DE19831392A1 - Two-range reflection reduction for the visible spectral range and a wavelength of: (248 +/- 15) NM - Google Patents
Two-range reflection reduction for the visible spectral range and a wavelength of: (248 +/- 15) NMInfo
- Publication number
- DE19831392A1 DE19831392A1 DE19831392A DE19831392A DE19831392A1 DE 19831392 A1 DE19831392 A1 DE 19831392A1 DE 19831392 A DE19831392 A DE 19831392A DE 19831392 A DE19831392 A DE 19831392A DE 19831392 A1 DE19831392 A1 DE 19831392A1
- Authority
- DE
- Germany
- Prior art keywords
- wavelength
- range
- lambda
- visible spectral
- reflection reduction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003595 spectral effect Effects 0.000 title claims abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 11
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical group O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000000758 substrate Substances 0.000 claims abstract description 5
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical group [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims abstract description 4
- 229910052681 coesite Inorganic materials 0.000 claims abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract 2
- 239000000377 silicon dioxide Substances 0.000 claims abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract 2
- 229910052682 stishovite Inorganic materials 0.000 claims abstract 2
- 229910052905 tridymite Inorganic materials 0.000 claims abstract 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 abstract description 5
- 238000000576 coating method Methods 0.000 abstract description 5
- 239000000463 material Substances 0.000 description 6
- 229910001634 calcium fluoride Inorganic materials 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Glass (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
Darstellung einer reflexionsmindernden Beschichtung, die sowohl im sichtbaren Spektralbereich als auch für die Excimer-Wellenlänge (248 nm) wirkt. Dabei ist zusätzlich zu beachten, daß es sich bei dem Excimer-Laser anwendungsgemäß um einen Leistungslaser zur Materialbearbeitung handelt. Die Beschichtung muß deshalb eine entsprechend hohe Zerstör schwelle aufweisen.Representation of a reflection-reducing coating that both in the visible spectral range and for the Excimer wavelength (248 nm) works. It is in addition to note that the excimer laser is suitable for the application is a power laser for material processing. The Coating must therefore have a correspondingly high level of destruction have threshold.
Wird auf eine hochwertige Vergütung der Linsenoberflächen ver zichtet, hat dies zur Folge, daß zur Erreichung der geforderten Mindestenergien am zu bearbeitenden Material ein Laser mit deutlich höherer Leistung eingesetzt werden muß. In dem hier beschichteten Objektiv sind acht Linsen (gleich 16 Glas-Luft-Flächen) für die Strahlführung von der Laserquelle bis zur Probe konstruktiv notwendig. Würde nun auf die hochwertige Vergütung verzichtet, hätte dies zur Folge, daß ein Reflexionsverlust von ca. 50% ent stehen würde. Ein Laser mit doppelter Leistung müßte folglich eingesetzt werden. Da Anschaffungs- und Unterhaltskosten eines Excimer-Lasers eher überproportional mit dem Leistungszuwachs steigen, ist ersichtlich, daß sich der Aufwand für eine ent sprechende Vergütung der Komponenten lohnt.Is based on a high quality coating of the lens surfaces ceases, this means that to achieve the required Minimum energies on the material to be processed with a laser higher power must be used. In the coated here Objective are eight lenses (equal to 16 glass-air surfaces) for constructive beam guidance from the laser source to the sample necessary. If the high-quality remuneration were now waived, this would result in a reflection loss of approx. 50% would stand. A laser with double power would have to be be used. Since acquisition and maintenance costs are one Excimer lasers rather disproportionately with the increase in output rise, it can be seen that the effort for an ent speaking remuneration of the components is worthwhile.
Ein weiterer Grund für den Einsatz hochwertiger Vergütungsschich ten ist die Vermeidung von Falschlicht. Durch unkontrollierte Re flexionen an den optischen Komponenten kann es zu einer diffusen Hintergrundsbeleuchtung auf der Probe kommen, die einen von der Laserlichtintensität abhängigen definierten Materialabtrag er schwert.Another reason for using high-quality compensation layers is avoiding false light. Through uncontrolled re Flexions on the optical components can lead to a diffuse Backlights come on the sample that one of the Laser light intensity dependent defined material removal sword.
Die gleichzeitige Reflexionsminderung für das sichtbare Spektrum erlaubt die in-Situ-Kontrolle der Strahlführung des Lasers auf der Probe und die Nutzung aller anderen in der Mikroskopie und Bild aufzeichnung üblichen Verfahren.The simultaneous reduction in reflection for the visible spectrum allows the in-situ control of the beam guidance of the laser on the Sample and use everyone else in microscopy and imaging recording usual procedures.
Die hier vorgestellte Zweibereichs-Reflexionsminderung
erfüllt die o. g. For
derungen:
The two-range reflection reduction presented here meets the above requirements:
- - für die UV-tauglichen Materialien Calciumfluorid, Lithiumfluorid, Quarz, Quarzglas und weitere Materia lien, deren Brechzahl bei 248 nm kleiner/gleich 1,6 ist;- for the UV-compatible materials calcium fluoride, Lithium fluoride, quartz, quartz glass and other materia lien, whose refractive index at 248 nm is less than or equal to 1.6 is;
- - dabei werden Zerstörschwellen von 3 J/cm2 für Suprasil und 4 J/cm2 für Calciumfluorid meßtechnisch belegt;- In this case, destruction thresholds of 3 J / cm 2 for Suprasil and 4 J / cm 2 for calcium fluoride are verified by measurement;
- - die gemessene Reflexionsverminderung zeigt die Abb. 1 exemplarisch an Suprasil;- Fig. 1 shows the measured reflection reduction using Suprasil as an example;
- - die gemessene Transmissionserhöhung wird in Abb. 2 an einer beidseitig beschichteten 3 mm dicken Suprasil scheibe gezeigt.- The measured increase in transmission is shown in Fig. 2 on a 3 mm thick Suprasil disc coated on both sides.
Das für die Realisierung notwendige Schichtsystem besteht aus neun Einzelschichten, die ihrerseits aus Magnesium fluorid und Aluminiumoxid bestehen. Die Abb. 3 und 4 zei gen die Rechnungen für GaF2- und SiO2-Substrate. Sowohl bei den Substraten als auch den Schichtmaterialien wird die Dispersion bei der Berechnung berücksichtigt. Die Dicken werden in Lambda/4-Einheiten angegeben.The layer system required for implementation consists of nine individual layers, which in turn consist of magnesium fluoride and aluminum oxide. Figures 3 and 4 show the calculations for GaF 2 and SiO 2 substrates. The dispersion is taken into account in the calculation for both the substrates and the layer materials. The thicknesses are given in lambda / 4 units.
Die Brechzahlen dürfen um ± 0,02 schwanken; die Dicken um ± 5%. Der angenommene Einfallswinkel ist (0 ± 15°).The refractive indices may fluctuate by ± 0.02; the fat ones by ± 5%. The assumed angle of incidence is (0 ± 15 °).
Claims (2)
Substrat: Quarzglas (SiO2)
.373M
.390 K
2.086 M
.320 K
1.124 M
1.467 K
.689M
.320 K
1.044 M
Luft: 1.00,
wobei gilt: M=Magnesiumfluorid (MgF2); K=Aluminiumoxid (Al2O3:); Schichtdicken in Lambda/Viertel-Einheiten; Bezugswellenlänge: 300 nm; Einfallswinkel: (0 ± 15) Grad.1. Two-region reflection reduction layer for the visible spectral range, characterized in that it is additionally effective for a wavelength of lambda = (248 ± 15) nm and has the following structure consisting of nine layers:
Substrate: quartz glass (SiO2)
.373M
.390 K
2,086 M
.320 K
1,124 m
1,467 K
.689M
.320 K
1,044 M
Air: 1.00,
where: M = magnesium fluoride (MgF2); K = aluminum oxide (Al2O3 :); Layer thicknesses in lambda / quarter units; Reference wavelength: 300 nm; Angle of incidence: (0 ± 15) degrees.
Substrat: Calciumfluorid (CaF2)
.500 M
.320 K
2.086 M
.320 K
1.124 M
1.467 K
.570 M
.320 K
1.044 M
Luft: 1.00,
wobei gilt: M=Magnesiumfluorid (MgF2); K=Aluminiumoxid (Al2O3); Schichtdicken in Lambda/Viertel-Einheiten; Bezugswellenlänge: 300 nm; Einfallswinkel: (0 ± 15) Grad.2. Two-region reflection reduction layer for the visible spectral range, characterized in that it is additionally effective for a wavelength of lambda = (248 ± 15) nm and has the following structure consisting of nine layers:
Substrate: calcium fluoride (CaF2)
.500 M
.320 K
2,086 M
.320 K
1,124 m
1,467 K
.570 M
.320 K
1,044 M
Air: 1.00,
where: M = magnesium fluoride (MgF2); K = aluminum oxide (Al2O3); Layer thicknesses in lambda / quarter units; Reference wavelength: 300 nm; Angle of incidence: (0 ± 15) degrees.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19831392A DE19831392A1 (en) | 1998-07-14 | 1998-07-14 | Two-range reflection reduction for the visible spectral range and a wavelength of: (248 +/- 15) NM |
| PCT/DE1999/002186 WO2000003957A2 (en) | 1998-07-14 | 1999-07-14 | Double-range reflection reduction for the visible spectral range |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19831392A DE19831392A1 (en) | 1998-07-14 | 1998-07-14 | Two-range reflection reduction for the visible spectral range and a wavelength of: (248 +/- 15) NM |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE19831392A1 true DE19831392A1 (en) | 2000-02-03 |
Family
ID=7873916
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19831392A Withdrawn DE19831392A1 (en) | 1998-07-14 | 1998-07-14 | Two-range reflection reduction for the visible spectral range and a wavelength of: (248 +/- 15) NM |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE19831392A1 (en) |
| WO (1) | WO2000003957A2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10064143A1 (en) * | 2000-12-15 | 2002-06-20 | Zeiss Carl | Anti-reflection coating for ultraviolet light at large angles of incidence |
| DE10101017A1 (en) * | 2001-01-05 | 2002-07-11 | Zeiss Carl | Optical component used in microlithographic systems for manufacturing highly integrated semiconductor components comprises a substrate with a multiple layer system with layers arranged on the surface of the substrate |
| DE10119909A1 (en) * | 2001-04-23 | 2002-10-31 | Leica Microsystems | Inspection microscope for several wavelength ranges and reflection reducing layer for an inspection microscope for several wavelength ranges |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5390316A (en) * | 1977-01-20 | 1978-08-09 | Nippon Chemical Ind | Reflectionnproof film |
| JP2586527B2 (en) * | 1987-11-26 | 1997-03-05 | ミノルタ株式会社 | Anti-reflective coating |
| US5532871A (en) * | 1992-11-25 | 1996-07-02 | Canon Kabushiki Kaisha | Two-wavelength antireflection film |
| JP3224316B2 (en) * | 1993-09-07 | 2001-10-29 | キヤノン株式会社 | Two-wavelength anti-reflection coating |
-
1998
- 1998-07-14 DE DE19831392A patent/DE19831392A1/en not_active Withdrawn
-
1999
- 1999-07-14 WO PCT/DE1999/002186 patent/WO2000003957A2/en not_active Ceased
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10064143A1 (en) * | 2000-12-15 | 2002-06-20 | Zeiss Carl | Anti-reflection coating for ultraviolet light at large angles of incidence |
| US6697194B2 (en) | 2000-12-15 | 2004-02-24 | Carl Zeiss Smt Ag | Antireflection coating for ultraviolet light at large angles of incidence |
| US6967771B2 (en) | 2000-12-15 | 2005-11-22 | Carl Zeiss Smt Ag | Antireflection coating for ultraviolet light at large angles of incidence |
| DE10101017A1 (en) * | 2001-01-05 | 2002-07-11 | Zeiss Carl | Optical component used in microlithographic systems for manufacturing highly integrated semiconductor components comprises a substrate with a multiple layer system with layers arranged on the surface of the substrate |
| US6825976B2 (en) | 2001-01-05 | 2004-11-30 | Carl Zeiss Smt Ag | Antireflection coating for ultraviolet light |
| DE10119909A1 (en) * | 2001-04-23 | 2002-10-31 | Leica Microsystems | Inspection microscope for several wavelength ranges and reflection reducing layer for an inspection microscope for several wavelength ranges |
| DE10119909B4 (en) * | 2001-04-23 | 2005-04-21 | Leica Microsystems Semiconductor Gmbh | Inspection microscope for the visible and ultraviolet spectral range and reflection reduction layer for the visible and ultraviolet spectral range |
| US7274505B2 (en) | 2001-04-23 | 2007-09-25 | Leica Microsystems Cms Gmbh | Inspection microscope for several wavelength ranges and reflection reducing layer for an inspection microscope for several wavelength ranges |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2000003957A2 (en) | 2000-01-27 |
| WO2000003957A3 (en) | 2000-04-20 |
| WO2000003957A9 (en) | 2000-07-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8139 | Disposal/non-payment of the annual fee |