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DE19831392A1 - Two-range reflection reduction for the visible spectral range and a wavelength of: (248 +/- 15) NM - Google Patents

Two-range reflection reduction for the visible spectral range and a wavelength of: (248 +/- 15) NM

Info

Publication number
DE19831392A1
DE19831392A1 DE19831392A DE19831392A DE19831392A1 DE 19831392 A1 DE19831392 A1 DE 19831392A1 DE 19831392 A DE19831392 A DE 19831392A DE 19831392 A DE19831392 A DE 19831392A DE 19831392 A1 DE19831392 A1 DE 19831392A1
Authority
DE
Germany
Prior art keywords
wavelength
range
lambda
visible spectral
reflection reduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19831392A
Other languages
German (de)
Inventor
Claus Gunkel
Monika Rueger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leica Microsystems CMS GmbH
Original Assignee
Leica Microsystems Wetzlar GmbH
Leica Microsystems CMS GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leica Microsystems Wetzlar GmbH, Leica Microsystems CMS GmbH filed Critical Leica Microsystems Wetzlar GmbH
Priority to DE19831392A priority Critical patent/DE19831392A1/en
Priority to PCT/DE1999/002186 priority patent/WO2000003957A2/en
Publication of DE19831392A1 publication Critical patent/DE19831392A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

The invention relates to a double-range reflection reducing coating for the visible spectral range which consists of nine layers. The reflection-reducing coating is also effective at a wavelength of lambda = (248 +/- 15) nm. The nine layers are made of a substrate containing quartz glass (SiO2); .373 M; .390 K; 2.086 M; .320 K; 1.124 M; 1.467 K; .689 M; .320 K; 1.044 M; and air: 1.00, where M is magnesium fluoride (MgF2) and K is aluminium oxide (Al2O3). The layer thicknesses are configured in quarter-lambda units and the reference wavelength is 300 nm for an angle of incidence of (0 +/- 15) degrees.

Description

Zielaim

Darstellung einer reflexionsmindernden Beschichtung, die sowohl im sichtbaren Spektralbereich als auch für die Excimer-Wellenlänge (248 nm) wirkt. Dabei ist zusätzlich zu beachten, daß es sich bei dem Excimer-Laser anwendungsgemäß um einen Leistungslaser zur Materialbearbeitung handelt. Die Beschichtung muß deshalb eine entsprechend hohe Zerstör­ schwelle aufweisen.Representation of a reflection-reducing coating that both in the visible spectral range and for the Excimer wavelength (248 nm) works. It is in addition to note that the excimer laser is suitable for the application is a power laser for material processing. The Coating must therefore have a correspondingly high level of destruction have threshold.

Wird auf eine hochwertige Vergütung der Linsenoberflächen ver­ zichtet, hat dies zur Folge, daß zur Erreichung der geforderten Mindestenergien am zu bearbeitenden Material ein Laser mit deutlich höherer Leistung eingesetzt werden muß. In dem hier beschichteten Objektiv sind acht Linsen (gleich 16 Glas-Luft-Flächen) für die Strahlführung von der Laserquelle bis zur Probe konstruktiv notwendig. Würde nun auf die hochwertige Vergütung verzichtet, hätte dies zur Folge, daß ein Reflexionsverlust von ca. 50% ent­ stehen würde. Ein Laser mit doppelter Leistung müßte folglich eingesetzt werden. Da Anschaffungs- und Unterhaltskosten eines Excimer-Lasers eher überproportional mit dem Leistungszuwachs steigen, ist ersichtlich, daß sich der Aufwand für eine ent­ sprechende Vergütung der Komponenten lohnt.Is based on a high quality coating of the lens surfaces ceases, this means that to achieve the required Minimum energies on the material to be processed with a laser higher power must be used. In the coated here Objective are eight lenses (equal to 16 glass-air surfaces) for constructive beam guidance from the laser source to the sample necessary. If the high-quality remuneration were now waived, this would result in a reflection loss of approx. 50% would stand. A laser with double power would have to be be used. Since acquisition and maintenance costs are one Excimer lasers rather disproportionately with the increase in output rise, it can be seen that the effort for an ent speaking remuneration of the components is worthwhile.

Ein weiterer Grund für den Einsatz hochwertiger Vergütungsschich­ ten ist die Vermeidung von Falschlicht. Durch unkontrollierte Re­ flexionen an den optischen Komponenten kann es zu einer diffusen Hintergrundsbeleuchtung auf der Probe kommen, die einen von der Laserlichtintensität abhängigen definierten Materialabtrag er­ schwert.Another reason for using high-quality compensation layers is avoiding false light. Through uncontrolled re Flexions on the optical components can lead to a diffuse Backlights come on the sample that one of the Laser light intensity dependent defined material removal sword.

Die gleichzeitige Reflexionsminderung für das sichtbare Spektrum erlaubt die in-Situ-Kontrolle der Strahlführung des Lasers auf der Probe und die Nutzung aller anderen in der Mikroskopie und Bild­ aufzeichnung üblichen Verfahren.The simultaneous reduction in reflection for the visible spectrum allows the in-situ control of the beam guidance of the laser on the Sample and use everyone else in microscopy and imaging recording usual procedures.

ErgebnisResult

Die hier vorgestellte Zweibereichs-Reflexionsminderung erfüllt die o. g. For­ derungen:
The two-range reflection reduction presented here meets the above requirements:

  • - für die UV-tauglichen Materialien Calciumfluorid, Lithiumfluorid, Quarz, Quarzglas und weitere Materia­ lien, deren Brechzahl bei 248 nm kleiner/gleich 1,6 ist;- for the UV-compatible materials calcium fluoride, Lithium fluoride, quartz, quartz glass and other materia lien, whose refractive index at 248 nm is less than or equal to 1.6 is;
  • - dabei werden Zerstörschwellen von 3 J/cm2 für Suprasil und 4 J/cm2 für Calciumfluorid meßtechnisch belegt;- In this case, destruction thresholds of 3 J / cm 2 for Suprasil and 4 J / cm 2 for calcium fluoride are verified by measurement;
  • - die gemessene Reflexionsverminderung zeigt die Abb. 1 exemplarisch an Suprasil;- Fig. 1 shows the measured reflection reduction using Suprasil as an example;
  • - die gemessene Transmissionserhöhung wird in Abb. 2 an einer beidseitig beschichteten 3 mm dicken Suprasil­ scheibe gezeigt.- The measured increase in transmission is shown in Fig. 2 on a 3 mm thick Suprasil disc coated on both sides.
Lösungsolution

Das für die Realisierung notwendige Schichtsystem besteht aus neun Einzelschichten, die ihrerseits aus Magnesium­ fluorid und Aluminiumoxid bestehen. Die Abb. 3 und 4 zei­ gen die Rechnungen für GaF2- und SiO2-Substrate. Sowohl bei den Substraten als auch den Schichtmaterialien wird die Dispersion bei der Berechnung berücksichtigt. Die Dicken werden in Lambda/4-Einheiten angegeben.The layer system required for implementation consists of nine individual layers, which in turn consist of magnesium fluoride and aluminum oxide. Figures 3 and 4 show the calculations for GaF 2 and SiO 2 substrates. The dispersion is taken into account in the calculation for both the substrates and the layer materials. The thicknesses are given in lambda / 4 units.

Die Brechzahlen dürfen um ± 0,02 schwanken; die Dicken um ± 5%. Der angenommene Einfallswinkel ist (0 ± 15°).The refractive indices may fluctuate by ± 0.02; the fat ones by ± 5%. The assumed angle of incidence is (0 ± 15 °).

Claims (2)

1. Zweibereichs-Reflexionsminderungsschicht für den sichtbaren Spektralbereich, dadurch gekennzeichnet, daß sie zusätzlich für eine Wellenlänge von Lambda = (248 ± 15) nm wirksam ist und folgenden, aus neun Schichten bestehenden Aufbau aufweist:
Substrat: Quarzglas (SiO2)
.373M
.390 K
2.086 M
.320 K
1.124 M
1.467 K
.689M
.320 K
1.044 M
Luft: 1.00,
wobei gilt: M=Magnesiumfluorid (MgF2); K=Aluminiumoxid (Al2O3:); Schichtdicken in Lambda/Viertel-Einheiten; Bezugswellenlänge: 300 nm; Einfallswinkel: (0 ± 15) Grad.
1. Two-region reflection reduction layer for the visible spectral range, characterized in that it is additionally effective for a wavelength of lambda = (248 ± 15) nm and has the following structure consisting of nine layers:
Substrate: quartz glass (SiO2)
.373M
.390 K
2,086 M
.320 K
1,124 m
1,467 K
.689M
.320 K
1,044 M
Air: 1.00,
where: M = magnesium fluoride (MgF2); K = aluminum oxide (Al2O3 :); Layer thicknesses in lambda / quarter units; Reference wavelength: 300 nm; Angle of incidence: (0 ± 15) degrees.
2. Zweibereichs-Reflexionsminderungsschicht für den sichtbaren Spektralbereich, dadurch gekennzeichnet, daß sie zusätzlich für eine Wellenlänge von Lambda = (248 ± 15) nm wirksam ist und folgenden, aus neun Schichten bestehenden Aufbau aufweist:
Substrat: Calciumfluorid (CaF2)
.500 M
.320 K
2.086 M
.320 K
1.124 M
1.467 K
.570 M
.320 K
1.044 M
Luft: 1.00,
wobei gilt: M=Magnesiumfluorid (MgF2); K=Aluminiumoxid (Al2O3); Schichtdicken in Lambda/Viertel-Einheiten; Bezugswellenlänge: 300 nm; Einfallswinkel: (0 ± 15) Grad.
2. Two-region reflection reduction layer for the visible spectral range, characterized in that it is additionally effective for a wavelength of lambda = (248 ± 15) nm and has the following structure consisting of nine layers:
Substrate: calcium fluoride (CaF2)
.500 M
.320 K
2,086 M
.320 K
1,124 m
1,467 K
.570 M
.320 K
1,044 M
Air: 1.00,
where: M = magnesium fluoride (MgF2); K = aluminum oxide (Al2O3); Layer thicknesses in lambda / quarter units; Reference wavelength: 300 nm; Angle of incidence: (0 ± 15) degrees.
DE19831392A 1998-07-14 1998-07-14 Two-range reflection reduction for the visible spectral range and a wavelength of: (248 +/- 15) NM Withdrawn DE19831392A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE19831392A DE19831392A1 (en) 1998-07-14 1998-07-14 Two-range reflection reduction for the visible spectral range and a wavelength of: (248 +/- 15) NM
PCT/DE1999/002186 WO2000003957A2 (en) 1998-07-14 1999-07-14 Double-range reflection reduction for the visible spectral range

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19831392A DE19831392A1 (en) 1998-07-14 1998-07-14 Two-range reflection reduction for the visible spectral range and a wavelength of: (248 +/- 15) NM

Publications (1)

Publication Number Publication Date
DE19831392A1 true DE19831392A1 (en) 2000-02-03

Family

ID=7873916

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19831392A Withdrawn DE19831392A1 (en) 1998-07-14 1998-07-14 Two-range reflection reduction for the visible spectral range and a wavelength of: (248 +/- 15) NM

Country Status (2)

Country Link
DE (1) DE19831392A1 (en)
WO (1) WO2000003957A2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10064143A1 (en) * 2000-12-15 2002-06-20 Zeiss Carl Anti-reflection coating for ultraviolet light at large angles of incidence
DE10101017A1 (en) * 2001-01-05 2002-07-11 Zeiss Carl Optical component used in microlithographic systems for manufacturing highly integrated semiconductor components comprises a substrate with a multiple layer system with layers arranged on the surface of the substrate
DE10119909A1 (en) * 2001-04-23 2002-10-31 Leica Microsystems Inspection microscope for several wavelength ranges and reflection reducing layer for an inspection microscope for several wavelength ranges

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5390316A (en) * 1977-01-20 1978-08-09 Nippon Chemical Ind Reflectionnproof film
JP2586527B2 (en) * 1987-11-26 1997-03-05 ミノルタ株式会社 Anti-reflective coating
US5532871A (en) * 1992-11-25 1996-07-02 Canon Kabushiki Kaisha Two-wavelength antireflection film
JP3224316B2 (en) * 1993-09-07 2001-10-29 キヤノン株式会社 Two-wavelength anti-reflection coating

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10064143A1 (en) * 2000-12-15 2002-06-20 Zeiss Carl Anti-reflection coating for ultraviolet light at large angles of incidence
US6697194B2 (en) 2000-12-15 2004-02-24 Carl Zeiss Smt Ag Antireflection coating for ultraviolet light at large angles of incidence
US6967771B2 (en) 2000-12-15 2005-11-22 Carl Zeiss Smt Ag Antireflection coating for ultraviolet light at large angles of incidence
DE10101017A1 (en) * 2001-01-05 2002-07-11 Zeiss Carl Optical component used in microlithographic systems for manufacturing highly integrated semiconductor components comprises a substrate with a multiple layer system with layers arranged on the surface of the substrate
US6825976B2 (en) 2001-01-05 2004-11-30 Carl Zeiss Smt Ag Antireflection coating for ultraviolet light
DE10119909A1 (en) * 2001-04-23 2002-10-31 Leica Microsystems Inspection microscope for several wavelength ranges and reflection reducing layer for an inspection microscope for several wavelength ranges
DE10119909B4 (en) * 2001-04-23 2005-04-21 Leica Microsystems Semiconductor Gmbh Inspection microscope for the visible and ultraviolet spectral range and reflection reduction layer for the visible and ultraviolet spectral range
US7274505B2 (en) 2001-04-23 2007-09-25 Leica Microsystems Cms Gmbh Inspection microscope for several wavelength ranges and reflection reducing layer for an inspection microscope for several wavelength ranges

Also Published As

Publication number Publication date
WO2000003957A2 (en) 2000-01-27
WO2000003957A3 (en) 2000-04-20
WO2000003957A9 (en) 2000-07-20

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