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DE3788158D1 - Vorrichtung für die Erkennung von Vergrösserungsfehlern in einem optischen Abbildungssystem. - Google Patents

Vorrichtung für die Erkennung von Vergrösserungsfehlern in einem optischen Abbildungssystem.

Info

Publication number
DE3788158D1
DE3788158D1 DE87200873T DE3788158T DE3788158D1 DE 3788158 D1 DE3788158 D1 DE 3788158D1 DE 87200873 T DE87200873 T DE 87200873T DE 3788158 T DE3788158 T DE 3788158T DE 3788158 D1 DE3788158 D1 DE 3788158D1
Authority
DE
Germany
Prior art keywords
detection
imaging system
optical imaging
magnification errors
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE87200873T
Other languages
English (en)
Other versions
DE3788158T2 (de
Inventor
Gijsbertus Bouwhuis
Antonius H M Akkermans
De Looy Guido C R M Van
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of DE3788158D1 publication Critical patent/DE3788158D1/de
Application granted granted Critical
Publication of DE3788158T2 publication Critical patent/DE3788158T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Projection-Type Copiers In General (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
DE3788158T 1986-05-21 1987-05-12 Vorrichtung für die Erkennung von Vergrösserungsfehlern in einem optischen Abbildungssystem. Expired - Lifetime DE3788158T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8601278A NL8601278A (nl) 1986-05-21 1986-05-21 Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem.

Publications (2)

Publication Number Publication Date
DE3788158D1 true DE3788158D1 (de) 1993-12-23
DE3788158T2 DE3788158T2 (de) 1994-05-19

Family

ID=19848039

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3788158T Expired - Lifetime DE3788158T2 (de) 1986-05-21 1987-05-12 Vorrichtung für die Erkennung von Vergrösserungsfehlern in einem optischen Abbildungssystem.

Country Status (5)

Country Link
US (1) US4772119A (de)
EP (1) EP0247665B1 (de)
JP (1) JPS631031A (de)
DE (1) DE3788158T2 (de)
NL (1) NL8601278A (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4893195A (en) * 1987-08-27 1990-01-09 Minolta Camera Kabushiki Kaisha Image processing apparatus capable of eliminating moire pattern
JP2712330B2 (ja) 1988-07-20 1998-02-10 株式会社ニコン 露光条件測定方法
US4908656A (en) * 1988-01-21 1990-03-13 Nikon Corporation Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision
US5062705A (en) * 1989-09-13 1991-11-05 Matsushita Electric Industrial Co., Ltd. Apparatus for evaluating a lens
NL9000503A (nl) * 1990-03-05 1991-10-01 Asm Lithography Bv Apparaat en werkwijze voor het afbeelden van een maskerpatroon op een substraat.
JP3218657B2 (ja) * 1991-12-04 2001-10-15 キヤノン株式会社 ロータリーエンコーダ
US5300786A (en) * 1992-10-28 1994-04-05 International Business Machines Corporation Optical focus phase shift test pattern, monitoring system and process
US6160628A (en) * 1999-06-29 2000-12-12 Nikon Corporation Interferometer system and method for lens column alignment
US6956659B2 (en) * 2001-05-22 2005-10-18 Nikon Precision Inc. Measurement of critical dimensions of etched features
US6717676B2 (en) * 2002-03-12 2004-04-06 Eastman Kodak Company Method for measuring magnification of an afocal optical system
US6974653B2 (en) * 2002-04-19 2005-12-13 Nikon Precision Inc. Methods for critical dimension and focus mapping using critical dimension test marks
US6867846B2 (en) 2003-01-15 2005-03-15 Asml Holding Nv Tailored reflecting diffractor for EUV lithographic system aberration measurement
US7268891B2 (en) 2003-01-15 2007-09-11 Asml Holding N.V. Transmission shear grating in checkerboard configuration for EUV wavefront sensor
US7113255B2 (en) 2003-12-19 2006-09-26 Asml Holding N.V. Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured thereby
WO2005069079A1 (de) * 2004-01-16 2005-07-28 Carl Zeiss Smt Ag Vorrichtung und verfahren zur wellenfrontvermessung eines optischen abbildungssystems und mikrolithographie-projektionsbelichtungsanlage
US7561280B2 (en) * 2007-03-15 2009-07-14 Agilent Technologies, Inc. Displacement measurement sensor head and system having measurement sub-beams comprising zeroth order and first order diffraction components
US7545507B2 (en) * 2007-03-15 2009-06-09 Agilent Technologies, Inc. Displacement measurement system
DE102008029970A1 (de) 2008-06-26 2009-12-31 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zum Überwachen einer lateralen Abbildungsstabilität
US7924433B2 (en) * 2008-09-08 2011-04-12 Agilent Technologies, Inc. Displacement measurement system and method of use
WO2010134487A1 (ja) * 2009-05-18 2010-11-25 株式会社ニコン 波面計測方法及び装置、並びに露光方法及び装置
US8492703B2 (en) * 2009-08-04 2013-07-23 Mitutoyo Corporation Lens aberration correction in a doubly telecentric displacement sensor
NL2005414A (en) * 2009-10-28 2011-05-02 Asml Netherlands Bv Lithographic apparatus and patterning device.
JP5598033B2 (ja) * 2010-03-15 2014-10-01 ソニー株式会社 情報処理装置、情報処理方法、およびプログラム
DE102012212662A1 (de) * 2012-07-19 2013-08-22 Carl Zeiss Smt Gmbh Vorrichtung zur Vermessung eines abbildenden optischen Systems
US10241425B2 (en) * 2014-12-22 2019-03-26 Asml Netherlands B.V. Level sensor, lithographic apparatus and device manufacturing method
CN108489930A (zh) * 2018-01-30 2018-09-04 中国科学院上海技术物理研究所 基于单元胞立体相位光栅的被动式THz光谱仪

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
FR2450468A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
EP0045321B1 (de) * 1980-07-31 1986-12-10 International Business Machines Corporation Verfahren und Einrichtung zur optischen Distanzmessung
US4629313A (en) * 1982-10-22 1986-12-16 Nippon Kogaku K.K. Exposure apparatus
US4631416A (en) * 1983-12-19 1986-12-23 Hewlett-Packard Company Wafer/mask alignment system using diffraction gratings

Also Published As

Publication number Publication date
JPH0482175B2 (de) 1992-12-25
JPS631031A (ja) 1988-01-06
EP0247665B1 (de) 1993-11-18
DE3788158T2 (de) 1994-05-19
NL8601278A (nl) 1987-12-16
US4772119A (en) 1988-09-20
EP0247665A1 (de) 1987-12-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8327 Change in the person/name/address of the patent owner

Owner name: ASM LITHOGRAPHY B.V., VELDHOVEN, NL