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DE50211190D1 - Projection exposure system - Google Patents

Projection exposure system

Info

Publication number
DE50211190D1
DE50211190D1 DE50211190T DE50211190T DE50211190D1 DE 50211190 D1 DE50211190 D1 DE 50211190D1 DE 50211190 T DE50211190 T DE 50211190T DE 50211190 T DE50211190 T DE 50211190T DE 50211190 D1 DE50211190 D1 DE 50211190D1
Authority
DE
Germany
Prior art keywords
projection exposure
exposure system
projection
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE50211190T
Other languages
German (de)
Inventor
Bernhard Kneer
Gerald Dr Richter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Application granted granted Critical
Publication of DE50211190D1 publication Critical patent/DE50211190D1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE50211190T 2001-09-05 2002-07-05 Projection exposure system Expired - Fee Related DE50211190D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10143385A DE10143385C2 (en) 2001-09-05 2001-09-05 Projection exposure system

Publications (1)

Publication Number Publication Date
DE50211190D1 true DE50211190D1 (en) 2007-12-27

Family

ID=7697717

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10143385A Expired - Fee Related DE10143385C2 (en) 2001-09-05 2001-09-05 Projection exposure system
DE50211190T Expired - Fee Related DE50211190D1 (en) 2001-09-05 2002-07-05 Projection exposure system

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE10143385A Expired - Fee Related DE10143385C2 (en) 2001-09-05 2001-09-05 Projection exposure system

Country Status (6)

Country Link
US (3) US20030063268A1 (en)
EP (1) EP1291719B1 (en)
JP (2) JP2003156684A (en)
KR (1) KR100939423B1 (en)
DE (2) DE10143385C2 (en)
TW (1) TW569038B (en)

Families Citing this family (22)

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Publication number Priority date Publication date Assignee Title
JP2002287023A (en) * 2001-03-27 2002-10-03 Nikon Corp Projection optical system, projection exposure apparatus including the projection optical system, and projection exposure method
US8208198B2 (en) * 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
JP5102492B2 (en) * 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー Objective lens for microlithography projection with crystal elements
US20080151365A1 (en) * 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
DE102004035595B4 (en) 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Method for adjusting a projection objective
KR101639964B1 (en) 2004-05-17 2016-07-14 칼 짜이스 에스엠티 게엠베하 Projection exposure system comprising a catadioptric projection objective with intermediate images
TWI454731B (en) 2005-05-27 2014-10-01 Zeiss Carl Smt Gmbh Method for improving the imaging properties of a projection objective, and such a projection objective
JP5559543B2 (en) * 2006-11-30 2014-07-23 カール・ツァイス・エスエムティー・ゲーエムベーハー Method of manufacturing a projection objective and projection objective manufactured by this method
EP1927890A1 (en) * 2006-11-30 2008-06-04 Carl Zeiss SMT AG Method of manufacturing a projection objective and projection objective manufactured by that method
KR101492287B1 (en) * 2007-03-27 2015-02-11 칼 짜이스 에스엠테 게엠베하 Correction of optical elements by means of correction light emitted in a flat manner
DE102008001497A1 (en) 2007-05-07 2008-11-13 Carl Zeiss Smt Ag Optical subsystem i.e. projection lens, for projection illumination system for semiconductor lithography, has set of optical elements, where two optical elements are arranged in different places in subsystem and are moveable together
DE102009029673A1 (en) 2009-09-22 2010-11-25 Carl Zeiss Smt Ag Manipulator for positioning optical element i.e. reflector, in projection exposure system, has actuators for moving reflector in spatial degree of movement, where one of actuators has coupling element connected with reflector
DE102010029651A1 (en) 2010-06-02 2011-12-08 Carl Zeiss Smt Gmbh Method for operating a microlithographic projection exposure apparatus with correction of aberrations induced by rigorous effects of the mask
WO2011141046A1 (en) 2010-04-23 2011-11-17 Carl Zeiss Smt Gmbh Process of operating a lithographic system comprising a manipulation of an optical element of the lithographic system
JP2011237588A (en) * 2010-05-10 2011-11-24 Sony Corp Zoom lens and imaging device
DE102011080437A1 (en) * 2010-09-30 2012-04-05 Carl Zeiss Smt Gmbh Imaging optical system for microlithography
CN102486569B (en) * 2010-12-01 2014-06-18 上海微电子装备有限公司 Projection lens system
JP6186352B2 (en) 2011-05-30 2017-08-23 カール・ツァイス・エスエムティー・ゲーエムベーハー Method for moving an optical element of a projection exposure apparatus for microlithography
DE102012211256A1 (en) * 2012-06-29 2014-01-02 Carl Zeiss Smt Gmbh Projection exposure machine for projection lithography
TWI476442B (en) * 2013-02-26 2015-03-11 Sintai Optical Shenzhen Co Ltd Zoom lens
DE102015206448B4 (en) 2015-04-10 2018-06-21 Carl Zeiss Smt Gmbh Control device for controlling at least one manipulator of a projection objective, adjusting device and method for controlling at least one manipulator
CN114415351B (en) * 2022-01-17 2022-08-19 东莞市融光光学有限公司 Glass-plastic hybrid lens

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US4065722A (en) * 1976-12-27 1977-12-27 Glenayre Electronics, Ltd. Demodulation method and circuit for discretely modulated ac signals
JPS61502507A (en) * 1984-06-21 1986-10-30 アメリカン テレフオン アンド テレグラフ カムパニ− Deep UV lithography
JPH0690361B2 (en) * 1984-10-18 1994-11-14 オリンパス光学工業株式会社 Zoom lenses
JPH0820599B2 (en) * 1985-05-11 1996-03-04 株式会社ニコン Zoom lens
JPS62235916A (en) * 1986-04-07 1987-10-16 Fuji Photo Film Co Ltd Zoom lens
JP2897345B2 (en) * 1990-05-25 1999-05-31 キヤノン株式会社 Projection exposure equipment
US6078380A (en) * 1991-10-08 2000-06-20 Nikon Corporation Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
JP3243818B2 (en) * 1992-02-14 2002-01-07 株式会社ニコン Projection exposure apparatus and method, and element manufacturing method
US5226186A (en) * 1992-07-06 1993-07-13 Dennis Boyd Waterbed mattress with draining system
JPH06349703A (en) * 1993-06-11 1994-12-22 Nikon Corp Projection exposure device
JPH07270685A (en) * 1994-03-29 1995-10-20 Nikon Corp Zoom lens
JPH0817719A (en) * 1994-06-30 1996-01-19 Nikon Corp Projection exposure device
US5930032A (en) * 1994-12-22 1999-07-27 Asahi Kogaku Kogyo Kabushiki Kaisha UV image forming optical system and lens for UV radiation
JP3445045B2 (en) * 1994-12-29 2003-09-08 キヤノン株式会社 Projection exposure apparatus and device manufacturing method using the same
JP3893626B2 (en) * 1995-01-25 2007-03-14 株式会社ニコン Projection optical apparatus adjustment method, projection optical apparatus, exposure apparatus, and exposure method
US5831700A (en) * 1995-05-19 1998-11-03 Kent State University Polymer stabilized four domain twisted nematic liquid crystal display
JP3624973B2 (en) * 1995-10-12 2005-03-02 株式会社ニコン Projection optical system
US6061180A (en) * 1996-10-29 2000-05-09 Canon Kabushiki Kaisha Zoom lens
JP3365606B2 (en) * 1997-01-30 2003-01-14 富士写真光機株式会社 Infrared zoom lens
JP3925576B2 (en) * 1997-07-24 2007-06-06 株式会社ニコン Projection optical system, exposure apparatus including the optical system, and device manufacturing method using the apparatus
JPH11307415A (en) * 1998-04-16 1999-11-05 Nikon Corp Exposure method and exposure apparatus
US7112772B2 (en) 1998-05-29 2006-09-26 Carl Zeiss Smt Ag Catadioptric projection objective with adaptive mirror and projection exposure method
US6256086B1 (en) * 1998-10-06 2001-07-03 Canon Kabushiki Kaisha Projection exposure apparatus, and device manufacturing method
DE19855108A1 (en) * 1998-11-30 2000-05-31 Zeiss Carl Fa Microlithographic reduction lens, projection exposure system and method
DE19942281A1 (en) * 1999-05-14 2000-11-16 Zeiss Carl Fa Projection lens has system filter screen, constrictions and bulges, negative lens, and positive lenses
JP3862497B2 (en) * 2000-11-10 2006-12-27 キヤノン株式会社 Exposure apparatus and device manufacturing method
JP2002287023A (en) * 2001-03-27 2002-10-03 Nikon Corp Projection optical system, projection exposure apparatus including the projection optical system, and projection exposure method

Also Published As

Publication number Publication date
DE10143385C2 (en) 2003-07-17
TW569038B (en) 2004-01-01
EP1291719A1 (en) 2003-03-12
KR20030021127A (en) 2003-03-12
JP2009037251A (en) 2009-02-19
DE10143385A1 (en) 2003-04-03
KR100939423B1 (en) 2010-01-28
JP2003156684A (en) 2003-05-30
US20030063268A1 (en) 2003-04-03
US7408621B2 (en) 2008-08-05
EP1291719B1 (en) 2007-11-14
US7457043B2 (en) 2008-11-25
US20060170897A1 (en) 2006-08-03
US20070171539A1 (en) 2007-07-26

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: CARL ZEISS SMT AG, 73447 OBERKOCHEN, DE

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee