DE3588185D1 - Verfahren zur Herstellung von gemusterten Photoschutzlackschichten - Google Patents
Verfahren zur Herstellung von gemusterten PhotoschutzlackschichtenInfo
- Publication number
- DE3588185D1 DE3588185D1 DE3588185T DE3588185T DE3588185D1 DE 3588185 D1 DE3588185 D1 DE 3588185D1 DE 3588185 T DE3588185 T DE 3588185T DE 3588185 T DE3588185 T DE 3588185T DE 3588185 D1 DE3588185 D1 DE 3588185D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- protective lacquer
- lacquer layers
- patterned photo
- photo protective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US63987584A | 1984-08-13 | 1984-08-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3588185D1 true DE3588185D1 (de) | 1998-06-10 |
| DE3588185T2 DE3588185T2 (de) | 1998-12-17 |
Family
ID=24565935
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19853588185 Expired - Lifetime DE3588185T2 (de) | 1984-08-13 | 1985-08-07 | Verfahren zur Herstellung von gemusterten Photoschutzlackschichten |
| DE8585903964T Expired - Lifetime DE3582491D1 (de) | 1984-08-13 | 1985-08-07 | Verfahren zur herstellung von dessinierten photoschutzlackschichten. |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8585903964T Expired - Lifetime DE3582491D1 (de) | 1984-08-13 | 1985-08-07 | Verfahren zur herstellung von dessinierten photoschutzlackschichten. |
Country Status (4)
| Country | Link |
|---|---|
| EP (2) | EP0193543B1 (de) |
| JP (1) | JPH0769616B2 (de) |
| DE (2) | DE3588185T2 (de) |
| WO (1) | WO1986001313A1 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE900156A (fr) * | 1984-07-13 | 1985-01-14 | Itt Ind Belgium | Procede pour superposer deux couches de vernis photosensibles positifs. |
| EP0282201B1 (de) * | 1987-03-09 | 1994-06-15 | Matsushita Electric Industrial Co., Ltd. | Verfahren zur Herstellung von Mustern |
| JP2653072B2 (ja) * | 1987-12-07 | 1997-09-10 | 松下電器産業株式会社 | パターン形成方法 |
| JPH0474488A (ja) * | 1990-07-16 | 1992-03-09 | Mitsubishi Electric Corp | 半導体レーザ装置およびその製造方法 |
| KR100263900B1 (ko) * | 1993-03-04 | 2000-09-01 | 윤종용 | 마스크 및 그 제조방법 |
| GR1005410B (el) * | 2006-01-20 | 2007-01-31 | Εκεφε "Δημοκριτος" | Μεθοδος εναποθεσης πλειαδας πολυμερικων υλικων σεχημικα ευαισθητες συστοιχιες |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1146297A (en) * | 1965-09-02 | 1969-03-26 | Texas Instruments Inc | Photomask and method for making same |
| JPS51114931A (en) * | 1975-04-02 | 1976-10-09 | Hitachi Ltd | Photoresist pattern formation method |
| US4394437A (en) * | 1981-09-24 | 1983-07-19 | International Business Machines Corporation | Process for increasing resolution of photolithographic images |
| NL8203521A (nl) * | 1982-09-10 | 1984-04-02 | Philips Nv | Werkwijze voor het vervaardigen van een inrichting. |
-
1985
- 1985-08-07 DE DE19853588185 patent/DE3588185T2/de not_active Expired - Lifetime
- 1985-08-07 DE DE8585903964T patent/DE3582491D1/de not_active Expired - Lifetime
- 1985-08-07 EP EP85903964A patent/EP0193543B1/de not_active Expired - Lifetime
- 1985-08-07 EP EP89202373A patent/EP0359342B1/de not_active Expired - Lifetime
- 1985-08-07 JP JP60503480A patent/JPH0769616B2/ja not_active Expired - Lifetime
- 1985-08-07 WO PCT/US1985/001490 patent/WO1986001313A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| EP0359342B1 (de) | 1998-05-06 |
| DE3582491D1 (de) | 1991-05-16 |
| WO1986001313A1 (en) | 1986-02-27 |
| EP0193543B1 (de) | 1991-04-10 |
| DE3588185T2 (de) | 1998-12-17 |
| EP0359342A3 (de) | 1990-11-22 |
| EP0359342A2 (de) | 1990-03-21 |
| EP0193543A1 (de) | 1986-09-10 |
| JPH0769616B2 (ja) | 1995-07-31 |
| JPS61502987A (ja) | 1986-12-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8328 | Change in the person/name/address of the agent |
Free format text: V. BEZOLD & SOZIEN, 80799 MUENCHEN |
|
| 8327 | Change in the person/name/address of the patent owner |
Owner name: HYNIX SEMICONDUCTOR INC., ICHON, KYONGGI, KR Owner name: NCR INTERNATIONAL, INC., DAYTON, OHIO, US |