printing plate is an image using one for direct plate making used infrared laser.

The Inventors have made serious studies to improve the image recording properties, namely the depth of development and the storage stability and as a result, found out that both the depth of development as well as the storage stability improved by using a specific infrared absorbent become. The present invention has been based on this discovery completed.

worin X¹ und X² unabhängig darstellen: -CR⁷R⁸-, -S-, -Se-, -NR⁹-, -CH=CH- oder -O-, R¹ und R² unabhängig eine Alkylgruppe mit 13 bis 30 Kohlenstoffatomen darstellen, R³, R⁴, R⁵ und R⁶ unabhängig ein Wasserstoffatom oder eine Alkylgruppe mit 1 bis 10 Kohlenstoffatomen darstellen, oder eine Vielzahl von Atomen darstellen können, die für eine Kombination von R⁴ und R⁵ oder R⁶ und R⁷ zur Bildung eines aliphatischen 5- oder 6-gliedrigen Rings, eines aromatischen 6-gliedrigen Rings, eines aromatischen 10-gliedrigen Rings, eines substituierten, aromatischen 6-gliedrigen Rings oder eines substituierten aromatischen, 10-gliedrigen Rings benötigt werden, R⁷ und R⁸ unabhängig eine Alkylgruppe mit 1 bis 18 Kohlenstoffatomen oder eine Arylgruppe mit 6 bis 18 Kohlenstoffatomen darstellen, R⁹ eine Alkylgruppe mit 1 bis 8 Kohlenstoffatomen oder eine Arylgruppe mit 6 bis 18 Kohlenstoffatomen darstellt, Z eine Heptamethingruppe darstellt, die einen Substituenten aufweisen kann, worin der Substituent eine Alkylgruppe mit 8 oder weniger Kohlenstoffatomen, ein Halogenatom oder eine Aminogruppe ist, und die Heptamethingruppe kann einen Cyclohexenring oder einen Cyclopentenring einschliessen, der durch Kombinieren von Substituenten an zwei Methinkohlenstoffatomen miteinander gebildet wird, und der einen Substituenten aufweisen kann, worin der Substituent in der Ringstruktur ausgewählt ist aus einer Alkylgruppe mit 6 oder weniger Kohlenstoffatomen oder einem Halogenatom, und Q ein Gegenion darstellt.According to a first aspect of the present invention, there is provided a photosensitive composition comprising: an infrared absorbent (a) represented by the following formula (I) and a polymer compound (b) which is insoluble in water and soluble in an aqueous alkaline solution, wherein the Solubility of the photosensitive composition is changed in an aqueous alkaline solution by irradiation with an infrared laser.

wherein X ¹ and X ^{2 are} independently: -CR ⁷ R ⁸ -, -S-, -Se-, -NR ⁹ -, -CH = CH- or -O-, R ¹ and R ² independently represent an alkyl group having 13 to 30 carbon atoms, R ^3, R ^4, R ⁵ and R ⁶ independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, or may represent a plurality of atoms which for a combination of R ⁴ and R ⁵ or R ⁶ and R ^{7 is} required to form an aliphatic 5- or 6-membered ring, a 6-membered aromatic ring, an aromatic 10-membered ring, a substituted 6-membered aromatic ring or a substituted aromatic 10-membered ring, R ⁷ and R ⁸ independently represents an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms, R ^{9 represents} an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 18 carbon atoms, Z represents a heptamethine group having a substituent k wherein the substituent is an alkyl group having 8 or less carbon atoms, a halogen atom or an amino group, and the heptamethine group may include a cyclohexene ring or a cyclopentene ring which is formed by combining substituents on two methine carbon atoms with each other, and which may have a substituent, wherein the substituent in the ring structure is selected from an alkyl group having 6 or less carbon atoms or a halogen atom, and Q is a counterion.

worin A ein Atom, ausgewählt aus der Gruppe bestehend aus B, P, As, Sb, Cl und Br, darstellt, Y ein Halogenatom oder Sauerstoffatom darstellt und m eine ganze Zahl von 1 bis 6 bezeichnet.According to a second aspect of the present invention, the counter ion Q of the infrared absorbent represented by formula (I) or (II) is preferably a counter ion represented by the following formula (III) or contains a sulfonic acid structure:

wherein A represents an atom selected from the group consisting of B, P, As, Sb, Cl and Br, Y is a halogen represents natom or oxygen atom and m denotes an integer from 1 to 6.

The Effects of each of the above inventions are not unique, however, With regard to the first aspect of the invention, a long-chain Alkyl group in the final position of a dye in the infrared absorbent (a), represented by formula (I), whereby the organic Properties of the dye can be improved and efficient Conversion of light into heat on the surface the photosensitive layer is performed. Also improved the presence of the infrared absorbent with a long-chain Alkyl group storage stability. Thus, the affinity of the infrared absorbent becomes (a) to that in the aqueous alkaline solution soluble Polymer (b) and the ability to the solubility in the aqueous alkaline soluble To suppress polymer (b) improved. Because of such reasons comes into consideration that an improvement of the image recording properties and a suppressing effect deterioration of image recording properties after a long time Storage can be effected.

According to one third aspect of the present invention is a planographic A printing plate provided, comprising a photosensitive layer, consisting of the above photosensitive composition, wherein the photosensitive layer is deposited on a substrate becomes.

DESCRIPTION PREFERRED EMBODIMENTS

First embodiment:

A first inventive embodiment will be described in detail below.

Infrared absorbent (a) represented by the general formula (I):
An infrared absorbent represented by the general formula (I) can remarkably reduce the solubility of image areas in an alkaline developer by interaction with the above-mentioned polymer compound (b) which is insoluble in water and soluble in alkaline aqueous solution. While non-image areas are excellent in suppressing the generation of images because the solubility in alkaline solution is recovered by decomposing the infrared absorbent represented by the general formula (I) itself and / or canceling the heat generation attributed to absorption of near-infrared rays.

The above-mentioned infrared absorbents represented by the general formula (I) will be described in more detail.

In the general formula (I), each of X ¹ and X ² independently represents -CR ⁷ R ⁸ -, -S-, -Se-, -NR ⁹ -, -CH = CH- or -O-; wherein R ⁷ and R ^{8 represent} an alkyl group having 1 to 18 carbon atoms, a substituted alkyl group having 1 to 18 carbon atoms, an aryl group having 6 to 18 carbon atoms or a substituted aryl group having 6 to 18 carbon atoms.

Each of R ¹ and R ² independently represents an alkyl group having 13 to 30 carbon atoms, and these alkyl groups may have a substituent.

Each of R ³ , R ⁴ , R ⁵ and R ⁶ independently represents hydrogen, an alkyl group having 1 to 10 carbon atoms or a substituted alkyl group having 1 to 10 carbon atoms, R ³ and R ⁴ or R ⁵ and R ⁶ may be bonded together and represent a variety of atoms necessary to form an aliphatic 5-membered or 6-membered ring, aromatic 6-membered ring, aromatic 10-membered ring, substituted 6-membered aromatic ring or substituted aromatic 10-membered ring , R ⁹ represents an alkyl group having 1 to 18 carbon atoms, a substituted alkyl group having 1 to 18 carbon atoms, an aryl group having 6 to 18 carbon atoms, or a substituted aryl group having 6 to 18 carbon atoms.

The above-mentioned alkyl group represented by R ¹ to R ⁹ includes straight-chain, branched or cyclic alkyl groups having 13 to 30 or 1 to 18 carbon atoms. Specific examples thereof include: a methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, Outyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, octadecyl group, eicosyl group, isopropyl group, isobutyl group, s-butyl group, t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, Cyclopentyl group and 2-norbornyl group. Among them, it is more preferable that R ¹ and R ^{2 represent} a straight-chain alkyl group, R ³ to R ^{9 represent} a straight-chain alkyl group having 1 to 10 carbon atoms, a branched alkyl group having 3 to 12 carbon atoms or a cyclic alkyl group having 5 to 10 carbon atoms.

When these alkyl groups have a substituent, monovalent non-metal atoms other than hydrogen are used as the substituent. Preferred examples thereof include: halogen atoms (-F, -Br, -Cl, -I), hydroxy groups, alkoxy groups, aryloxy groups, mercapto groups, alkylthio groups, arylthio groups, alkyldithio groups, aryldithio groups, amino groups, N-alkylamino groups, N, N-dialkylamino groups, N Arylamino groups, N, N-diarylamino groups, N-alkyl-N-arylamino groups, acyloxy groups, carbamoyloxy groups, N-alkylcarbamoyloxy groups, N-arylcarbamoyloxy groups, N, N-dialkylcarbamoyloxy groups, N, N-dialkylcarbamoyloxy groups, N-alkyl-N-arylcarbamoyloxy groups, alkylsulfoxy groups , Arylsulfoxy, acylthio, acylamino, N-alkylacylamino, N-arylacylamino, ureido, N'-alkylureido, N ', N'-dialkylureido, N'-arylureido, N', N'-diarylureido, N'-alkyl-N ' -arylureido groups, N-alkylureido groups, N-arylureido groups, N'-alkyl-N-alkylureido groups, N'-alkyl-N-arylureido groups, N ', N'-dialkyl-N-alkylureido groups, N', N'-dialkyl-N -arylureido groups, N'-aryl-N-alkylurea ido groups, N'-aryl-N-arylureido groups, N ', N'-diaryl-N-alkylureido groups, N', N'-diaryl-N-arylureido groups, N'-alkyl-N'-aryl-N-alkylureido groups, N '-Alkyl-N'-aryl-N-arylureido groups, alkoxycarbonylamino groups, aryloxycarbonylamino groups, N-alkyl-N-alkoxycarbonylamino groups, N-alkyl-N-aryloxycarbonylamino groups, N-aryl-N-alkoxycarbonylamino groups, N-aryl-N-aryloxycarbonylamino groups, formyl groups , Acyl groups, carboxy groups and conjugated base group (hereinafter referred to as "carboxylate"), alkoxycarbonyl groups, aryloxycarbonyl groups, carbamoyl groups, N-alkylcarbamoyl groups, N, N-dialkylcarbamoyl groups, N-arylcarbamoyl groups, N, N-diarylcarbamoyl groups, N-alkyl-N-arylcarbamoyl groups, Alkylsulfinyl groups, arylsulfinyl groups, alkylsulfonyl groups, arylsulfonyl groups, sulfo groups (-SO ₃ H) and conjugated base thereof (hereinafter referred to as "sulfonato group"), alkoxysulfonyl groups, aryloxysulfonyl groups, sulfinamoyl groups, N-alkylsulfinamoyl groups, N, N-dialk ylsulfinamoyl groups, N-arylsulfinamoyl groups, N, N-diarylsulfinamoyl groups, N-alkyl-N-arylsulfinamoyl groups, sulfamoyl groups, N-alkylsulfamoyl groups, N, N-dialkylsulfamoyl groups, N-arylsulfamoyl groups, N, N-diarylsulfamoyl groups, N-alkyl-N-arylsulfamoyl groups, N-acylsulfamoyl groups and conjugated base group, N-alkylsulfonylsulfamoyl groups (-SO ₂ NHSO ₂ R, R represents an alkyl group) and conjugated base groups thereof,
N-arylsulfonylsulfamoyl groups (-SO ₂ NHSO ₂ Ar, Ar represents an aryl group) and conjugated base group thereof, N-alkylsulfonylcarbamoyl groups (-CONHSO ₂ R, R represents an alkyl group) and conjugated base group thereof, N-arylsulfonylcarbamoyl groups (-CONHSO ₂ Ar , Ar represents an aryl group) and conjugated base group thereof, alkoxysilyl groups (-SI (OR) ₃ , R represents an alkyl group), aryloxysilyl groups (-Si (OAr) ₃ , Ar represents an aryl group), hydroxysilyl groups (-Si (OH ₃ ) and conjugated base group thereof, phosphono groups (-PO ₃ H ₂ ) and conjugated base groups thereof (hereinafter referred to as "phosphonato group"), dialkylphosphono groups (-PO ₃ R ² , R represents an alkyl group), diarylphosphono groups (-PO ₃ Ar ₂ , Ar represents an aryl group), alkylarylphosphono group (-PO ₃ (R) (Ar), R represents an alkyl group and Ar represents an aryl group), monoalkylphosphono-grupe (-PO ₃ H (R), R represents an alkyl group) and conjugated base group thereof ( hereinafter referred to as "alkylphosphonato group"), monoarylphosphono group (-PO ₃ H (Ar), Ar represents an aryl group) and conjugated base group thereof (hereinafter referred to as "arylphosphonato group"), phosphonooxy group (-OPO ₃ H ₂ ) and conjugated base group thereof ( hereinafter referred to as "phosphonatooxy group"), dialkylphosphonooxy group (-OPO ₃ (R) ₂ , R represents an alkyl group), diarylphosphonooxy groups (-OPO ₃ (Ar) ₂ , Ar represents an aryl group), alkylarylphosphonooxy groups (-OPO ₃ (R) (Ar), R represents an alkyl group and Ar represents an aryl group), monoalkylphosphonooxy groups (-OPO ₃ H (R), R represents an alkyl group) and conjugated base group thereof (hereinafter referred to as "alkylphosphonatooxy group"), monoarylphosphonooxy groups (-OPO ₃ H (Ar), Ar represents an aryl group) and conjugated base group thereof (hereinafter referred to as "arylphosphonatooxy group"), cyano groups, nitro groups, aryl groups, alkenyl groups and alkynyl groups.

When specific examples of the alkyl group in these on alkyl groups Substituents to be substituted become the above-mentioned alkyl groups for example, and specific examples of the aryl group include: a phenyl group, Biphenyl group, naphthyl group, tolyl group, xylyl group, mesityl group, cumenyl group, Fluorophenyl group, chlorophenyl group, bromophenyl group, chloromethylphenyl group, Hydroxyphenyl group, methoxyphenyl group, ethoxyphenyl group, phenoxyphenyl group, Acetoxyphenyl group, benzoyloxyphenyl group, methylthiophenyl group, Phenylthiophenyl group, methylaminophenyl group, dimethylaminophenyl group, Acetylaminophenyl group, carboxyphenyl group, methoxycarbonylphenyl group, Ethoxycarbonylphenyl group, phenoxycarbonylphenyl group, N-phenylcarbamoylphenyl group, phenyl group, Nitrophenyl group, cyanophenyl group, sulfophenyl group, sulfonatophenyl group, Phosphonophenyl group, phosphonatophenyl group, etc.

When Substituent of the aryl group to be substituted on the alkyl groups become the above-mentioned aryl groups for example listed, and examples of the alkenyl group include: a vinyl group, 1-propenyl group, 1-butenyl group, cynnamyl group, 2-chloro-1-ethenyl group, etc. and Examples of the alkyl group include an ethynyl group, 1-propynyl group, 1-butynyl group, trimethylsilylethynyl group, phenylethynyl group etc.

From to conclude this substituent more preferred examples thereof: halogen atoms (-F, -Br, -Cl, -I), alkoxy groups, Aryloxy groups, alkylthio groups, arylthio groups, N-alkylamino groups, N, N-dialkylamino groups, acyloxy groups, N-alkylcarbamoyloxy groups, N-arylcarbamoyloxy groups, acylamino groups, formyl groups, carboxyl groups, Alkoxycarbonyl groups, aryloxycarbonyl groups, carbamoyl groups, N-alkylcarbamoyl groups, N, N-dialkylcarbamoyl groups, N-arylcarbamoyl groups, N-alkyl-N-arylcarbamoyl groups, Sulfo groups, sulfonato groups, sulfamoyl groups, N-alkylsulfamoyl groups, N, N-dialkylsulfamoyl groups, N-arylsulfamoyl groups, N-alkyl-N-arylsulfamoyl groups, Phosphono groups, phosphonato groups, dialkylphosphono groups, diarylphosphono groups, Monoalkylphosphono groups, alkylphosphonato groups, monoarylphosphono groups, Arylphosphonate groups, phosphonooxy groups, phosphonatooxy groups, Aryl groups, alkenyl groups, etc.

On the other hand, in substituted alkyl groups as the alkylene group combined with a substituent to form a substituted alkyl group, divalent organic groups obtained by removing one hydrogen atom of the above-mentioned alkyl groups having 1 to 30 carbon atoms, and preferred examples of R ³ to R ^{9 are} included straight chain alkylene groups having 1 to 12 carbon atoms, branched alkylene groups having 3 to 12 carbon atoms, and cyclic alkylene groups having 5 to 10 carbon atoms. Preferred specific examples of the substituted alkyl group obtained by combining the above-mentioned substituent with an alkylene group include: a chloromethyl group, bromomethyl group, 2-chloroethyl group, trifluoromethyl group, methoxymethyl group, methoxyethoxyethyl group, allyloxymethyl group, phenoxymethyl group, methylthiomethyl group, tolylthiomethyl group, ethylaminoethyl group, diethylaminopropyl group, morpholinopropyl group, acetyloxymethyl group, Benzoyloxymethyl, N-cyclohexylcarbamoyloxyethyl, N-phenylcarbamoyloxyethyl, acetylaminoethyl, N-methylbenzoylaminopropyl, 2-oxoethyl, 2-oxopropyl, carboxypropyl, methoxycarbonylethyl, methoxycarbonylmethyl, methoxycarbonylbutyl, allyloxycarbonylbutyl, chlorophenoxycarbonylmethyl, (Methoxyphenyl) carbamoylethyl group, N-methyl-N- (sulfonyl) carbamoylme thylgruppe, sulfamoyloctylgruppe sulfopropyl group, sulfobutyl group, sulfonatobutyl group, sulfamoylbutyl group, N-ethylsulfamoylmethyl, N, N-dipropylsulfamoylpropyl, N-tolylsulfamoylpropyl, N-methyl-N- (phosphonophenyl), phosphonobutyl, phosphonatohexyl, diethylphosphonobutyl, diphenylphosphonopropyl, methylphosphonobutyl, methylphosphonatobutyl, tolylphosphonohexyl, Tolylphosphonatohexylgrupe , Phosphonooxypropyl group, phosphonooxybutyl group, benzyl group, phenethyl group, α-methoxybenzyl group, 1-methyl-1-phenylethyl group, p-methylbenzyl group, cynnamyl group, allyl group, 1-propenylmethyl group, 2-butenyl group, 2-methylallyl group, 2-methylpropenylmethyl group, 2-propynyl group, 2 Butynyl group, 3-butynyl group, etc.

As the above-mentioned aryl group represented by R ¹ to R ¹⁰ , those in which one to three benzene rings form a condensed ring and those in which a benzene ring and a 5-membered unsaturated ring form a condensed ring are cited, and specific examples thereof include a phenyl group, naphthyl group, anthryl group, phenanthryl group, indenyl group, acenabutenyl group and fluorenyl group, and of these groups, a phenyl group and a naphthyl group are more preferable.

When substituted aryl group will be those as substituents a monovalent non-metal atom other than hydrogen on a ring-forming one Having carbon atom of the above-mentioned aryl groups. As a preferred example of the substituent, the above-mentioned alkyl groups, substituted alkyl groups and those as a substituent Examples of substituted alkyl groups are given.

Preferred specific examples of such substituted aryl groups include biphenyl group, rolyl group, xylyl group, mesityl group, cumenyl group, chlorophenyl group, bromophenyl group, fluorophenyl group, chloromethylphenyl group, trifluoromethylphenyl group, hydroxyphenyl group, methoxyphenyl group, methoxyethoxyphenyl group, allyloxyphenyl group, phenoxyphenyl group, methylthiophenyl group, tolylthiophenyl group, phenylthiophenyl group, ethylaminophenyl group, dimethylaminophenyl group, Diethylaminophenyl, morpholinophenyl, acetyloxyphenyl, benzoyloxyphenyl, N-cyclohexylcarbamoyloxyphenyl, N-phenylcarbamoyloxyphenyl, acetylaminophenyl, N-methylbenzoylaminophenyl, carboxyphenyl, methoxycarbonylphenyl, allylo xycarbonylphenyl group, chlorophenoxycarbonylphenyl group, carbamoylphenyl group, N-methylcarbamoylphenyl group, N, N-dipropylcarbamoylphenyl group, N- (methoxyphenyl) carbamoylphenyl group, N-methyl-N- (sulfenyl) carbamoylphenyl group, sulfenyl group, sulfonatophenyl group, sulfamoylphenyl group, N-ethylsulfamoylphenyl group, N, N-dipropylsulfamoylphenyl group, N-tolylsulfamoylphenyl group, N-methyl-N- (phosphonophenyl) isulfamoylphenyl group, phosphonophenyl group, phosphonatophenyl group, diethylphosphonophenyl group, diphenylphosphonophenyl group, methylphosphonophenyl group, methylphosphonatophenyl group, tolylphosphonophenyl group, tolylphosphonatophenyl group, allylphenyl group, 1-propenylmethylphenyl group, 2-butenylphenyl group, 2-methylallylphenyl group, 2-methylpropenylphenyl group, 2 Propynylphenyl group, 2-butynylphenyl group, 3-butynylphenyl group, etc.

Z represents a hepteamine group which may have a substituent. When a heptamethine group has a substituent, examples of the substituent include: alkyl groups having 8 or less carbon atoms, halogen atoms, alkoxy groups, aryloxy groups, alkylthio groups, arylthio groups, N-alkylamino groups, N, N-dialkylamino groups, N-arylamino groups, N, N-diarylamino groups, heterocyclic groups, etc., and these substituents may be further substituted with the same substituents as illustrated for R ¹ to R ⁶ .

Under these are from the standpoint of absorption wavelength suitability as an infrared absorbent and ease of synthesis thereof a heptamine group with no substituent, a heptamine group with a halogen atom as a substituent, a heptamethine group with an arylthio group as a substituent, a heptamethine group with an N, N-diarylamino group as a substituent, etc. preferred.

These Heptamine group may be one that has a cyclohexene ring or Cyclopentene ring formed by mutual association of substituents at two methane carbon atoms be. One or more of the ring structures described above can be used in Heptamethine be present. These ring structures can one Substituent, and as a substituent on this ring structure are alkyl groups having 6 or less carbon atoms and halogen atoms listed. Among them are alkyl groups having 6 or less carbon atoms etc., from the viewpoint of simplicity of synthesis.

Q represents a counterion and may form a bond with R ¹ to R ⁶ to give an intramolecular salt. This counterion Q is not particularly limited, and any ion known as a counter ion of a known infrared absorption dye can be used, provided that it is suitable for the absorption wavelength region of an infrared absorbent.

When this counterion are those represented by the above-mentioned general formula (III) and A represents an atom selected in the formula the group consisting of B, P, As, Sb, Cl and Br, and B, P, Sb and Cl are in the interests of simplicity of synthesis and security of the compound is preferred.

Y represents a halogen atom, e.g. Cl, I, Br, F etc. or an oxygen atom Among these, Y preferably represents a fluorine or oxygen atom from the viewpoint of the simplicity of availability of the raw material represents.

m represents an integer of 1 to 6, and preferably in the range of 4 to 6.

preferred Counterions Q in this embodiment are listed below, but Q is not limited to this.

When Q become those having a sulfonic acid structure in the structure also preferably used.

• 1) Methansulfonation,
• 2) Ethansulfonation,
• 3) 1-Propansulfonation,
• 4) 2-Propansulfonation,
• 5) n-Butansulfonation,
• 6) Allylsulfonation,
• 7) 10-Camphorsulfonation,
• 8) Trifluormethansulfonation,
• 9) Pentafluorethansulfonation,
• 10) Benzolsulfonation,
• 11) p-Toluolsulfonation,
• 12) 3-Methoxybenzolsulfonation,
• 13) 4-Methoxybenzolsulfonation,
• 14) 4-Hydroxybenzolsulfonation,
• 15) 4-Chlorbenzolsulfonation,
• 16) 3-Nitrobenzolsulfonation,
• 17) 4-Nitrobenzolsulfonation,
• 18) 4-Acetylbenzolsulfonation,
• 19) Pentafluorbenzolsulfonation,
• 20) 4-Dodecylbenzolsulfonation,
• 21) Mesitylensulfonation,
• 22) 2,4,6-Triisopropylbenzolsulfonation,
• 23) 2-Hydroxy-4-methoxybenzophenon-5-sulfonation,
• 24) Dimethylisophthalat-5-sulfonation,
• 25) Diphenylamin-4-sulfonation,
• 26) 1-Naphthalinsulfonation,
• 27) 2-Naphthalinsulfonation,
• 28) 2-Naphthol-6-sulfonation,
• 29) 2-Naphthol-7-sulfonation,
• 30) Anthrachinon-1-sulfonation,
• 31) Anthrachinon-2-sulfonation,
• 32) 9,10-Dimethoxyanthracen-2-sulfonation,
• 33) 9,10-Diethoxyanthracen-2-sulfonation,
• 34) Chinolin-8-sulfonation,
• 35) 8-Hydroxychinolin-5-sulfonation,
• 36) 8-Anilino-naphthalin-1-sulfonation.

Examples of the counter anion having a sulfonic acid structure which can be used as the counter ion Q in an infrared absorbent of this embodiment include the following ions.

• 1) methane sulfonation,
• 2) ethane sulfonation,
• 3) 1-propane sulfonation,
• 4) 2-propane sulfonation,
• 5) n-butane sulphonation,
• 6) allyl sulfonation,
• 7) 10 camphorsulfonation,
• 8) trifluoromethane sulfonation,
• 9) pentafluoroethanesulfonate,
• 10) benzenesulfonate ion,
• 11) p-toluenesulfonate ion,
• 12) 3-methoxybenzenesulfonate ion,
• 13) 4-methoxybenzenesulfonate ion,
• 14) 4-hydroxybenzenesulfonate ion,
• 15) 4-chlorobenzenesulfonate ion,
• 16) 3-nitrobenzenesulfonate ion,
• 17) 4-nitrobenzenesulfonate ion,
• 18) 4-acetylbenzenesulfonate ion,
• 19) pentafluorobenzenesulfonate ion,
• 20) 4-dodecylbenzenesulfonate ion,
• 21) mesitylen sulfonation,
• 22) 2,4,6-triisopropylbenzene sulphonation,
• 23) 2-hydroxy-4-methoxybenzophenone-5-sulfonate ion,
• 24) dimethyl isophthalate-5-sulfonate,
• 25) diphenylamine-4-sulfonation,
• 26) 1-naphthalene sulfonation,
• 27) 2-naphthalenesulfonate ion,
• 28) 2-naphthol-6-sulfonate ion,
• 29) 2-naphthol-7-sulfonate,
• 30) anthraquinone-1-sulfonation,
• 31) anthraquinone-2-sulfonation,
• 32) 9,10-dimethoxyanthracene-2-sulfonate,
• 33) 9,10-diethoxyanthracene-2-sulfonate,
• 34) quinoline-8-sulfonation,
• 35) 8-hydroxyquinoline-5-sulfonation,
• 36) 8-anilino-naphthalene-1-sulfonation.

One Process for the preparation of an infrared absorbent, shown by the general formula (I) will be described below.

The infrared absorbent represented by the general formula (I) can be produced by known organic synthesis technology. As specific synthesis methods are mentioned in US 5,441,866 , Zh. Org. Khim. Vol. 28, (No. 10), 1992, pages 2159 to 2164, EP 464,543 A1 Method described.

specific Examples [(IR-8), (IR-11), (IR-14), (IR-16), (IR-18), (IR-24)] of the infrared absorption agent represented by the general formula (I) are listed below, but they limit the range of the infrared absorbent of this embodiment not a.

In the present embodiment can the above-mentioned infrared absorbent in an amount from 0.01 to 50% by weight, preferably 0.1 to 20% by weight, more preferably 0.5 to 15 wt .-% based on the total solids content of the photosensitive Composition can be added. If the amount added is less is 0.01% by weight, an image may be photosensitive Composition can not be formed, and if in a crowd of more than 50 wt% added, there is the fear that stains on non-image portions are generated when the composition in a photosensitive layer of a planographic printing plate is used.

In a photosensitive composition of this embodiment can other pigments or dyes with infrared absorption properties be added to improve the image forming properties, additionally to the above-mentioned infrared absorbent.

When Pigments can commercially available Pigments and those described in Color Index (C.I.) Handbook, "Saishin Ganryo Binran (current pigment manual) "(Nippon Ganryo Gijutsu Kyokai, 1977), "Saishin Ganryo Oyo Gijutsu (current pigment application technology) "(CMC, 1986)," Insatsu Ink Gijutsu (printing ink technology) "(CMC, 1984).

When Pigment become black pigments, yellow pigments, orange Pigments, brown pigments, red pigments, violet-colored pigments, blue pigments, fluorescent pigments, metal powder pigments and listed other polymer-bound pigments. In particular, insoluble azo pigments, Azolac pigments, condensed azo pigments, chelate zo pigments, phthalocyanine pigments, Anthraquinone pigments, perylene and perynone pigments, thioindigo pigments, Quinacridone pigments, dioxazine pigments, isoindolinone pigments, quinophthalone pigments, Färbelackpigmente, Azine pigments, nitrosopigments, nitro pigments, natural pigments, fluorescent pigments, inorganic pigments, carbon black, etc. used become.

These Pigments can a surface treatment be subjected or not. As a surface treatment method a method wherein a resin or a wax coats on the surface is a method in which a surfactant is attached, a method wherein a reactive substance (e.g., a silane coupling agent, a Epoxy compound, polyisocyanate, etc.) having the surface of a Pigments is tied, etc. considered. The above Surface treatment processes are in "Kinzoku Sekken no Seishitsu to Oyo (Nature and Use of Metal Soaps) "(Sachi Publication)," Insatsu Ink Gijutsu (Printing Ink Technology) "(CMC, 1984), and" Saishin Ganryo Oyo Gijutsu (Current Pigment Application Technology) "(CMC, 1986).

The particle size of a pigment is preferably in the range of 0.01 to 10 μm, and more preferably in the range of 0.05 to 1 μm, especially in the range of 0.1 to 1 μm. When the particle size of a pigment is less than 0.01 μm, the stability of a dispersed material in a photosensitive layer coating solution is not preferable, while if it is more than 10 μm, the uniformity of photosensitive layer deteriorates. For dispersing a pigment, known dispersing technologies used for the production of ink and toner, etc. can be used.

When Disperser be a Ultraschalldispergierapparatur, a Sand mill, an attrition mill, one bead mill, a super mill, a ball mill, an impeller, a disperser, a KD mill, a colloid mill, a Dynatron, a three-roll mill, a pressure kneader, etc. called. Details are in "Saishin Ganryo Oyo Gijutsu (current Pigment application technology) "(CMC, 1986).

When Dye can commercially available and dyes described in the literature (e.g., "Senryo Binran (Pigment Manual)" (Yuki Gosei Kagaku Kyokai, 1970)). Specific examples of this conclude Azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, Anthraquinone dyes, phthalocyanine dyes, carbonium dyes, Quinoneimine dyes, methine dyes, cyanine dyes, diimmonium dyes, Aminium dyes, etc.

In this embodiment Among these pigments or dyes are those that are infrared or near-infrared, particularly preferred since they are for use a laser that emits infrared or near-infrared, suitable are.

When such a pigment that has an infrared or near-infrared ray soot can be suitably used. Further examples for Pigments that absorb infrared or near-infrared rays close Cyanine dyes described in JP-A Nos. 58-125246, 59-84356, 59-202829, 60-78787, etc., methine dyes described in JP-A Nos. 58-173696, 58-181690, 58-194595, etc., naphthoquinone dyes, described in JP-A Nos. 58-112793, 58-224793, 59-48187, 59-73996, 60-52940, 60-63744, etc., squarylium pigments described in JP-A-58-112792 etc., cyanine dyes described in British Pat. No. 434,875, dihydroperimidine quarylium dyes, described in US Pat. No. 5,380,635, etc., a.

Further are used as dye near-infrared absorption stabilizers, described in US Pat. No. 5,156,938, suitably used and further preferably arylbenzo (thio) pyrylium salts described in U.S. Patent 3,881,924, Trimethinthiopyrylium salts described in JP-A-57-142645 (U.S.P. 4,327,169), pyrylium-based compounds described in JP-A Nos. 58-181051, 58-220143, 59-41363, 59-84248, 59-84249, 59-146063 and 59-146061, cyanine pigments described in JP-A-59-216146, pentamethine thiopyrylium salts, in U.S. Patent 4,283,475, and pyrylium compounds in JP-B Nos. 5-13514 and 5-19702, etc., and Epolight III-178, Epolight III-130, Epolight III-125, Epolight IV-62A (manufactured by Eporin) etc. as commercially available Products used.

When Particularly preferred other examples of the dye are near infrared absorption dyes by formulas (I) and (II) in U.S. Patent 4,756,993.

The Pigments or dyes can in an amount of 0.01 to 50% by weight, preferably 0.1 to 10% by weight, and in the case of a dye, more preferably 0.5 to 10% by weight. and in the case of a pigment, more preferably from 3.1 to 10% by weight, based on the total solids content of a printing plate material, be added. When the added amount of the pigment or dye is less than 0.01% by weight, the sensitivity decreases while, when she over 50% by weight, the uniformity A photosensitive layer is lost and durability a recorded layer deteriorates.

These Dyes or pigments can to a photosensitive composition or together with others Components are added to a photosensitive layer, and alternatively, in the manufacture of a planographic printing plate another layer is provided as a photosensitive layer to which the dyes or pigments are added. These Dyes or pigments can individually or in admixture of two or more.

• (b) Eine in der vorliegenden Ausführungsform, in einer wässrigen alkalischen Lösung lösliche Polymerverbindung ist eine Verbindung mit einer nachstehend beschriebenen Säuregruppenstruktur der Hauptkette oder Nebenkette der Polymerverbindung.

(b) Resin soluble in aqueous alkaline solution:

• (b) A polymer compound soluble in an aqueous alkaline solution in the present embodiment is a compound having an acid group structure of the main chain or side chain of the polymer compound described below.

Phenolic hydroxy group (-Ar-OH), carboxy group (-CO ₃ H), sulfonate group (-SO ₃ H), phosphate group (-OPO ₃ H), sulfonamide group (-SO ₂ NH-R), substituted sulfonamide-based acid group (active imide group ) (-SO ₂ NHCOR, -SO ₂ NHSO ₂ R, -CONHSO ₂ R),
wherein Ar represents a divalent aryl group which may have a substituent, and R represents a hydrocarbyl represents hydrogen group, which may have a substituent.

Under these examples become (b-1) a phenolic hydroxy group, (b-2) a sulfonamide group, (b-3) an active amide group as preferred acid group and one in water alkaline solution soluble resin with (b-1) a phenolic hydroxy group (hereinafter referred to as "resin having a phenolic hydroxyl group Hydroxy group ") most preferably used.

Examples a polymer compound having (b-1) a phenolic hydroxy group close novolak resins, such as polycondensates of phenol and formaldehyde (hereinafter referred to as "phenol-formaldehyde resin"), polycondensates of m-cresol and formaldehyde (hereinafter referred to as "m-cresol-formaldehyde resin"), polycondensates of p-cresol and formaldehyde, polycondensates of m- / p-cresol mixtures and formaldehyde, Polycondensates of phenol and cresol (each of an m, p or m / p mixture) and formaldehyde, etc., and polycondensates of pyrogallol and acetone one. Alternatively you can also copolymers obtained by copolymerization of monomers with a phenol group in the side chain can be used. As such Monomers having a phenyl group are acrylamide, methacrylamide, Acrylate, methacrylate or hydroxystyrene with a phenolic group called. In particular, you can suitably used: N- (2-hydroxyphenyl) acrylamide, N- (3-hydroxyphenyl) acrylamide, N- (4-hydroxyphenyl) acrylamide, N- (2-hydroxyphenyl) methacrylamide, N- (3-hydroxyphenyl) methacrylamide, N- (4-hydroxyphenyl) methacrylamide, o-hydroxyphenyl acrylate, m-hydroxyphenyl acrylate, p-hydroxyphenyl acrylate, o-hydroxyphenyl methacrylate, m-hydroxyphenyl methacrylate, p-hydroxyphenyl methacrylate, o-hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene, 2- (2-hydroxyphenyl) ethyl acrylate, 2- (3-hydroxyphenyl) ethyl acrylate, 2- (4-hydroxyphenyl) ethyl acrylate, 2- (2-hydroxyphenyl) ethyl methacrylate, 2- (3-hydroxyphenyl) ethyl methacrylate, 2- (4-hydroxyphenyl) ethyl methacrylate, 2- (N '- (4-hydroxyphenyl) ureido) ethyl acrylate, 2- (N '- (4-hydroxyphenyl) ureido) ethyl methacrylate etc.

Polymers having a weight-average molecular weight of 5.0 × 10 ² to 2.0 × 10 ⁵ and a number-average molecular weight of 2.0 × 10 ² to 1.0 × 10 ⁵ are preferable from the viewpoint of image-forming ability. These resins may be used singly or in combination of two or more. When used in combination, polycondensates of formaldehyde with phenol having as substituent an alkyl group of 3 to 8 carbon atoms, such as a polycondensate of t-butylphenol with formaldehyde, and polycondensates of octylphenol with formaldehyde, as described in US Pat. No. 4,123,279, may be used simultaneously. be used.

As also described in US Pat. No. 4,123,279 Polycondensates of formaldehyde with phenol with as substituent one Alkyl group of 3 to 8 carbon atoms, such as t-butylphenol-formaldehyde resin, Octylphenyl-formaldehyde resin. Such resins with a phenolic hydroxy group may be used alone or in combination used by two or more.

in the Fall one in an aqueous one alkaline solution soluble Polymer compound having (b-2) a sulfonamide group, as the monomer with (b-2) a sulfonamide group, the main monomer of this polymer compound monomers are called composed of a low molecular weight Compound having one or more sulfonamide groups, wherein at least a hydrogen atom is bonded to a nitrogen atom and one or more polymerizable unsaturated bonds in one Molecule. Among these are low molecular weight compounds having a Acryloyl group, allyl group or vinyloxy group and a substituted one or monosubstituted aminosulfonyl group or substituted ones Sulfonylimino group preferred.

Examples of these compounds include the compounds described below, represented by the general formulas (4) to (8).

In the general formulas, each of X ¹ and X ² independently includes -O- or -NR ¹⁷ -. Each of R ²¹ and R ²⁴ independently represents a hydrogen atom or -CH _3. Each of R ²² , R ²⁵ , R ²⁹ , R ³² and R ³⁶ independently represents an alkylene group having 1 to 12 carbon atoms, cycloalkylene group, arylene group or aralkylene group Each of R ²³ , R ¹⁷ and R ³³ independently represents a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, cycloalkyl group, aryl group or aralkyl group which may have a substituent. Each of R ²⁶ and R ³⁷ represents independently an alkyl group having 1 to 12 carbon atoms, cycloalkyl group, aryl group or aralkyl group which may have a substituent. Each of R ²⁸ , R ³⁰ and R ³⁴ independently represents a hydrogen atom or -CH _3. Each of R ³¹ and R ³⁵ independently represents a single bond or an alkylene group having 1 to 12 carbon atoms, cycloalkylene group, arylene group or aralkylene group which may have a substituent Each of Y ¹ and Y ² independently represents a single bond or CO-.

Especially can m-Aminosulfonylphenyl methacrylate, N- (p-aminosulfonylphenyl) methacrylate, N- (p-aminosulfonylphenyl) acrylamide etc. are suitably used.

In the case of an aqueous alkaline solution-soluble polymer compound having (b-3) as an active amide group, as a monomer having (b-3) an active imide group having an active imide group in the molecule represented by the following formula and containing the main monomer, which constitutes this polymer compound is called monomers composed of a low molecular weight compound having one or more active imino groups represented by the following formula and one or more polymerizable unsaturated bonds in a molecule:

When these connections can in particular N- (p-toluenesulfonyl) methacrylamide, N- (p-toluenesulfonyl) acrylamide etc. are suitably used.

In in the watery alkaline solution soluble Copolymer used in the present embodiment is, is the monomer containing acid groups (b-1) to (b-3) not necessarily restricted in one way, two or more monomers with the same acid group or two or more monomers having different acid groups may be copolymerized become.

When Copolymerization can Graft copolymerization process, block copolymerization process, statistical copolymerization methods and the like commonly used become.

The contains above-mentioned copolymer as copolymerization component monomers with an acid group (b-1) to (b-3) for copolymerization in an amount of preferably 10 mol% or more, and more preferably 20 mol% or more. If the Amount of the copolymerization is less than 10 mol% is the mutual action with a resin having a phenolic hydroxy group insufficient, and the improvement effect of the development depth, which is the merit when the copolymerization component is used becomes insufficient.

Further For example, this copolymer may have copolymerization components other than that above-mentioned monomer containing an acid group (b-1) to (b-3) contain.

• (1) Acrylate und Methacrylate mit einer aliphatischen Hydroxygruppe, wie z.B. 2-Hydroxyethylacrylat, 2-Hydroxyethylmethacrylat usw.
• (2) Alkylacrylate, wie Methylacrylat, Ethylacrylat, Propylacrylat, Butylacrylat, Amylacrylat, Hexylacrylat, Octylacrylat, Benzylacrylat, 2-Chlorethylacrylat, Glycidylacrylat, N-Dimethylaminoethylacrylat usw.
• (3) Alkylmethacrylate, wie Methylmethacrylat, Ethylmethacrylat, Propylmethacrylat, Butylmethacrylat, Amylmethacrylat, Hexylmethacrylat, Cyclohexylmethacrylat, Benzylmethacrylat, 2-Chlorethylmethacrylat, Glycidylmethacrylat, N-Dimethylaminoethylmethacrylat usw.
• (4) Acrylamide oder Methacrylamide, wie Acrylamid, Methacrylamid, N-Methylolacrylamid, N-Ethylacrylamid, N-Hexylmethacrylamid, N-Cyclohexylacrylamid, N-Hydroxyethylacrylamid, N-Phenylacrylamid, N-Nitrophenylacrylamid, N-Ethyl-N-phenylacrylamid usw.
• (5) Vinylether, wie Ethylvinylether, 2-Chlorethylvinylether, Hydroxyethylvinylether, Propylvinylether, Butylvinylether, Octylvinylether, Phenylvinylether usw.
• (6) Vinylether, wie Vinylacetat, Vinylchloracetat, Vinylbutyrat, Vinylbenzoat usw.
• (7) Styrole, wie Styrol, α-Methylstyrol, Methylstyrol, Chlormethylstyrol usw.
• (8) Vinylketone, wie Methylvinylketon, Ethylvinylketon, Propylvinylketon, Phenylvinylketon usw.
• (9) Olefine, wie Ethylen, Propylen, Isobutylen, Butadien, Isopren usw.
• (10) N-Vinylpyrrolidon, N-Vinylcarbazol, 4-Vinylpyridin, Acrylnitril, Methacrylnitril usw.
• (11) Ungesättigte Imide, wie Maleimid, N-Acryloylacrylamid, N-Acetylmethacrylamid, N-Propionylmethacrylamid, N-(p-Chlorbenzoyl)methacrylamid usw.
• (12) Ungesättigte Carbonsäuren, wie Acrylsäure, Methacrylsäure, Maleinsäureanhydrid, Itaconsäure usw.

As the monomer which can be used as the copolymerization component, the following monomers (1) to (12) can be used.

• (1) Acrylates and methacrylates having an aliphatic hydroxy group such as 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, etc.
• (2) Alkyl acrylates such as methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, benzyl acrylate, 2-chloroethyl acrylate, glycidyl acrylate, N-dimethylaminoethyl acrylate, etc.
• (3) Alkyl methacrylates such as methyl methacrylate, ethyl methacrylate, propyl methacrylate, butyl methacrylate, amyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, 2-chloroethyl methacrylate, glycidyl methacrylate, N-dimethylaminoethyl methacrylate, etc.
• (4) acrylamides or methacrylamides such as acrylamide, methacrylamide, N-methylolacrylamide, N-ethylacrylamide, N-hexylmethacrylamide, N-cyclohexylacrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide, N-ethyl-N-phenylacrylamide, etc.
• (5) Vinyl ethers such as ethyl vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether, etc.
• (6) Vinyl ethers such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, vinyl benzoate, etc.
• (7) styrenes such as styrene, α-methylstyrene, methylstyrene, chloromethylstyrene, etc.
• (8) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, phenyl vinyl ketone, etc.
• (9) Olefins such as ethylene, propylene, isobutylene, butadiene, isoprene, etc.
• (10) N-vinylpyrrolidone, N-vinylcarbazole, 4-vinylpyridine, acrylonitrile, methacrylonitrile, etc.
• (11) Unsaturated imides such as maleimide, N-acryloylacrylamide, N-acetylmethacrylamide, N-propionylmethacrylamide, N- (p-chlorobenzoyl) methacrylamide, etc.
• (12) Unsaturated carboxylic acids such as acrylic acid, methacrylic acid, maleic anhydride, itaconic acid, etc.

When in water alkaline solution soluble Polymer compound in this embodiment are compounds with a weight average molecular weight of 2,000 or more and a number average molecular weight of 500 or more preferable from the viewpoint of film strength, independently from a homopolymer or copolymer. Furthermore, preferred Compounds a weight average molecular weight of 5,000 to 300,000 and a number average molecular weight of 800 to 250,000 and a Degree of dispersion (weight average molecular weight / number average molecular weight) from 1.1 to 10.

in the The above copolymer is the weight-mixing ratio of Monomers with an acid group (b-1) to (b-3) to another monomer, preferably in the range from 50:50 to 5:95, more preferably in the range of 40:60 to 10:90, from the point of view of development depth.

When Polymer compound having a phenolic hydroxy group are disclosed in U.S. Pat the present embodiment preferably novolak resins, such as a polycondensate of m- / p-mixed cresol with formaldehyde, a polycondensate of phenol and cresol and formaldehyde etc., a copolymer of N- (4-hydroxyphenyl) methacrylamide / methylmethacrylamide / methyl methacrylate / acrylonitrile, a copolymer of 2- (N '- (4-hydroxyphenyl) ureido) ethyl methacrylate / methyl methacrylate / acrylonitrile etc. called.

In the present embodiment are considered as preferred polymer compound having a sulfonamide group N- (p-aminosulfonylphenyl) methacrylamide / methyl methacrylate / acrylonitrile etc., and as a polymer compound having an active imide group are a copolymer of N- (p-toluenesulfonyl) methacrylamide / methyl methacrylate / acrylonitrile (2-hydroxyethyl methacrylate etc. called.

These in water alkaline solution soluble Polymer compounds can individually or in combination of two or more and in one Addition amount of 30 to 99 wt.%, Preferably 40 to 95 wt.%, In particular preferably 50 to 90% by weight, based on the total solids content a photosensitive composition can be used. If the amount of added in aqueous alkaline solution soluble Polymer compound is less than 30 wt.%, Worsens the durability of the recording layer, while when over 99% by weight both sensitivity and durability are not are preferred.

Other components:

To a photosensitive composition of the present embodiment can Further, if necessary, various additives are added. For example, when another onium salt, an aromatic sulfone compound, an aromatic sulfonate compound, a polyfunctional amine compound etc. can be added, the ability to solve a in water alkaline solution soluble Polymers can be improved by a developer to suppress what a preferred phenomenon is.

When above-mentioned onium salt can a diazonium salt, ammonium salt, phosphonium salt, iodonium salt, Sulfonium salt, selenonium salt, arsonium salt, etc. may be mentioned. In the present embodiment used, preferred examples of the onium salt include: Diazonium salts described in S.I. Schlesinger, Photogr. Sci. Closely., 18, 387 (1974), T.S. Bal et al., Polymer, 21, 423 (1980) or hpa5-158230, Ammonium salts described in U.S. Patents 4,069,055 and 4,069,056 or JP-A-3-140140, phosphonium salts described in D.C. Necker et al., Macromolecules, 17, 2468 (1984), C.S. Wen et al., Teh, Proc. Conf. Rad. Curing ASIA, page 478, Tokyo, October 1988, U.S. Patents 4,069,055 or 4,069,056, iodonium salts described in J.V. Crivello et al., Macromolecules, 10 (6), 1307 (1977), Chem. & Eng. News, page 31, November 28, 1988, EP-104,143, U.S. Patents 339,049, 410,201, JP-A Nos. 2-150848 or 2-296514, sulfonium salts described in J.V. Crivello et al., Polymer J., 17, 73 (1985), J.V. Crivello et al., J. Org. Chem, 43, 3055 (1978), W.R. Watt et al., J. Polymer Sci., Polymer Chem. Ed., 22, 1789 (1984), J.V. Crivello et al., Polymer Bull. 14, 279 (1985), J.V. Crivello et al., Macromolecules, 14 (5), 1141 (1981), J.V. Crivello et al., J. Polymer Sci., Polymer Chem. Ed., 17, 2877 (1979), EP Patents 370,693, 233,567, 297,443, 297,442, U.S. Patents 4,933,377, 3,902,114, 410,201, 339,049, 4,760,013, 4,734 444, 2,833,827, German Patents 2,904,626, 3,604,580, 3,604,581, selenonium salts, described in J.V. Crivello et al., Macromolecules, 10 (6), 1307 (1977) or J.V. Crivello et al., J. Polymer Sci., Polymer Chem. Ed., 17, 1047 (1979), arsonium salts described in C.S. Wen t al., Teh, Proc. Conf. Rad. Curing ASIA, page 478, Tokyo, October 1988, etc.

When Counterion of the above-mentioned onium salt are mentioned: tetrafluoroboric acid, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 5-nitro-o-toluenesulfonic acid, 5-sulfosalicylic acid, 2,5-dimethylbenzenesulfonic acid, 2,4,6-trimethylbenzenesulfonic acid, 2-nitrobenzenesulfonic acid, 3-chlorobenzenesulfonic acid, 3 Bromobenzenesulfonic acid, 2-fluoro caprylnaphthalenesulfonic acid, dodecylbenzenesulfonic acid, 1-naphthol-5-sulfonic acid, 2-methoxy-4-hydroxy-5-benzoylbenzenesulfonic acid, p-toluenesulfonic acid, etc.

Under these are in particular hexafluorophosphoric acid and triisopropylnaphthalenesulfonic acid and alkylaromatic sulfonic acids, such as 2,5-dimethylbenzenesulfonic etc. suitable.

The The above-mentioned onium salt is used in an amount of preferably 1 to 50% by weight, more preferably 5 to 30% by weight, particularly preferably 10 to 30% by weight, based on the total solids content of the materials, the make the first shift, added.

To further improve the sensitivity, cyclic acid anhydrides, phenols and organic acids can be used simultaneously. As cyclic acid anhydride may be mentioned: phthalic acid acid anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, 3,6-endooxy-Δ 4 -tetrahydrophthalic anhydride, tetrachlorophthalic anhydride, maleic anhydride, chloromaleic anhydride, ⫾-phenylmaleic anhydride, succinic anhydride, pyromellitic anhydride, etc., described in U.S. Patent 4,115,128. As phenols may be mentioned: bisphenol A , p-nitrophenol, p-ethoxyphenol, 2,4,4'-trihydroxybenzophenone, 2,3,4-trihydroxybenzophenone, 4-hydroxybenzophenone, 4,4 ', 4''- trihydroxytriphenylmethane, 4,4', 3 '', 4 '' - tetrahydroxy-3,5,3 ', 5'-tetramethyltriphenylmethane, etc. Further may be mentioned as organic acids: sulfonic acids, sulfinic acids, alkyl sulfuric acid, phosphonic acids, phosphates and carboxylic acids, as described in JP-A Nos. 60-88942 and 2-96755, etc., and specific examples thereof include p-toluenesulfonic acid, dodecylbenzenesulfonic acid, p-toluenesulfinic acid, ethylsulfuric acid, phenylphosphonic acid, phenylphosphinic acid, phenylphosphate, diph enyl phosphate, benzoic acid, isophthalic acid, adipic acid, p-toluic acid, 3,4-dimethoxybenzoic acid, phthalic acid, terephthalic acid, 4-cyclohexene-1,2-dicarboxylic acid, erucic acid, lauric acid, n-undecanoic acid, ascorbic acid, etc.

Of the Proportion of the above-mentioned cyclic acid anhydrides, phenols and organic acids that in the printing material is preferably 0.05 to 20 % By weight, more preferably 0.1 to 15% by weight, especially preferably 0.1 up to 10% by weight.

In A printing plate material of the present embodiment may be nonionic Surfactants described in JP-A Nos. 62-251740 and 3-208514, and ampholytic ones Surfactants described in JP-A Nos. 59-121044 and 4-13149 for increasing the treatment stability be added against development conditions.

specific Examples of nonionic surfactants include sorbitan tristearate, Sorbitan monopalmitate, sorbitan trioleate, stearic acid monoglyceride, polyoxyethylene nonylphenyl ether etc. one.

specific Examples of ampholytic surfactants include alkyldi (aminoethyl) glycine, Alkylpolyaminoethylglycine hydrochloride, 2-alkyl-N-carboxyethyl-N-hydroxyethyl-imidazolinium betaine and N-tetradecyl-N, N-betaine type compounds (e.g., "Amogen K", trade name by Daiichi Kogyo K.K.), etc.

Of the Proportion of the above, non-ionic surfactants and ampholytic Surfactants for A printing plate material used is preferably 0.05 to 15% by weight, more preferably 0.1 to 5% by weight.

To A printing plate material of the first embodiment may include Copy-out means for providing a visible image immediately after heating by irradiation and a pigment or dye as the image colorant be added.

When Auskopiermittel can a combination of a compound (a photo acid-emitting agent) that an acid by heating can emit by irradiation, and an organic dye, which can form a salt, typically called. Especially can a combination of o-naphthoquinonazido-4-sulfonic acid halide and a salt-forming one organic dye as described in JP-A Nos. 50-36209 and 53-8128, respectively described; and a combination of a trihalomethyl compound and a salt-forming organic dye as in JP-A, respectively Nos. 53-36223, 54-74728, 60-3626, 61-143748, 61-151644 and 63-58440 described, be called. Exist as Trihalogenmethylverbindung an oxazole compound and a triazine compound, each excellent term stability own and provide a clear copy image.

When image colorant can other dyes in addition to the above-mentioned salt-forming organic dye become. Suitable dyes include an oil-soluble dye and a basic dye and the salt-forming organic dye. Especially can Oil Yellow # 101, Oil Yellow # 103, Oil Pink # 312, Oil Green BG, Oil Blue BOS, Oil Blue # 603, Oil Black BY, Oil Black BS and Oil Black T-505 (manufactured by Orient Chemicals Ltd.), Victoria Pure Blue, Crystal Violet (CI42555), Methyl Violet (CI42535), Ethyl Violet, Rhodamine B (CI145170B), malachite green (CI42000), methylene blue (CI52015) etc. are called. In particular, those disclosed in JP-A-62-293247 Dyes preferred. These dyes can become a printing plate material in a relationship from 0.01 to 10% by weight, preferably 0.1 to 3% by weight, based on total solids of the printing plate material.

In addition, if necessary, a plasticizer may be added to the printing plate material of the first embodiment to provide flexibility for a coating. As the plasticizer, for example, butylphthalyl, poly (ethyl glycol), tributyl citrate, diethyl phthalate, dibutyl phthalate, dihexyl phthalate, dioctyl phthalate, tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate, an oligomer and a polymer of acrylic acid or methacrylic acid, etc. can be used.

Further can additionally an epoxy compound; vinyl ethers; and a phenolic compound with an alkoxymethyl group and a phenol compound having a hydroxymethyl group, as disclosed in JP-A-8-276558; and a crosslinking connection with alkali solution inhibition effect, as disclosed in JP-A-9-328937; etc. suitably according to one Task be added.

A planographic printing plate of the present embodiment can be prepared by dissolving the components of the photosensitive layer coating solution in a solvent containing the photosensitive component of the present embodiment and the components of a coating solution for a desired layer, such as a protective layer, and applying the coating solution (s) on one suitable carrier. Then, as the solvent used, ethylene dichloride, cyclohexanone, methyl ethyl ketone, methanol, ethanol, propanol, ethylene glycol monomethyl ether, 1-methoxy-2-propanol, 2-methoxyethyl acetate, 1-methoxy-2-propyl acetate, dimethoxyethane, methyl lactate, ethyl lactate, N, N-dimethylacetoamide , N, N-dimethylformamide, tetramethylurea, N-methylpyrrolidone, dimethyl sulfoxide, sulfolane, ⫾-butyrolactone, toluene, water, etc., to which the solvent is not limited. Each of the solvents is used singly or in the form of a mixture. The concentration of the above components (as total solids, including an additive) in a solvent is preferably 1 to 50% by weight. Further, the applied amount (as solids) to the substrate, such as after application and drying, which is varied according to use, is usually and preferably 0.5 to 5 g / m ² for a photosensitive printing plate.

When Coating process can various methods are used, e.g. can bar coating, spin coating, spray coating, Casting coating, dip coating, air knife coating, Sheet coating, roll coating, etc. are called. The smaller the amount applied is the greater the apparent photographic Sensitivity, but the film properties of the photosensitive Layer are reduced.

To a coating liquid, coated on a photosensitive layer in which a photosensitive Composition of the first embodiment is used, a surfactant for improving the applicability, e.g. a fluorine-containing surfactant as disclosed in JP-A-62-170950, be added. The added amount is preferably 0.01 to 1% by weight, more preferably 0.05 to 0.5% by weight, of the entire printing plate material.

When Substrate for a planographic printing plate of the first embodiment is used, are a flat material that is dimensionally stable, e.g. Paper; Paper on which a plastic, such as polyethylene, polypropylene or polystyrene laminated; a metal plate, like aluminum, Zinc or copper; a plastic film, such as cellulose diacetate, cellulose triacetate, Cellulose propionate, cellulose butyrate, cellulose acetate butyrate, cellulose nitrate, Poly (ethylene terephthalate), polyethylene, polystyrene, polypropylene, Polycarbonate, poly (vinyl acetal); Paper or a plastic film, On the /, as mentioned above, a metal laminated or deposited is; etc. included.

When Substrate for a planographic printing plate of the first embodiment is used, For example, a polyester film and an aluminum plate are preferable, and a Aluminum plate, which in size stable and relatively cheap, among others, is particularly preferred. A suitable aluminum plate is an aluminum plate or a Alloy plate, including aluminum as the main component and including (another) element (s), in a very small amount Amount, and further, a plastic film laminated on the aluminum or deposited, also suitable. The other element (s), that can be included in the aluminum alloy close Silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, Nickel, titanium, etc. The content of other elements in the alloy is 10% by weight or less. A particularly suitable aluminum according to the invention is pure aluminum. Because it is difficult with the current finishing technologies perfectly pure aluminum, but aluminum may be included other elements are used in a very small amount. Therefore, an invention applied aluminum plate not specified in the composition, and a suitable aluminum plate, which is common as a raw material and is generally known or used, can be used. The thickness of the invention used aluminum plate is about 0.1 to 0.6 mm, preferably 0.15 to 0.4 mm, more preferably 0.2 to 0.3 mm. Before the surface roughening an aluminum plate is, if desired, a cleaning treatment with a surfactant, an organic solvent, an alkaline aqueous solution etc. performed, to roll oil from their surface to remove.

A surface roughening for the surface an aluminum plate is carried out by various methods: e.g. a mechanical roughening method, a surface roughening method by electrochemical dissolution the surface, and a surface roughening method chemical and selective dissolution the surface. As a mechanical surface roughening method can a public one known method, such as a ball polishing method, a brush polishing method, a pneumatic polishing method or a buff polishing method be used. As an electrochemical surface roughening method a method using alternating or direct current in an electrolyte of hydrochloric acid or nitric acid called. Furthermore, a method in which both can be used together are combined as disclosed in JP-A-54-63902.

A surface roughened Aluminum plate is subjected to alkaline etching and a neutralization process and then, if desired, anodized to obtain the water retention properties and to increase the wear and abrasion resistance. As electrolyte for use in the anodization of the aluminum plate, various electrolytes, the one porous Can form oxide film, be used. Usually can Sulfuric acid, Phosphoric acid, oxalic acid, chromic acid or an acid mixture used of it. The concentration of such an electrolyte becomes dependent determined suitably by the electrolyte.

The conditions of the anodization treatment may vary depending on the electrolyte used and therefore can not be fully described. However, usually, a solution having an electrolyte concentration of 1 to 80% by weight; a liquid temperature of 5 to 70 ° C; a current density of 5 to 60 A / dm ² ; a voltage of 1 to 100 V and an electrolysis time of 10 seconds to 5 minutes, suitable.

If the amount of the anodic oxide film is less than 1.0 g / m ² , the durability is insufficient, scratches tend to occur on the non-image area of the planographic printing plate, and therefore the ink tends to adhere to the scratched areas upon printing; ie "scratch marks" are simply caused.

To The anodization treatment will be the aluminum surface if necessary, subjected to a treatment for increasing the hydrophilicity. As in the first embodiment Suitable hydrophilization treatment exists alkaline Metal silicate method (in which, for example, an aqueous solution of sodium silicate is used in US Pat. Nos. 2,714,055, 3,181,461, 3,280,734 and 3 902 734 is disclosed. In this process, a substrate in an aqueous one solution dipped in sodium silicate or electrolyzed therein. Moreover may be a treatment with potassium zirconate fluoride, as in JP-B-36-22063 discloses; and a treatment method with poly (vinylphosphonic acid), such as in U.S. Patents 3,276,868, 4,153,461 and 4,689,272, etc. be used.

A invention Planographic printing plate is one in which a photosensitive Positive-type layer including a photosensitive one according to the present invention Composition, provided on its substrate. however may, if necessary, an intermediate layer between the substrate and the photosensitive layer.

When Component of the intermediate layer are various organic compounds used. The component is selected from the group consisting from carboxymethylcellulose; dextrin; Gum arabic; Phosphonic acid with an amine group such as 2-aminoethylphosphonic acid; an organic phosphonic acid, the may have (a) substituents, such as phenylphosphonic acid, naphthylphosphonic acid, alkylphosphonic acid, glycerophosphonic acid, methylene diphosphonic acid or ethylenediphosphonic; an organic phosphoric acid, which may have a substituent, such as phenylphosphoric acid, naphthylphosphoric acid, alkylphosphoric acid or glycerophosphoric; an organic phosphonic acid, which may have a substituent, such as phenylphosphinic acid, naphthylphosphinic acid, alkylphosphinic acid or glycerophosphinic; an amino acid, such as glycine, β-alanine; an amine hydrochloride having a hydroxy group such as triethanolamine hydrochloride; etc., and may be used as a mixture of two or more.

The organic intermediate layer may be provided according to the following methods: an organic intermediate layer providing method comprising the steps of: dissolving the above-mentioned organic compound in an organic solvent such as methanol, ethanol or methyl ethyl ketone, or water, or a solvent mixture thereof, applying the solution on an aluminum plate and drying it; and an organic interlayer deposition method comprising the steps of: dissolving the above organic compound in an organic solvent such as methanol, ethanol or methyl ethyl ketone, or water, or a solvent mixture thereof, immersing the aluminum plate in the solution so that the aluminum plate adsorbs the above-mentioned compound, and then washing it with water and drying. In the former method, a solution including the above-described organic compound may be applied in a concentration of 0.005 to 10% by weight in various ways, while in the latter method, a solution having a concentration of 0.01 to 20% by weight, preferably 0 , 05 to 5% by weight; an immersion temperature of 20 to 90 ° C, preferably 25 to 50 ° C; a dipping time of 0.1 second to 20 minutes, preferably 2 seconds to 1 minute can be applied. A solution used in these methods can be adjusted to a pH of 1 to 12 with a basic material such as ammonia, triethylamine, potassium hydroxide and / or an acidic material such as hydrochloric acid or phosphoric acid. Further, a yellow dye may be added to improve the color tone reproducibility of an image recording material.

The amount to be applied to the organic intermediate layer is suitably 2 to 200 mg / m ² , preferably 5 to 100 mg / m ² . If the applied amount is less than 2 mg / m ² , sufficient plate abrasion performance can not be provided. If the applied amount is larger than 200 mg / m ² , the results are also unsatisfactory.

A as mentioned above The positive-type planographic printing plate prepared is usually exposed to image exposure and development treatment.

When for the Image exposure used source of active light can Solid-state laser and a semiconductor laser using infrared rays a wavelength from 750 to 1200 nm can be called.

In this embodiment is a light source with an emission wavelength between near infrared and Infrared preferred, and accordingly are a solid laser and a semiconductor laser is particularly preferred.

When development solution and refreshment solution (Replenisher) for A planographic printing plate of the first embodiment may be a general well-known, watery alkaline solution and inorganic alkaline salts, such as sodium silicate, Potassium silicate, tertiary Sodium phosphate, tertiary Potassium phosphate, tertiary Ammonium phosphate, secondary Sodium phosphate, secondary Potassium phosphate, secondary ammonium phosphate, Sodium carbonate, potassium carbonate, ammonium carbonate, sodium bicarbonate, Potassium bicarbonate, ammonium bicarbonate, sodium borate, Potassium borate, ammonium borate, sodium hydroxide, ammonium hydroxide, potassium hydroxide and lithium hydroxide to be named. In addition, you can organic basic agents, such as monomethylamine, dimethylamine, trimethylamine, Monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, Triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, Monoisopropanolamine, diisopropanolamine, ethyleneimine, ethylenediamine and pyridine, also used.

each this basic agent is used singly or as a mixture of two or more of them.

Particularly preferred developing solutions among these basic agents are an aqueous solution of a silicate, such as sodium silicate or potassium silicate, because the developing characteristics are represented by the ratio of silica (SiO ₂ ), which is a component of the silicates, to an alkaline metal oxide (M ₂ O) and each Concentration of it can be adjusted. For example, an alkali metal silicate as disclosed in JP-A-54-62004 or JP-B-57-7427 is effectively used.

Moreover is known that if the development using an automatic Developer performed becomes, a watery solution (namely a developer) having an alkali strength higher than that of a developing solution and thereby a variety of PS plates can be treated, without the development solution in a development tank for to replace a long period of time. In an embodiment according to the invention For example, this refresh system is preferably used. To the acceleration and to perform control of the development properties, and the diffusion of during the Development of generated residues and the affinity of PS plates with ink in a print image area to increase, can various surfactants and / or organic solvents for developing solution and the refreshing solution be given if necessary. Suitable surfactants may be anionic, cationic, nonionic and amphoteric surfactants.

Further, if necessary, a reducing agent such as hydroquinone; resorcinol; a sodium salt or potassium salt of an inorganic acid such as sulfuric acid or sulfurous acid; an organic car bonsäure; a deforming agent; and adding a water softener to the developing solution and the replenisher.

A Printing plate obtained by using the above developing solution and Reconditioner is developed with washing water, a rinsing solution, including a Surfactants, etc .; and a desensitizing fluid, including gum arabic and / or a starch derivative treated. As an after-treatment, if an image-recording material in an inventive Embodiment as Pressure plate is used, various combinations of the above Treatments are applied.

since The latest is used in the boardmaking or printing industry Purpose of rationalization and standardization of printing work an automatic (development) processor for printing plates is widely used used. Such an automatic processor usually includes a process part and a post-treatment part. More specifically an automatic processor an apparatus for transporting a printing plate, Processing liquid tank and a spray apparatus, wherein in the processor a printing plate transported horizontally, and every treatment liquid must be sprayed from a spray nozzle to effect the development process, while she is pumped up. Moreover, since the last years one Method known, wherein a printing plate in processing liquids, into the processing fluid tanks are abandoned, immersed and in the processing fluids transferred by guide rollers becomes. According to Such automatic processing makes it possible to have a Reconditioner to every processing liquid to give depending the amount of processing, the operating hours, etc.

Moreover may also be a processing method with a substantially fresh processing liquid, i.e. an expandable System, to be applied.

A photosensitive printing plate in which a photosensitive composition the first embodiment is used will be explained. If an unnecessary scene (e.g., the print of a film corner of an original image film, etc.) the planographic printing plate exists, that of an image exposure, Development, washing with water and / or rinsing and / or gumming exposed has been removed, the unnecessary image area become. To the unnecessary To remove an image, e.g. a method comprising the steps of: applying a removal fluid on the unnecessary Scene, Standing for a predetermined period of time and subsequent washing with water, as disclosed in JP-B-2-13293, preferably used. Moreover may also include a method comprising the steps of illuminating of active light introduced through an optical fiber onto the optical fiber unnecessary scene and then developing, as in JP-A-59-174842 disclosed.

The can be obtained as described above planographic printing plate, if desired, be coated with a Desensibilisierungsgummi, and then the planographic printing plate is subjected to a printing step. If a planographic printing plate with a higher plate wear is desired, however, a firing treatment is applied to it.

If subjected a planographic printing plate to a firing treatment It is preferred, before the burning treatment with a Gegenätzflüssigkeit as described in JP-B Nos. 61-2518 and 55-28062, respectively JP-A Nos. 62-31859 and 61-159655.

When Method for this is an application method of Gegenätzflüssigkeit on the planographic printing plate using a sponge or absorbent cotton, in the counter etching liquid waterproof is, or dipping the planographic printing plate in a bin, those with the counter etching liquid filled is, or a coating process using an automatic Coater applied. In addition, by homogenizing the amount applied using a roller crusher or Roller crusher rolls more preferred after application or coating Results provided.

The applied amount of the counter etching liquid is usually and suitably 0.03 to 0.8 g / m ² (as dry weight).

The planographic printing plate to which the Gegenätzflüssigkeit is applied, if necessary, dried and then heated at an elevated temperature using a burning processor (for example, a burning processor BP-1300 ^®, as described by Fuji Photo Film Co., Ltd. sold), wherein the heating temperature is preferably in the range of 180 to 300 ° C and the heating time is in the range of 1 to 20 minutes, depending on the kind of the image forming components.

The burned planographic printing plate can, if necessary, Treatments, such as washing with water and gumming, subjected which are usually carried out become. However, if a counter etching liquid, including a water-soluble Polymer compound is used, gumming, etc., i. E. a desensitization treatment, be omitted.

The Planographic provided by the above treatments Printing plate is subjected to offset printing, etc., to make it big Number of prints to use.

In all planographic printing plates of the first embodiment, the fluctuation in sensitivity before and after preservation is 20 mJ / cm ² or less, which is a practically acceptable level. Therefore, the planographic printing plates of the first embodiment are also classified as excellent in preservation stability.

It It was found that when the above-mentioned specific infrared absorbent according to the first embodiment is used, a photosensitive composition is provided which is highly sensitive and has excellent stability of sensitivity owns, if development solutions of different Concentrations were used (namely excellent development latitude) and further has excellent preservative stability.

in addition, can, according to one planographic printing plate in which this photosensitive composition is used, direct plate generation using an infrared laser carried out which is highly sensitive and outstanding development breadth and preservative stability has.

As stated above, Finally, a photosensitive composition of the first embodiment has a broad development latitude and excellent image forming properties, and even after the photosensitive composition has a long time Stored for a long time, the image-forming deteriorate Properties not, and thus it has good preservative stability. Further is the planographic printing plate in which this photosensitive Composition is used, a planographic printing plate from the positive type to the direct plate making, the picture through can produce an infrared laser, and therefore can be excellent image-forming Provide properties and preservative stability.

Claims (8)

A photosensitive composition comprising: (a) an infrared absorbent represented by the following formula (I); and (b) a polymer compound which is insoluble in water and soluble in an aqueous alkaline solution, wherein: the solubility of the photosensitive composition in an aqueous alkaline solution is changed by irradiation with an infrared laser:

wherein X ¹ and X ^{2 are} independently: -CR ⁷ R ⁸ -, -S-, -Se-, -NR ⁹ -, -CH = CH- or -O-, R ¹ and R ² independently represent an alkyl group having 13 to 30 carbon atoms, R ^3, R ^4, R ⁵ and R ⁶ independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, or may represent a plurality of atoms which for a combination of R ⁴ and R ⁵ or R ⁶ and R ^{7 is} required to form an aliphatic 5- or 6-membered ring, a 6-membered aromatic ring, an aromatic 10-membered ring, a substituted 6-membered aromatic ring or a substituted aromatic 10-membered ring, R ⁷ and R ⁸ independently represents an alkyl group having 1 to 18 carbon atoms or an aryl group having 6 to 18 carbon atoms, R ^{9 represents} an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 to 18 carbon atoms, Z represents a heptamethine group having a substituent k wherein the substituent is an alkyl group having 8 or less carbon atoms, a halogen atom or an amino group, and the heptamethine group may include a cyclohexene ring or a cyclopentene ring which is formed by combining substituents on two methine carbon atoms with each other, and which may have a substituent, wherein the substituent in the ring structure is selected from an alkyl group having 6 or less carbon atoms or a halogen atom, and Q is a counter ion represents. A photosensitive composition according to claim 1, wherein the counter ion Q of the infrared absorbent represented by the formula (I) is represented by the following formula (III):

wherein A represents an atom selected from the group consisting of B, P, As, Sb, Cl and Br, Y represents a halogen atom or an oxygen atom, and m denotes an integer of 1 to 6. Photosensitive composition according to claim 1, wherein the counterion Q of the infrared absorbent, shown by the formula (I), a counter ion having a sulfonic acid structure is. Photosensitive composition according to claim 1, wherein the in aqueous alkaline solution soluble polymer compound an acid group structure in the main chain or side chain thereof. Photosensitive composition according to claim 4, wherein the acid group structure a phenolic hydroxy group, a sulfonamide group and an activated one Imide group includes. Photosensitive composition according to claim 1, wherein the infrared absorbent is a long-chain alkyl group in the N position of the dye. Photosensitive composition according to claim 1, wherein the infrared absorbent in a proportion of 0.01 to 50% by weight, based on the total solids content of the photosensitive Composition, is added. A planographic printing plate comprising a photosensitive Layer consisting of the photosensitive composition according to one the claims 1 to 7, wherein the photosensitive composition is on a substrate provided.