DE3768145D1 - Photopolymerisierbare zusammensetzung. - Google Patents

Photopolymerisierbare zusammensetzung.

Info

Publication number: DE3768145D1
Authority: DE; Germany
Prior art keywords: photopolymerizable composition; photopolymerizable; composition
Prior art date: 1986-06-10
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE8787305155T

Other languages

English (en)

Inventor

Noriaki Takahashi

Noriko Watanabe

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Mitsubishi Chemical Corp

Original Assignee

Mitsubishi Kasei Corp

Mitsubishi Chemical Industries Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-06-10

Filing date

1987-06-10

Publication date

1991-04-04

1987-06-10 Application filed by Mitsubishi Kasei Corp, Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Kasei Corp

1991-04-04 Application granted granted Critical

1991-04-04 Publication of DE3768145D1 publication Critical patent/DE3768145D1/de

2007-06-11 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Macromonomer-Based Addition Polymer (AREA)
Non-Metallic Protective Coatings For Printed Circuits (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Polymerisation Methods In General (AREA)
Paints Or Removers (AREA)

DE8787305155T 1986-06-10 1987-06-10 Photopolymerisierbare zusammensetzung. Expired - Lifetime DE3768145D1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP61134532A JPS62290705A (ja)	1986-06-10	1986-06-10	光重合性組成物

Publications (1)

Publication Number	Publication Date
DE3768145D1 true DE3768145D1 (de)	1991-04-04

Family

ID=15130520

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE8787305155T Expired - Lifetime DE3768145D1 (de)	1986-06-10	1987-06-10	Photopolymerisierbare zusammensetzung.

Country Status (6)

Country	Link
US (1)	US4920037A (de)
EP (1)	EP0249468B1 (de)
JP (1)	JPS62290705A (de)
KR (1)	KR880000823A (de)
CA (1)	CA1288539C (de)
DE (1)	DE3768145D1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5483104A (en) *	1990-01-12	1996-01-09	Paradigm Technology, Inc.	Self-aligning contact and interconnect structure
US5166771A (en) *	1990-01-12	1992-11-24	Paradigm Technology, Inc.	Self-aligning contact and interconnect structure
DE69116933T2 (de) *	1990-06-04	1996-07-11	Canon Kk	Lichtempfindliches Element zur Elektrophotographie
US5153102A (en) *	1990-08-10	1992-10-06	Industrial Technology Research Institute	Alkalline-solution-developable liquid photographic composition
DE4129284A1 (de) *	1991-09-03	1993-03-04	Agfa Gevaert Ag	Bilderzeugungselement mit einem fotopolymerisierbaren monomer
TW424172B (en)	1995-04-19	2001-03-01	Hitachi Chemical Co Ltd	Photosensitive resin composition and photosensitive element using the same
US6890701B2 (en) *	2001-09-11	2005-05-10	Fuji Photo Film Co., Ltd.	Photopolymerizable composition
JP2007293221A (ja)	2006-03-31	2007-11-08	Fujifilm Corp	平版印刷版の作製方法及び平版印刷版原版
WO2008049932A1 (de) *	2006-10-27	2008-05-02	Basf Se	Strahlungshärtbare mischung, enthaltend niedermolekulare, ethylenisch ungesättigte verbindungen mit nicht-aromatischen ringsystemen
TWI635365B (zh) *	2014-08-21	2018-09-11	日商富士軟片股份有限公司	Sublayer film forming composition, laminate, pattern forming method, imprint forming kit, and device manufacturing method
TWI632188B (zh) *	2014-08-27	2018-08-11	日商富士軟片股份有限公司	底層膜形成用樹脂組成物、積層體、圖案形成方法、壓印形成用套組及元件的製造方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2811443A (en) *	1955-09-15	1957-10-29	Eastman Kodak Co	Photographic reproduction process using light sensitive polymeric stilbazoles and quaternary salts thereof
JPS4827801A (de) *	1971-08-06	1973-04-12
BE793732A (fr) *	1972-01-10	1973-05-02	Grace W R & Co	Composition contenant un polyene et un polythiol
US3907865A (en) *	1973-06-20	1975-09-23	Kansai Paint Co Ltd	Photopolymerizable vinylurethane monomer
DE2429636C3 (de) *	1973-06-28	1986-05-07	Teijin Ltd., Osaka	Lichtempfindliche Harzmasse
GB1463816A (en) *	1973-11-08	1977-02-09	Kodak Ltd	Photosensitive lithographic materials and polymers useful therein
US3932401A (en) *	1974-01-31	1976-01-13	Minnesota Mining And Manufacturing Company	Mixed acrylic acid/methacrylic acid esters of tris (hydroxyalkyl) isocyanurates
JPS51116893A (en) *	1975-04-08	1976-10-14	Ube Ind Ltd	Photo-setting compositions
US4047963A (en) *	1976-06-17	1977-09-13	Hercules Incorporated	Photopolymer compositions
DE2861486D1 (en) *	1977-11-21	1982-02-18	Ciba Geigy Ag	Process for the application of soldering masks to printed circuits with through holes for contacting
DE3120052A1 (de) *	1981-05-20	1982-12-09	Hoechst Ag, 6000 Frankfurt	Durch strahlung polymerisierbares gemisch und damit hergestelltes kopiermaterial
US4435497A (en) *	1981-06-19	1984-03-06	Ciba-Geigy Corporation	Carboxyl-containing compositions and their polymerization
JPS5946643A (ja) *	1982-09-09	1984-03-16	Fuji Photo Film Co Ltd	感光性平版印刷版
US4528332A (en) *	1983-01-06	1985-07-09	Asahi Kasei Kogyo Kabushiki Kaisha	Epoxy compounds, process for the preparation thereof and resist materials comprising thereof
JPS59204837A (ja) *	1983-05-09	1984-11-20	Asahi Chem Ind Co Ltd	光重合性積層体及びそれを用いたレジスト像形成方法
US4501689A (en) *	1983-09-26	1985-02-26	Makoto Yanagawa	Photopolymerizable composition
JPS60147425A (ja) *	1984-01-11	1985-08-03	Nitto Electric Ind Co Ltd	硬化性樹脂組成物
JPS6128545A (ja) *	1984-07-18	1986-02-08	Hitachi Ltd	樹脂組成物及び積層板

1986
- 1986-06-10 JP JP61134532A patent/JPS62290705A/ja active Pending
1987
- 1987-06-09 CA CA000539185A patent/CA1288539C/en not_active Expired - Lifetime
- 1987-06-09 KR KR870005853A patent/KR880000823A/ko not_active Withdrawn
- 1987-06-10 DE DE8787305155T patent/DE3768145D1/de not_active Expired - Lifetime
- 1987-06-10 EP EP87305155A patent/EP0249468B1/de not_active Expired - Lifetime
1989
- 1989-09-13 US US07/406,180 patent/US4920037A/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
KR880000823A (ko)	1988-03-29
US4920037A (en)	1990-04-24
JPS62290705A (ja)	1987-12-17
EP0249468B1 (de)	1991-02-27
EP0249468A3 (en)	1988-09-07
CA1288539C (en)	1991-09-03
EP0249468A2 (de)	1987-12-16

Publication	Publication Date	Title
DE3677276D1 (de)	1991-03-07	Photopolymerisierbare zusammensetzung.
DE68921867D1 (de)	1995-04-27	Photopolymerisierbare Zusammensetzung.
DE3761146D1 (de)	1990-01-18	Detergens-zusammensetzung.
DE3751555D1 (de)	1995-11-16	Photoempfindliche Zusammensetzung.
DE3773631D1 (de)	1991-11-14	Polyaethylen-zusammensetzung.
DE3774763D1 (de)	1992-01-09	Carboxy-benzotriazole enthaltende photopolymerisierbare zusammensetzung.
DE3788103D1 (de)	1993-12-16	Lichtempfindliche Zusammensetzung.
DE68914176D1 (de)	1994-05-05	Photopolymerisierbare Zusammensetzung.
DE3873550D1 (de)	1992-09-17	Photopolymerisierbare zusammensetzungen.
DE3784447D1 (de)	1993-04-08	Haertbare organopolysiloxanzusammensetzung.
FI883837L (fi)	1988-08-18	Aoksjuka foerhindrande komposition.
FI875703A0 (fi)	1987-12-23	Laekemedelplaoster-kompositioner.
DE3779948D1 (de)	1992-07-30	Sauerstoff entziehende zusammensetzung.
DE3853694D1 (de)	1995-06-08	Photolackzusammensetzung.
DE3851921D1 (de)	1994-12-01	Photopolymerisierbare Zusammensetzung.
DE3779951D1 (de)	1992-07-30	Klebrigmachende zusammensetzung.
DE3482215D1 (de)	1990-06-13	Photopolymerisierbare zusammensetzung.
FI874483A0 (fi)	1987-10-12	Herbicid komposition.
DE3888400D1 (de)	1994-04-21	Photoresistzusammensetzungen.
DE3871083D1 (de)	1992-06-17	Photopolymerisierbare zusammensetzungen.
DE68919102D1 (de)	1994-12-08	Photopolymerisierbare Zusammensetzung.
DE3768145D1 (de)	1991-04-04	Photopolymerisierbare zusammensetzung.
FI861117A7 (fi)	1987-09-19	Genomfoerningskonstruktion i en maetanordning.
DE3779956D1 (de)	1992-07-30	Photohaertbare zusammensetzung.
DE3877063D1 (de)	1993-02-11	Photopolymerisierbare dentalzusammensetzung.

Legal Events

Date	Code	Title	Description
1992-03-26	8364	No opposition during term of opposition
1994-06-09	8339	Ceased/non-payment of the annual fee